Radiation defects in germanium. radiation defects annealed at ∼260°C in n-type germanium

Abstract

Point defects produced by neutron, electron or γ-ray irradiation were studied by electrical measurements. The defect levels were analyzed by DLTS technique. Annealing of radiation induced defects at about 260°C was obtained in 20 min isochronal annealings. Annealed fraction of the 260°C stage was obtained to be 85% in arsenic-doped crystals and independent of the species of irradiating particle. The value in antimony-doped and oxygen-doped specimens were 25 and 70%, respectively. The activation energy was found to be 1.6 eV and the annealing kinetics were first order. A tentative model for the defect responsible at the 260°C stage is a vacancy complex.     

高温退火后非掺杂磷化铟材料的电子辐照缺陷

对不同气氛下高温退火非掺杂磷化铟(InP)材料的电子辐照缺陷进行了研究. 除铁受主外，磷化铁(FeP₂)气氛下退火后的InP中辐照前没有深能级缺陷，而辐照后样品的热激电流谱(TSC)中出现了5个较为明显的缺陷峰，对应的激活能分别为0.23 eV, 0.26 eV, 0.31 eV, 0.37 eV和0.46 eV. 磷(P)气氛下退火后InP中的热生缺陷较多，电子辐照后形成的缺陷具有复合体特征. 与辐照前相比，辐照后样品的载流子浓度和迁移率产生显著变化. 在同样的条件下，经FeP₂ 气氛下高温退火后的InP样品的辐照缺陷恢复速度较快. 根据这些现象分析了缺陷的属性、快速恢复机理和缺陷对材料电学性质的影响. 关键词： 磷化铟 电子辐照 缺陷     

Low density approximation for diffusion annealing

The problem of annealing of Frenkel-pairs in electron irradiated fee metals due to diffusion of interstitials is treated starting from exact equations for single particle densities, pair densities, etc. The mobile interstitials are considered to interact with vacancies (leading to recombination), impurity atoms (leading to interstitial-impurity complexes) and with each other (leading to interstitial clusters).

By using the superposition approximation, i.e. replacing three-particle probabilities by products of two-particle probabilities we obtain generalized Waite equations. For low defect densities the annealing is at different times governed by different processes. For short times the important process is the recombination of an interstitial with the near-by correlated vacancy generated by the same electron impact event, the so-called correlated recovery. For long times the remaining interstitials undergo long range migration and interact with uncorrelated sinks. During this process interstitial impurity complexes and interstitial clusters are formed.

The time dependence of the defect densities, the remaining fraction of defects after completion of diffusion annealing and the size distribution of interstitial clusters are calculated. Detailed comparison with experiments in Cu and Pt will be made.     

Study of “uncorrelated” radiation damage inNi 111In

With 1.5 MeV deuterons lattice defects have been introduced into diffused sources of¹¹¹In in Ni. Defect structure and annealing behavior were found in all respects comparable to previous work in Groningen using ion-implantation. The results suggest that the defect structure in Ni and other fcc metals is not strongly dependent on the manner in which the defects are introduced.Research supported in part by the National Science Foundation.     

纯金属中电子能损效应的实验研究

简要评述了快重离子辐照在纯金属中引起的电子能损效应的实验研究结果 ,特别是强电子能损在金属中引起的辐照缺陷的部分退火、新缺陷的产生 .离子潜径迹的形成和辐照相变等. As swift heavy ions are available for irradiation damage study, it has been tried to evidence whether electronic energy loss might play a role in the damage processes of metallic targets. Experimental investigations showed that, as increase of electronic energy loss, large amount of electronic energy loss can result in radiation annealing of part of defects produced by elastic collisions, defect creation, latent track formation, as well as phase transition, and so on. Pure metals...     

Damage production and annealing in ion-irradiated FCC metals

Abstract

Damage production, radiation annealing and stage I recovery in some FCC metals irradiated with ～ 1 MeV and ～ 100 MeV ions near 10 K are studied using electrical resistivity measurements. For ～ 1 MeV light and heavy ion irradiations, the fraction of stage I recovery and the damage efficiency decrease with the PKA median energy. For ～ 100 MeV heavy ion irradiations, an anomalous reduction of stage I recovery and a large cross-section for subthreshold recombination are found in Ni, and an enhancement of the damage efficiency is found in Cu; they are interpreted as due to the electron excitation by irradiating ions and the subsequent energy transfer from excited electrons to lattice atoms. Simultaneous differential equations describing the production and radiation annealing of two or more types of defects are solved, where the respective defect concentration is expressed as a function of fluence.     

Measurement of stored energy of KCl after 4·6°K reactor irradiation

Five KCl single crystals were irradiated at 4·6°K in the core of the Munich Nuclear Reactor for periods of 100 sec, 10 min, 1 hr or 10 hr, respectively. After irradiation the stored energy of the samples was measured in a differential-heat-flow calorimeter at two different heating rates: 0·29 and 1·1°K/min. At 0·29°K/min peaks of stored energy release were resolved at 21°K, near 27·5°K, at 32·5°K, at 42·5°K and near 50°K. An attempt was made to evaluate the corresponding activation energies using two different methods (see Table 1 in the text). The annealing stages at 21 and 32·5°K correspond to first order kinetics. The annealing stages at 42·5 and near 50°K are not of first order. A similar experiment was performed on KBr single crystals and is reported in the preceding paper. The results are compared with annealing studies on low temperature X-irradiated KCl and KBr crystals. From both our experiments it follows that also during reactor irradiation at 4·6°K ionization mechanisms of defect production should be responsible for the four observed low temperature recovery peaks; only defect recovery at higher temperatures may be at least partially explained by recombination of collision produced defects, i.e. the typical neutron irradiation effect as it takes place in metals.     

Effects of implantation defects on the carrier concentration of 6H-SiC

The effects of ion irradiation defects on the carrier concentration of 6H-SiC epitaxial layer were studied by current–voltage (I–V), capacitance.-voltage (C–V) measurements, thermally stimulated capacitance and deep level transient spectroscopy. The defects were produced by irradiation with 10 MeV C⁺ at a fluence of 10¹¹ ions/cm² and subsequent thermal annealings were carried out in the temperature range 500–1700 K under N₂ flux. I–V and C–V measurements reveal the presence of a high defect concentration after irradiation and annealing at temperature lower than 1000 K. Thermally stimulated capacitance measurements show that some of the defects induce a deactivation of the nitrogen donor, while some of the generated defects, behaving as donor-like traps, contribute to increase the material free carrier concentration at temperatures above their freezing point. Deep level transient spectroscopy measurements performed in the temperature range 150–450 K show the presence of several overlapping traps after ion irradiation and annealing at 1000 K: these traps suffer a recovery and a transformation at higher temperatures. The annealing of all traps at temperatures as high as 1700 K allows one to completely restore the n-type conductivity. The defects mainly responsible of the observed change in the carrier concentration are identified. PACS 73.30.+y; 61.80.Jh; 61.82.Fk; 85.30.Hi     

Role of nickel and manganese in recovery of resistivity in iron-based alloys after low-temperature proton irradiation

This study investigates the recovery of electric resistivity in pure iron, Fe–0.6Ni and Fe–1.5Mn as related to isochronal annealing following 1 MeV proton irradiation at lower temperature than 70 K, focusing on the relationship between solute atoms and irradiation defects. Both nickel and manganese prevent stage I_D recovery, which corresponds to correlated recombination. Stage II recovery is also changed by the addition of a solute, which corresponds to the migration of small interstitial clusters. In both pure iron and Fe–0.6Ni, no evident difference was observed in the stage III region, which corresponds to the migration of vacancies. In contrast, two substages appeared in the Fe–1.5Mn at a higher temperature than stage III_B appeared in pure iron. These substages are considered to represent the release of irradiation-induced defects, which was trapped by manganese.     

Positron annihilation studies of defects in helium-irradiated silicon

Positron annihilation studies have been carried out on Si-n irradiated with He⁺ ions at the V.U.B. cyclotron, to a dose of 4×10¹⁷ He/cm². No temperature dependence on the S-parameter and lifetimes is seen below the irradiation temperature. The positron lifetime associated to the created defects is 290 ps. During the isochronal annealing, this lifetime stays constant up to 700 K. It is attributed to the annihilation of positrons from large vacancy-clusters filled with He atoms. From the isochronal annealing results, only one annealing stage is seen. This annealing stage which extends over a long range of temperature 700–1000 K, is ascribed to the degassing of helium atoms from defects and the growth of vacancy-clusters. The lifetime of positrons in those defects reaches a value of about 530±30 ps at 1000 K, indicating that the vacancy-clusters formed have a mean size of more than 8 vacancies.     

Irradiation-induced atomic defects in SiC studied by positron annihilation

The present paper reports on positron lifetime measurements on atomic defects in SiC after low-temperature (80 K) electron irradiation of low (0.47 MeV) and high (2.5 MeV) electron energies and doses from 1.8×10¹⁷ to 1.9×10¹⁹ e/cm² as well as after subsequent isochronal annealing up to 1900 K. For these studies the single crystals of nitrogen doped (2–3×10¹⁸ cm^–3) SiC grown by a modified Lely technique with hexagonal structure (6H polytype) were used.According to the positron lifetime measurements, very different types of vacancy-like positron traps are introducted after irradiation with electrons of either low or high energy. The formation of defect agglomerates and their decay at high temperatures is studied during isochronal annealing and related to earlier studies.Paper presented at the 132nd WE-Heraeus-Seminar on Positron Studies of Semiconductor Defects, Halle, Germany, 29 August to 2 September 1994     

Illumination induced annealing in electron-irradiated p-type silicon

Illumination with white light during isochronal annealing in p-type Si irradiated with 2 MeV electrons at 77 K introduces stages of recovery at around 85 and 140 K. These stages recover about 90% of carriers removed by the irradiation.     

硅单粒子位移损伤多尺度模拟研究

本文结合分子动力学方法和动力学蒙特卡罗方法, 研究了单个粒子入射硅引起的位移损伤缺陷的产生和演化过程; 基于Shockley-Read-Hall理论计算了单个粒子入射引起的位移损伤缺陷导致的泄漏电流增加及其演化过程, 比较了缺陷退火因子与泄漏电流退火因子之间的差异, 并将计算结果与实验值进行了对比. 结果表明, 计算泄漏电流时, 仅考虑一种缺陷的情况下缺陷退火因子与泄漏电流退火因子相同, 考虑两种缺陷类型情况下二者在数值上有所区别, 但缺陷退火因子仍能在一定程度上反映泄漏电流的退火行为. 分子动力学模拟中采用Stillinger-Weber势函数和Tersoff势函数时缺陷退火因子和泄漏电流退火因子与实验结果一致, 基于Stillinger-Weber势函数的计算结果与实验值更为接近.     

Simulating high energy cascades in metals

Abstract

The processes of radiation damage, from initial defect production to microstructure evolution, occur over a wide spectrum of time and size scales. An understanding of the fundamental aspects of these processes requires a spectrum of theoretical models, each applicable in its own time and distance scales. As elements of this multi-model approach, molecular dynamics and binary collision simulations play complementary roles in the characterization of the primary damage state of high energy collision cascades. Molecular dynamics is needed to describe the individual point defects in the primary damage state with the requisite physical reality. The binary collision approximation is needed to model the gross structure of statistically significant numbers of high energy cascades. Information provided by both models is needed for connecting the defect production in the primary damage state with the appropriate models of defect diffusion and interaction describing the microstructure evolution. Results of binary collision simulations of high energy cascade morphology are reviewed. The energy dependence of freely migrating defect fractions calculated in recent molecular dynamics simulations are compared to results obtained much earlier with a binary collision/annealing simulation approach. The favorable agreement demonstrates the viability of the multi-model approach to defect production in high energy cascades.     

Interaction of hydrogen and deuterium with intrinsic atomic defects in high-purity electron-irradiated nickel

Abstract

High-purity nickel was irradiated with 2 MeV electrons at temperatures below 80 K to a dose of 1 × 10²³ e^?/m² in the as-prepared state and after charging with H or D. By means of magnetic after-effect measurements relaxations of anisotropic radiation-induced defects and of defect-hydrogen complexes were investigated in the temperature range between 4.2 and 500 K. The isochronal annealing behaviour of these relaxations and the isochronal recovery of the residual resistivity was measured simultaneously on the same specimens. At temperatures below the hydrogen mobility (< 160 K) in charged irradiated specimens relaxation maxima are observed at 45, 100, 115 and 140 K which show no isotope shift for H and D charging. The maxima below 160 K are explained by defect-hydrogen complexes, where radiation-induced defects reorient around immobile hydrogen atoms. Above 160 K, where hydrogen atoms get mobile, in charged irradiated specimens a broad relaxation maximum appears at 170 K which shows an inverse isotope shift for H and D charging. This 170 K maximum anneals in Stage III. A hydrogen diffusion maximum observed in charged specimens at 215 K prior to irradiation is missing after electron irradiation. The 170 K relaxation is explained by defect-hydrogen complexes, where hydrogen atoms reorient around immobile radiation-induced defects while the long-range hydrogen diffusion is suppressed by these defects. In such relaxation measurements hydrogen and deuterium atoms are used as a “probe” to investigate radiation-induced defects.     

Hot electron studies of lattice damage created in silicon by implantation of 2.8 MeV protons

Abstract

In this paper we report the results of a study of the annealing properties of the ionized defect density associated with the damage created in the silicon lattice by implantation of 2.8 MeV protons at room temperature. In particular, the annealing of damage created by implanting to a level of 4.43 × 10¹² protons/cm² is reported. The resulting isochronal annealing curve covered the temperature range from 70°C to 460°C. Two major annealing stages are discussed, one a broad stage between 70°C to 200°C and the other an abrupt annealing stage between 440°C to 460°C. Between the temperature range 200°C to 440°C the number of ionized defects remained relatively constant. Above 460°C no detectable effects of the proton implantation remained.     

Time-resolved defect production and annealing during electron-beam processing of silicon

In (100)p-Si radiation damage was produced by implanting B⁺ ions with an energy of 80keV, 90keV and 1.6MeV. The specimens were annealed by scanned electronbeam irradiation (20keV, 1–2mAcm^–2). The formation, evolution and annihilation of defects during the irradiation process were investigated by employing DLTS and RBS measuring techniques. The results show a minimum of defect concentration and an efficiency of the electrical activation of B higher than 80% at an annealing time of 4.5 s. For irradiation times longer than 5 s it becomes evident, that the crystal surface acts as source of defects and contributes to an increase in defect concentration.     

Thermo-stimulated luminescence of x-ray- and alpha-irradiated yttria-stabilized zirconia

Yttria-stabilized zirconia (ZrO2 : Y3+) single crystals (with 9.5 mol% Y2O3) were irradiated with x-rays and α particles. Thermally stimulated luminescence (TSL) data show a main broad peak centred at ～500-550 K in the glow curves of all irradiated samples. The TSL peak maximum temperature is consistent with the characteristic recovery temperature (～450 K) of colour centres (T centres) deduced from isochronal annealing curves measured by electron paramagnetic resonance (EPR) spectroscopy. However, the trap-depth energies (ranging between 0.8 and 1.2 eV) deduced from the initial rise of partially cleaned TSL peaks (and from a rough approximation using Urbach's formula) are much larger than the activation energies for defect recovery of 0.3 eV deduced from the EPR data. A second TSL peak centred at ～350-450 K found in freshly irradiated samples is seen to decay substantially in aged samples. The processes involved in TSL are discussed in relation to the defect annealing processes, and available defect-level energy and TSL data.