Surface reactivity of pulsed-plasma polymerized pentafluorophenyl methacrylate (PFM) toward amines and proteins in solution

Pulsed-plasma polymerization has been used to deposit ultrathin layers of pentafluorophenyl methacrylate by using low duty cycles and low power input. The monomer structure can be retained such that the chemical reactivity of the active ester group could be studied using the reaction with a simple amine. The film properties in aqueous phosphate buffer have been investigated using Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and real time surface plasmon resonance spectroscopy. The films react readily with diaminohexane and immunoglobulin (IgG), yet the reactivity shows a dependence on the extent of hydrolysis of the ester group.     

Electroluminescence and Photoluminescence of Conjugated Polymer Films Prepared by Plasma Enhanced Chemical Vapor Deposition of Naphthalene

Polymer light-emitting devices were fabricated utilizing plasma polymerized thin films as emissive layers. These conjugated polymer films were prepared by RF plasma enhanced chemical vapor deposition using naphthalene as monomer. The effect of different applied powers on the chemical structure and optical properties of the conjugated polymers was investigated. Fourier transform infrared (FTIR) and Raman spectroscopies confirmed that a conjugated polymer film with a 3-D cross-linked network was developed. By increasing the power, products tended to form as highly cross-linked polymer films. The fabricated devices showed broadband Electroluminescence (EL) emission peaks with center at 535–550 nm. Photoluminescence (PL) spectra of plasma polymers showed different excimeric emissions, resulted from crosslinked architecture. As the plasma power increased, the optical properties showed two different domains; up to 200 W, EL, PL and UV–Vis spectra red-shifted and broadened significantly. At higher powers, a reverse behavior was observed. Also, the relation between the film structure and plasma species was investigated using optical emission spectroscopy.     

低介电常数聚喹啉衍生物薄膜的合成与表征

采用等离子体聚合技术合成了一种新型的低介电常数聚喹啉衍生物薄膜: 聚3-氰基喹啉(PP3QCN)薄膜. 借助于傅里叶变换红外光谱(FT-IR)、紫外-可见(UV-Vis)吸收光谱、X光电子能谱(XPS)和原子力显微镜(AFM)对薄膜结构进行了系统表征. 结果表明, 等离子体聚合条件对沉积膜的化学结构、表面组成、膜形态以及介电性能均有影响. 在较低的等离子体放电功率(10 W)条件下, 可得到具有较高芳环保留率和较大π-共轭体系的高质量聚3-氰基喹啉薄膜材料; 而在较高功率(25 W)条件下, 聚合过程中会出现比较严重的单体分子破碎, 形成较多非π-共轭体系的聚合物, 从而导致聚3-氰基喹啉的共轭度降低. 聚3-氰基喹啉薄膜的介电性能测试结果表明, 低放电功率(10 W)条件下制得的聚3-氰基喹啉薄膜具有比较低的介电常数值, 仅为2.45.     

Deposition of plasma conjugated polynitrile thin films and their optical properties

The plasma polymerization of 4-phenylbenzonitrile was carried out with the objective of synthesizing a novel conjugated polynitrile thin film with a better optical property. The structure, compositions and morphology of the plasma-polymerized 4-phenylbenzonitrile (PPBPCN) thin films were investigated by Fourier transform infrared (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). A fine, homogenous PPBPCN film with a large π-conjugated system and a high retention of the aromatic ring structure of the starting monomer in the deposited plasma films is obtained when a low discharge power of 30 W was used during film formation. For the first time, a blue emission with relatively high photoluminescence intensity for PPBPCN thin films was observed.     

Nucleobase orientation and ordering in films of single-stranded DNA on gold

We demonstrate how the orientation and ordering of DNA bases in ultrahigh vacuum (UHV) and ambient environments can be determined using complementary spectroscopic methods. Near-edge X-ray absorption fine structure (NEXAFS) with fluorescence detection, X-ray photoelectron (XPS), and Fourier transform infrared (FTIR) spectroscopies are used to quantify the coverage, chemical composition, orientation, and ordering of thymine bases in model self-assembled monolayers of thymine homo-oligonucleotides [oligo(dT)] on gold. We find that, in monolayers of thiol-modified oligo(dT), thymine bases tend to orient parallel to the Au substrate, and this preferential orientation is significantly more pronounced in monolayers of thiolated 5-mers compared to 25-mers. We interpret this preferential orientation as a signature of significant correlations (local ordering) between individual nuleobases, which offers a way to quantify and compare nucleobase interactions in films under both ambient and UHV conditions.     

Chemical Investigation on Various Aromatic Compounds Polymerization in Low Pressure Helium Plasma

Remarkable properties of plasma polymer films are greatly dependent not only on the chemical structure of precursor but also on the reactor design and the deposition conditions. In many industrial applications it is a challenge to control the plasma polymer structure. In this paper we investigate the chemical transformation of various aromatic compounds, such as activation and fragmentation of substituent-part, aromatic ring opening, during plasma polymerization process. Polymerized films are deposited in a low-frequency capacitively coupled plasma-enhanced chemical vapour deposition reactor, working at low pressure. The chemical composition of plasma-polymerized films is elucidated by Fourier-transform infrared spectroscopy, solid-state carbon-13 nuclear magnetic resonance spectroscopy, and X-ray photoelectron spectroscopy. Based on spectroscopic measurements, the intermediary reactions during film growth may be presumed.     

Surface analysis of films and film systems produced by pulsed laser deposition

Ceramic films and film systems (ZrO₂ films, ZrO₂/Ti multilayers, and BN films) are deposited by pulsed laser deposition (PLD) and analyzed using X-ray photoelectron (XPS), Auger electron (AES), and micro-Raman spectroscopies. The electron spectroscopies are used to determine the film stoichiometry, the nature of the bonding, and to specify contaminant species. The micro-Raman spectroscopy gives information on crystal structure, grain size, and mechanical stress within the films. In ZrO₂ films a stoichiometry is achieved with typically 5%, with only weak dependencies on processing variables. The only contaminants are a small amount of water from the ambient gas and a carbonaceous surface layer. Multilayers consisting of alternating ZrO₂ and Ti layers exhibit a TiC contamination within the Ti layers. Depending on the processing variables, BN films may be nearly stoichiometric or may have significant, even dominant contaminations throughout the film from elemental B, B₂O₃, and/or a boron-oxynitride species. The first component is due to the non-stoichiometric material removal from the target (N-depletion) at low laser fluences, as confirmed by XPS measurements on irradiated targets. The second and third arise from H₂O in the ambient, and exhibit a complex dependence on processing variables. Micro-Raman spectra show only amorphous or hexagonalphase BN. Depending on the position on the substrate relative to the laser-induced vapour/plasma plume, there may be a particle deposition or mechanical stress within the films, as evidenced from large shifts (up to 15 cm^–1) of the Raman spectral peaks.     

Molecular Design of Fluorocarbon Film Architecture by Pulsed Plasma Enhanced and Pyrolytic Chemical Vapor Deposition

Pulsed plasma enhanced chemical vapor deposition (pulsed PECVD) and pyrolytic chemical vapor deposition (pyrolyric CVD) of fluorocarbon films from hexafluoropropylene oxide (HFPO) have demonstrated the ability to molecularly design film architecture. Film structures ranging from highly amorphous crosslinked matrices to linear perfluoroalkyl chain crystallites can be established by reducing the modulation frequency of plasma discharge in plasma activated deposition and by eventually shifting mechanistically from an electrically activated to a thermally activated process. X-ray photoelectron spectroscopy (XPS) showed CF₂ content increasing from 39–65 mol%. Fourier transform infrared spectroscopy (FTIR) showed an increasing resolution between the symmetric and asymmetric CF₂ stretches, and a reduction in the intensity of the amorphous PTFE and CF₃ bands. High-resolution solid-state ¹⁹F nuclear magnetic resonance spectroscopy (NMR) revealed an increasing CF₂CF₂CF₂ character, with the pyrolytic CVD film much like bulk poly(tetrafluoroethylene) (PTFE). X-ray diffraction (XRD) patterns evidenced an increase in crystallinity, with the pyrolytic CVD film showing a characteristic peak at 2 = 18° representing the (100) plane of the hexagonal structure of crystalline PTFE above 19°C.     

Nanostructured ultra-low-κ porous fluoropolymer composite films via plasma co-polymerization of hydrophobic and hydrophilic monomers and subsequent hydrolysis treatment

A new approach to fabricate porous nanostructured fluoropolymer composite films with a low dielectric constant (κ) was put forward at the first time. Initially, a film (pp-HDFD-PEGMA film) composed of dense, uniform, and well-defined nanospheres was controllably deposited on hydrogen-terminated silicon substrates by simultaneous plasma polymerization and deposition of a fluorine-containing hydrophobic monomer, 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluoro-1-decene (HDFD), and a hydrophilic monomer poly(ethylene glycol) methacrylate (PEGMA), using a pulsed plasma polymerization technique. Then, by hydrolysing the plasma co-deposited film in aqueous hydrochloric acid solution to effectively remove the soluble nanospheres or fragments which mainly derived from PEGMA, a nanoporous fluorocarbon film was achieved. Subsequently, a top poly(tetrafluoroethylene) layer was deposited via the magnetron sputtering process to cap and complete an encapsulated structure. The resulting bilayer composite film consisting of a layer of nanostructured fluorocarbon porous film and a layer of encapsulation fluorocarbon polymer has a κ value of 1.8. The morphology investigation of the plasma co-deposited film prior and after acid-treatment by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM) confirmed the form of the nanospheres and nanoporous structure, while the chemical composition and structure analysis by X-ray photoelectron spectroscopy (XPS) revealed that after the acid-treatment, the porous nanostructured film are composed predominantly of mainly fluorocarbon polymer.     

Characterization of Plasma-Polymerized 4-vinyl Pyridine with Silver Nanoparticles on Poly(ethylene terephthalate) Film for Anti-Microbial Properties

4-vinyl pyridine was polymerized on poly(ethylene terephthalate) (PET) film by using lower energy pulsed AC plasma under low pressure in Ar atmosphere. The plasma polymerized coating was characterized by ATR Fourier transform infrared (FT-IR), scanning electron microscopy (SEM), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). Different thicknesses of poly(4-vinyl pyridine) coating under different plasma polymerization conditions were studied. Silver nanoparticles with diameter around 50nm deposit were precipitated on the poly(4-vinyl pyridine) coating by UV irradiation in Silver nitride water solution, in order to enhance the anti-microbial properties. Different kinds of modified PET films were tested for anti-microbial properties against yeast (Debaryomyces hansenii) by using microbiological analyser µ-4200 and direct microscopic count method.     

Chemical and physical modification and electret properties of polytetrafluoroethylene films

Composites with titanium oxide structures on the surface of a polymer matrix were prepared by preliminary plasma activation of polytetrafluoroethylene films, followed by chemical treatment with vapors of titanium tetrachloride and water. The chemical composition and structure of the modified film surface were studied by scanning electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. The stability of the formed surface charge increases in going from the initial film to the plasma-activated film, then to the film successively treated with vapors of titanium tetrachloride and water, and finally to the plasma-activated film treated subsequently with vapors of titanium tetrachloride and water. The modified polytetrafluoroethylene films are of interest as electrets with enhanced operation characteristics.     

Preparation and characterization of ultrathin dual-layer ionic liquid lubrication film assembled on silica surfaces

A novel ultrathin dual-layer film, which contained both bonded and mobile phases in ionic liquids (ILs) layer, was fabricated successfully on a silicon substrate modified by a self-assembled monolayer (SAM). The formation and surface properties of the films were analyzed using ellipsometer, water contact angle meter, attenuated total reflectance Fourier transform infrared spectroscopy, multi-functional X-ray photoelectron spectroscopy, and atomic force microscope. Meanwhile, the adhesive and nanotribological behaviors of the films were evaluated by a homemade colloidal probe. A ball-on-plate tribometer was used to evaluate the microtribological performances of the films. Compared with the single-layer ILs film deposited directly on the silicon surface, the as-prepared dual-layer film shows the improved tribological properties, which is attributed to the special chemical structure and outstanding physical properties of the dual-layer film, i.e., the strong adhesion between bonded phase of ILs and silicon substrate via the chemical bonding with SAM, the interlinked hydrogen bonds among the molecules, and two-phase structure composed of steady bonded phase with load-carrying capacity and flowable mobile phase with self-replenishment property.     

Properties of the Teflon AF1601S Surface Treated with the Low-Pressure Argon Plasma

The stability of the surface properties of Teflon AF films were investigated after their exposure to the low-pressure argon plasma for various times. X-ray photoelectron and infrared spectroscopies, atomic force microscopy, scanning optical microscopy based on chromatic aberration, goniometry (the measurement of water contact angles), as well as electrokinetic method and ellipsometry were used to control changes in the chemical composition and surface properties of Teflon AF films taking place upon their plasma treatment. The stable hydrophilization of the surface of Teflon AF films resulted from plasma treatment was revealed.     

PE-CVD of Organic Thin Films with Controlled Surface Concentration of Carboxylic Groups

Organic thin films have been deposited onto various substrates by means of radiofrequency glow discharges fed with acrylic acid vapors. The effect of the experimental parameters on film composition has been investigated with X-ray Photoelectron and FT-IR spectroscopies; Optical Emission Spectroscopy has been carried out for plasma phase characterization. It is shown that the concentration of oxygen and carboxylic groups in the coating decreases with increasing power, while the concentration trend of CO species in the plasma increases. It is demonstrated that films deposited from acrylic acid, which can be used as functional layers for biomolecule immobilization, can be deposited with a controlled surface concentration of -COOH groups through a simple in situ monitoring of the deposition process.     

Spectroscopic investigation of the technique of plasma assisted pulsed laser deposition of titanium dioxide

The characterization of plasma assisted pulsed laser deposition (PA-PLD) of titanium dioxide with biased substrate is discussed. Both the stage of plasma expansion and deposition have been studied. Optical emission spectroscopy was employed to estimate laser-induced plasma parameters, while different techniques [optical microscopy, scanning electron microscopy (SEM), spectrophotometry, X-ray photoelectron spectrometry (XPS)] were used to characterize the film properties. It is shown that PA-PLD prevents contamination of the deposited films by particles ejected during the interaction of the KrF excimer laser radiation with the titanium dioxide targets. Investigation made on the film deposited by conventional PLD and PA-PLD, has shown that the PA-PLD technique allows to improve the quality of the deposited films for what concerns their stoichiometry, morphology and deposition rate.     

Preparation of alkyl-modified silicon nanosheets by hydrosilylation of layered polysilane (Si6H6)

Alkyl-modified crystalline silicon nanosheets 2 were synthesized and maintained the crystal structure of a Si(111) plane, in which the dangling silicon bond is stabilized by capping with the alkyl group. 2 was characterized using UV-vis, Fourier transform-infrared, and X-ray photoelectron spectroscopies; X-ray diffraction; and X-ray absorption near edge structure analysis. A model structure is proposed that has a periodicity through the nanosheet surface.     

Deposition of polyacrylic acid films on PDMS substrate in dielectric barrier corona discharge at atmospheric pressure

This paper reports on deposition of acrylic acid films polymerized by an efficient and cost‐effective technique of dielectric barrier corona discharge at atmospheric pressure. The liquid acrylic acid was vaporized and carried by argon gas into plasma to deposit polyacrylic acid films on polydimethylsiloxane substrate. A nonthermal corona discharge was generated in a pyrex flask using a steel tube‐to‐plate asymmetric electrode configuration. The plasma was excited using an in‐house developed power supply operating with continuous wave signals of 10‐kHz frequency. The emission spectra of plasma species were recorded to know their contribution during deposition process. The deposited surfaces were characterized using contact angle measurements, atomic force microscopy, Fourier transform infrared spectroscopy, X‐ray photoelectron spectroscopy and film thickness measurements. A maximum film growth rate of 363 nm/min was achieved under optimal condition of discharge. The results suggest that this plasma technique is capable of depositing organic coatings with a high concentration of carboxylic functional groups that could be potentially used for biomedical and microfluidic applications.     

n型金刚石薄膜催化生长碳纳米管

研究了n型金刚石薄膜作为催化剂生长碳纳米管的方法.首先采用丙酮裂解化学气相沉积(CVD)法制备均匀的n型金刚石薄膜,然后采用乙醇为碳源的CVD法,在850、900和950℃下,分别在n型金刚石薄膜上制备了碳球、竹节状碳管和多壁碳纳米管.所得产物用扫描电子显微镜、透射电子显微镜、拉曼光谱和X射线光电子能谱表征.实验结果表明产物的形貌与反应温度有关.我们还提出了与金刚石催化生长碳纳米管结果相符的实验机理.     

Effect of Radiofrequency Plasma Assisted Grafting of Polypropylene on the Properties of Muga Silk Yarn

Radiofrequency (RF) Ar/propylene glow discharge is utilized for grafting polypropylene onto muga silk yarn at working pressure of 1.2?×?10^?1 mbar and in the of RF power range of 20?C80?W. The plasma discharge is diagnosed using self-compensated emissive probe to study the variation of ion energy impinging on the substrates with RF power. From chemical compositional analysis, a possible grafting mechanism between propylene and muga yarn is proposed by considering the charge-transfer initiation through the formation of electron-donor?Cacceptor (EDA) complex. X-ray photoelectron spectroscopy reveals that at RF power values of 60?C80?W, the ion sputtering effect becomes dominant over plasma grafting thereby leading to severe destruction in chemical structure of the polypropylene grafted (PP-grafted) muga yarns. The experimental results show that PP-grafted muga yarns exhibit improved mechanical strength and hydrophobic behavior as compared to the virgin yarn. The properties of the PP-grafted muga yarns are observed to be dependent on atomic concentration, surface morphology as well as the results obtained from plasma discharge characteristics.