大面积10000线/毫米软X射线金属型透射光栅的设计、制作与检测

基于严格的矢量耦合波理论,优化设计了用于13.4nm软X射线干涉光刻的透射型双光栅掩模版. 采用电子束光刻技术,在国内首次成功制作了周期为100nm的大面积金属型透射光栅.光栅面积为1.5mm ×1.5mm,Cr浮雕厚度为50nm,Gap/period为0.6,衬底Si₃N₄厚度为100nm. 此光栅将用于上海光源软X射线干涉光刻实验站.利用其1级衍射光和2级衍射光将可以经济高效地制作周期为50和25nm的大面积周期结构.最后,测量了该光栅对波长为13.4nm 同步辐射光的衍射光强度,并且推算得出该光栅的1级和2级衍射效率分别为4.41%和0.49%,与理论设计值比较符合.实验结果与理论模拟结果的对比表明该光栅侧壁陡直,Gap/period的控制也与设计值符合. 关键词： 软X射线金属型透射光栅 严格耦合波方法 衍射效率 软X射线干涉光刻     

复色光源X射线光栅衍射效率

基于Fresnel衍射理论,分析了复色光源X射线光栅衍射效率.研究了X射线光栅不同材料、不同槽深、源的谱分布及不同占空比对衍射效率及成像质量的影响,给出这些参量的选择方法.主要考虑了各种参量对光栅0级及1级衍射强度的影响.发现高Z元素的物质不适合做X射线光栅材料,低Z元素Be、Si、Al及有机物PMMA等较适合18~30 keV波段的X射线光栅.源的谱分布决定了光栅槽深选择.数值计算给出了Si光栅各种参量的具体值.     

偶氮苯聚合物全息光栅衍射效率和偏振特性研究

研究了不同偏振全息模式下基于交联偶氮苯聚合物薄膜的相位光栅的形成机理、衍射效率和偏振特性.利用琼斯矢量表征了正交线偏振(SP)和半行线偏振(SS)干涉模式下的偏振干涉场.基于SP和SS两种模式,制作了无明显表成起伏的纯折射率光栅和有表面起伏的浮雕光栅.偏光显微镜(POM)观测说明纯折射率光栅具有周期性的折射率分布;近场光学显微镜(SNOM)探测说明纯折射率光栅和浮雕光栅的表而起伏在5 nm以下和 85.23 nm.实验表明.当探测光为水平偏振时,纯折射率光栅的衍射效率达到22.2%.浮雕光栅只能达到1.65%.纯折射率光栅的0、 1级衍射光分别为水平和竖直线偏振光,偏振度达到0.9969和0.9963;浮雕光栅的0, 1级衍射光均为水平线偏振光.     

激光等离子体软X射线辐射能谱时间分辨测量研究

利用(国内最近研制成功的)带聚酰亚胺膜底衬的金透射光栅与软X射线条纹相机相配合,(在LF11~#激光装置上)使用波长为0.53μm的激光打靶,测量了平面Au靶软X射线时间分辨能谱。测量结果观察到了金等离子体的O带辐射强度随时间增加的现象。文章计算了光栅的衍射效率,并讨论了影响测量谱的几个关键因素。     

X射线光栅相位成像的理论和方法

通过对X射线光栅相位衬度成像实验装置的理论分析,提出了光栅位移曲线的表达式,推导出了X射线光栅相位衬度成像方程.根据该成像方程,提出了基于光栅成像相位提取方法.这些理论结果将简化光栅相位衬度成像实验步骤,提高信息获取效率,并为X射线光栅相位衬度成像和计算机断层成像的结合,进一步提出光栅相位衬度CT的简化理论奠定基础. 关键词： X射线 相位衬度成像 光栅衍射 Talbot效应     

软X射线聚焦波带片相对衍射特性的实验研究

通过测量软X射线相位型和振幅型聚焦波带片的一级衍射强度,实验得到了自行研制的两种相位型软X射线聚焦波带片的相对衍射特性。测量实验装置简单,调节相对容易。选择合适的针孔大小可使得接收信号有足够的信噪比。对波带片聚酰亚胺衬底的厚度进行了归一化。分别将3个镍和锗波带片的一级衍射强度与金波带片进行了比较。在3.2nm工作波长,研制的镍、锗软X射线相位型波带片的平均一级衍射效率分别是软X射线振幅型金波带片一级衍射效率的1.60和1.26倍,与理论值1.77和1.34很接近。测试结果表明,我们制作的相位型波带片具有较高精度。     

基于多层膜技术的硬X射线Laue透镜衍射效率的理论研究

采用耦合波理论分析了X射线在多层膜Laue透镜中的传播,选择Cu的Kα线作X射线光源,计算了多层膜Laue透镜的衍射效率.材料为WSi2/Si,最外层宽度为10 nm,深度为8 500 nm的多层膜Laue透镜,倾斜情况下外层区域局部光栅的衍射效率可达59%,理论上证明了多层膜Laue透镜是实现X射线聚焦的有效手段.     

浮雕型全息相位光栅的衍射

本文从理论上推导出了浮雕型相位全息光栅所满足的衍射方程式,并数值计算了光刻胶四种情况下的+1级衍射光的衍射效率与相位光栅刻蚀深度的关系.还和大量实际拍摄的全息光栅作了比较,发现它基本上都能与实验相符；文中还指出了如何选择拍摄参数来控制光栅的刻蚀深度,以确保制作高衍射效率和高信噪比的PET(聚酯薄膜)模压全息片所需要的光刻胶母版拍摄.     

软X射线能谱定量测量技术研究

采用每毫米1000线的自支撑透射光栅配上背照射软X射线CCD(charge coupled device)组成了透射光栅谱仪,利用北京同步辐射装置(BSRF)3W1B光束线软X射线实验站上X射线源分别对透射光栅的衍射效率和软X射线CCD的响应灵敏度进行了准确的实验标定,获得了150eV到1500eV能区的绝对衍射效率和响应灵敏度的实验结果;同时在国内外研究工作的基础上,发展了自己的透射光栅衍射效率理论计算模型和X射线CCD响应灵敏度计算模型,开展了相应的理论计算和实验标定结果比对工作,理论和实验符合较好,     

基于严格耦合波理论的宽光谱金属介质膜光栅衍射特性分析

基于严格耦合波理论建立了金属介质膜光栅的衍射机理模型,给出了TE模式金属介质膜光栅衍射效率的表达式.以-1级衍射效率和工作带宽为评价函数,对金属介质膜光栅的表面浮雕结构进行了优化设计.对于800 nm和1053 nm为中心的TE波,设计的金属介质膜光栅-1级衍射效率优于97%的工作带宽分别达到130 nm和150 nm,最后讨论了设计的宽光谱高衍射效率金属介质膜光栅的制备工艺容差.此研究对于提高脉宽压缩光栅的性能具有重要的意义. 关键词： 衍射效率 金属介质膜光栅 严格耦合波理论     

SiC/W/Ir multilayer-coated grating for enhanced efficiency in 50-100 nm wavelength range in Seya-Namioka mount

A broadband [SiC/W/Ir](2) multilayer coating was deposited onto a diffraction grating to enhance the grating efficiency in the 50-100 nm wavelength range in a Seya-Namioka mount. The holographic ion-beam etched grating had a laminar profile with 1200 lines/mm. The coating was designed by using the subquarterwave multilayer theory. The measurement results show that the efficiency in the -1st diffraction order is greater than 9.3% throughout the wavelength range of 50-100 nm, which is obviously higher than that of single-layer gratings with SiC, Ir, or Au coatings.     

Phase diffractive optical gratings on glass substrates by laser ablation

A novel and rapid laser ablation method for the fabrication of phase diffractive gratings in low-cost glass substrates is presented. The structures are characterized in terms of their shape and physical parameters by confocal microscopy and SEM microscopy. The first-order diffraction efficiency at normal incidence under 632.8 nm wavelength is shown. The influence of the overlap factor on the period grating is studied.     

Electromagnetic effects for the resonance-domain IR diffractive optics

Binary optics technology enables the manufacture of arrays of diffractive micro-optical elements which are used in many optoelectronic devices, e.g. the focal plane collection optics. The first-order diffraction grating efficiency decreases in the best part of the resonance-domain region of diffraction, i.e. when the grating period is close to the optical wavelength in the substrate material. A large fraction of the fast binary lens surface relief is built of staircase annular structures whose width is of wavelength scale. Therefore, the rigorous electromagnetic theory of gratings has been applied in this paper to calculate and analyze the diffraction effects for the resonance-domain longwave (8–12 μm) infrared (LWIR) binary optics. It is shown that electromagnetic effects limit the speed of the LWIR first-order diffractive lenses and the optical gain achievable with the diffractive lenses used as the focal plane collection optics in the IR detection systems.     

Phase diffraction gratings based on a Si(400) crystal

The X-ray optical properties of diffraction gratings fabricated on the basis of a Si(400) crystal with a period of D = 1 μm are studied by triple-crystal X-ray diffractometry. The diffraction gratings are manufactured both by silicon profiling during the process of plasma chemical etching and by forming a phase-shift grating on the surface of a Si crystal. The principal difference in the diffraction properties of these gratings is demonstrated. The presence of an Au phase-shift grating is shown to lead to the formation of a two-dimensional diffraction pattern, whereas Si profiling leads to the formation of only a one-dimensional diffraction pattern.     

Direct Fabrication Methods of Surface Relief Electro-Optic Gratings in Azo-Polymer Films

Two fabrication methods of surface relief electro-optic (EO) gratings in azo-polymer films are described: surface deformation by a continuous wave laser and laser ablation by a pulse laser. In the fabrication process, the periodic intensity modulation of laser beams is formed by an interference fringe or a phase mask. The surface relief EO grating is fabricated by poling the surface relief grating (SRG) after the SRG fabrication process. The linear dependence of an applied voltage in the modulation efficiency of the first-order diffraction beam is observed. The proposed methods are effective for highly-efficient surface relief EO grating fabrication.     

Highly resolved EUV beam-foil spectra of silicon

Spectra of foil-excited ions at tandem energies in the EUV region show many unclassified lines. In order to provide a basis for term analysis, high resolution spectra of Si are taken using a ruled 600 l/mm grating in 3^rd diffraction order and two holographic gratings of 1,200 l/mm resp. 3,600 l/mm in first diffraction order. With the latter grating the resolution power of a 2.2 m grazing-incidence monochromator is sufficient to measure fine-structure splittings of inter-shell transitions of O VI–O VIII and Si X–Si XII in the wavelength rangeλ < 20 nm. The performance of the gratings is demonstrated.     

多层介质膜脉宽压缩光栅的严格矢量分析

用于展宽和压缩激光脉冲的多层膜脉宽压缩光栅是由多层介质高反膜和位于其顶层的浮雕光栅构成。以设计的高反射多层膜为基础,利用傅里叶模式理论分析了其衍射场分布,给出了TE波自准直角入射的使用条件下,多层介质膜脉宽压缩光栅衍射效率的表达式。以-1级衍射效率为评价函数,分别讨论了HfO2和SiO2为顶层材料时,多层膜脉宽压缩光栅-1级衍射效率高于0.95的光栅结构参量范围。结果表明,在该条件下,选择HfO2为顶层材料时,光栅结构参量有较大的取值范围。给出了优化的光栅结构参量,并分析了光栅制作误差及其使用条件的宽容度,对光栅制作工艺和使用具有一定的指导意义。     

High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region

We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An Mo/Si multilayer-coated specimen with a blaze angle of 1.9 degrees was fabricated and measured. At an incident angle of 10 degrees and a wavelength of 13.62 nm, the diffraction efficiency of the negative second order reaches 36.2%.