InGaAsN量子阱的光致发光谱研究(英文)

我们测量了低N组分的InGaAsN/InGaAs/GaAs量子阱材料的光致发光(PL)谱,测量温度范围从13K到300K。实验结果显示,InGaAsN的PL谱的主峰值的能量位置随温度的变化呈现出反常的S型温度依赖关系。用Varshni经验公式对实验数据进行拟合之后,发现在低温下InGaAsN量子阱中的载流子是处于局域态的。此外,我们还测量了样品在不同的温度、不同的能量位置的瞬态谱,结果进一步证实了:在低温下,InGaAsN的PL谱谱峰主要是局域态激子的复合发光占据主导地位,而且InGaAsN中的载流子局域态主要是由N等电子缺陷造成的涨落势引起的。     

In组分对InGaN/GaN蓝光LED的发光性质的影响

利用扫描透射电子显微术(STEM)和变温光致发光光谱(PL)研究了In组分对InGaN/GaN蓝光LED的发光的影响.STEM发现两个样品量子阱结构相同,低温PL显示低In组分的样品的发光峰位随着温度的升高呈现出经典S(Red-Blue-Red)曲线.目前普遍认为蓝移是In组分分布不均匀造成的局域激子发光的主要原因,然...     

生长温度和结构参数对InGaAs／GaAs量子阱光学特性的影响

研究了不同生长温度下制备的In0.15Ga0.85As/GaAs应变量子阱的PL谱,结果表明,生长温度越高,In偏析和In-Ga互混越严重,同时,导致更多的In脱附,PL谱发光峰蓝移。对不同In含量的和不同InGaAs厚度的InGaAs/GaAs量子阱进行PL谱测试,分析表明In含量<0.2,生长温度低于560℃时,In含量和InGaAs层量子阱的厚度对In偏析、脱附和In-Ga互混基本没有影响。     

InGaAs/GaAs应变量子阱的发光特性研究

利用低压金属有机化学气相沉积技术(LP-MOCVD)生长InGaAs/GaAs单量子阱(SQW),通过改变生长速率、优化生长温度和V/III比改善了量子阱样品的室温光致发光(PL)特性。测试结果表明,当生长温度为600℃、生长速率为1.15μm/h时,生长的量子阱PL谱较好,增加V/III比能够提高量子阱的发光强度。实验分析了在不同的In气相比条件下,生长速率对量子阱质量的影响,利用模型解释了高In气相比时,随着生长速率增加PL谱蓝移现象消失的原因。     

关于InGaN/GaN多量子阱结构内量子效率的研究

利用金属有机物化学气相沉积技术在蓝宝石衬底(0001)面生长了InGaN/GaN多量子阱结构,并测量了其荧光(PL)光谱的峰位能量和发光效率对温度和注入载流子密度的依赖性.结果显示,该样品PL的峰位能量对温度的依赖性是"S形"的(降低-增加-降低),并且最大发光效率出现在50 K左右.前者反映了InGaN阱层中势能的非均一性和载流子复合的局域特征,后者则表明了将极低温度下的内量子效率设定为100%的传统界定方法应当被修正.进一步的研究结果显示,发光效率不仅是温度的函数,同时也是注入载流子密度的函数.为此我们对传统的基于PL光谱测量来确定某结构(或器件)内量子效率的方法进行了修正:在不同温度下测量发光效率对注入载流子密度的依赖性,并将发光效率的最大值设为内量子效率是100%,这样,其他温度点和注入载流子密度点所对应的内量子效率也就随之确定.     

Zn杂质扩散诱导AlGaInP/GaInP量子阱混杂

杂质扩散诱导量子阱混杂技术可用于制作腔面非吸收窗口,提高大功率半导体激光器的输出功率.以Zn2As2为扩散源,采用闭管扩散方式,在550℃下对650 nm半导体激光器的外延片进行了一系列Zn杂质扩散诱导量子阱混杂的实验.实验发现,随着扩散时间从20～120 min,样品光致发光(PL)谱蓝移偏移增加,峰值波长蓝移53 nm;当扩散时间超过60 min后,样品的PL谱中不仅出现了常见的蓝移峰,同时还出现了红移峰,峰值波长红移32 nm.分析表明PL谱蓝移来自Zn扩散引起的AlGaInP/GaInP间的量子阱混杂;红移来自Zn杂质扩散对样品中Ga0.51In0.49P缓冲层的影响.还研究了扩散温度(550℃)和扩散时间对样品晶体品质的影响,并在理论上计算了AlGaInP/GaInP量子阱混杂巾的Al-Ga的互扩散系数.     

GaNAs/GaAs量子阱的激子局域化以及退局域化

我们利用光荧光(PL)以及时间分辨光谱(TRPL)研究了用MBE生长在GaAs衬底上的GaNAs/GaAs量子阱的激子局域化以及退局域化。研究发现,在低温下用连续光(CW)激发,由于GaNAs中势振荡所产生的局域激子发光是所测量到光谱的主要发光来源。然而在脉冲激发下,情况完全不同。在高载流子密度激发或者高温下GaNAs/GaAs量子阱中例外,一个高能端的PL峰成为了主要的发光来源。通过研究,我们将这个新的发光峰指认为量子阱中非局域激子复合的PL峰。这个发光峰在温度和激发强度的变化过程中与局域激子相互竞争。我们相信这一过程也是许多文献所报道的在InGaN和AlGaN等氮化物中经常观测到的发光峰位随温度“S”形变化的主要根源。     

GaNAs/GaAs量子阱的激子局域化以及退局域化

我们利用光荧光(PL)以及时间分辨光谱(TRPL)研究了用MBE生长在GaAs衬底上的GaNAs/GaAs量子阱的激子局域化以及退局域化.研究发现,在低温下用连续光(Cw)激发,由于GaNAs中势振荡所产生的局域激子发光是所测量到光谱的主要发光来源.然而在脉冲激发下,情况完全不同.在高载流子密度激发或者高温下GaNAs/GaAs量子阱中例外,一个高能端的PL峰成为了主要的发光来源.通过研究,我们将这个新的发光峰指认为量子阱中非局域激子复合的PL峰.这个发光峰在温度和激发强度的变化过程中与局域激子相互竞争.我们相信这一过程也是许多文献所报道的在InGaN和AlGaN等氮化物中经常观测到的发光峰位随温度"S"形变化的主要根源.     

In_(0.2)Ga_(0.8)As/GaAs单量子阱PL谱温度特性及其机制

测量了不同阱宽In0.2Ga0.8As/GaAs单量子阱的PL谱的峰值波长和荧光谱线半峰全宽随温度的变化。利用Varshni公式对实验峰值波长进行拟合,得到了新的参数。结果表明,无位错应变量子阱带隙仍具有其体材料的特性:荧光谱线半峰全宽随温度升高迅速展宽,这主要归因于声子关联作用增强和激子热离化为自由载流子所致;阱宽越窄荧光峰值能量越高,将其与量子尺寸效应的理论计算结果进行了比较。文中还考察了谱线半峰全宽和阱宽的关系,利用合金无序对这一现象进行了解释。     

MOCVD的InGaAs/GaAs应变层量子阱的低温光致发光研究

本文中利用MOCVD方法得到了高质量的InGaAs/GaAs应变层量子阱材料,4.3nm量子阱10KPLFWHM仅为3.49meV.通过对样品荧光谱在变激发强度,变温时的峰位、峰形研究,我们发现,合金组分起伏散射是样品低温荧光谱展宽的主要原因,因而是MOCVD生长中应该首先解决的问题,实验结果还表明,在讨论低温PL谱形时,必需考虑光生载流子由随机起伏势中高能位置向低能位置的迁移过程。     

蓝光激光器结构中InGaN/GaN多量子阱界面效应的精细光致发光光谱研究

金属有机化学气相沉积(MOCVD)方法制备InGaN/GaN多量子阱结构时,在GaN势垒层生长的N2载气中引入适量H2,能够有效改善阱/垒界面质量从而提升发光效率.本工作利用光致发光(PL)光谱技术,对蓝光激光器结构中的InGaN/GaN多量子阱的发光性能进行了精细的光谱学测量与表征,研究了通H2生长对量子阱界面的调控...     

具有三角形InGaN/GaN多量子阱的高内量子效率的蓝光LED(英文)

对InGaN量子阱LED的内量子效率进行了优化研究。分别对发光光谱、量子阱中的载流子浓度、能带分布、静电场和内量子效应进行了理论分析。对具有不同量子阱数量的InGaN/GaN LED进行了理论数值比对研究。研究结果表明,对于传统结构的LED而言,2个量子阱的结构相对于5个和7个量子阱具有更好的光学性能。同时还研究了具有三角形量子阱结构的LED,研究结果显示,三角形多量子阱结构具有较高的电致发光强度、更高的内量子效率和更好的发光效率,所有的优点都归因于较高的电子-空穴波函数重叠率和低的Stark效应所产生的较高的载流子输入效率和复合发光效率。     

Enhancement of light-emission efficiency of ultraviolet InGaN/GaN multiple quantum well light emitting diode with InGaN underlying layer

Two ultraviolet InGaN/GaN light emitting diodes (LEDs) with and without InGaN underlying layer beneath the multiple quantum wells (MQWs) were grown by metal-organic vapor phase epitaxy. Based on the photoluminescence excitation measurements, it was found that the Stokes shift of the sample with a 10-nm-thick In_0.1Ga_0.9N underlying layer was about 64 meV, which was smaller than that of the reference sample without InGaN underlying layer, indicating a reduced quantum-confined Stark effect (QCSE) due to the decrease of the piezoelectric polarization field in the MQWs. In addition, by fitting the photon energy dependence of carrier lifetime values, the radiative recombination lifetime of the sample with and without InGaN underlying layer were obtained about 1.22 and 1.58 ns at 10?K, respectively. The shorter carrier lifetime also confirmed that the QCSE in the MQWs was weakened after inserting the InGaN underlying layer. In addition, although the depth of carrier localization in the sample with InGaN underlying layer became smaller, the nonradiative recombination centers (NRCs) inside it decreased, and thus suppressed the nonradiative recombination process significantly according to the electroluminescence measurement results. Compared to the reference sample, the efficiency droop behavior was delayed in the sample with InGaN underlying layer and the droop effect was also effectively alleviated. Therefore, the enhanced light-emission efficiency of ultraviolet InGaN/GaN MQW LEDs could be attributed to the decrease of QCSE and NRCs.     

In-situ monitoring of optical near-field material processing by electron microscopes

A GaN-to-InGaN interface modification by predeposition of an ultrathin In-rich InGaN incomplete layer followed by a thin triangular InGaN well layer was employed to overcome the negative effects of polarization field on light emission efficiency of InGaN/GaN quantum wells as well as to improve the crystalline quality by avoidance of a significant strain generation and enhanced surfactant effect. Further, the interface modification induced energy band structure engineering reduces the spatial separation of electrons and holes, and thus increases the carrier recombination rate. The improvement in crystalline quality, localized potential fluctuation, and energy band engineering contribute to the significant increase of green emission of the InGaN/GaN quantum wells.     

Effects of a prestrained InGaN interlayer on the emission properties of InGaN/GaN multiple quantum wells in a laser diode structure

The electroluminescence (EL) and photoluminescence (PL) spectra of InGaN/GaN multiple quantum wells (MQWs) with a prestrained InGaN interlayer in a laser diode structure are investigated. When the injection current increases from 5 mA to 50 mA, the blueshift of the EL emission peak is 1 meV for the prestrained sample and 23 meV for a control sample with the conventional structure. Also, the internal quantum efficiency and the EL intensity at the injection current of 20 mA are increased by 71% and 65% respectively by inserting the prestrained InGaN interlayer. The reduced blueshift and the enhanced emission are attributed mainly to the reduced quantum-confined Stark effect (QCSE) in the prestrained sample. Such attributions are supported by the theoretical simulation results, which reveal the smaller piezoelectric field and the enhanced overlap of electron and hole wave functions in the prestrained sample. Therefore, the prestrained InGaN interlayer contributes to strain relaxation in the MQW layer and enhancement of light emission due to the reduction of QCSE.     

Influence of electron-beam irradiation in SEM on the cathodoluminescence and electron-beam-induced current in InGaN/GaN light-emitting diodes with a buried active region

The influence of irradiation in a scanning electron microscope on the optical properties inherent to light-emitting diodes (LEDs) with multiple InGaN/GaN quantum wells, assembled by means of the flip-chip mounting technique, has been investigated via the cathodoluminescence (CL) and electron-beam-induced current methods. It is demonstrated that the action of an electron beam qualitatively varies both these LEDs and structures with a thin upper GaN layer only at large beam energies. It has been revealed that irradiation not only leads to changes in the spectrum and intensity of CL but also decreases the energy corresponding to the excitation of emission associated with quantum wells. A similar effect is also observed in structures whose external quantum efficiency has been decreased several times due to long-running tests performed at an injection current density of 35 A/cm² and a temperature of 100°C.     

High-efficiency InGaN/AlInGaN multiple quantum wells with lattice-matched AlInGaN superlattices barrier

A new approach to fabricating high-quality AlInGaN film as a lattice-matched barrier layer in multiple quantum wells(MQWs) is presented. The high-quality AlInGaN film is realized by growing the AlGaN/InGaN short period superlattices through metalorganic chemical vapor deposition, and then being used as a barrier in the MQWs. The crystalline quality of the MQWs with the lattice-matched AlInGaN barrier and that of the conventional InGaN/GaN MQWs are characterized by x-ray diffraction and scanning electron microscopy. The photoluminescence(PL) properties of the InGaN/AlInGa N MQWs are investigated by varying the excitation power density and temperature through comparing with those of the InGaN/GaN MQWs. The integral PL intensity of InGaN/AlInGaN MQWs is over 3 times higher than that of InGaN/GaN MQWs at room temperature under the highest excitation power. Temperature-dependent PL further demonstrates that the internal quantum efficiency of InGaN/AlInGaN MQWs(76.1%) is much higher than that of InGaN/GaN MQWs(21%).The improved luminescence performance of InGaN/AlInGaN MQWs can be attributed to the distinct reduction of the barrier-well lattice mismatch and the strain-induced non-radiative recombination centers.     

Local indium segregation and bang gap variations in high efficiency green light emitting InGaN/GaN diodes

High efficient green light emitting diodes (LED) on the basis of GaN/InGaN exhibit indium-rich nanoclusters inside the quantum wells (QW) due to InN-GaN phase decomposition. By direct measurements of the variations in the electronic structure, we show for the first time a correlation between indium-rich nanoclusters and local energy band gap minima. Our investigations reveal the presence of 1-3 nm wide indium rich clusters in these devices with indium concentrations x as large as x∼0.30-0.40 that narrow the band gap locally to energies as small as 2.65 eV. These clusters are able to act as local traps for migrating photon-emitting carriers and seem to boost the overall device performance.     

Excitonic optical absorption in wurtzite InGaN/GaN quantum wells

Within the framework of the effective-mass and envelope function theory, exciton states and optical properties in wurtzite (WZ) InGaN/GaN quantum wells (QWs) are investigated theoretically considering the built-in electric field effects. Numerical results show that the built-in electric field, well width and in composition have obvious influences on exciton states and optical properties in WZ InGaN/GaN QWs. The built-in electric field caused by polarizations leads to a remarkable reduction of the ground-state exciton binding energy, the interband transition energy and the integrated absorption probability in WZ InGaN/GaN QWs with any well width and In composition. In particular, the integrated absorption probability is zero in WZ InGaN/GaN QWs with any In composition and well width L > 4 nm. In addition, the competition effects between quantum confinement and the built-in electric field (between quantum size and the built-in electric field) on exciton states and optical properties have also been investigated.     

高效InGaN/AlInGaN发光二极管的结构设计及其理论研究

利用Advanced Physical Models of Semiconductor Devices (APSYS)理论对比研究了InGaN/AlInGaN 和 InGaN/GaN多量子阱作为有源层的InGaN基发光二极管的结构和电学特性。与InGaN/GaN 基LED 中GaN作为垒层材料相比,在AlInGaN材料体系中,通过调节AlInGaN中Al和In的组分可以优化器件的性能。当InGaN阱层材料中In组分为8%时,可以实现无应力的In_0.08Ga_0.92N/AlInGaN基 LED。在这种无应力结构中可以进一步降低大功率LED的"效率下降"(Effciency droop)问题。理论模拟结果显示,四元系AlInGaN作为垒层可以进一步减少载流子泄露,增加空穴注入效率,减少极化场对器件性能的影响。在In_0.08Ga_0.92N /AlInGaN量子阱中的载流子浓度、有源层的辐射复合率、电流特性曲线和内量子效率等方面都优于InGaN/GaN基LED。无应变AlInGaN垒层代替传统的GaN垒层后,能够得到高效的发光二极管,并且大电流注入下的"效率滚降"问题得到改善。