厚度对未掺杂ZnO薄膜光谱性能的影响

X射线衍射光谱、拉曼光谱和紫外可见透射光谱技术是薄膜材料检测的重要技术手段.通过对薄膜材料光谱性能的分析,可以获得薄膜材料的物相、晶体结构和透光性能等信息.为了解厚度对未掺杂ZnO薄膜的X射线衍射光谱、拉曼光谱和紫外可见透射光谱性能的影响,利用溶胶-凝胶法在石英衬底上旋涂制备了不同厚度的未掺杂ZnO薄膜样品,并对薄膜样...     

Thickness Dependence of Photoconductance in Strained BiFeO3 Thin Films With Planar Device Geometry

The recent discovery of efficient charge separation in tetragonal–rhombohedral (T‐R) polymorphic phase boundaries (PPBs) in strained BiFeO₃ (BFO) films is of great interest, and also raised a question of whether the PPBs could enhance the performance of BFO‐based planar photodetectors. To address it, we prepare BFO films with thickness ranging from 8 to 90 nm on the LaAlO₃ substrates, in which the BFO evolves from a pure T phase (without PPBs) to a T‐R mixed phase (with PPBs) due to the strain relaxation. Then, we comparatively investigate the photoconductive properties of these BFO films with the planar device geometry. It is found that the photoconductance first increases and then decreases with increasing film thickness. Particularly, the 50‐nm film containing the pure T phase without any detectable PPBs exhibits the highest photoconductance. This unexpected observation can be understood by analyzing the effects of increasing film thickness and associated phase evolution on the photoconduction‐related parameters.     

Effects of Thickness and Temperature on Thermoelectric Properties of Bi_2Te_3-Based Thin Films

Bi_2Te_3 thin films and GeTe/B_2Te_3 superlattices of different thicknesses are prepared on the silicon dioxide substrates by magnetron sputtering technique and thermally annealed at 573 K for 30 min. Thermoelectric(TE)measurements indicate that optimal thickness and thickness ratio improve the TE performance of Bi_2Te_3 thin films and GeTe/B_2Te_3 superlattices, respectively. High TE performances with figure-of-merit(ZT) values as high as 1.32 and 1.56 are achieved at 443 K for 30 nm and 50 nm Bi_2Te_3 thin films, respectively. These ZT values are higher than those of p-type Bi_2Te_3 alloys as reported. Relatively high ZT of the GeTe/B_2Te_3 superlattices at 300-380 K were 0.62-0.76. The achieved high ZT value may be attributed to the unique nano-and microstructures of the films,which increase phonon scattering and reduce thermal conductivity. The results indicate that Bi_2Te_3-based thin films can serve as high-performance materials for applications in TE devices.     

膜层厚度对蓝宝石衬底上生长的ITO薄膜性质的影响

采用磁控溅射的方法在蓝宝石衬底上制备了氧化铟锡(ITO)透明氧化物薄膜;研究了不同厚度薄膜的结构、光学和电学特性。经X射线衍射(XRD)测量,发现在蓝宝石衬底上生长的ITO薄膜呈现了较高的(222)择优取向;随着膜层厚度的增加,该衍射峰对应的2θ衍射角逐渐向大角度方向移动,同时该衍射峰的半峰全宽逐渐减小,平均晶粒尺寸增大。 经光学透射光谱测量,发现随着膜层厚度的增加,光学透过率逐渐减小。膜层厚度为0.2 μm时,可见光透过率超过80%,当膜层厚度为0.8 μm时,可见光透过率下降到60%。电学测量结果表明,随着膜层厚度的增加,薄膜电阻率逐渐减小。膜层厚度为0.2 μm时,电阻率为9×10^-4 Ω·cm, 膜层厚度为0.8 μm时,电阻率为5.5×10^-4 Ω·cm。     

Effects of Substitution of Sm for Bi in BiFeO3 Thin Films Prepared by the Sol-Gel Method

Bi1-xSmxFeO3 films with x= 0, 0.03, 0.05, 0.07 and 0.10 are prepared on LaNiO3/Si（100） substrates by the sol-gel method. X-ray diffraction patterns reveal that pure phase films with random orientations are fabricated. The results of SEM indicate that films with denser surfaces are obtained by Sm substitution. At the doping level of x=0.05, remnant polarization Pr increases to 3.19 μC/cm2 from 1.12 μC/cm2 of the un-substituted BiFeO3 film and shows enhanced ferroelectricity at room temperature. Because of the low leakage current density in the high electric field region, a polarization hysteresis loop with remanent polarization of 5.15 μC/cm2 is observed in the 0.10 Sm-substituted BiFeO3 films at the applied electric field of 226 kV/cm. Through the substitution of Sm, the leakage current density is reduced for the films with x= 0.07-0.10.     

应变对La_(1-x)Sr_xMnO_3薄膜的物理性质的影响(英文)

Both tensile strain and compressive strain effects on the properties of La_(1-x)Sr_xMnO_3 (x=0.1) films were investigated.The films on SrTiO_3 (100) display 'unusual' tensile strain~([1]), which supports a ferromagnetic metallic behavior when film thickness is larger than 10nm.The films on NdGaO_3 (100) presenting compressive strain, on the other hand, demonstrate strongly enhanced insulating behavior.Inordertoobtainunambiguousresults,allfilmsampleswerepreparedusingthesamedepositionconditi…     

半导体薄膜场发射中的膜厚影响

考虑到薄膜中的电子散射,发展与完善了现有的场发射F-N(Fowler-Nordheim)模型,理论研究了不同厚度的半导体薄膜对其场发射性能的影响。结果表明:薄膜厚度对场发射性能的影响是非常显著的,随着薄膜厚度的增加,将相继出现极差膜厚值与最佳膜厚值,理论计算很好地验证了已有的实验结果;并进一步理论分析了半导体薄膜场发射性能随膜厚变化行为的物理实质,其可能来源于有效隧穿势垒面积的改变及电流密度在薄膜中的散射衰减。     

退火对ZnO薄膜质量的影响

用金属有机化学气相沉积法（MOCVD）在蓝宝石（0001）衬底上制备了c轴取向的高质量的ZnO薄膜,通过在生长温度下氧气和氮气中退火处理的比较,研究了退火对ZnO薄膜结构和发光特性的影响。通过X射线衍射测量得知,经过氮气和氧气退火都可以使其002峰增强,且在氧退火中表现得尤为明显。光致发光测量发现氮气中退火的ZnO薄膜的紫外发光峰明显增强,而深能级发光峰明显减弱;而氧气中退火的ZnO薄膜的紫外发光峰略有减弱,而深能级峰显著增强。     

Magnetic Properties of Heisenberg Thin Films in an External Field

The magnetic properties of Heisenberg ferromagnetic films in an external magnetic field are investigated by means of the variational cumulant expansion (VCE). The magnetization can be in principle calculated analytically as the function of the temperature and the number of atomic layers in the film to an arbitrary order of accuracy in the VCE. We calculate the spontaneous magnetization and coercivity to the third order for spin-1/2 Heisenberg films with simple cubic lattices by using a graphic technique.     

Optical and Structural Properties of Ammonia-Free Amorphous Silicon Nitride Thin Films for Photovoltaic Applications

Hydrogenated amorphous silicon nitride (a-SiN_x:H) thin films have been deposited through the green chemistry route using silane (SiH₄) and nitrogen (N₂) as process gases with SiH₄ flow being variable and N₂ flow being constant without the use of pollutant and corrosive ammonia (NH₃) by the plasma-enhanced chemical vapor deposition technique at 13.56 MHz. Fourier transform infrared spectroscopy analysis shows various possible vibrational modes of Si-H, Si-N, and N-H bonds present in the film. Raman spectroscopy is performed on these samples to calculate volume fractions corresponding to amorphous phases present in the a-SiN_x:H films. The refractive index (η) values are calculated using Swanepoel's method, which are in the range of 2.89 to 3.17. The thickness of the deposited films has been evaluated using transmission spectra. Absorption coefficient and band gap (E _g) values are obtained from optical absorption studies. An increase in the E _g and a decrease in the η value have been observed for the samples grown with decreasing SiH₄ flow.     

Magnetic Properties of Heisenberg Thin Films in an External Field

The magnetic properties of Heisenberg ferromagnetic films in an external magnetic field are investigated by means of the variational cumulant expansion (VCE). The magnetization can be in principle calculated analytically as the function of the temperature and the number of atomic layers in the film to an arbitrary order of accuracy in the VCE. We calculate the spontaneous magnetization and coercivity to the third order for spin-1/2 Heisenberg films with simple cubic lattices by using a graphic technique.     

Field Emission Properties of Ball-Like Nano-Carbon Thin Films Deposited on Mo Films with Accidented Topography

Ball-like nano-earbon thin films （BNCTs） are grown on Mo layers by microwave plasma chemical vapour deposition （MPCVD） system. The Mo layers are deposited on ceramic substrates by electron beam deposition method and are pretreated by ultrasonically scratching. The optimization effects of ultrasonically scratching pretreatment on the surface micro-structures of carbon films are studied. It is found from field-emission scanning electron microscope （FE-SEM） images and Raman spectra that the surface structures of the carbon films deposited on Mo pretreated are improved, which are composed of highly uniform nano-structured carbon balls with considerable disorder structures. Field emission （FE） measurements are carried out using a diode structure. The experimental results indicate that the BNCTs exhibit good FE properties, which have the turn on field of 1.56 V/μm, and the current density of 1.0mA/cm^2 at electric field of 4.0 V/μm, the uniformly distributed emission site density from a broad well-proportioned emission area of 4 cm^2 are also obtained. Linearity is observed in Fowler Nordheim （F N） plots in higher field region, and the possible emission mechanism of BNCTs is discussed.     

WO3薄膜的电致变色特性研究

介绍了ＷＯ３电致变色薄膜的变色机理和制备工艺，对ＷＯ３薄膜的电阻率，结构，化学组玢，电化学特性和变性性能等特性进行了工艺，提出了ＷＯ３薄膜的一种新的锂化方法，这种方法对进一步研制全固态电致变色薄膜器件是十分关键的。     

低温缓冲层对氧化锌薄膜质量的影响

利用金属有机化学气相沉积(MOCVD)法,在Si衬底上外延生长ZnO薄膜。为了改善氧化锌薄膜的质量,首先在Si衬底上生长低温ZnO缓冲层,然后再生长高质量的ZnO薄膜。通过XRD、SEM、光致发光(PL)光谱的实验研究,发现低温ZnO缓冲层可有效降低ZnO薄膜和Si衬底之间的晶格失配以及因热膨胀系数不同引起的晶格畸变。利用低温缓冲层生长的ZnO薄膜的(002)面衍射峰的强度要比直接在Si上生长的ZnO薄膜样品的高,并且衍射峰的半高宽也由0.21°减小到0.18°,同时有低温缓冲层的样品室温下的光致发光峰也有了明显的增高。这说明利用低温缓冲层生长的ZnO薄膜的结晶质量和光学性质都得到了明显改善。     

退火处理对YMnO3薄膜的结构和荧光性能的影响

室温下,采用脉冲激光沉积方法在Si(100)衬底上制备了YMnO3薄膜,并对其进行了不同温度的退火处理。采用X射线衍射和荧光光谱分析方法对薄膜的结构和荧光特性进行了研究。结果表明:通过退火处理,可以得到正交相和六方相共存的多晶态YMnO3薄膜,并且随着退火温度的升高,两相的比例发生变化,由正交相为主转变为六方相为主。YMnO3薄膜样品的荧光发射峰集中在波长430～620nm范围内,可能是由Mn3 离子从5T2到5E之间的能级跃迁所引起的。其荧光强度随着退火温度的升高逐渐增强,但峰位基本保持不变,说明薄膜结构的改变对Mn3 离子的能级跃迁几率有明显的影响,对能级位置的影响不大;而且荧光光谱还显示在同一薄膜中各个荧光峰的相对强度随着退火温度的变化不大。     

Effects of Annealing Temperature on Structural and Optical Properties of ZnO Thin Films

The effects of annealing temperature on the structural and optical properties of ZnO films grown on Si （100） substrates by sol-gel spin-coating are investigated. The structural and optical properties are characterized by x-ray diffraction, scanning electron microscopy and photoluminescence spectra. X-ray diffraction analysis shows the crystal quality of ZnO films becomes better after annealing at high temperature. The grain size increases with the temperature increasing. It is found that the tensile stress in the plane of ZnO films first increases and then decreases with the annealing temperature increasing, reaching the maximum value of 1.8 GPa at 700℃. PL spectra of ZnO films annealed at various temperatures consists of a near band edge emission around 380 nm and visible emissions due to the electronic defects, which are related to deep level emissions, such as oxide antisite （OZn）, interstitial oxygen （Oi）, interstitial zinc （Zni） and zinc vacancy （VZn^-）, which are generated during annealing process. The evolution of defects is analyzed by PL spectra based on the energy of the electronic transitions.     

Improved Polarization Retention of BiFeO_3 Thin Films Using GdScO_3 (110) Substrates

Epitaxial ferroelectric thin films on single-crystal substrates generally show a preferred domain orientation in one direction over the other in demonstration of a poor polarization retention. This behavior will affect their application in nonvolatile ferroelectric random access memories where bipolar polarization states are used to store the logic 0 and 1 data. Here the retention characteristics of BiFeO_3 thin films with SrRuO_3 bottom electrodes on both GdScO_3(110) and SrTiO_3(100) substrates are studied and compared, and the results of piezoresponse force microscopy provide a long time retention property of the films on two substrates. It is found that bismuth ferrite thin films grown on GdScO_3 substrates show no preferred domain variants in comparison with the preferred downward polarization orientation toward bottom electrodes on SrTiO_3 substrates. The retention test from a positive-up domain to a negative-down domain using a signal generator and an oscilloscope coincidentally shows bistable polarization states on the GdScO_3 substrate over a measuring time of 500 s, unlike the preferred domain orientation on SrTiO_3, where more than 65% of upward domains disappear after 1 s. In addition, different sizes of domains have been written and read by using the scanning tip of piezoresponse force microscopy; where the polarization can stabilize over one month. This study paves one route to improve the polarization retention property through the optimization of the lattice-mismatched stresses between films and substrates.     

Electronic Spectra and Fluorescence Polarization Kinetics of Thin Zn-Porphyrin Films

The photophysical properties of thin films of Zn-monopyridyltriphenylporphyrin (Zn(4-Py)TrPP) obtained by the method of centrifugation on a quartz film substrate have been investigated. The results of the analysis of the measured excitation and luminescence spectra and also of the kinetic curves of fluorescence depolarization, as they decay, of the Zn(4-Py)TrPP films permit the conclusion that Zn-meso-monopyridylporphyrins self-organize into aggregates. The symmetric closed tetramer ([Zn(4-Py)TrPP]₄) seems to be the most probable aggregate of Zn-meso-monopyridylporphyrins.     

Temperature and Thickness Effects on Electrical Properties of InP Films Deposited by Spray Pyrolysis

InP film samples are prepared by spray pyrolysis technique using aqueous solutions of InCl₃ and Na₂HPO₄, which are atomized with compressed air as carrier gas onto glass substrates at 500°C with different thicknesses of the films. The structural properties of the samples are determined by x-ray diffraction (XRD). It is found that the crystal structure of the InP films is polycrystalline hexagonal. The orientations of all the obtained films are along the c-axis perpendicular to the substrate. The electrical measurements of the samples are obtained by dc four-probe technique on rectangular-shape samples. The effects of temperature on the electrical properties of the InP films are studied in detail.