大气环境下氦气等离子体中化学过程数值模拟

建立一个大气化学程序用以模拟大气压下（地面附近）或低压（高空）情况下混合气体（氦气中混入少量空气）中产生等离子体后的化学过程。给出了电子寿命和主要带电粒子的随时间演化图。电子寿命在大气压下要长于大气等离子体，但在低压情况下这个结论不成立。电子数密度在一很长一段时间内不服从指数衰减规律。     

Numerical simulation of chemical processes in atmospheric plasmas

A model is built to study chemical processes in atmospheric plasmas at low altitude (high pressure) and at high altitude (low pressure). The plasma lifetime and the temporal evolution of the main charged species are presented.The electron number density does not strictly obey the exponential damping law in a long period. The heavy charged species are dominant at low altitude in comparison with the light species at high altitude. Some species of small amount in natural air play an important role in the processes.     

On the use of atmospheric pressure plasmas as electromagneticreflectors and absorbers

Tenuous man-made plasmas in the Earth's atmosphere from sea level to 100 km are discussed. An ionization source generates a tenuous plasma with an electron number density n_e that is high near the source and diminishes with distance from the source. After the source shuts off, n_e decreases as a function of time as electrons recombine with positive ions or attach to negative ions. The electromagnetic properties that are essential to an understanding of these plasmas, which can be modeled as cold collisional plasmas, is discussed. Gas and plasma characteristics, such as momentum-transfer collision rate, plasma lifetime, recombination kinetics, and the effect of noble gases, are presented. Typical collision rates and plasma lifetimes at atmospheric pressure are quantified. Applications for a plasma with a gradient are discussed. They include a high-altitude plasma that can reflect or absorb from HF to VHF and a broadband atmospheric pressure absorber. The generation and use of plasma, including electron impact ionization with a high-energy electron-beam source and UV photoionization of an alkali vapor or an organic vapor such as tetrakis (dimethylamino)ethylene (TMAE), is described. The power required to sustain a plasma is quantified, and properties such as maximum absorption and bandwidth are discussed. Tradeoffs among maximum absorption, absorption bandwidth, duty ratio, and applied power permit optimization of absorption primarily at VHF     

Predictive estimation of vacuum ultraviolet emission intensity in a low-pressure inductively coupled hydrogen plasma based on the branching ratio technique

Vacuum ultraviolet (VUV) emission has recently attracted attention in low pressure processing plasmas because of the possibility of high-energy photon damages on the substrates. To quantify the VUV induced damages during the plasma processes, it is need to use of a VUV spectrometer equipped with vacuum systems not readily available in industries. In this work, therefore, we report a simple method to estimate the VUV emission intensity of hydrogen plasmas utilizing a conventional visible spectrometer widely used in plasma processes. From the measurement of hydrogen emission spectra in the visible wavelength region, the VUV emission line (Lyman-β) was calculated using the branching ratio technique and enabled the estimation of Lyman-α emission intensity based on the Boltzmann relation with given plasma parameters. In addition, it was found that the method could also predict the VUV emission intensity for high density hydrogen plasma cases by considering the self-absorption effect by hydrogen atoms.     

A Green's Function Approach to the Shift of Spectral Lines in Dense Plasmas

Variations of the spectral lines in high dense ion plasmas with temperature and pressure may be characterized by the broadening as well as by the shift of spectral lines. For dense hydrogen- and alkali-plasmas (free carrier density larger than 10¹⁶/cm³) one of the possible mechanisms responsible for line profiles is considered to be the Coulomb interaction with free charged carriers. Using thermodynamic Green's functions, a systematic approach to the theory of spectral lines starting from the complex dielectric function is outlined. The line shift is derived from a perturbative treatment of the two-particle Green's function in the surrounding plasma. The shift of several lines proportional to the carrier density is evaluated as a function of the temperature and compared with experimental results.     

Interaction of microwaves with atmospheric pressure plasmas

In this paper, the interaction of microwaves with a plasma, generated at atmospheric pressure, is studied. The refractive index, attenuation index, skin depth, attenuation coefficient, phase coefficient, and reflectivity are investigated as functions of the plasma number density, the wave frequency and type of polarization, and the grazing angle. It is found that two frequency regimes characterize these type of plasmas. The first is a range where the phase velocity and attenuation of the wave both increase with frequency. The second is a frequency range in which the phase velocity and attenuation of the wave remain constant. It is also found that to have a shallow skin depth, the plasma number density has to be in the 10¹³ cm^–3 range. The reflectivity is found to be an increasing function of the number density. In horizontal polarization, the reflectivity is a decreasing function of the grazing angle. But in vertical polarization and for grazing angle less than 20°, the reflectivity has a maximum at a frequency , where f_pe is the electron plasma frequency and v is the collision frequency.     

Investigation of first and second ionization on optical properties of atmospheric plasmas

In this paper, the relation between refractive index and other atmospheric plasma properties including electron, ion and molecule number densities and temperature are calculated. Considering the first and second ionization and the atmospheric air composition, the temperature dependence of the atmospheric plasma on refractive index is obtained by Saha equation. Also, in contrast to conventional models for evaluating electron number density by optical techniques, in which the refractive index of plasmas is approximately assumed equal to electron refractive index, this work is proposed for accurate and absolute measurement of electron density profile and determination of plasma region.     

Thomson散射诊断技术的新进展

Thomson散射是一种主动而无干扰地对等离子体进行诊断的方法．它能够以较高的时空分辨率测量等离子体的参数，如电子与离子温度、密度以及等离子体的膨胀速度、电离程度、热流等参数．文章从Thomson散射基本概念出发，介绍了Thomson散射诊断方法在研究激光与等离子体相互作用中的重要意义，并分别介绍了近年来Thomson散射诊断技术的新进展，如对高Z等离子体、两种离子种类的等离子体、多种形态等离子体以及高密度等离子体的研究．文章最后对国内Thomson散射诊断技术的发展状况进行了简述．     

Measurement of neutral gas temperature in inductively coupled plasmas

Dependence of the neutral gas temperature on the gas pressure and discharge power in an inductively coupled plasma source has been investigated using optical emission spectroscopy. Both nitrogen and argon plasmas have been studied separately. In the case of argon plasma, about 5% nitrogen was added to the total gas flow as an actinometer. The maximum temperature was found to be as high as 1850 K at 1 Torr working pressure and 600 W radiofrequency power. The temperature increases almost linearly with the logarithm of the gas pressure, but changes only slightly with the discharge power in the range of 100–600 W. In a nitrogen plasma, a sudden increase in the neutral gas temperature occurs when the gas pressure is increased at a given discharge power. This suggests a discharge-mode transition from the H-mode (high plasma density) to the E-mode (low plasma density). In the H-mode, the gas temperature is proportional to the logarithm of the gas pressure, as in the argon plasma. However, the gas temperature increases almost linearly with the discharge power, which is in contrast to the case of argon plasma. The electron density in the nitrogen plasma is about 10% of that in the argon plasma. This may explain the observation that the nitrogen neutral temperature is always lower than the argon neutral temperature under the same discharge power and gas pressure.     

大气压等离子体辅助多晶硅薄膜化学气相沉积参数诊断

本文采用发射光谱法诊断了大气压下Ar气、SiCl₄及H₂气混合气体（Ar/SiCl₄/H₂）射频放电等离子体射流特性.利用Si原子谱线强度计算了电子激发温度并以此估算了Si原子数密度,研究了射频功率及气体流量对电子激发温度和Si原子数密度以及SiCl₄解离率的作用. 关键词： 大气压等离子体射流 发射光谱 电子激发温度 多晶硅薄膜沉积     

大气压等离子体辅助多晶硅薄膜化学气相沉积参数诊断

本文采用发射光谱法诊断了大气压下Ar气、SiCl₄及H₂气混合气体（Ar/SiCl₄/H₂）射频放电等离子体射流特性.利用Si原子谱线强度计算了电子激发温度并以此估算了Si原子数密度,研究了射频功率及气体流量对电子激发温度和Si原子数密度以及SiCl₄解离率的作用.     

Electron Temperatures and Electron Densities in Microwave Helium Discharges with Pressures Higher than 0.1 MPa

We adopted laser Thomson scattering for measuring the electron density and the electron temperature of microwave plasmas produced in helium at the pressures higher than the atmospheric pressure. The electron density decreased while we observed the increase in the electron temperature with the pressure. These are reasonable results by considering the decrease in the reduced electric field, the dominant loss of electrons via three‐body recombination with helium as the third body, and the production of electrons with medium energy via heavy particle collisions at the high gas pressure. The temporal variation of the electron temperature had the rise and the fall time constants of approximately 10 ns. The rapid heating and cooling of the electron temperature are due to the fast energy transfer from electrons to helium because of the high collision frequency in the high‐pressure discharge. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Modeling of Large ELM Suppressions for High Confinement Plasma in D Ⅲ-D

The H-mode discharges with high edge pressure gradients are expected for the economic feasibility of future fusion reactors. However, the high edge pressure gradients easily produce ELM instability , which generally can expel large, heat and particle loading to the divertor targets. These ELMs limit the core plasma performance and reduce the lifetime of divertor target plates. The transports of heat and particles outward across plasma boundary are useful to control density and impurity profiles for achieving steady state, high performance plasmas. Consequently, any technique to eliminate or mitigate large fast ELM impulses must replace the transient heat and particle transports with another slow process. Such a technique is high priority for a burning plasma device such as ITER.     

仪器展宽对大气压等离子体电子密度测量的影响

实验使用两台不同的单色仪,采用光谱线型法测量了大气压氩气介质阻挡放电中的电子密度.诊断结果表明,由于不同的单色仪其仪器加宽不同,仪器加宽对总的光谱线型有较大影响.通过考虑等离子体中的各种加宽机制,采用卷积和反卷积的方法对氩原子发射谱线线型进行了分析,从整个光谱线型中分离出Stark线型,排除了仪器加宽对最终诊断结果的影响.从而最终测量了大气压氩气介质阻挡放电中的电子密度.测量得到在大气压氩气介质阻挡放电中单个放电丝存在时,电子温度为10000K时,电子密度约为3.05-3.26×1021 m-3.此方法不仅可以应用在大气压介质阻挡放电中,还可以用于测量其它大气压等离子体电子密度.     

Power Consideration for Pulsed Discharges in Potassium Seeded Argon

Minimization of energy consumed in plasma generation is critical for applications, in which a large volume of plasmas is needed. We suggest that a high electron density atmospheric pressure plasmas can be generated by pulsed discharges in potassium seeded argon at an elevated temperature with a very small power input. The ionization efficiency and power budget of pulsed discharges in such plasmas are analytically studied. The results show that ionization efficiency of argon, especially at small reduced electric field E/N （the ratio of the electric field to the gas number density）, is improved effectively in the presence of small amount of potassium additives. Power input of pulsed discharge to sustain a prescribed average level of ionization in potassium seeded argon is three orders of magnitude lower than that in pure argon. Further, unlike in pure argon, it is found that very short high-voltage pulses with very high repetition rates are unnecessary in potassium seeded argon. A pulse with lOOns of pulse duration, 5kHz of repetition rate, and 2Td （1 Td = 1 × 10^-21 Vm^2） of E/N is enough to sustain an electron density of 10^19 m^-3 in 1 arm 1500K Ar＋0.1% K mixture, with a very small power input of about 0.08 × 10^4 W/m^3.     

进气道内衬筒形等离子体隐身性能三维模拟

针对飞机进气道等离子体隐身问题,建立了三维筒形进气道模型,采用有限元求解波动方程,计算了腔体内壁覆盖均匀等离子体时的雷达散射截面。研究表明:腔体内覆盖等离子体时可以有效吸收入射电磁波能量;吸收随电磁波频率增加而减弱,但由于腔体结构作用,会存在几个吸收峰;吸收随电子数密度增加而增强,但电子数密度过高时,吸收效果会变差;最佳碰撞频率虽然与电磁波频率和电子数密度有关,但其值可约为9GHz;吸收随等离子体厚度增加而变大,但在较大电子数密度时,由于电磁波在等离子体与空气交界面处反射导致厚度增加,从而使得吸收变小;选取合适的入射角度和等离子体数密度可以在1~3GHz频段实现明显的隐身效果。     

Propagation and interaction of ion-acoustic solitary waves in a quantum electron-positron-ion plasma

This paper discusses the existence of ion-acoustic solitary waves and their interaction in a dense quantum electron-positron-ion plasma by using the quantum hydrodynamic equations.The extended Poincar’e-Lighthill-Kuo perturbation method is used to derive the Korteweg-de Vries equations for quantum ion-acoustic solitary waves in this plasma.The effects of the ratio of positrons to ions unperturbation number density p and the quantum diffraction parameter H e (H p) on the newly formed wave during interaction,and the phase shift of the colliding solitary waves are studied.It is found that the interaction between two solitary waves fits linear superposition principle and these plasma parameters have significantly influence on the newly formed wave and phase shift of the colliding solitary waves.The investigations should be useful for understanding the propagation and interaction of ion-acoustic solitary waves in dense astrophysical plasmas (such as white dwarfs) as well as in intense laser-solid matter interaction experiments.     

双温度氩-氮等离子体热力学和输运性质计算

获得覆盖较宽温度和压力范围内的等离子体热力学和输运性质是开展等离子体传热和流动过程数值模拟的必要条件.本文通过联立Saha方程、道尔顿分压定律以及电荷准中性条件求解等离子体组分;采用理想气体动力学理论计算等离子体热力学性质;基于Chapman-Enskog方法求解等离子体输运性质.利用上述方法计算了压力为0.1, 1.0和10.0 atm (1 atm=101325 Pa),电子温度在300—30000 K范围内,非局域热力学平衡(电子温度不等于重粒子温度)条件下氩-氮等离子体的热力学和输运性质.结果表明压力和非平衡度会影响等离子体中各化学反应过程,从而对氩-氮等离子体的热力学及输运性质有较大的影响.在局域热力学平衡条件下,计算获得的氩-氮等离子体输运性质和文献报道的数据符合良好.     

The influence of moisture on atmospheric pressure plasma etching of PA6 films

The moisture in the substrate material may have a potential influence on atmospheric pressure plasma treatment. In order to investigate how the existence of moisture affects atmospheric pressure plasma treatment, polyamide 6 (PA6) films were treated by helium, helium/oxygen (O₂) plasmas using atmospheric pressure plasma jet (APPJ) at different moisture regain. The film surfaces were investigated using contact-angle measurements, atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) to characterize the surfaces. The exposure of PA6 film surfaces to the plasmas led to the etching process on the surfaces and changes in the topography of the surfaces. It was shown that the etching rate and the surface roughness were higher for the 9.33% moisture regain (relative humidity 100%) group than that of the 1.61% moisture regain (relative humidity 10%) group with the same plasma gas and power.     

Formation of liquidlike and crystalline structures in dusty plasmas

Under certain conditions in a dusty plasma, which is a low-temperature plasma with dust grains, the strong interaction between grains can give rise to gas-liquid-solid-state phase transitions. A study is made of ordered (liquidlike and crystalline) grain structures in various kinds of dusty plasmas: a thermal plasma at atmospheric pressure, a plasma of a dc glow discharge, and a UV radiation-driven plasma. The results of experimental observations of ordered dust structures are reported, and the characteristic features of the dust structures and the conditions for their appearance are discussed.