A NEW METHOD TO ENHANCE THE MAGNETISM OF Fe OVERLAYER ON GaAs(100): SULFUR PASSIVATION USING CH3CSNH2

Ferromagnetic resonance (FMR) has been used to investigat the magnetism of Fe overlayer on S-passivated GaAs(lO0) pretreated by CH₃CSNH₂. Comparing with the magnetism of Fe overlayer on clean GaAs(100), we find that sulfur passivation can prevent Aa diffusion into Fe overlayer and weaken the interaction of As and Fe. It results in enhancing the magnetism of Fe overlayer on GaAs(100). We also investigate the effects of the pre-annealing of S- pasaivated GaAs(100) substrate on the magnetism of Fe overlayers. The results show that the maximum effective magnetization can be obtained at annealing temperature of 400℃. According to the experimental results of synchrotron radiation photoemission, it can be explained by the change of chemical composition and surface structure of the passivation layer on GaAs(100) surface after the annealing.     

S钝化GaAs(100)表面的电子特性

用TB-LMTO方法研究单层的S原子在理想的GaAs (100) 表面的化学吸附, 对GaAs(100)表面是Ga-和As-中断两种情况分别进行考虑. 计算了S原子在不同位置的吸附能、吸附体系与清洁的GaAs(100)表面的层投影态密度, 以及电子转移情况. 结果表明, 两种情况下S原子都是桥位吸附最稳定, S-Ga相互作用比S-As稍强, S钝化GaAs(100)表面可以取得明显的钝化效果.     

多种含硫溶液钝化(100)GaAs表面的实验研究

为实现GaAs表面的钝化,以Na2S、(NH4)2S、CH3CSNH2为主要研究对象,通过对比实验研究得出较为理想的湿法钝化液。通过光致发光(PL)谱研究了(NH4)2S 叔丁醇、CH3CSNH2 NH4OH、CH3CSNH2 叔丁醇三种不同含硫溶液钝化(100)GaAs表面后的发光特性。PL谱测试发现,(NH4)2S 叔丁醇饱和溶液处理过的(100)GaAs表面光致发光强度最强,PL谱的相对发光强度是未做钝化处理的10倍左右。因此得出(NH4)2S 叔丁醇饱和溶液是较为理想的(100)GaAs表面钝化液。     

射频等离子硫钝化GaAs(100)的表面特性

采用射频等离子方法,对Ga As(100)衬底片表面进行干法硫等离子体钝化,旨在得到性能稳定含硫钝化层。样品经过360℃温度条件下的快速热退火,光致发光(PL)测试表明,钝化后的样品PL强度上升了71%。同时,钝化样品的稳定性测试结果表明,样品放置在实验室空气中30 d,其PL强度未出现明显变化,说明Ga As的等离子体干法硫钝化具有较好的性能稳定性。     

正十八硫醇钝化GaAs(100)表面特性研究

为了有效降低GaAs半导体表面态密度,提出了采用正十八硫醇（ODT,CH₃[CH₂]₁₇SH）进行GaAs表面钝化的方案。首先,分别对GaAs（100）晶片进行了常规硫代乙酰胺（TAM,CH₃CSNH₂）钝化和正十八硫醇钝化,通过X射线光电子能谱（XPS）对比分析了钝化前后晶片表面的化学成分,然后利用光致发光光谱（PL）对正十八硫醇处理的GaAs（100）晶片进行了钝化时间的优化,最后通过扫描电子显微镜（SEM）测试了钝化前后的晶片表面形貌。实验结果表明：采用正十八硫醇钝化的GaAs（100）表面,相比常规硫代乙酰胺钝化方案,具有更低的氧化物含量和更厚的硫化层厚度;室温钝化条件下,钝化时间越长,正十八硫醇的钝化效果越好,但PL强度在钝化超过24 h后基本达到稳定,最高PL强度提高了116%;正十八硫醇钝化的GaAs（100）晶片具有良好的表面形貌,表面形成了均匀、平整的硫化物钝化层。数据表明正十八硫醇是钝化GaAs（100）表面一种非常有效的技术手段。     

Adsorption of Fe on GaAs(100) Surface

The adsorption of one monolayer Fe atoms on an ideal GaAs (100) surface is studied by using the self-consistent tight-binding linear muffin-tin orbital method. The Fe adatom chemisorption on Ga- and As-terminatedsurface are considered separately. A monolayer of S atoms is used to saturate the dangling bonds on one of the supercellsurfaces. Energies of adsorption systems of an Fe atom on different sites are calculated, and the charge transfers areinvestigated. It is found that Fe-As interaction is stronger than Fe-Ga interaction and Fe atoms prefer to be adsorbed onthe As-terminated surface. It is possible for the adsorbed Fe atoms to sit below the As-terminated surface resulting inan Fe-Ga-As mixed layer. The layer projected density states are calculated and compared with that of the clean surface.     

Laser projection-patterned etching of (100) GaAs by gaseous HCl and CH3Cl

Laser projection-patterned etching of GaAs in a HCl and CH₃Cl atmosphere performed using a pulsed KrF-excimer laser (=248 nm, =15 ns) and deep-UV projection optics (resolution 2 m) is reported. The etching process carried out in a vacuum system having a base pressure of 10^–6 mbar is shown to result from a purely thermochemical reaction. Etching takes place in two steps: (i) between the laser pulses, the etchant gas reacts with the GaAs surface-atomic layer to form chlorination products (mainly As and Ga monochlorides), (ii) local laser surface heating results in the desorption of these products allowing further reaction of the gas with the surface. The influence of the etching parameters (laser energy density, gas pressure and pulse repetition rate) on the etch rate and the morphology of the etched features was studied. Etch rates up to 0.15 nm per pulse, corresponding to the removal of 0.5 GaAs molecular layer, are achieved. The spatial resolution of the etching process is shown to be controlled by the heat spread in the semiconductor and by the nonlinear dependence of the etch rate on the surface temperature. As a result, etched features smaller or larger than the projected features of the photomask are achieved depending on the laser energy density. Etched lines having a width of 1.3 m were obtained at low fluences by the projection of 2 m wide lines onto the GaAs surface.     

Surface reactions of TiCl4 and Al(CH3)3 on GaAs(100) during the first half-cycle of atomic layer deposition

GaAs(100) was exposed to pulses of trimethylaluminum (TMA, Al(CH₃)₃) and titanium tetrachloride (TiCl₄) to mimic the first half-cycle of atomic layer deposition (ALD). Both precursors removed the 9.0 ± 1.6 Å-thick mixed oxide consisting primarily of As₂O₃ with a small Ga₂O component that was left on the surface after aqueous HF treatment and vacuum annealing. In its place, TMA deposited an Al₂O₃ layer, but TiCl₄ exposure left Cl atoms adsorbed to an elemental As layer. This suggests that oxygen was removed by the formation of a volatile oxychloride species. A small TiO₂ coverage of approximately 0.04 monolayer remained on the surface for deposition temperatures of 89 °C to 135 °C, but no TiO₂ was present from 170 °C to 230 °C. The adsorbed Cl layer chemically passivated the surface at these temperatures and blocked TiO₂ deposition even after 50 full ALD cycles of TiCl₄ and water vapor. The Cl and As layers desorbed simultaneously at higher temperature producing peaks in the temperature programmed desorption spectrum in the range 237–297 °C. This allowed TiO₂ deposition at 300 °C in single TiCl₄ pulse experiments. On the native oxide-covered surface where there was a higher proportional Ga oxide composition, TiCl₄ exposure deposited TiO₂.     

Magnetic properties of thermally deposited Fe/GaAs(100) thin films

Thin (50–200 Å) films of iron have been prepared on (100) gallium arsenide substrates by thermal evaporation at a deposition rate of 3–30 Å/s and a pressure of ～10^?5 torr. Dependences of the saturation magnetization, cubic and uniaxial planar anisotropy constants, and the ferromagnetic resonance linewidth on the film thickness were studied by ferromagnetic resonance at 9.8 GHz. It has been found that the parameters of thermally deposited Fe/GaAs (001) films are comparable to those achieved with molecular-beam epitaxy.     

Anomalous bismuth-stabilized (2x1) reconstructions on GaAs(100) and InP(100) surfaces

First-principles phase diagrams of bismuth-stabilized GaAs- and InP(100) surfaces demonstrate for the first time the presence of anomalous (2x1) reconstructions, which disobey the common electron counting principle. Combining these theoretical results with our scanning-tunneling-microscopy and photoemission measurements, we identify novel (2x1) surface structures, which are composed of symmetric Bi-Bi and asymmetric mixed Bi-As and Bi-P dimers, and find that they are stabilized by stress relief and pseudogap formation.     

Electron microscopy investigation of GaAs(100)-(Ga2Se3)-GaAs nanostructures

The GaAs(100)-Ga₂Se₃ heterostructures have been investigated by transmission and scanning electron microscopy. The sequence of structural transformations at the GaAs(100) surface during treatment in selenium vapor has been determined. It has been found that the preliminary treatment of the GaAs(100) surface in selenium vapor increases the orienting effect of the GaAs(100) substrate on the GaAs film growth.     

Magnetism of the Fe/ZnSe(001) interface

The magnetism of epitaxial ultrathin films of Fe on ZnSe(001) has been investigated by x-ray magnetic circular dichroism down to the submonolayer regime. In contrast to other metallic ferromagnet/semiconductor interfaces, no reduction of the Fe magnetic moment was found at the Fe/ZnSe(001) interface. Furthermore, a significant enhancement of the Fe magnetic moment compared to the bulk value was observed for coverages up to one monolayer in agreement with theoretical predictions. We also demonstrate that the magnetic properties of the Fe/ZnSe(001) interface remain stable against thermal annealing up to 300 degrees C, a prerequisite for the future development of efficient spintronics devices.     

β-Hydride elimination reaction of triethylgallium on GaAs(100) surfaces

We have used a pulsed molecular beam and time-resolved mass spectrometry to study the pyrolysis of triethylgallium (TEGa) on GaAs(100) surfaces from room temperature to 450°C. The β-hydride elimination pathway which produces ethylene and hydrogen competes with the direct desorption of the ethyl radicals. We have made a quantitative measure of the branching ratio and found that the β-hydride elimination reaction is promoted by increasing the Ga/As stoichiometric ratio of the GaAs(100) surface, but becomes less important and independent of Ga coverage at higher temperatures. The β-hydride elimination process is the rate limiting step in the desorption of ethylene and is first order in the ethyl group coverage.     

Magnetism of Mg atomic chains on the NaCl(100) surface

Based on the first-principles calculations within the density-functional theory, we have investigated the magnetism of 1D Mg nanowires, both unsupported and supported by the NaCl(100) surface. It is shown that Mg can exhibit magnetism in both the geometry of linear and zigzag chains. The freestanding Mg linear chain shows magnetization when the bonds are compressed. For an Mg zigzag chain, however, ferromagnetism is predicted at the equilibrium bond length. It is found that the magnetism of Mg chains can be maintained when deposited on the NaCl(100) surface. We have also analyzed the results by using the Stoner theory and the calculated electronic band structures.     

A LEED-AES study of the oxidation of Fe (110) and Fe (100)

Simultaneous LEED and AES observations have been used to study the initial stages of oxidation of the Fe(110) and Fe(100) single crystal surfaces at 300 K and 400 K and of a clean Fe polycrystal at 300 K. Accurate surface lattice spacings of the precursory oxide structures have been measured and attempts have been made to quantitatively evaluate the corresponding surface oxygen density.On the (110) single crystal surface the final structure is FeO-like with a lattice spacing 4% larger than that of bulk FeO. The transition to the FeO-like structure starts with a surface lattice expansion in the [11̄0] direction followed by an expansion in the [001] direction in order to accommodate the (111) face of the FeO-like structure. On the (100) single crystal face the oxygen and iron form an fcc (100) face which initially contracts and then expands with increasing oxygen doses. The structure formed at 300 K is spinel-like but heat treatment causes a transition to FeO(100).The changes of the surface unit cell dimensions are interpreted as the result of an interaction between adsorbate and substrate. This interaction is strongest in a direction parallel to the close packed rows of the substrate, making the corresponding periodicity of the adsorbate more resistant to lattice changes.In the case of the polycrystal a hexagonal structure was observed after oxygen adsorption with no simple relation to the oxide structures observed on the single crystals. The initial sticking coefficients in the interval 0–10^?5 torr sec ranged from 0.07 to 0.36 depending on temperature and crystal face observed. The latter dependence is explained in terms of the surface structure.