高温超导薄膜(Y0.6Ho0.4)Ba2Cu3O7-δ/SAT/MgO的制备

用脉冲激光沉积法在先在ＭｇＯ衬底上制备一层Ｓｒ２（ＡｌＴａ）Ｏ６薄膜作为过渡层,再制备（Ｙ０．６Ｈｏ０．４）Ｂａ２Ｃｕ３Ｏ７－δ超导薄膜,新超导薄膜的零电阻温度Ｔｃ０为８９Ｋ,临界电流密度Ｊｃ为２．３＊１０＾６Ａ／ｃｍ＾２（７７Ｋ）,用Ｘ射线衍射仪及扫描电子显微镜分析了薄膜特性。     

激光分子束外延制备的BaTiO3及c取向YBa2Cu3O7-δ薄膜的生长模式

用反射式高能电子衍射（ＲＨＥＥＤ） 和原子力显微镜（ＡＦＭ） 研究激光分子束制备的铁电ＢａＴｉＯ３ 和高Ｔｃ 超导ｃ 取向Ｙ１Ｂａ２Ｃｕ３Ｏ７ 薄膜的生长模式,ＢＴＯ 铁电薄膜是原子级平整的层状生长模式;ｃ 取向ＹＢＣＯ 超导薄膜是ＳＫ生长模式 当薄膜厚度小于５ 个原胞时,层状生长,然后是台阶岛状生长．处理ＳｒＴｉＯ３ 基片表面可以改变ｃ 取向ＹＢＣＯ薄膜的生长模式     

激光沉积法制备（Y1—xHox）Ba2Cu3O7—δ薄膜

本文报道了用激光沉积法在（１００）ＬａＡｌＯ３衬底上制备（Ｙ１－ｘＨｏｘ）Ｂａ２Ｃｕ３Ｏ７－δ（ｘ＝０，０．２，０．４）超导薄膜．结果表明，新超导薄膜表面光滑，具有很强的ｃ轴织构，零电阻温度Ｔｃ０约９１Ｋ，最佳临界电流密度Ｊｃ为４．７×１０６Ａ／ｃｍ２（７７Ｋ）．     

掩模法制备高TcYBa2Cu3O7Josephson边缘结

本文利用脉冲激光沉积的定向性和掩模的阴影效应，原位沉积Ｎ－ＹＢＣＯ作为势垒层制备了高ＴｃＹＢａ２Ｃｕ３Ｏ７Ｊｏｓｅｐｈｓｏｎ边缘结，在６０Ｋ，微波辐照观察到明显的Ｓｈａｐｉｒｏ台阶，在Ｔｃ附近，Ｉｃ∽（１－Ｔ／Ｔｃ），ｎ＝１．８８。     

YSZ／Si上溅射BSCCO超导膜的生长机理分析

本研究了利用ＹＳＺ（Ｙ稳定的ＺｒＯ２）缓冲层在Ｓｉ衬底上单靶偏轴溅射Ｂｉ－Ｓｒ－Ｃａ－Ｃｕ－Ｏ高温超导薄膜的工艺条件，给出了ＹＳＺ和ＢＳＣＣＯ薄膜的性能测试结果，并根据电镜分析结果，提出了ＢＳＣＣＯ薄膜的螺旋柱状生长机理。     

MOCVD法在金属基体上制备YBCO超导带

本报道了用ＭＯＣＶＤ静态和动态沉积两种工艺制备ＹＢＣＯ超导带的实验结果。以Ｙ（ＴＭＨＤ）３、Ｂａ（ＴＭＨＤ）２和Ｃｕ（ＴＭＨＤ）２为挥发源，Ｏ２气为反应剂，高纯Ａｒ气为载流气体，在静止和以１０－１５ｃｍ／ｈ带速移动的金属银基体上，制出了有强烈ｃ－轴取向的ＹＢＣＯ超导带。静态沉积样品的Ｊｃ达到１．０４×１０＾４Ａ／ｃｍ＾２，动态沉积样品的Ｊｃ达到１．４×１０＾４Ａ／ｃｍ＾２（７８Ｋ，０Ｔ）。对改…     

Y稳定的ZrO2基体上YBa2Cu3O7／SrTiO3／YBa2Cu3O7异质外延三层…

采用磁控溅射方法在（１００）ＹＳＺ基底上沉积了ＹＢａ２Ｃｕ３Ｏ７／ＳｒＴｉＯ３／ＹＢａ２Ｃｕ３Ｏ７异质外延三层膜。利用交流磁化率和四引线电阻测量的方法确定了三层膜的超导性能，利用Ｘ射线衍射和透射电子显微镜研究了三层膜的结构特征。研究结果表明，膜层的结晶质量较好，临界转变温度Ｔｃ在８３．５Ｋ和８６．７Ｋ之间。ＹＢＣＯ膜层中的绝大多数甚至全部）晶粒为ｃ取向，在有些膜中只存在少量的ａ或ｂ取向的ＹＢＣＯ晶     

Y稳定的ZrO_2基体上YBa_2Cu_3O_7／SrTiO_3／YBa_2Cu_3O_7异质外延三层膜的制备、超导性能和显微结构

采用磁控溅射方法在（１００）ＹＳＺ基底上沉积了ＹＢａ２Ｃｕ３Ｏ７／ＳｒＴｉＯ３／ＹＢａ２Ｃｕ３Ｏ７异质外延三层膜，利用交流磁化率和四引线电阻测量的方法确定了三层膜的超导性能，利用Ｘ射线衍射和透射电子显微镜研究了三层膜的结构特征．研究结果表明，膜层的结晶质量较好，临界转变温度Ｔｃ在８３．Ｋ和８６．７Ｋ之间．ＹＢＣＯ膜层中的绝大多数甚至全部）晶粒为Ｃ取向，在有些膜中只存在少量的ａ或ｂ取向的ＹＢＣＯ晶粒．三层膜中层界面比较清晰但不十分平整．在膜／基界面处有８－１０ｎｍ厚的过渡层，它由多晶的ＢａＺｒＯ３组成．膜层和（１０）ＹＳＺ基底之间具有如下的外延生长关系ＹＳＺ［００１］／／ＹＢＣＯ［１１０］／／ＳｒＴｊＯ３［１１０］；ＹＳＺ（１００）／／ＹＢＣＯ（００１）／／ＳｒＴｉＯ３（００１）．     

用MOCVD法在YSZ衬底上制备YBCO膜

用低压ＭＯＣＶＤ多源法在单晶ＹＳＺ和具有双轴取向ＩＢＡＤＹＳＺ的金属基带上沉积了ＹＢＣＯ膜,它们的Ｊｃ（７７．３Ｋ,０Ｔ）分别为～２×１０６Ａ／ｃｍ２和～７×１０４Ａ／ｃｍ２．分析了本试验中的Ｊｃ差别原因．在单晶ＹＳＺ上ＹＢＣＯ高Ｊｃ数值显示了用ＭＯＣＶＤ制备涂层膜导体的潜力     

Ag/Pb(Zr0.53Ti0.47)O3/YBa2Cu3O7-x三端器件构造和性能的研究

应用脉冲激光沉积法和光刻技术我们成功地制作Ａｇ／Ｐｂ（Ｚｒ０．５３Ｔｉ０．４７）Ｏ３／ＹＢａ２Ｃｕ３Ｏ７－ｘ（ＰＺＴ／ＹＢＣＯ）三端器件．为了降低矫顽场,应用变形相界（ｘ≈０．５３）的５５０纳米厚的ＰＺＴ作为门电极,通过优化沉积条件和门电极面积小型化（６×１０－６ｃｍ２）,在６４Ｋ下三端器件门电极显示了极好的电性能,低的矫顽场（～３７ｋＶ／ｃｍ）、大的饱和极化强度（６０μＣ／ｃｍ２）、剩余极化强度（４１μＣ／ｃｍ２）以及击穿电压～３×１０５Ｖ／ｃｍ．对于我们的场效应器件,在±９Ｖ的情况下沟道电阻被调制～３％．     

Observation of defects and growth orientations of YBa2Cu3Ox thin films with YSZ buffer layers on Si

We have investigated defects and in-plate orientations of YBa₂Cu₃O_x thin films prepared by pulsed laser deposition (PLD) with YSZ as a buffer layer. The films showed c-axis oriented growth with the transition temperature T_co up to 87 K. Several types of defects including thermally induced cracks, grain boundaries and outgrowths were observed by scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The grain boundary provided a favorable path for crack propagation. The outgrowths nucleated on the YSZ surface grew with stoichiometric composition. According to X-ray diffraction (XRD) and HRTEM studies the YSZ buffer layer grew with the orientation relationship, YSZ110//Si110 and YSZ(001)//Si(001) up to the YBCO/YSZ interface. The superconducting YBCO films on top grew mainly with YBCO100//Si110 and YBCO(001)//Si(001), with some minor portions of YBCO110//Si110 and YBCO(001)//Si(001).     

Improved initial epitaxial growth of superconducting YBa2Cu3O7 thin films on Y–ZrO2 substrates with a La1.85Sr0.15CuO4 buffer layer

Epitaxial thin films of YBa₂Cu₃O₇ (YBCO) have been deposited on Y–ZrO₂ (YSZ) substrates by means of the pulse laser deposition technique. It has been found that the initial epitaxy of YBCO thin films grown on YSZ can be significantly improved by using La_1.85Sr_0.15CuO₄ (LSCO) as a buffer layer. X-ray diffraction measurements show that the epitaxial YBCO films have single in-plane orientation with YBCO [100]LSCO [100] and LSCO [100]YSZ [110]. The real-time resistance measurements reveal that with LSCO buffer layers the initial formation of the YBCO ultra-thin films changes from the island growth to the layer-by-layer growth.     

Deposition and characterization of YBCO/CeO2/YSZ/CeO2 multilayers on biaxially textured Ni substrates

CeO2/YSZ/CeO2 buffer layers were deposited on biaxially textured Ni substrates by pulsed laser deposition. The influence of the processing parameters on the texture development of the seed layer CeO2 was investigated. Epitaxial films of YBCO were then grown in situ on the CeO2/YSZ （yttria-stabilized ZrO2）/CeO2-buffered Ni substrates. The resulting YBCO conductors exhibited self-fleld critical current density Jc of more than 1 MA/cm^2 at 77K and superconducting transition temperature Tc of about 91K.     

High critical current density YBa2Cu3O7−δ tapes prepared by the surface-oxidation epitaxy method

YBa₂Cu₃O_7−δ (YBCO) films with high critical current density (J_c) were successfully fabricated on nickel tapes buffered with epitaxial NiO. NiO was prepared on the textured nickel tape by the surface-oxidation epitaxy (SOE) method. We have reported so far a critical temperature (T_c) of 87 K and J_c=4–6×10⁴ A/cm² (77 K, 0 T) for the YBCO films on NiO/Ni tapes. To enhance the superconducting properties of the YBCO films on the SOE-grown NiO, depositions of thin oxide cap layers such as YSZ, CeO₂, and MgO on NiO were investigated. These oxide cap layers were epitaxially grown on NiO and provided the template for the epitaxial growth of YBCO films. Substantially improved data of T_c=88 K and J_c=3×10⁵ A/cm² (77 K, 0 T) and 1×10⁴ A/cm² (77 K, Hc, 4 T) were obtained for YBCO film on NiO, by using a MgO cap layer with a thickness of 50 nm. The method described in this paper is a simple way to produce long YBCO tape conductors with high-J_c values.     

T1系超导薄膜金属涂层的生长与特性研究

我们研究了T1-2212超导薄膜在带有YSZ／CeO2缓冲层和带有Ce02／YSZ／CeO2缓冲层的Ni金属RABiTS基带上的生长情况．基带上的缓冲层是采用PLD方法制备的，T1-2212薄膜的制备采用了磁控溅射和后热处理两步方法．XRD实验结果表明。T1-2212薄膜都具有很好的C轴垂直于膜面的织构，并具有双向外延生长特性．在CeO2／YSZ／CeO2／Ni基带上制作的T1-2212薄膜的Tc达到102．8K，J,（77K,0T）达到2.6MA／cm^2；在YSZ／CeO2／Ni基带上薄膜Tc可达97．7K，Jc（77K,0T）也可以达到0．45MA／cm^2.     

Tl系超导薄膜金属涂层的生长与特性研究

我们研究了Tl-2212超导薄膜在带有YSZ/CeO2缓冲层和带有CeO2/YSZ/CeO2缓冲层的Ni金属RABiTS基带上的生长情况.基带上的缓冲层是采用PLD方法制备的,Tl-2212薄膜的制备采用了磁控溅射和后热处理两步方法.XRD 实验结果表明,Tl-2212薄膜都具有很好的C轴垂直于膜面的织构,并具有双向外延生长特性.在CeO2/YSZ/CeO2/Ni基带上制作的Tl-2212薄膜的Tc达到102.8 K,Jc(77 K,0 T)达到2.6 MA/cm2;在YSZ/CeO2/Ni基带上薄膜Tc可达97.7 K,Jc(77 K,0 T)也可以达到0.45 MA/cm2.     

IBAD技术制备涂层导体用YSZ缓冲层长带的研究

在钇钡铜氧(YBCO)高温超导涂层导体制备路线中,离子束辅助沉积技术(IBAD)是两大主流技术路线之一,取得了最为突出的研究成果.本文简要介绍了IBAD技术制备YBCO涂层导体的最新研究进展;并采用离子束辅助沉积技术在哈氏合金(Hastelloy)基底上成功制备了1米长具有钇稳定氧化锆(YSZ)缓冲层的金属基带.采用X射线衍射仪(XRD)分析YSZ缓冲层的取向;利用原子力显微镜(AFM)和扫描电镜(FESEM)观察其表面形貌.获得了可以实际应用的IBAD-YSZ/Hastelloy缓冲层长基带,可以在该基带上研制其他缓冲层以制备YBCO高温超导涂层导体带材.     

PREPARATION OF a-AXIS ORIENTED YBa2Cu3Ox THIN FILMS

The a-axis oriented YBa₂Cu₃O_x(YBCO) thin films could be grown on (100) SrTiO₃(STO) substrates with STO buffer layers by dc and rf magnetron sputtering either by low-ering the deposition temperature, or by using a self-template technique. For the latter, the resistivity of the thin film at 290K along the substrate [001] direction is about four times larger than that in the [010] direction. The zero resistance temperatures T_c0 are 89 K in both directions. So high quality a-axis oriented YBCO thin films can be prepared by the self-template technique. Also the T_c0 increase monotonously with the reduction of the thickness of the YBCO seed layer.     

插入二氧化铈薄膜提高MOD-YBa2Cu3O7-x厚膜超导性能的研究

YBa₂Cu₃O_7-x(YBCO)膜存在“厚度效应”: 随着厚度增加, YBCO薄膜的临界电流密度下降, 尤其是YBCO薄膜的厚度超过1 μm时, 它的临界电流密度急剧下降. 本文在YBCO薄膜之间引入极薄的二氧化铈(CeO₂)薄膜, 成功制备出结构为YBCO/YBCO/CeO₂/YBCO的超导厚膜. 所制备的厚度为2 μm的YBCO膜临界电流密度为1.36 MA/cm² (77 K, 自场), 其性能比相同厚度的纯YBCO膜有了较大幅度的提升. 研究表明CeO₂薄膜起到了传递织构、松弛应力的作用.     

Fabrication of YBCO／YSZ and YBCO／MgO thick films using electrophoretic deposition with top-seeded melt growth process

Superconducting thick films were grown on single crystals MgO and YSZ by electrophoretic deposition with Y_2BaCuO_5(Y211) addition. YBCO thick films were then accomplished by sintering the precursor films above the peritectic temperature. Single crystals of MgO (3×3×0.5 mm^3) were used as top-seed to control crystal structure of the thick films. As shown by scanning electron microscopy, the morphologies of YBCO/YSZ and YBCO/MgO thick films are spherulitic texture and platelet type. The critical temperature is ～89 K for the YBCO/YSZ thick film; the onset transition temperature is 86.4 K and the transition width is ～3 K for YBCO/MgO thick film. The critical current densities (as determined by Bean model) are, in A/cm^2, 3870 (77 K) for YBCO/YSZ thick films and 2399 (77 K) for YBCO/MgO thick films, which are comparable to the best J_c reported of the thick films prepared by the same method.