二氧化钛薄膜的制备及退火对其形貌、结构的影响

利用磁控溅射技术,在石英基片上沉积Ti膜,分别在400、600、700、900℃的大气中退火获得TiO2薄膜。采用这种制备方式获得的TiO2薄膜呈现不同的颜色,退火温度为400℃的样品为暗紫红色,600℃时为黑色,而在700℃和900℃时均为黄色。采用X射线衍射、扫描电子显微镜（SEM）以及Raman光谱等手段研究了退火温度对TiO2薄膜的结构和形貌的影响。结果表明：退火温度为400℃时,TiO2薄膜为锐钛矿相,温度升高至600℃时,几乎转变为金红石晶相,但仍存在微量锐钛矿相,温度升高至700℃以上,则完全转变为金红石晶相。由XRD衍射图可知退火温度为700℃和900℃时,薄膜的金红石相沿（101）晶面择优取向。     

光学薄膜激光诱导损伤机理研究

基于电子密度演化模型,借助数值方法,研究了飞秒激光作用下光学薄膜内的电子密度演化过程,讨论了初始电子密度Ni和激光脉冲宽度τ对光学薄膜激光损伤阈值Fth的影响,分析了激光诱导薄膜损伤过程中MPI和AI的性质和作用.研究结果表明,对应于一定的脉宽,存在一个临界初始电子密度,当Ni低于这一临界密度时,Fth不受Ni影响;当Ni高于临界密度时,Fth随Ni增加而降低.临界初始电子密度随着脉宽的减小而增加。对于FS和BBS介质薄膜,Fth随脉宽的增加而升高。初始电子密度Ni对BBS中的MPI和AI基本没有影响;同样Ni对FS中的AI基本不产生影响,但当Ni>1011 cm－3时,FS中MPI电子密度随Ni增加而降低.在所研究的脉宽范围τ∈［0.01,5］ps,AI是FS介质激光诱导损伤的主要机制.而对于BBS,当脉宽τ∈［0.03,5］ps,AI是激光诱导损伤的主要机制;当脉宽τ∈［0.01,0.03］ps,MPI在激光诱导损伤中占主导地位.     

一种激光损伤阈值测试新方法

随着激光器朝向大功率、高能量的方向发展,激光损伤阈值成为了衡量光学元件抗激光损伤能力的重要参数之一,因此,能否准确地测量出光学元件的激光损伤阈值成为研究的重点。而光学元件激光损伤阈值测试的关键是能否准确地判别光学元件是否发生激光损伤。为解决目前常见的损伤判别方法存在的精度低、识别时间长、适用材料范围窄、操作复杂等不足,提出了一种新的激光损伤的判别方法,即等离子体诊断法。以K9玻璃为例,搭建激光损伤阈值的测试平台,利用光纤光谱仪采集强激光辐照K9玻璃时所产生的激光等离子体闪光光谱,并对该光谱进行诊断分析,将该光谱中是否含有待测试光学元件材料中特征元素的光谱峰作为其是否收到激光损伤的标准。同时,对K9玻璃进行了激光损伤阈值的测试,并将测试结果与等离子体闪光法和显微镜法所测的激光损伤阈值进行了对比分析。实验表明,提出的等离子体诊断方法的判别精度高、速度快、测试装置结构简单,易实现在线测量,可以大大地提高光学元件激光损伤阈值测试工作的效率。     

不同沉积参量下ZrO2薄膜的微结构和激光损伤阈值

ZrO2采用X射线衍射(XRD)技术分析了不同充氧条件和沉积温度对ZrO2溥膜组成结构的影响,并对不同工艺下制备的薄膜的表面粗糙度和激光损伤阈值进行了测量。结果发现随着氧压的升高,ZrO2溥膜将由单斜相多晶态逐渐转变为非晶态结构,而随着基片温度的增加,溥膜将由非晶态逐渐转变为单斜相多晶态。同时发现随着氧压升高晶粒尺寸减小,而随着沉积温度增加,晶粒尺寸增大。氧压增加时工艺对表面粗糙度有一定程度的改善,而沉积温度升高,工艺对表面粗糙度的改善不明显。晶粒尺寸大小变化与表面粗糙度变化存在对应关系。激光损伤测量表明,氧压条件和沉积温度对ZrO2薄膜的抗激光损伤能力有着较大影响。     

Influence of Annealing Temperature on Structure, Optical Loss and Laser-Induced Damage Threshold of TiO2 Thin Films

TiO2 thin films are prepared on fused silica with conventional electron beam evaporation deposition. After annealed at different temperatures for 4h, the spectra and XRD patterns of the TiO2 thin film are obtained. Weak absorption of coatings is measured by the surface thermal lensing technique, and laser-induced damage threshold （LIDT） is determined. It is found that with the increasing annealing temperature, the transmittance of TiO2 films decreases. Especially when coatings are annealed at high temperature over 1173K, the optical loss is very serious. Weak absorption detection indicates that the absorption of coatings decreases firstly and then increases, and the absorption and defects play major roles in the LIDT of TiO2 thin films.     

半导体材料的激光辐照效应计算和损伤阈值分析

在激光对抗中,探测器容易受到激光损伤,为此研究了连续强激光对半导体材料的损伤机理,建立了氧碘化学激光器辐照InSb圆板型靶材的二维物理模型。在圆柱坐标系中利用积分变换法,求解热传导和热弹性力学方程组。得到由激光辐照引起的温度场和热应力场的瞬态分布。经过严格的理论分析,计算出InSb材料的激光破坏阈值,讨论了,不同的辐照时间和光斑半径对破坏阈值的影响。研究发现其破坏形态为熔融破坏,一般不会出现解理或炸裂现象,这一结果与相关实验报道一致。最后分析了与温度有关的非线性参量对损伤阈值的影响。     

热退火诱导纳米银膜形貌变化对表面等离激元共振特性的影响

采用磁控溅射技术制备并通过不同温度的快速热退火得到了不同表面形貌的纳米银膜。利用XRD,SEM和紫外-可见-近红外透射光谱等技术研究了纳米银膜的结构、表面形貌与光学性质。实验结果表明,随着退火温度的升高,银膜开口面积分数、银岛(纳米粒子)间距增大,长宽比减小,银岛由各向异性的蠕虫状变成各向同性的纳米球;表面等离激元共振带发生连续的蓝移,半高宽变窄。分析表明,纳米银膜的表面等离激元共振特性可以通过热退火诱导的表面形貌变化实现调整。     

磁控溅射技术制备TiO2薄膜的研究进展

介绍了磁控溅射法镀膜的基本原理,综述了近年来关于溅射功率、工作压强、氩氧比例、沉积温度和退火等工艺参数以及掺杂对T iO2薄膜结构、形貌和光学性质影响的研究进展,并对磁控溅射技术制备T iO2薄膜的发展方向进行了展望。     

Laser Induced Damage Threshold at 355 and 1064nm of Ta2O5 Films of Different Phases

Ta2O5 films axe deposited on fused silica substrates by conventional electron beam evaporation method. By annealing at different temperatures, Ta2 O5 films of amorphous, hexagonal and orthorhombic phases are obtained and confirmed by x-ray diffractometer （XRD） results. X-ray photoelectron spectroscopy （XPS） analysis shows that chemical composition of all the films is stoichiometry. It is found that the amorphous Ta2 O5 film achieves the highest laser induced damage threshold （LIDT） either at 355 or 1064nm, followed by hexagonal phase and finally orthorhombic phase. The damage morphologies at 355 and 1064nm are different as the former shows a uniform fused area while the latter is centred on one or more defect points, which is induced by different damage mechanisms. The decrease of the LIDT at 1064nm is attributed to the increasing structural defect, while at 355nm is due to the combination effect of the increasing structural defect and decreasing band gap energy.     

光学玻璃基底原子层同质材料沉积薄膜光谱及激光诱导损伤特性研究

通过原子层沉积技术在熔石英玻璃表面制备了同质材料的单层SiO2薄膜,对光学薄膜的物理化学性质和强激光辐照下的激光诱导损伤性能进行了深入研究.实验中采用双叔丁基氨基硅烷(BTBAS)和臭氧(O3)作为反应前驱体,在熔石英光学元件表面进行了SiO2薄膜的原子层沉积工艺研究,以不同沉积温度条件制备了一系列膜样品.首先对原子层...     

RuO2/TiO2/漂珠复合光催化剂的制备及性能

"利用RuO2/TiO2前驱体溶胶,采用溶胶-凝胶-浸渍法在漂珠(FP)表面沉积RuO2/TiO2膜,经120 ℃干燥、500 ℃焙烧制备复合光催化剂RuO2/TiO2/FP,并通过SEM、XRD以及FT-IR分别对其结构进行了表征． 结果表明,RuO2/TiO2膜的平均厚度(三层)约1 1m,膜材料中TiO2主要呈现锐钛矿型结构,而RuO2是以非晶态高度分散在粒子表面．以高效氯氰菊酯杀虫剂的光催化降解为模型反应,研究了RuO2/TiO2/FP的光催化性能,探讨了影响催化剂活性的因素及采用太阳光做光源处理     

Structural Organization of Syndiotactic Polypropylene Films Quenched at Different Temperatures

Films of highly syndiotactic polypropylene (sPP) were quenched at different temperatures between 0°C and 100°C and analyzed as soon as prepared and after 1 month of aging at room temperature. Wide-angle X-ray diffractograms (WAXDs) showed that all the samples crystallized in the disordered helical form I, with the crystallinity increasing both on increasing the quenching temperature and on aging, although to a lower extent. The analysis of sorption and diffusion of dichloromethane vapor at low activity shows that, in some samples, the fraction of impermeable phase is consistently higher than the crystalline fraction. This induced us to hypothesize the presence of an intermediate phase, or mesophase, not crystalline, yet impermeable to the vapors. The fraction of mesophase decreases on increasing the quenching temperature, and it is a very small quantity at 100°C. The dynamic-mechanical analysis showed two transitions in the aged samples, which could correspond to the lower and upper glass transitions, already suggested for aged films of isotactic polypropylene (IPP).     

Preparation and Properties of Antimicrobial Poly(butylene adipate-co-terephthalate)/TiO2 Nanocomposites Films

Abstract

Poly(butylene adipate-co-terephthalate) (PBAT) nanocomposite films with various contents of nano-titanium dioxide (TiO₂) and titanium dioxide doped silver (Ag-TiO₂) were prepared by a solvent casting method. The TiO₂ and Ag-TiO₂ nanoparticles were surface-modified with silane coupling agents to improve their compatibility and dispersibility in the PBAT matrix. They were denoted as mTiO₂ and mAg-TiO₂, and were characrterized by Fourier transform infrared (FTIR) spectroscopy and transmission electron microscopy (TEM). The morphology of the PBAT nanocomposite films was studied by field emission scanning electron microscopy (FE-SEM). The crystallinity of the PBAT film increased upon the introduction of the nano-TiO₂/Ag-TiO₂. Its mechanical properties and gas barrier properties were also significantly improved. In addition, the PBAT/mTiO₂ and PBAT/mAg-TiO₂ nanocomposite films showed a strong antibacterial activity against Gram-negative (Escherichia coli) and Gram-positive (Staphylococcus aureus) food-borne pathogenic bacteria.     

HfO2薄膜的结构对抗激光损伤阈值的影响

利用蒸发氧化铪和离子辅助蒸发金属铪反应沉积氧化铪薄膜，对两种工艺下制备的氧化铪薄膜进行光学和结构以及激光损伤特性的研究. 实验结果表明，用金属铪反应沉积的氧化铪薄膜不仅结构均匀，并且具有较高的激光损伤阈值. 文章对损伤阈值和薄膜的结构及光学特性之间的关系进行了讨论.     

不同晶型的纳米TiO2粉体的制备及表征

本文介绍了不同晶型的纳米TiO2粉体的制备方法，用透射电镜、XRD衍射确定了其晶型、粒径、形貌，测定纳米粉体的红外光谱。     

溶胶—凝胶法制备CdS微晶掺杂TiO2／SiO2薄膜及其非线性光学特性

采用溶胶－凝胶方法在普通的载玻片上制备了ＣｄＳ微晶掺杂的ＴｉＯ２／ＳｉＯ２复合薄膜。用正硅酸乙酯、钛酸丁酯、醋酸镉作原料，比较了两种硫化剂：硫尿和硫代乙酰氨的硫化作用。Ｘ射线衍射谱和拉曼光谱揭示了ＣｄＳ微晶镶嵌在ＴｉＯ２／ＳｉＯ２薄膜的玻璃网络中。不同热处理温度、不同热处理时间的吸收光谱表明薄膜中存在着量子尺寸效应。采用Ｚ扫描技术测量了薄膜的非线性吸收及非线性折射率ｎ２＝－４．６７×１０－７ｅｓｕ。     

不同热处理的GeTe薄膜的光学参数测量

运用一种新的测量单面镀膜膜层光学参数的方法，对不同热处理的ＧｅＴｅ半导体薄膜样品的光学参数进行了测量，准确地获得了被测薄膜材料的光学参数，并采用椭圆偏振光谱测量作比较研究。经此为基础，对用椭偏仪测得的数据进行拟合计算，得出了样品材料在２５０～８３０ｎｍ波段范围的复折射曲线。     

不同成分比例CIGS薄膜及太阳电池的快速退火

研究了110~180 ℃(2 min)下的快速热退火对Cu(In,Ga)Se2(CIGS)薄膜特性及CIGS太阳电池性能的影响.结果表明:对于不同成分比例的CIGS(正常、富Cu、高Ga)电池来说,150 ℃,2 min的快速退火最利于电池性能及二极管特性的增加.其中,退火对富Cu电池的开路电压Voc改善最大,这是因为快速热退火对消除部分CIGS薄膜中的CuSex有积极作用,从薄膜的电阻率有少量提高,器件的短路电流Jsc有少量下降可以得到验证;而对于高Ga电池来说,填充因子FF的改善最大,这是因为高Ga样品的缺陷较多,退火会消除薄膜内部的部分缺陷,从而薄膜的迁移率及Jsc都有所提高,使得FF有较大的增加.