紫外有机发光器件的激子形成区域优化与掺杂调控

采用空穴传输兼发光层CBP和电子传输兼发光层TAZ构建了紫外有机电致发光器件(UVOLED),通过调控功能层厚度可以优化激子形成区域,进而改善器件性能。实验结果表明:CBP厚度的变化对器件性能影响甚微,而TAZ厚度变化则有显著影响。当CBP和TAZ厚度分别为50 nm和30 nm时,获得了最大辐照度为4.4 m W/cm2@270 m A/cm2、外量子效率(EQE)为0.94%@12.5 m A/cm2,发光来自于CBP主发光峰~410nm以及TAZ肩峰~380 nm的UVOLED器件。在此基础上,通过在CBP/TAZ界面引入超薄[CBP∶TAZ]掺杂层可以加速激子复合,降低器件驱动电压,同时还有利于改善载流子平衡性,提高发光效率(最大EQE达到了0.97%@20 m A/cm2)而不影响光谱特性。     

电极修饰层PEO/LiF对聚合物发光二极管发光性能的提高

在以聚合物发光材料poly(2-methoxy-5-(2′-ethylhexyloxy)-1,4-phenylene vinylene)(MEH-PPV)为发光层的聚合物发光二极管(PLEDs)的金属阴极与聚合物发光层之间插入一层绝缘的聚合物poly(ethylene oxide)(PEO),发光器件的发光性能有所提高,尤其是PEO/LiF共同对Al电极修饰时发光器件的开启电压、发光强度、电流效率等性能显著提高。初步分析表明修饰层的插入造成了发光聚合物层与金属电极界面形成势垒,通过空穴堆积抑制空穴的注入,增加电子的注入,并且PEO层可以有效抑制激子在阴极的猝灭。     

一种改善红光顶发射OLED色纯度及角度依赖特性的方法研究

在Si/SiO₂衬底上生长金属银作为阳极,4,4,4-tris(3-methylphenylpheny-lamino)-triphenylamine(m-MTDATA):MoOx/m-MTDATA/N,N-bis-(1-naphthyl)-N,N-diphenyl-1,1-biphenyl-4,4-diamine(NPB)作为空穴注入及传输层,发光层采用4,4-N,N-dicarbazole-biphenyl(CBP)掺杂磷光染料(1-(phenyl)isoquinoline)iridium(III) acetylanetonate(Ir(piq)₂(acac))的结构,4,7-di-phenyl-1,10-phenanthroline(BPhen)作为空穴阻挡层及电子传输层,阴极为LiF(1 nm)/Al(2 nm)/Ag(20 nm)复合阴极结构.通过在光取出的复合阴极上方生长一层CBP光学覆盖层,有效地改善了复合阴极膜系的透射率,从而改善了顶发射结构的光学耦合输出特性,在提高器件的正向发光效率的同时还使色坐标往深红光区移动.并且生长光学覆盖层结构的器件角度依赖特性明显得到改善,这对于制作高显示质量的显示器件具有重要意义.在原有结构的基础上增加20 nm的NPB掺杂磷光染料Ir(piq)₂(acac)作发光层,从而得到双发光层结构为NPB:Ir(piq)₂(acac)(1%,20 nm)/CBP:Ir(piq)₂(acac)(1%, 20 nm).由于NPB具有较高的空穴迁移率,避免了由于光学厚度的增加而引起器件工作电压的大幅升高,而双发光层的结构有利于增大激子复合区域,提高辐射复合几率,减少非辐射损耗,实现主客体之间高效的三线态能量传递,相对单发光层顶发射结构,双发光层结构不仅提高了器件的发光效率,而且改善了器件的色坐标.     

利用电子传输层掺杂改善有机发光器件的效率

利用BCP掺杂到电子传输层Alq中,在掺杂层中阻挡了空穴的迁移,调整了空穴和电子的平衡,将激子有效地限制在发光层中发光,从而增加有机电致发光器件的效率.器件的最大电流效率在外加电压9 V时达到4.1 cd/A(掺杂浓度8%时),与一般未掺杂器件相比效率提高了2倍多.同时也减少空穴到达阴极,而减少发光淬灭.     

一种采用Li3N掺杂电子注入层的底发射倒置结构OLED的制备

采用Li3N掺杂电子注入层Alq3∶Li3N,制作了一种结构为ITO/Alq3 Alq3∶Li3N/Alq3/NPB/MoO3/Al的倒置底发射有机发光器件.其中ITO玻璃作为透明阴极,金属Al作为顶部阳极,在ITO阴极与电子传输层之间加入Li3N n型掺杂层,改善了该器件的电子注入和传输能力|在Al阳极与空穴传输层之间加入MoO3缓冲层,降低了Al阳极与NPB之间较大的空穴注入势垒,改善了空穴注入能力.实验表明:此结构的倒置底发射有机发光器件性能可达到传统结构的常用有机发光器件如ITO/NPB/Alq3/LiF/Al的性能,完全可以满足非晶硅薄膜晶体管有源有机发光器件中驱动电路的匹配及性能要求.     

间隔层对红绿磷光有机电致发光器件发光性能的影响

制备了结构为ITO/MoO₃(40 nm)/NPB(40 nm)/TCTA(10 nm)/CBP∶GIr1(14%)∶R-4B(2%)(20 nm) /间隔层(3 nm)/ CBP∶GIr1(14%)∶R-4B(2%)(10 nm)/BCP(10 nm)/Alq₃(40 nm)/LiF(1 nm)/Al(100 nm) 的有机电致发光器件,间隔层分别为CBP,TCTA,TPBI和BCP,GIr1和R-4B分别为绿红磷光材料。通过加入不同间隔层来调控载流子和激子在发光层内的分布并研究了其对器件发光性能的影响。研究表明TCTA,TPBI和BCP分别作为间隔层的器件较CBP为间隔层的参考器件,电压为6 V时,电流效率分别高出59%,79%和93%,以BCP为间隔层的器件效率最高达到22.58 cd·A-1;TPBI和BCP为间隔层相对于以TCTA为间隔层的器件,在较高的电流密度下,效率滚降更小。分析原因TCTA间隔层较高的LUMO能级和三线态能量将电子和激子限制在较窄的复合区域,提高了载流子相遇形成激子的概率,在较高电流密度下猝灭也更严重;TPBI和BCP由于具有较高的HOMO能级和电子传输能力,拓宽了激子的复合区域。间隔层引起电子或空穴的累积,形成较高的空间电场,有利于发光层相应载流子的注入与传输。由于发光层掺杂方式为红绿共掺,器件均获得了较好的色坐标稳定性。     

高效率和色稳定性的双超薄发光层的黄光有机电致发光器件

主要对rubrene黄光发光材料制作0.1nm厚度的超薄发光层的有机电致发光器件作了研究,并配合BCP空穴阻挡层探讨了对器件效率和色坐标稳定性的影响。双超薄rubrene发光层配合BCP空穴阻挡层的有机电致发光器件的性能得到了很好的改善,外加电压6V时,器件电流效率为6.35cd.A-1;外加电压10V时,器件发光亮度达到了7068cd.m-2。另外,在较大的外加电压驱动范围内,器件的色坐标一直保持在(0.49,0.49)。增加的发光效率和良好的色坐标稳定性主要是取决于空穴与电子的注入与输运平衡以及激子在超薄rubrene发光层中稳定性的复合平衡。     

F16CuPc作为阳极缓冲层对有机太阳能电池性能的显著改善

采用F₁₆CuPc作为有机太阳能电池的阳极缓冲层可使器件的性能得到显著提高。F₁₆CuPc的引入,一方面可以实现CuPc分子的定向生长,从而改善CuPc薄膜的结晶度,提高其空穴迁移率;另一方面在F₁₆CuPc/CuPc界面处可形成偶极层,改善空穴的输出效率。以上两个作用有效提高了器件的载流子收集效率,降低了器件的串联电阻和光生载流子复合几率,从而提高了器件的短路电流和填充因子。同时,F₁₆CuPc的引入使器件的内建电场增大,提高了器件的开路电压。     

注入和输运对单层有机发光器件复合发光的影响

通过分析聚合物电致发光器件中载流子注入、输运、激子的解离与复合过程,提出了激子解离与复合的理论模型. 基于电流连续性方程和Poisson方程,给出了激子复合密度、电流密度及复合效率表达式.研究两电极与有机层之间在Ohmic和Fowler-Nordheim接触条件下载流子迁移率对器件中激子的复合密度及外加电压和注入势垒对器件电流和复合效率的影响.结果表明:1)在一个较宽的注入势垒和迁移率范围内,复合密度不是由两个注入电极的相对注入比决定而是由有机层电子和空穴迁移率之比所支配;2)固定阴极势垒,而阳极势垒由小变大时,器件电流由接触限制向空间电荷限制转变;3)复合效率随外电压升高先增加,当电压达一临界值时而陡降,存在一个最佳的注入势垒值.结果说明:电极与有机层的能带匹配及有机层间的迁移率匹配对器件复合发光有着极其重要的影响.其计算值与所报道的理论结果相符.     

MoO_3作空穴注入层的有机电致发光器件(英文)

研究了三氧化钼(MoO3)薄层作为有机电致发光器件空穴注入层的器件性能和注入机制。发现1nm厚度下发光器件性能最佳,器件的最大电流效率比对比发光器件的最大电流效率提高1.6倍。器件的电容曲线表明MoO3薄层能有效提高空穴载流子的注入,多数载流子开始注入的拐点大约降低了9V。单空穴载流子电流曲线说明MoO3器件的电流注入是空间电荷受限电流注入机制,MoO3使阳极界面处形成欧姆接触,而对比器件的电流注入是陷阱电荷受限电流注入机制。器件的光伏曲线进一步说明器件性能的提高是由于MoO3层能使阳极界面能级分布发生改变,1nmMoO3厚度下器件的内建电势从对比器件的0.25V提高到了0.8V,有效降低了空穴注入势垒,提高了器件性能,但过厚的MoO3层由于增加了器件的串联内阻,会导致器件性能降低。     

绝缘层LiF/Al电极对提高P-PPV发光器件发光性能的研究

为了提高聚合物电致发光器件中Ba（Ca）／Al阴极的稳定性,在该阴极与聚合物发光材料poly（2-（4-ethylexyl）phenyl-1,4-phenylene vinylene）（P-PPV）层之间插入一层7nm的LiF绝缘层,发光器件的发光性能在多项参数（发光器件的电压．电流特性、发光强度及外量子效率,以及电流效率等发光性能指标）上能够与工作性能优良但稳定性较差的Ba（Ca）／Al电极结构PLEDs器件的发光特性具有可比性。这对于研制高效率、高稳定的聚合物电致发光器件并最终将其用于商业目的,具有重大现实意义。     

半导体带间级联激光器研究进展

半导体带间级联量子阱是实现3~5μm波段中红外激光器的重要前沿,其在半导体光电器件技术、气体检测、医学医疗以及自由空间光通信等诸多领域具有重要科学意义和应用价值。半导体带间级联量子阱发光机理是以二类量子阱中的电子与空穴的带间辐射复合发光为主导,再通过电子注入区与空穴注入区形成级联放大,实现多个量子阱周期内电子与空穴的重复利用。本文综述了半导体带间级联激光器从提出能带结构、外延材料到器件制备技术的发展历程,剖析了器件结构各功能区基本概念和工作原理,介绍了器件结构设计与制备工艺技术难点的里程碑突破,详细解释了载流子再平衡、分别限制层等设计,最后展望了半导体带间级联激光器的发展方向和趋势。     

正弦式注入下半导体中过剩载流子的相移寿命

本文用单能级复合中心模型,分析了半导体中正弦式注入下过剩载流子的相移寿命与复合中心参数的关系,由此得出了相移寿命与稳态寿命和瞬态寿命的异同:(1)相移寿命与注入频率有关,随频率的增高而减小。(2)低频注入下电子空穴相移寿命相同,并等于瞬态寿命。文中同时讨论了低频注入的条件。     

光散射谱作为研究半导体材料的探针

本文讨论了半导体材料激发的光散射谱,主要包括传导电子和空穴的单粒子跃迁;具有各种施主态和受主态的束缚电子和空穴的跃迁;杂质和缺陷的局域化振动和电子振动跃迁以及诸如等离子体子散射的集体激发。     

Energy Spectrum of Charge Carriers in Elastically Strained Assemblies of Ge/Si Quantum Dots

The results of studying the energy spectrum of electrons and holes localized in second-type Ge/Si heterostructures with Ge quantum dots are presented. In such structures, holes are localized at Ge quantum dots, and electrons, in three-dimensional quantum wells, which form in Si at the Ge—Si interface because of inhomogeneous deformations that appear as a result of the difference between the Ge and Si lattice constants. It is shown that changes in the deformations in the assembly of quantum dots as a result of a variation in their spatial arrangement significantly changes the binding energy of electrons, the position of their localization at quantum dots, the binding energy and wave-function symmetry of holes at double quantum dots (artificial molecules), and the exchange interaction of electrons and holes in the exciton composition. A practically important result of the presented data is the development of approaches to increase the luminescence quantum efficiency and the absorption coefficient in assemblies of quantum dots.     

高效率的有机电致发光器件

有机电致发光器件 (OL EDs)的发光机理包括电子和空穴从电极的注入、激子的形成及复合发光 ,其中 ,空穴和电子的注入平衡是非常重要的。为了平衡载流子的注入以得到高效率和稳定性好的器件 ,人们不仅使用了电子注入更为有效的 L i F/ Al[1] 和 Cs F/ Al[2 ] 等复合电极 ,同时也使用了空穴缓冲层 ,如 S.A.Van Slyke等 [3]在ITO和 NPB之间使用 Cu Pc,使得器件的稳定性得到了明显的提高 ;A.Gyoutoku等[4 ] 用碳膜使器件的半寿命超过 3 5 0 0小时 ;最近 ,Y.Kurosaka等 [5]和 Z.B.Deng[6 ]分别在 ITO和空穴传输层之间插入一薄层 Al…     

Pivotal role of ballistic and quasi-ballistic electrons on LED efficiency

Significant progress in the power conversion efficiency and brightness of InGaN-based light emitting diodes (LEDs) has paved the way for these devices to be considered for LED lighting. In this realm, however, the efficiency must be retained at high injection levels in order to generate the lumens required. Unfortunately, LEDs undergo a monotonic efficiency degradation starting at current densities even lower than 50 A/cm² which would hinder LED insertion into the general lighting market. The physical origins for the loss of efficiency retention are at present a topic of intense debate given its enormous implications. This paper reviews the current status of the field regarding the mechanisms that have been put forward as being responsible for the loss of efficiency, such as Auger recombination, electron overflow (spillover), current crowding, asymmetric injection of electrons and holes, and poor transport of holes through the active region, the last one being applicable to multiple quantum well designs. While the Auger recombination received early attention, increasing number of researchers seem to think otherwise at the moment in that it alone (if any) cannot explain the progressively worsening loss of efficiency reduction as the InN mole fraction is increased. Increasing number of reports seems to suggest that the electron overflow is one of the major causes of efficiency degradation. The physical driving force for this is likely to be the relatively poor hole concentration and transport, and skewed injection favoring electrons owing to their relatively high concentration. Most intriguingly there is recent experimental convincing evidence to suggest that quasi-ballistic electrons in the active region, which are not able to thermalize within the residence time and possibly longitudinal optical phonon lifetime, contribute to the carrier overflow which would require an entirely new thought process in the realm of LEDs.     

Analysis of the planar transistor at medium and high injection levels

The processes occurring in the base of a planar transistor of the p-n-p type at medium and high injection levels were investigated by an approximate method, taking into account explicity the space charge, the electric field, and scattering at moving carriers. For nonstationary injection the current densities are described by the used combination of hyperbolic functions.Notation pa, n0 equilibrium concentration of holes and elections - Tp, rn lifetime of holes and electrons taking into account surface recombination - jp, jn current density of holes and electrons - Dp, Dn, p, jjn diffusion coefficients and mobilities for holes and electrons respectively - NA, NQ concentration of acceptor and donor impurities - E electric field intensity - q charge per hole - s dielectric constant of semiconductor - b = Mn/Mp! x coordinate measured from emitter towards collector - Wn width of base - Wp width of emitter region - d(Vc) width of p-n junction with reverse bias Vc at junction - k Boltzman's constant - T absolute temperatme - h Planck's constant - mo mass of free electron     

Trap-assisted tunneling hole injection in SiO<Subscript>2</Subscript>: Experiment and theory

The injection of holes from silicon through silicon oxide (SiO₂) in a tantalum nitride-aluminum oxide-silicon nitride-silicon oxide-silicon (TANOS) structure has been studied experimentally. Using the high-permittivity Al₂O₃ insulator as a blocking one suppresses the parasitic injection of electrons from the conducting TaN contact. This allows the injection of holes from the substrate into nitride to be studied up to comparatively high electric fields. The experimental data are not described by the standard Fowler-Nordheim law with reasonable physical parameters. At the same time, these data are in good agreement with the model of trap-assisted tunneling hole injection in SiO₂. The developed theory shows that the traps in a narrow energy band make a major contribution to this process, i.e., this injection is resonant in nature.     

电子传输层厚度及阻塞层对量子点发光二极管性能的影响

针对量子点发光二极管(QLED)中载流子注入不平衡的问题,对空穴和电子在量子点层的注入速率进行了研究。制备了不同电子传输层厚度、结构为ITO/PEDOT∶PSS/Poly-TPD/QDs/Alq3/Al的QLED样品。Alq_3厚度由25 nm逐步递增至45 nm时,器件的开启电压升高,器件均发出量子点的红光。当Alq_3厚度为30nm时,器件的电流效率最高。此时,空穴和电子在量子点层的注入速率达到相对平衡。为进一步研究器件的发光特性,在QDs和Alq_3接触界面嵌入电子阻塞层TPD。研究发现,当TPD的厚度为1 nm时,器件发出红光;当TPD厚度为3 nm和5 nm时,器件开始出现绿光。实验结果表明,在选取电子阻塞层时,应选择LUMO较低的材料且阻塞层的厚度必须很薄。