Angular distribution of atoms sputtered from germanium by 1–20 keV Ar ions

The angular distribution of atoms sputtered from germanium under 1–20 keV Ar⁺ ion bombardment (normal incidence) has been studied experimentally and using computer simulations. A collector technique combined with Rutherford backscattering to analyze the distribution of collected material was used. In addition, the surface topography was under control. It was found that the experimental angular distribution of sputtered atoms (E ₀=3–10 keV) could be approximated by the function cos ⁿ θ with n≈ 1.65. Such a high value of n is connected with the surface scattering of ejected atoms and a noticeable contribution of backscattered ions to the formation of the sputter flux (the mass effect). The target surface was found to be practically flat even at ion fluencies ～10¹⁸ ions/cm². The results obtained are compared with data from the literature, including our recent data on Si sputtering.     

第Ⅶ类两态叠加多模叠加态光场的偶数阶等阶N次方Y压缩

本文构造了由多模相干态|{Z_j}>_q与多模虚相干态的相反态|{-iZ_j}>_q这两者的线性叠加所组成的第Ⅶ类两态叠加多模叠加态光场|ψ₇⁽²⁾>_q.利用多模压缩态理论,研究了态|ψ₇⁽²⁾>_q的偶数阶等阶N次方Y压缩特性.结果发现:在压缩阶数N=2p、并且P=2m+1(m=0,1,2,3,…,…)的条件下,如果各模的初始相位φj(j=1,2,3,…,q)、态间的初始相位差与各单模相干态光场的平均光子数之和 等分别满足一定的取值条件,则在这种情况下态|ψ₇⁽²⁾>_q可呈现出周期性变化的偶数阶等阶N次方Y压缩效应.     

Transmission of 18 keV negative ions Cl through nanocapillariesin Al2O3 membrane

We investigate the angular distribution of the transmitted 18keV negative ions Cl^- through Al₂O₃ nanocapillaries of 50 nm in diameter and 10 μm in length. Elastic scattering ions and inelastic scattering ions are obtained simultaneously. The experimental result is partially consistent with the guiding effect. We can qualitatively explain our experimental result through a dynamic process.     

Electron temperature (T e) measurements by Thomson scattering system

Thomson scattering technique based on high power laser has already proved its superoirity in measuring the electron temperature (T _e and density (n _e) in fusion plasma devices like tokamaks. The method is a direct and unambiguous one, widely used for the localised and simultaneous measurements of the above parameters. In Thomson scattering experiment, the light scattered by the plasma electrons is used for the measurements. The plasma electron temperature is measured from the Doppler shifted scattered spectrum and density from the total scattered intensity. A single point Thomson scattering system involving a Q-switched ruby laser and PMTs as the detector is deployed in ADITYA tokamak to give the plasma electron parameters. The system is capable of providing the parameters T _e from 30 eV to 1 keV and n _e from 5 × 10¹²cm⁻³−5 × 10¹³cm⁻³. The system is also able to give the parameter profile from the plasma center (Z=0 cm) to a vertical position of Z=+22 cm to Z=−14 cm, with a spatial resolution of 1 cm on shot to shot basis. This paper discusses the initial measurements of the plasma temperature from ADITYA.     

Investigation of the passage of 100–1000-MeV/nucleon superheavy ions through homogeneous media

This work is a continuation of the experimental and theoretical investigations of the effect of the Z ₁ ³ correction to the stopping power of ions on the passage of heavy ions ⁴⁰Ar, ⁵⁶Fe, ¹⁹⁷Au, ¹³¹Xe, and ²³⁸U with energies of about 1 GeV/nucleon through a homogeneous medium. The previously observed systematic deviations of the calculations based on the first Born approximation to the scattering of a particle by the atomic electrons in the medium from the experimental values of the total ionization ranges of the nuclei and their stopping powers is confirmed. The discrepancy increases with the atomic number of the projectile nucleus. It is shown that the Z ₁ ³ correction in the form proposed by Jackson and McCarthy eliminates, especially for ions with Z ₁>50, the systematic discrepancy between the computed and experimental values. For the experimental energy range relativistic Mott scattering of a particle by the atomic electrons in the target makes the dominant contribution to the observed Z ₁ ³ effect. Zh. éksp. Teor. Fiz. 115, 404–415 (February 1999)     

第Ⅱ类三态叠加多模叠加态光场等幂次2m+1次方Y压缩

构造了由多模虚相干态|{iZ_j}>_q、多模虚相干态的相反态|{-iZ_j}>_q和多模真空态|{O_j}>_q这三种不同的量子光场态的线性叠加所组成的第Ⅱ类三态叠加多模叠加态光场|ψ₂⁽³⁾>_q.利用多模压缩态理论,研究了态|ψ₂⁽³⁾>_q的广义非线性等幂次2m+1次方Y压缩特性.结果发现:在压缩次数N=2m+1(m=0,1,2,3,…,…)的条件下,只要各模的初始相位和态间的初始相位差分别满足一定的取值条件,态|ψ₂⁽³⁾>_q就可呈现出周期性变化的、任意奇数次的广义非线性等幂次N次方Y压缩效应.     

第Ⅱ类两态叠加多模叠加态光场的非线性高阶压缩特性研究

本文根据量子力学中的线性叠加原理,构造了由多模(即q模)虚相干态|{iZ_j}>_q及其相反态|{-iZ_j}>_q的线性叠加所组成的第Ⅱ类两态叠加多模叠加态光场|ψ₂⁽²⁾>_q.利用新近建立的有关双模及多模辐射场的非线性高阶压缩理论,首次对态|ψ₂⁽²⁾>_q的两种非线性高阶压缩(即N次方Y压缩和N次方H压缩)效应进行了详细研究。结果表明:1)当N为奇数时,如果各模的初始相位满足一定的量子化条件,而态间的初始相位差在其态间压缩区内连续变化;或者态间的初始相位差取某一特定值,而各模的初始相位在其腔模压缩区内连续变化时,态|ψ₂⁽²⁾>_q就会呈现出周期性变化的、任意阶的N次方Y压缩效应。2)当q·N为奇数时,如果各模的初始相位和满足一定的量子化条件,而态间的初始相位差在上述的态间压缩区内连续变化;或者态间的初始相位差取上述的某一固定值,而各模的初始相位和在其腔模和压缩区内连续变化时,态|ψ₂⁽²⁾>_q就呈现出周期性变化的、任意阶的N次方H压缩效应。3)与文献10相比,态|ψ₂⁽²⁾>_q与态|ψ(2)1>_q这两者之间的压缩情况正好相反。     

Nuclear orientation of14N after grazing collisions with a silicon surface

The nuclear orientation of¹⁴N is investigated after the scattering of¹⁴N⁺ ions with energies ranging from 7 to 350 keV from an Si(111)-surface under grazing angles of incidence. For projectile energies above 50 keV, we find a constant nuclear orientationP ₁=〈I _z 〉/I∼22%, whereas towards lower energiesP _I shows a pronounced decrease. Our measurements provide important information in the application of surface scattering to obtain nuclear polarized beams.     

Experimental measurement of effective atomic number of composite materials for Compton effect in the <Emphasis Type="Italic">γ</Emphasis>-ray region 280–1115 keV by a new method

In this paper, we report a new method to determine the effective atomic number, Z _eff, of composite materials for Compton effect in the γ-ray region 280–1115 keV based on the theoretically obtained Klein–Nishina scattering cross-sections in the angular range 50°–100° as well as a method to experimentally measure differential incoherent (Compton) scattering cross-sections in this angular range. The method was employed to evaluate Z _eff for different inorganic compounds containing elements in the range Z = 1–56, at three scattering angles 60°, 80° and 100° at three incident gamma energies 279.1 keV, 661.6 keV and 1115.5 keV and we have verified this method to be an appropriate method. Interestingly, the Z _eff values so obtained for the inorganic compounds were found to be equal to the total number of electrons present in the sample as given by the atomic number of the elements constituting the sample in accordance with the chemical formula of the sample. This was the case at all the three energies.     

Stability of subatomic carbon films on metal surfaces against low-energy gas ion bombardment

The earlier developed original experimental technique for measuring and analyzing the parameters of low-frequency fluctuations of the field-emission current in metal film systems is used to measure the sputtering yield Y _f of carbon films (with a coverage Θ ranging from 1 to 4) applied on Fe, Nb, Ta, and U substrates. The value of Y _f is calculated by an expression derived within a theoretical model developed. The sputtering ratios were measured for the case when the carbon films are sputtered by H⁺ and He⁺ ions with an energy E _i between 2 and 10 keV. With Θ fixed, the energy dependences of Y _f are obtained for each of the ions. In addition, for each of the ions, the Θ dependences of Y _f are found for several values of E _i. In all the cases, the measured values of Y _f far exceed those for pure carbon. With another original technique that combines field-ion microscopy (FIM) and precise measurement of current and/or luminous properties of local regions in FIM images, the energy thresholds E _th of sputtering carbon films applied on the metal surfaces are found. The energy distributions of Y _f in the near-threshold energy range for various Θ are obtained.     

Interpreting the data on helium-ion scattering in metallic films

Earlier measurements of angular distributions in the multiple scattering of a helium-ion beam with energy below 300 keV on Al yielded rather unexpected results: the ratio between the half-width of the measured angular distribution, (θ_1/2)_e, and that predicted with the Moliere–Bethe theory, (θ_1/2)_MB, proved to stay almost constant throughout the investigated energy range. At the same time, one could expect the (θ_1/2)_e/(θ_1/2)_MB value to be affected by the beam-content variation due to the charge–exchange scattering. Towards resolving this problem, we compute the interaction potentials between the Не⁺⁺, Не⁺, and Не⁰ ions and the scattering atoms and reveal the electron-screening effects on the scattering process. Thereby, we explain the energy dependence of (θ_1/2)_e/(θ_1/2)_MB observed in the old and new measurements carried out at higher beam energies.     

第I种非对称三态叠加多模叠加态光场的高次和压缩——第一正交分量的N次方H压缩效应

构造了第孙中禹种强度不等的非对称三态叠加多模叠加态光场|ψ₁^(ABC)〉_q.利用多模压缩态理论研究了态|ψ₁^(ABC)〉_q第一正交分量高次和压缩.结果发现:①当构成态|ψ₁^(ABC)〉_q的三个多模相干态光场的强度不相等时,在一定条件下,态|ψ₁^(ABC)〉_q的第一正交分量可出现任意幂次的高次和压缩.②当上述的三个多模相干态光场强度相等时,态|ψ₁^(ABC)〉_q的第一正交分量的高次和压缩现象消失.在这种情况下,态|ψ₁^(ABC)〉_q的第一正交分量恒处于NH最小测不准态.     

Some studies of BF2 and B+F implanted Silicon

Ion-implanted shallow junctions have been investigated using BE₂ (molecular ions) by the anodic oxidation method coupled with a four-point probe technique. BF₂ ions were implanted through screen oxide at doses of 3–5 × 10¹⁵ ions/cm² and energies of 25 and 45 keV which is equivalent to 5.6 keV and 10 keV of boron ions. The effect of energy, dose and annealing temperature on shallow junctions is presented in this paper. The shallow junctions in the range of 0.19 μm to 0.47 μm were fabricated.

The effect of fluorine on sheet resistivity of boron implanted silicon at various doses, treated with two-step and three-step annealing, is also presented for comparison in the paper.     

Ab initio interatomic potentials for low-energy He ion/atom scattering

Ab initio (density functional theory) binary interatomic potentials have been calculated for low-energy He projectile interactions with target atoms having atomic numbers (Z ₂) from 6 to 54 (C to Xe). The calculated potentials cover the energy range that is typical for low-energy ion He ion/atom-scattering spectroscopy (≤2–7 keV, depending on Z ₂). For constant R, the screening function exhibits Z ₂ oscillations that are indicative of the electronic stabilities of the corresponding quasi-molecules; screening function minima are observed for the quasi-molecules that are isoelectronic with the noble gases. The He–Z ₂ interatomic potentials calculated for target elements lighter than Rb are suitable for use in simulations of low-energy ion-scattering experiments. However, the potentials calculated for target atoms heavier than Kr do not offer any clear benefits over the existing empirical potentials. The solid-state potential shift applicable to scattering in metallic solids has been estimated as typically 0 to+10 eV, using a simple thermodynamic model that exploits the similarities between the valence states of an He–Z ₂ quasi-molecule and the corresponding united atom.     

反冲原子对低速离子轰击Si表面时电子发射产额的影响

在兰州重离子加速器国家实验室电子回旋共振离子源高电荷态原子物理实验平台上,用低能(0.75keV/u≤EP/MP≤10.5keV/u,即3.8×105m/s≤vP≤1.42×106m/s)He2+,O2+和Ne2+离子束正入射到自清洁Si表面时二次电子发射产额的实验结果.结果表明电子发射产额γ近似正比于入射离子动能EP/MP.在相同动能下,γ(O)γ(Ne)γ(He),对于原子序数ZP比较大的O2+和Ne2+离子,ZP大者反而γ小,这与较高入射能量时的结果截然不同.通过计算不同入射能量下入射离子的阻止能损S,发现反冲原子对激发二次电子的作用随入射离子能量的降低显著增大,这正是导致在较低能量范围内二次电子发射产额与较高入射能量时存在差异的主要原因.     

第Ⅲ及第Ⅳ类两态叠加多模叠加态光场的等阶N次方Y压缩与等阶N次方H压缩——兼论“相似压缩”与“压缩简并”现象

本文根据量子力学中的线性叠加原理,分别构造了由多模(即q模)相干态|{Z_j}>_q与多模真空态|{0_j}>_q以及由多模相干态的相反态|{-Z_j}>_q与多模真空态|{0_j}>_q等的线性叠加所组成的第及第类两态叠加多模叠加态光场|ψ_+,3⁽²⁾>_q和|ψ_-,4⁽²⁾>_q.利用新近建立的多模压缩态理论,首次对态|ψ_+,3⁽²⁾>_q及态|ψ_-,4⁽²⁾>_q的广义非线性等阶N次方Y压缩和等阶N次方H压缩特性进行了详细研究.结果发现:1)态|ψ_+,3⁽²⁾>_q及态|ψ_-,4⁽²⁾>_q是两种典型的多模非经典光场,当各模的初始相位φ_j(j=1,2,3,…,q)或者各模的初始相位和 =φ_j以及态间的初始相位差(θ_±^(R)-θ^(0)_±)等分别满足一些特定的量子化条件时,态|ψ_+,3⁽²⁾>_q及态|ψ_-,4⁽²⁾>_q均可呈现出周期性变化的、任意阶的等阶N次方Y压缩效应和等阶N次方H压缩效应;2)当组成态|ψ_+,3⁽²⁾>_q及态|ψ_-,4⁽²⁾>_q的各对应复几率幅不相等亦即C₊^(R)≠C_-^(R)和C₊⁽⁰⁾≠C_-⁽⁰⁾时,态|ψ_+,3⁽²⁾>_q及态|ψ_-,4⁽²⁾>_q这两者的压缩条件和压缩特征虽然相同,但其压缩幅度(即压缩程度和压缩深度)却不相等,这种现象称为“相似压缩”;3)当组成态|ψ_+,3⁽²⁾>_q及态|ψ_-,4⁽²⁾>_q的各对应复几率幅相等亦即C₊^(R)=C_-^(R)和C₊⁽⁰⁾=C_-⁽⁰⁾时,态|ψ_+,3⁽²⁾>_q及态|ψ_-,4⁽²⁾>_q这两种截然不同的多模叠加态光场不仅具有完全相同的压缩条件和压缩特征,而且还具有完全相等的压缩幅度,这种现象就称为“压缩简并”.     

Isotopic mass effects for low-energy channeling in a silicon crystal

Monte Carlo (MC) simulations have been used to study the low-energy channeling of ¹⁰B and ¹¹B ions along the [100] axis in Si crystal. MC simulations show that the critical angle Ψ_C ≈ 15.3(keV/E)^1/2 (in degrees) for the channeling of isotopic ¹⁰B ions and Ψ_C=14.5(keV/E)^1/2 (in degrees) for the channeling of isotopic ¹¹B ions, where E is the incident energy. This means that (Ψ_{C for 10B ions}/Ψ_{C for 11B ions})≈ (15.3/14.5)≈ (11/10)^1/2.     

第Ⅰ种强度不对称三态叠加多模叠加态光场N次方Y压缩—第一正交相位分量的压缩情况

根据量子力学中的线性叠加原理,构造了由三个强度不等的多模相干态光场|{Z_j^(A)}>_q、|{Z_j^(B)}>_q和|{Z_j^(C)}>_q的线性叠加所组成的第Ⅰ种强度不对称三态叠加多模叠加态光场|ψ_l^(ABC)>_q.利用多模压缩态理论,研究了态|ψ_l^(ABC)>_q的第一正交方分量(即磁场分量)的广义非线性等幂次N次方Y压缩特性.结果发现:①在上述各多模相干态光场中各模的强度和各模的初始相位各不相等的情况下,态|ψ_l^(ABC)>_q的第一正交分量-磁场分量在一定的条件下,总可呈现出周期性变化的、任意等幂次的N次方Y压缩效应;②当上述各多模相干态光场的强度和各模的初始相位相等时,态|ψ_l^(ABC)>_q的磁场分量的N次方Y压缩现象消失,态|ψ_l^(ABC)>_q可恒处于等幂次N-Y最小测不准态.     

Possibilities of the formation of carbides and borides by ion implantation

In the system of boron and carbon, the formation of boron carbide was investigated after ion implantation of 25 keV B ions into carbon or of 25 keV C ions into boron and subsequent annealing. TEM and electron diffraction studies showed that the crystallization of boron carbide begins only at temperatures above 1050°C. By implantation of 20 keV C ions into iron (ion dose 10¹⁷ C ions/cm²) only the metastable ε-Fe₂O will be generated, which at above 220°C transforms into the stable cementite Fe₃C. After implantation of 20 keV B ions into iron, no formation of iron boride could be found. These experimental facts can be understood qualitatively with the help of the thermal-spike model. The energy density or the temperature in the thermal spikes is not sufficient for the generation of cementite iron boride or boron carbide.     

多模叠加态光场|ψ5(3)〉q中广义磁场4m次方Y压缩

构造了由多模复共轭相干态|{Z_j^*}〉_q、多模复共轭相干态的相反态|{-Z_j^*}〉_q以及多模虚相干态|{iZ_j^*}〉_q的线性叠加所组成的第Ⅴ类三态叠加多模叠加态光场|ψ₅⁽³⁾〉_q.利用多模压缩态理论研究了态|ψ₅⁽³⁾〉_q中广义磁场分量的等幂次N次方Y压缩特性.结果发现:当压缩次数N=2p且p=2m(m=1,2,3,…,…)时,只要各模的初始相位φ_j(j=1,2,…,…,q)、态间的初始相位差(θ₁-θ₂)、(θ₁-θ₃)和(θ₂-θ₃)以及受各模的初始相位φ_j调制的各单模相干态光场的平均光子数之和 等分别满足一定的取值条件,则态|ψ₅⁽³⁾〉_q的广义磁场分量就可呈现出周期性变化的广义非线性等幂次4m次方Y压缩效应.