Change of the electron effective mass in extremely heavily doped n-type Si obtained by ion implantation and laser annealing

Infrared optical properties of extremely heavily doped n-type Si, obtained by ion implantation and laser annealing, were studied. A new relation between free carrier effective mass (m¹) and carrier concentration (10¹⁹ ?5 × 10²¹cm^-3) was obtained. The value of m¹ increases significantly with the increase of carrier concentration, when carrier concentration exceeds 10²¹cm^-3. The result is discussed in relation to the occupation of electrons in a new valley of the conduction band.     

Effects of ion implantation on yellow luminescence in unintentional doped n-type GaN

The effects of Si, O, C and N ion implantation with different implantation doses on yellow luminescence (YL) of GaN have been investigated. The as-grown GaN samples used in the work were of unintentional doped n-type, and the photoluminescence (PL) spectra of samples had strong YL. The experimental results showed that YL of ion implanted samples exhibited marked reductions compared to samples with no implantation, while the near band edge (NBE) emissions were reduced to a lesser extent. The deep-level centers associated with YL may be produced in GaN films by O and C ion implantation, and identities of these deep-level centers were analyzed. It was also found that the dose dependence of YL was analogous with the one of the intensity ratios of YL to the near band edge (NBE) emission (I _YL /I _NBE ) for ion implanted samples. The possible reason for this comparability has been proposed.      

Formation of Cu nanoparticles in GaAs using MeV ion implantation followed by thermal annealing

Analytical electron microscopy, high-resolution X-ray diffraction and combined Rutherford backscattering spectrometry and channeling experiments have been used to investigate the radiation damage and the effect of post-implantation annealing on the microstructure of GaAs(100) single crystals implanted with 1.00 MeV Cu⁺ ions to a dose of ≈ 3×10¹⁶ cm^-2 at room temperature. The experiments reveal the formation of a thick and continuous amorphous layer in the as-implanted state. Annealing up to 600 °C for 60 min does not result in the complete recovery of the lattice order. The residual disorder in GaAs has been found to be mostly microtwins and stacking fault bundles. The redistribution of implanted atoms during annealing results in the formation of nano-sized Cu particles in the GaAs matrix. The X-ray diffraction result shows a cube-on-cube orientation of the Cu particles with the GaAs lattice. The depth distribution and size of the Cu particles have been determined from the experimental data. A tentative explanation for these results is presented. Received: 15 February 1999 / Accepted: 18 February 1999 / Published online: 28 April 1999     

Magnetic field dependence of the specific heat of heavily doped n-type silicon

The low temperature specific heat of an n-type phosphorous doped silicon sample containing 5 × 10¹⁸ charge carriers/cm³ in zero magnetic field and in a magnetic field of 28.5 kGauss has been measured. Within the experimental accuracy of the experiments no magnetic contribution to the specific heat has been detected. This result is discussed in the light of recent E.S.R. experiments on the same impurity banded silicon sample.     

Ferromagnetism in ZnO doped with Co by ion implantation

The importance of doping ZnO with magnetic ions is associated with the fact that this oxide is a good candidate for the formation of a magnetic-diluted semiconductor. Most of the studies reported in Co-doped ZnO were carried out in thin films, but the understanding of the modification of the magnetic behaviour due to doping demands the study of single-crystalline samples. In this work, ZnO single crystals were doped at room temperature with Co by ion implantation with fluences ranging between 2×10¹⁶ and 1×10¹⁷ ions cm⁻² and implantation energy of 100 keV. As implanted samples show a superparamagnetic behaviour attributed to the formation of Co clusters, room temperature ferromagnetism is attained after annealing at 800 °C, but no magnetoresistance was detected in the temperature range from 10 to 300 K.     

中红外下半导体掺杂调制的表面等离子体透射增强效应

理论研究了平面电磁波通过n型重掺GaAs薄膜的透射谱.当GaAs薄膜两表面刻上亚波长的周期性沟槽结构时,透射谱在中红外波段出现了异常的透射增强现象.把这一现象归因于表面等离子体模式和波导模式的耦合.通过优化结构参数可以得到最大的透射效率.此外,发现随着掺杂浓度的升高,透射谱线中的透射峰逐渐向高频方向移动,最优化后透射峰值随掺杂浓度的升高而逐渐降低.这是由于掺杂浓度的改变,导致了不同的等离子体频率和电子碰撞频率,从而影响了激发模式和薄膜对电磁波的吸收. 关键词： 表面等离子体 掺杂半导体 增强透射 掺杂调制     

Formation of precipitates in heavily boron doped 4H-SiC

Secondary ion mass spectrometry (SIMS) and transmission electron microscopy (TEM) are utilized to study precipitation and the solubility of B in 4H-SiC epitaxial layers super saturated with B. Heat treatments are performed in Ar atmosphere in an rf-heated furnace at temperatures between 1700 and 2000 °C. SIMS ion images, and TEM micrographs reveal the formation of two types of precipitates where the larger, more thermally stable one is suggested to be B₄C. The boron solubility is determined from SIMS depth profiles and is shown to follow the Arrhenius expression: 7.1 × 10²² exp(−1.4 eV/k_BT) cm⁻³ over the studied temperature range.     

Effect of nonpolar optical phonon scattering on free-carrier absorption in heavily doped n-type germanium

The effect of nonpolar optical phonon scattering on the free-carrier absorption in n-type semiconductors such as germanium has been investigated quantum mechanically in quantizing magnetic fields. It is assumed that the energy band of electrons in semiconductors is nonparabolic and the dominant scattering mechanism for electrons in solids is that of nonpolar optical phonon scattering. When the radiation field is polarized parallel to the magnetic field, the absorption coefficient will be of complex value due to the interaction of the radiation field and the optical phonon field with electrons in semiconductors. Results show that real and imaginary parts of the absorption coefficient oscillate quite considerably with the magnetic field in the high fields for the heavily doped n-type Ge. Both real and imaginary parts of the absorption coefficient appear as positive and negative values when changing the magnetic field. In low magnetic fields, the imaginary part of the absorption coefficient disappears. However, if the density of electrons increases, the imaginary part of the absorption coefficient will increase with the magnetic field in low fields. Moreover, it is also shown that the amplitudes of oscillations for the real and imaginary parts of the absorption coefficient do not vary in a regular trend with the density of electrons.     

Substitutional disorder effects on optical spectra of extremely heavily doped Si : P obtained by ion implantation and laser annealing

The optical reflectivity spectrum (2500–5000 Å) of extremely heavily phosphorus (P)-doped Si has been studied. The E₁ and E₂ peaks, which represent the completeness of the Si crystal, are slightly affected when doping concentrations are less than 10²¹ cm^-3 (2% Si : P). However,they appreciably degrade as the doping concentration increases from 10²¹ to 5×10²¹cm^-3 (10% Si : P). As the result of band calculations using a supercell configuration and pseudopotential method, we have been able to ascribe this behavior to the substitutional disorder effect.     

Optical and electronic properties of single modulation doped GaAs/AlGaAs V-grooved quantum wire modified by ion implantation

1 Introduction Recently, there is considerable interest in the fabrication and study of quasi-one di-mensional quantum wires (QWRs) due to their potential application for novel optoelec-tronic devices such as QWR laser array [1,2] etc. Among the various techniques devel-oped for producing quasi-one dimensional (quasi-1D) QWRs, the self-organized growth on patterned substrates has been proven to be one of the most promising methods, due to the simplicity of fabrication[3―5]. The QWR is fa…     

Infrared transmissivity of heavily doped contact layers on extrinsic silicon IR-detectors

The infrared transmissivity of heavily dopedp-type contact layers on silicon was studied in the 3–5 μm and 8–14 μm wavelength range in order to optimise the layer thickness and doping concentration for antireflection coating. The transmissivity of surface layers and buried layers was computed taking into account the free carrier optical dispersion by the Drude theory and corrections due to intervalence band transitions as well as multiple reflections and interferences in the layer. The computations are in quantitative agreement with measurements on contact layers formed by multiple boron implantation. It was found that the free carrier absorption loss completely cancels the gain due to the antireflection effect for a surface layer. Transmissivities of around 73% may be obtained by a buried heavily doped layer.