Surface modification and oxidation kinetics of hot-pressed AlN–SiC–MoSi2 electroconductive ceramic composite

The effects of oxidation on the microstructural modification and on the electrical resistivity and mechanical strength of a hot-pressed AlN–SiC–MoSi₂ electroconductive ceramic composite were studied. The kinetic of the oxidation was also evaluated. After the oxidation at temperatures below 1000 °C samples do not gain weight, due to simultaneous formation of SiO₂ and evaporation of MoO₃ formed by the oxidation of MoSi₂. However, the AlN/SiC matrix disables the “pesting” phenomena and strength degradation, despite the fact that at these temperatures MoSi₂ oxidizes rapidly. At temperatures above 1000 °C, the composite gains weight due to protective mullite layer formation on the surface, that provides a good oxidation resistance for use at higher temperatures. The kinetics of the oxidation follows the parabolic law. The possible rate-controlling mechanism is the diffusion of oxygen through the mullite-rich surface oxide scale.     

A new procedure for the preparation of Tl2Ba2CaCu2O8-δ characterization by neutron diffraction, electron diffraction and HREM

A new procedure for the preparation of Tl₂Ba₂CaCu₂O_8-δ is presented. In the first step stoichiometric amounts of Cu(NO₃)₂·3H₂O, Ba(OH)₂·H₂O, CaO and Tl₂O₃ are reacted in a closed alumina crucible at 760°C to form a mixture of Tl- 2212, CuO, CaO and other oxide phases. In the second step this material is milled, pelletized and fired in a gold-sealed alumina crucible at 860–900°C for three to eight hours. Three batches of Tl-2212 prepared by this method were investigated showing less than 1% loss of thallium while T_c was close to 110 K. Rietveld refinements using time-of-flight neutron-diffraction data demonstrate that the method produces pure material in a reproducible way and that the materials are substoichiometric with respect to oxygen (δ=0.3). Investigations using electron diffraction and high-resolution electron microscopy indicate the absence of stacking faults.     

Effect of Ag promoter on redox properties and catalytic performance of Ag-Mo-P-O catalysts for oxidative dehydrogenation of propane

The influence of addition of sliver ions on the redox properties and catalytic performance of molybdenum-phosphate catalyst in oxidative dehydrogenation (ODH) of propane has been investigated. MoO₃ and AgMoO₂PO₄ have been detected in Ag-doped Mo-P-O catalysts. The redox properties have been characterized by H₂-temperature-programmed reduction (TPR), electronic paramagnetic resonance (EPR) and X-ray photoelectron spectroscopy (XPS). The catalytic performance of MoO₃, Ag₂O, AgMoO₂PO₄ and Ag-doped Mo-P-O catalysts has also been examined. The incorporation of Ag improved the number of Mo⁵⁺ species and the reducibility of the catalysts. The Ag-doped catalysts favor activity and selectivity in ODH of propane higher than the undoped catalyst. The best catalyst was obtained with Ag/Mo ratio of 0.3 and MoO₃/AgMoO₂PO₄ ratio of 1.1. The influence of promoter Ag⁺ on redox properties and catalytic performance is due to forming redox couple “Ag⁰+Mo⁶⁺Ag⁺+Mo⁵⁺” and the synergetic effect originating from “coherent interface” between MoO₃ and AgMoO₂PO₄.     

Electrical conductivity and defect structure of Mg-doped Cr2O3

The electrical conductivity of Cr₂O₃ nominally doped with 2 mol% MgO has been studied by the four point a.c. technique as a function of the oxygen activity (O₂ + Ar, CO + CO₂ and H₂ + H₂O) in the temperature range 400–1200 °C. It is concluded that Cr₂O₃ doped with MgO is an extrinsic conductor and that the dissolved Mg-dopant is compensated by the formation of electron holes at near atmospheric oxygen pressures and by oxygen vacancies (or possibly interstitial chromium ions) at highly reduced oxygen activities (in CO + CO₂ and H₂ + H₂O gas mixtures). In H₂ + H₂O mixtures Mg-doped chromia also dissolves hydrogen as protons and significantly affects the defect structure and electrical conductivity. The defect structure of the oxide under various conditions is discussed.     

Measurement of diffusion coefficients using a quick echo split NMR imaging technique

A new method for the ultrafast generation of diffusion-weighted images is reported. The technique combines a quick echo split NMR imaging sequence with the principle of Stejskal and Tanner. It allows to determine the diffusion constant with nearly the same accuracy as the conventional spin-echo technique, requiring only a fraction of the time. The determined values for water doped with 1 g Cu(NO₃)₂ per liter of H₂O and pure acetone were D_water = (1.95 ± 0.02) × 10⁻⁹ m²/s and D_acetone = (4.05 ± 0.02) × 10⁻⁹ m²/s at 18.5°C. They are in good agreement both with literature and our own reference measurements using a diffusion-weighted spin-echo sequence. In addition, the temperature dependence of D_water was measured in the range of 18.5–45.9°C and a good correspondence with reported data was found.     

Superconducting oxide formation in the Yb---Ba---Cu---O system

Conditions for forming YbBa₂Cu₄O₈, Yb₂Ba₂Cu₃O_7−δ and YbBa₂Cu₃O_7−δ were determined in oxygen at 1.0 atm pressure by experiments with oxidized Yb---Ba---Cu---Ag alloys. YbBa₂Cu₃O_7−δ formed in less than 10 s when oxidized alloy ribbons were baked in the 805°C–890°C range. Large amounts of Ba₂Cu₃O₅ formed below 870°C. Yb₂Ba₄Cu₇O_15−δ and YbBa₂Cu₄O ₈ then formed in the 10²s–10³s range at temperatures in the 840°C–870°C and <840°C ranges, respectively. Ba₂Cu₃O₅ decomposition supplied Cu²⁺ and O²⁻ for the rapid transformation of YbBa₂Cu₃O_7−δ grains into Yb₂Ba₄Cu₇O_15−δ grains by intercalation. Intercalation was much slower in the absence of Ba₂Cu₃O₅. All of these transformation products underwent coarsening with increasing bake time. Rapid YbBa₂Cu₄O₈ and Yb₂Ba₄Cu₇O_15−δ formation, compared to the slow formation of these phase types when Yb was substituted by Y, Is due to the differing effects of Y and Yb on formation kinetics. Superconducting oxide-silver composite ribbons containing mainly YbBa₂Cu₃O_7−δ, Yb₂Ba₄Cu₇O_15−δ or YbBa₂Cu₄O₈ can be prepared from Yb---Ba ---Ba---Cu---Ag alloys.     

Paramagnetic relaxation in two double nitrates

Relaxation measurements have been performed on a single crystal of Ce₂Mg₃(NO₃)₁₂ · 24H₂O and of La₂Mn₃(NO₃)₁₂ · 24H₂O at liquid He temperatures.     

The study of hydronium NASICON conductivity with deuterium

The ionic conductivity of the bulk phase of bonded hydronium NASICON (Hyceram^TM) was measured at equilibrium with an H₂O/N₂ and then a D₂O/N₂ atmosphere, each at 100% relative humidity and 75% relative humidity over the temperature range 25°C to 50°C. At 100% relative humidity and 25°C, the protonic system had a bulk conductivity of 5.0×10⁻⁴ S/cm and an activation energy of 17.3kJ/mole; the same sample, when deuterated, had a bulk conductivity of 2.2×10⁻⁴ S/cm and an activation energy of 19.3kJ/mole. At 75% relative humidity and 25°C, the conductivity of the protonated system decreased to 1.4×10⁻⁴S/cm with an activation energy of 24.1 kJ/mole. The deuterated sample at 75% relative humidity had a bulk conductivity of 5.4×10⁻⁵ S/cm with an activation energy of 26.0 kJ/mole. The isotope effect suggested a proton hopping (Grotthus) mechanism as the means by which the protons pass through the lattice.     

Solid-state synthesis of potassium β- and β″-gallates

Direct synthesis of K-β- and β″-gallates by Ga₂O₃–K₂O solid-state reaction is described. The formation of K-β- or β″-gallates depends on the initial Ga₂O₃ phase. -Ga₂O₃ leads to K-β-gallate; β-Ga₂O₃ leads to K-β″-gallate. K-β″-Gallate is stable <1200°C. The high temperature stability of K-β″-gallate can be enhanced by doping with aliovalent ions.     

Effects of precursors on nucleation in atomic layer deposition of HfO2

Atomic layer deposition of hafnium dioxide (HfO₂) on silicon substrates was studied. It was revealed that due to low adsorption probability of HfCl₄ on silicon substrates at higher temperatures (450–600 °C) the growth was non-uniform and markedly hindered in the initial stage of the HfCl₄–H₂O process. In the HfI₄–H₂O and HfI₄–O₂ processes, uniform growth with acceptable rate was obtained from the beginning of deposition. As a result, the HfI₄–H₂O and HfI₄–O₂ processes allowed deposition of smoother, more homogeneous and denser films than the HfCl₄–H₂O process did. The crystal structure developed, however, faster at the beginning of the HfCl₄–H₂O process.     

Oxidation and annealing of thin FeTi layers covered with Pd

The hydrogen storage material FeTi has the disadvantage to lose its sorption capacity in contact with impurities such as O₂ and H₂O. A possibility to overcome this problem is to coat it with an anti-corrosive layer which is permeable for hydrogen. In this study we prepared FeTi layers covered with a (4 or 20 nm) thin Pd layer. We used ion beam and sputter profiling techniques, X-ray photoelectron spectrometry and scanning probe techniques to investigate the response of these bi-layers upon annealing up to 300°C in vacuum, air and 10⁻⁵ mbar O₂. The layered structure remains intact up to 150°C. At 200°C in air and O₂, Fe and (some) Ti move towards the Pd surface where they form oxide regions. At higher temperatures thicker oxide regions, presumably along the Pd grains, are formed. These processes are more pronounced for the case of 4 nm Pd. A model is presented to explain the observed phenomena. We conclude that up to 150°C 4 nm of Pd is sufficient to act as a protective layer. For a temperature of 200°C, 20 nm Pd may still provide sufficient protection against oxidation.     

The temperature dependence of the short wavelength transmittance limit of vacuum ultraviolet window materials—I. Experiment

The short wavelength transmittance limit or cut-off wavelength, λ_co, of LiF, MgF₂, CaF₂, LaF₃, BaF₂, sapphire, synthetic crystal quartz and fused quartz has been measured from about 100°C to about 10°K. λ_co is not a well denned quantity, so for the purpose of this experiment it has been arbitrarily taken as the wavelength where transmittance could just be measured, usually 0.1-0.5 per cent. With one exception λ_co shifted to shorter wavelengths as the sample was cooled; the shift varied from about 40 to 80 Å over the temperature range from 100°C to 10°K, depending on the material, with the largest shift occurring in BaF₂;. The exception was LaF₃ which showed no measurable change in λ_co wth temperature. Over the temperature range from 20° to 100°C the slope of λ_co, with temperature for all materials was fairly constant, but below 20°C it decreased, approaching zero as the temperature approached 20°-10°K. In the case of synthetic crystal quartz, for example, the slope changed from about 0.28 Å/°K at room temperature to about 0.055 Å/°K at 80°K.     

Synthesis of YBa2Cu3O7−x superconducting thin films on LaAlO3 by means of PAMOCVD

High-T_c superconducting thin films have been deposited in situ by means of a plasma assisted metal-organic chemical vapour deposition (PAMOCVD) process on LaAlO₃. An EMCORE high-speed rotating disc reactor was used to deposit the films at a substrate temperature of 600°C to 800°C. The system is equipped with a (remote) 120 W microwave plasma generator. The oxidising plasma gas is N₂O and/or O₂ while Ar was used as the inert carrier gas for the different metal-organics. The influence of different process parameters (such as the temperatures of the metal-organics, substrate temperature, and plasma gas composition) on the superconductive properties and on the morphology of the films was investigated. Surface morphology and composition were studied by SEM/EDX or EPMA, and AC susceptibility measurements were used to investigate the superconductive properties (T_c and J_c). X-ray diffraction measurements indicated that single-phase YBa₂Cu₃O_7−x films were epitaxially grown with the 00l orientation perpendicular to the substrate surface. The critical temperature (T_c) of the films is about 90 K and the critical current density (J_c) is higher than 10⁶ A/cm² at 77 K and zero field.     

X-ray diffraction studies of epitaxy in orthorhombic- DyMnO3/Er1Ba2Cu3O7-δ thin film heterostructures on LaAlO3 (100) substrates

The heteroepitaxy in DyMnO₃/Er₁Ba₂Cu₃O_7-δ bilayer thin films on LaAlO₃ (100) substates was characterized by four-circle X-ray diffractometry. The Er₁Ba₂Cu₃O_7-δ thin films on LaAlO₃ (100) substrates were prepared by molecular-beam deposition (MBD) and post-growth annealing in wet and dry O₂ at 880°C, whereas the DyMnO₃ thin films on the Er₁Ba₂Cu₃O_7-δ/LaAlO₃ (100) heterostructure were deposited by MBD and post-growth annealing in dry O₂ at 750°C. The conventional X-ray diffraction (XRD) patterns as well as pole figures (φ-scans) for specific (hkl) reflections were acquired. The Er₁Ba₂Cu₃O_7-δ thin film in the DyMnO₃/Er₁Ba₂Cu₃O_7-δ/LaAlO₃ (100) heterostructure showed [001] oriented epitaxial growth, as expected. The DyMnO₃ thin film on the Er₁Ba₂Cu₃O_7-δ epilayer in the heterostructure grew with (110) epitaxy in its metastable orthorhombic phase (lattice constants: a_o=5.272 Å, b_o=5.795 Å and c_o=7.38 Å). The heteroepitaxial relationships at the orthorhombic-DyMnO O₃ (110) /Er₁Ba₂Cu₃O_7-δ (001) interface was determined as the following: DyMnO₃ (110) Er₁Ba₂Cu₃O_7-δ (001), DyMnO₃ [1 0] ¶r; Er₁Ba₂Cu₃O_7-δ[100] or Er₁Ba₂Cu₃O_7-δ[010], and DyMnO₃ [001] ¶r; Er₁Ba₂Cu₃O _7-δ[010] or Er₁Ba₂Cu₃O_7-δ [100].     

The inhibition of carbon deposition on stainless steel by prior selective oxidation

The tendency for carbonaceous deposits to accumulate on steel surfaces exposed to hydro-carbon-containing gaseous environments can be influenced strongly by the chemical nature of the elements present on their surfaces. This is known to be the case for (20% Cr, 25% Ni, 1% Nb) steel, which is used to contain the fuel in the core of the British Advanced Gas-Cooled reactor. It is shown here that carbonaceous deposition on to this steel can be monitored dynamically at temperature in an RF plasma discharge system containing CO₂/CH₄ gas and that the steel can be rendered inert to such deposition, at temperatures up to 650°C by subjecting it to prior annealing (at 800°C) in H₂/H₂O, thereby producing a surface which is free from iron or nickel.     

MoO_3/Si界面区钼掺杂非晶氧化硅层形成的第一性原理研究

采用基于密度泛函理论的第一性原理计算方法,通过模拟MoO_3/Si界面反应,研究了MoO_x薄膜沉积中原子、分子的吸附、扩散和成核过程,从原子尺度阐明了缓冲层钼掺杂非晶氧化硅(a-SiO_x(Mo))物质的形成和机理.结果表明,在1500 K温度下, MoO_3/Si界面区由Mo, O, Si三种原子混合,可形成新的稳定的物相.热蒸发沉积初始时, MoO_3中的两个O原子和Si成键更加稳定,同时伴随着电子从Si到O的转移,钝化了硅表面的悬挂键. MoO_3中氧空位的形成能小于SiO_2中氧空位的形成能,使得O原子容易从MoO_3中迁移至Si衬底一侧,从而形成氧化硅层;替位缺陷中, Si替位MoO_3中的Mo的形成能远远大于Mo替位SiO_2中的Si的形成能,使得Mo容易掺杂进入氧化硅中.因此,在晶硅(100)面上沉积MoO_3薄膜时, MoO_3中的O原子先与Si成键,形成氧化硅层,随后部分Mo原子替位氧化硅中的Si原子,最终形成含有钼掺杂的非晶氧化硅层.     

The influence of different fabrication processes on characteristics of excess Bi2O3-doped 0.95 (Na0.5Bi0.5)TiO3–0.05 BaTiO3 ceramics

In this study, we will develop the influences of the excess x wt% (x=0, 1, 2, and 3) Bi₂O₃-doped and the different fabricating process on the sintering and dielectric characteristics of 0.95 (Na_0.5Bi_0.5)TiO₃–0.05 BaTiO₃ ferroelectric ceramics with the aid of SEM and X-ray diffraction patterns, and dielectric–temperature curves. The 0.95 (Na_0.5Bi_0.5)TiO₃–0.05 BaTiO₃+x wt% Bi₂O₃ ceramics are fabricated by two different processes. The first process is that (Na_0.5Bi_0.5)TiO₃ composition is calcined at 850 °C and BaTiO₃ composition is calcined at 1100 °C, then the calcined (Na_0.5Bi_0.5)TiO₃ and BaTiO₃ powders are mixed in according to 0.95 (Na_0.5Bi_0.5)TiO₃–0.05 BaTiO₃+x wt% Bi₂O₃ compositions. The second process is that the raw materials are mixed in accordance to the 0.95 (Na_0.5Bi_0.5)TiO₃–0.05 BaTiO₃+x wt% Bi₂O₃ compositions and then calcining at 900 °C. The sintering process is carried out in air for 2 h from 1120 to 1240 °C. After sintering, the effects of process parameters on the dielectric characteristics will be developed by the dielectric–temperature curves. Dielectric–temperature properties are also investigated at the temperatures of 30–350 °C and at the frequencies of 10 kHz–1 MHz.     

The effects of substrate temperature on the superconducting properties of Tl2Ca2Ba2Cu3O10 films sputter-deposited from stoichiometric oxide targets

The annealing characteristics and the superconducting properties of Tl₂Ca₂Ba₂Cu₃O₁₀ thin films sputter-deposited onto yttrium- stabilized ZrO₂ substrate at up to 500°C from two stoichiometric oxide targets are reported. The films deposited at 400–500°C were found to require a lower post-annealing temperature than the films deposited at lower temperatures to attain the highest T_c superconducting state, due to a more pronounced Ba diffusion toward the substrate as indicated by their secondary ion mass spectrometry depth profiles. The highest T_c achieved tends to degrade with increasing substrate temperatures, a zero resistance T_c of 121 and ≈90 K, respectively, being observed for the films deposited at -ambient temperature and at 500°C. The formation of the highest T_c phase (Tl₂Ca₂Ba₂Cu₃O₁₀) generally is associated with a sheet type of crystal growth morphology with smooth and aligned surfaces which can be obtained only from the films capable of sustaining prolonged annealing at 900°C. Annealing at lower temperatures (≈860°C) results in the formation of rod or sphere type of morphologies with rough and randomly oriented crystals and the lower T_c phases such as Tl₂Ca₁Ba₂Cu₂O₈.     

Enhanced magnetic properties of Nd–Fe–B thin films crystallized by heat treatment

Nd₂Fe₁₄B Φ phase crystallites were formed in Nd_16.7Fe_65.5B_17.8 thin films prepared by RF sputtering with subsequent heat treatment. The 2 μm-thick films were deposited onto 0.1 mm Mo sheets at an average substrate temperature (T_s) of 365°C. The enhanced magnetic properties of the magnetically anisotropic thin films were investigated using different heating rates (h_r) of 10°C, 20°C, 50°C and 100°C/min in an annealing experiment. Transformation from the amorphous phase to the crystalline phase is clearly manifested by the formation of fine crystallites embedded as a columnar matrix of Nd₂Fe₁₄B phase. High-resolution scanning electron microscope data of the cross-section of the annealed films show columnar stacking of Nd₂Fe₁₄B crystallites with sizes <500 nm. Transmission electron microscope observations revealed that the microstructure of these films having out-of-plane magnetization consists of uniformly distributed Φ phase with grain size around 400 nm together with small Nd rich particles. This grain size of Φ phase is comparable to the single domain particle diameter of Nd₂Fe₁₄B. Significant change in _iH_c, 4πM_r and 4πM_s with h_r was confirmed. Annealing conditions with a heating rate of 50°C/min to an annealing temperature (T_a) of 650°C for 30 min was consequently found to give optimum properties for the NdFeB thin films. The resulting magnetic properties, considered to be the effect of varying h_r were _iH_c= 1307–1357 kA/m, 4πM_r=0.78–1.06 T and 4πM_s=0.81–1.07 T.     

Cuprite, paramelaconite and tenorite films deposited by reactive magnetron sputtering

Copper oxides films (Cu₂O, Cu₄O₃ and CuO) have been deposited by magnetron sputtering of a copper target in various Ar–O₂ reactive mixtures. The films are characterized by X-ray diffraction, scanning electron microscopy, four-point probe method and UV-Vis spectrometry. The three defined compounds in the Cu---O binary system can be deposited by varying the oxygen flow rate introduced into the reactor. All the films are crystallized with a mean crystal size ranging from 10 to about 35 nm. They are highly resistive and present a direct optical band gap higher than 2 eV. The application of a bias voltage during the deposition phase modifies the texture of the Cu₂O films and also induces a preferential resputtering of oxygen from the Cu₄O₃ ones. This resputtering phenomenon leads firstly to the occurrence of the cuprite phase mixed with the paramelaconite one and secondly to the amorphisation of the films. Finally, the thermal stability in air of cuprite, paramelaconite and tenorite films has been investigated. The results show that the stability of Cu₂O and Cu₄O₃ films in air is influenced by the thickness and/or the texture of the films. Tenorite films with a low optical band gap (1.71 eV) can be formed after air annealing at 350 °C of an unbiased cuprite film.