Protection-deprotection chemistry to control styrene self-directed line growth on hydrogen-terminated Si(100)

TEMPO, 2,2,6,6-tetramethylpiperidinyloxy, was used in a series of protection-deprotection chemical reactions in order to gain single molecule-level control over the extent of styrene line growth on hydrogen-terminated Si(100). The mechanism involves the reaction of TEMPO with the dangling bond at the end of individual styrene lines. The TEMPO cap protects the dangling bond from further reaction with styrene resulting in the termination of line growth. TEMPO is then selectively removed from desired lines, deprotecting the dangling bond, using the scanning tunneling microscope. Further exposure of the surface to styrene ensures that only the deprotected areas continue to grow while the protected lines do not. All lines can then be capped with TEMPO, and this allows for the generation of stable styrene lines of varying lengths.     

Multiredox tetrathiafulvalene-modified oxide-free hydrogen-terminated Si(100) surfaces

Tetrathiafulvalene (TTF) monolayers covalently bound to oxide-free hydrogen-terminated Si(100) surfaces have been prepared from the hydrosilylation reaction involving a TTF-terminated ethyne derivative. FTIR spectroscopy characterization using similarly modified porous Si(100) substrates revealed the presence of vibration bands assigned to the immobilized TTF rings and the Si-C═C- interfacial bonds. Cyclic voltammetry measurements showed the presence of two reversible one-electron systems ascribed to TTF/TTF(.+) and TTF(.+)/TTF(2+) redox couples at ca. 0.40 and 0.75 V vs SCE, respectively, which compare well with the values determined for the electroactive molecule in solution. The amount of immobilized TTF units could be varied in the range from 1.7 × 10(-10) to 5.2 × 10(-10) mol cm(-2) by diluting the TTF-terminated chains with inert n-decenyl chains. The highest coverage obtained for the single-component monolayer is consistent with a densely packed TTF monolayer.     

A kinetic model of the formation of organic monolayers on hydrogen-terminated silicon by hydrosilation of alkenes

We have analyzed a kinetic model for the formation of organic monolayers based on a previously suggested free radical chain mechanism for the reaction of unsaturated molecules with hydrogen-terminated silicon surfaces (Linford, M. R.; Fenter, P. M.; Chidsey, C. E. D. J. Am. Chem. Soc 1995, 117, 3145). A direct consequence of this mechanism is the nonexponential growth of the monolayer, and this has been observed spectroscopically. In the model, the initiation of silyl radicals on the surface is pseudo first order with rate constant, ki, and the rate of propagation is determined by the concentration of radicals and unreacted Si-H nearest neighbor sites with a rate constant, kp. This propagation step determines the rate at which the monolayer forms by addition of alkene molecules to form a track of molecules that constitute a self-avoiding random walk on the surface. The initiation step describes how frequently new random walks commence. A termination step by which the radicals are destroyed is also included. The solution of the kinetic equations yields the fraction of alkylated surface sites and the mean length of the random walks as a function of time. In mean-field approximation we show that (1) the average length of the random walk is proportional to (kp/ki)1/2, (2) the monolayer surface coverage grows exponentially only after an induction period, (3) the effective first-order rate constant describing the growth of the monolayer and the induction period (kt) is k = (2ki kp)1/2, (4) at long times the effective first-order rate constant drops to ki, and (5) the overall activation energy for the growth kinetics is the mean of the activation energies for the initiation and propagation steps. Monte Carlo simulations of the mechanism produce qualitatively similar kinetic plots, but the mean random walk length (and effective rate constant) is overestimated by the mean field approximation and when kp > ki, we find k approximately ki0.7kp0.3 and Ea = (0.7Ei+ 0.3Ep). However the most striking prediction of the Monte Carlo simulations is that at long times, t > 1/k, the effective first-order rate constant decreases to ki even in the absence of a chemical termination step. Experimental kinetic data for the reaction of undec-1-ene with hydrogen-terminated porous silicon under thermal reflux in toluene and ethylbenzene gave a value of k = 0.06 min(-1) and an activation energy of 107 kJ mol(-1). The activation energy is in reasonable agreement with density functional calculations of the transition state energies for the initiation and propagation steps.     

Protein-resistant monolayers prepared by hydrosilylation of alpha-oligo(ethylene glycol)-omega-alkenes on hydrogen-terminated silicon (111) surfaces

Atomically flat, homogeneous, and protein-resistant monolayers can be readily prepared on H-Si(111) surfaces by photo-induced hydrosilylation of alpha-oligo(ethylene glycol)-omega-alkenes.     

Branched fluoropolymer-Si hybrids via surface-initiated ATRP of pentafluorostyrene on hydrogen-terminated Si(100) surfaces

Linear, branched, and arborescent fluoropolymer-Si hybrids were prepared via surface-initiated atom transfer radical polymerization (ATRP) from the 4-vinylbenzyl chloride (VBC) inimer and ClSO(3)H-modified VBC that were immobilized on hydrogen-terminated Si(100), or Si-H, surfaces. The simple approach of UV-induced coupling of VBC with the Si-H surface provided a stable, Si-C bonded monolayer of "monofunctional" ATRP initiators (the Si-VBC surface). The aromatic rings of the Si-VBC surface were then sulfonated by ClSO(3)H to introduce sulfonyl chloride (-SO(2)Cl) groups and to give rise to a monolayer of "bifunctional" ATRP initiators. Kinetics study indicated that the chain growth of poly(pentafluorostyrene) from the functionalized silicon surfaces was consistent with a "controlled" or "living" process. The chemical composition and functionality of the silicon surface were tailored by the well-defined linear and branched fluoropolymer brushes. Atomic force microscopy images revealed that the surface-initiated ATRP of pentafluorostyrene (PFS) had proceeded uniformly on the Si-VBC surface to give rise to a dense and molecularly flat surface coverage of the linear brushes. The uniformity of surfaces with branched brushes was controlled by varying the feed ratio of the monomer and inimer (VBC in the present case). The living chain ends on the functionalized silicon surfaces were used as the macroinitiators for the synthesis of diblock copolymer brushes, consisting of the PFS and methyl methacrylate polymer blocks.     

Nanopatterning of alkynes on hydrogen-terminated silicon surfaces by scanning probe-induced cathodic electrografting

The electrochemical cathodic electrografting reaction, previously demonstrated on bulk silicon surfaces, can be patterned on the nanoscale utilizing conducting probe atomic force microscopy (CP-AFM). Alkyne electrografting is a particularly useful chemical technique since it leads to direct covalent attachment of conjugated alkynes to silicon. In addition, application of a forward bias during the reaction renders the surface less sensitive to oxidation and the resulting monolayers are very stable in air and basic aqueous solution. Alkyne monolayer lines can be drawn down to 40 nm resolution using a Pt-coated AFM tip, and the heights of the monolayers scale with the molecular length of the alkyne. The tip is biased (+) and the surface is biased (-) to drive the cathodic electrografting reaction under ambient conditions. The resistance of the monolayers to fluoride, as well as friction force microscopy, indicate that the alkynes are covalently bonded to the surface, not oxide-based, and hydrophobic. The reaction does not work with alkenes, and therefore hydrosilylation is not the primary mode of reaction. Wider lines (300 nm) can be produced using broadened Pt-coated AFM tips. This reaction could be important for the interfacing of conjugated molecules directly to silicon in a spatially controlled fashion.     

Covalent assembly of silver nanoparticles on hydrogen-terminated silicon surface

Synthesis of ω-alkenyl-terminated silver nanoparticles (AgNPs) and then their immobilization on a hydrogen-terminated silicon surface in two-dimensional arrangement through covalent interaction are demonstrated. The thermal-induced hydrosilylation at mild conditions facilitate nanoparticles assembly through interaction between terminal alkenyl (CH(2)=CH-) groups of AgNPs and hydrogen-terminated silicon surface. The assembly of AgNPs on a silicon surface is characterized by FESEM and XPS. Adequate coating of 10-undecene-1-thiol (UDT) on AgNPs and mild temperature hydrosilylation impede the fusion or aggregation of nanoparticles, while they immobilized on a silicon surface, which is very crucial to preserve the discrete entities of nanoparticles. This elegant and facile approach provides stable monolayer of AgNPs with very good coverage area and promises potential to fabricate electronic devices and solar cells, where nanoparticles needs to be directly attached to the silicon surface without an interfacial oxide thin film.     

Covalently attached monolayers on crystalline hydrogen-terminated silicon: extremely mild attachment by visible light

A very mild method was developed for the attachment of high-quality organic monolayers on crystalline silicon surfaces. By using visible light sources, from 447 to 658 nm, a variety of 1-alkenes and 1-alkynes were attached to hydrogen-terminated Si(100) and Si(111) surfaces at room temperature. The presence and the quality of the monolayers were evaluated by static water contact angles, X-ray photoelectron spectroscopy, and IR spectroscopy. Monolayers prepared by thermal, UV light, or visible light initiation were compared. Additionally, the ability of infrared reflection-absorption spectroscopy to study organic monolayers on silicon was explored. A reaction mechanism is discussed on the basis of investigations of the reaction behavior of 1-alkenes with silicon wafers with varying types and levels of doping. Finally, a series of mixed monolayers derived from the mixed solutions of a 1-alkene and an omega-fluoro-1-alkene were investigated to reveal that the composition of the mixed monolayers was directly proportional to the molar ratio of the two compounds in the solutions.     

Density control of dodecamanganese clusters anchored on silicon(100)

A synthetic strategy to control the density of Mn12 clusters anchored on silicon(100) was investigated. Diluted monolayers suitable for Mn12 anchoring were prepared by Si-grafting mixtures of the methyl 10-undecylenoate precursor ligand with 1-decene spectator spacers. Different ratios of these mixtures were tested. The grafted surfaces were hydrolyzed to reveal the carboxylic groups available for the subsequent exchange with the [Mn12O12(OAc)16(H2O)4]4 H2O2 AcOH cluster. Modified surfaces were analyzed by attenuated total reflection (ATR)-FTIR spectroscopy, X-ray photoemission spectroscopy (XPS), and AFM imaging. Results of XPS and ATR-FTIR spectroscopy show that the surface mole ratio between grafted ester and decene is higher than in the source solution. The surface density of the Mn12 cluster is, in turn, strictly proportional to the ester mole fraction. Well-resolved and isolated clusters were observed by AFM, using a diluted ester/decene 1:1 solution.     

Dispersion interactions enable the self-directed growth of linear alkane nanostructures covalently bound to silicon

Current interest in methods for controllably adding organic molecules to silicon surfaces relates to proposed hybrid silicon-organic devices. It was recently shown that a "self-directed" growth process, requiring only limited scanned probe intervention, has the potential to permit rapid, parallel production of ordered molecular nanostructures on silicon with predefined absolute position, structure, composition, and extent of growth. The hybrid organic-silicon structures formed are bound by strong covalent interactions. In this work, we use scanning tunneling microscopy and density functional theory techniques to show that molecule-surface dispersion interactions enable the growth process and play a crucial role in the final configurations of the nanostructures.     

Stereospecificity in the silicon tethered alpha-(methyl)allylation of aldehydes

Heating E- and Z-crotyl(diphenyl)silyloxy aldehydes, in the absence of an added catalyst, results in stereospecific intramolecular allyl transfer with moderate to high stereoselectivity.     

Comparative study on reactions and self-directed growth mechanisms of styrene molecules on H-terminated Si(111) and Si(100): combining quantum chemistry and molecular mechanics simulations

A comparative study on mechanisms of radical initiated self-directed growth of styrene molecules on the H-terminated Si(111) and Si(100) has been carried out by using quantum chemical and molecular mechanics methods. Several possible H-abstraction pathways through formations of transition states containing five-, six-, and even eight-membered ring structures are investigated with the aid of surface cluster models and density functional theory calculations. It has been demonstrated by employing periodic surface models and molecular mechanics simulations that the surface pattern and intermolecular interactions between phenyl groups play important roles in the self-directed growth processes. The formation of cluster-shaped aggregation of styrene molecules on H-Si(111) results from the undirectional chain reactions, due to the isotropic hexagonal arrangement of surface sites. On the contrary, the anisotropic style of H-Si(100) induces a strong directional preference for H-abstractions, following an order of the inter Si-Si dimer > the intra Si-Si dimer > the inter Si-Si dimer row. The one-dimensionally ordered structures of single and double lines along the Si-Si dimer row are thus formed on H-Si(100). The self-directed growths of styrene molecules on both H-Si(111) and H-Si(100) are revealed to be stage-dependent.     

Bonding structure of phenylacetylene on hydrogen-terminated Si(111) and Si(100): surface photoelectron spectroscopy analysis and ab initio calculations

Interfaces between phenylacetylene (PA) monolayers and two silicon surfaces, Si(111) and Si(100), are probed by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy, and the results are analyzed using ab initio molecular orbital calculations. The monolayer systems are prepared via the surface hydrosilylation reaction between PA and hydrogen-terminated silicon surfaces. The following spectral features are obtained for both of the PA-Si(111) and PA-Si(100) systems: a broad π-π* shakeup peak at 292 eV (XPS), a broad first ionization peak at 3.8 eV (UPS), and a low-energy C 1s → π* resonance peak at 284.3 eV (NEXAFS). These findings are ascribed to a styrene-like π-conjugated molecular structure at the PA-Si interface by comparing the experimental data with theoretical analysis results. A conclusion is drawn that the vinyl group can keep its π-conjugation character on the hydrogen-terminated Si(100) [H:Si(100)] surface composed of the dihydride (SiH(2)) groups as well as on hydrogen-terminated Si(111) having the monohydride (SiH) group. The formation mechanism of the PA-Si(100) interface is investigated within cluster ab initio calculations, and the possible structure of the H:Si(100) surface is discussed based on available data.     

Oxidation of the (100) face of crystalline silicon

The density functional theory was used to calculate the equilibrium structures of clusters serving as models of the sequence of reaction steps in the oxidation of the (100) face of crystalline silicon and their relative heat effects. The formation of all the intermediates on the (100) face proceeds without activation energy, suggesting the feasibility of avalanche-like formation of an SiO₂ film. __________ Translated from Teoreticheskaya i éksperimental’naya Khimiya, Vol. 43, No. 4, pp. 257–261, July–August, 2007.     

Controlled grafting of well-defined epoxide polymers on hydrogen-terminated silicon substrates by surface-initiated ATRP at ambient temperature

Controlled grafting of well-defined epoxide polymer brushes on the hydrogen-terminated Si(100) substrates (Si-H substrates) was carried out via the surface-initiated atom-transfer radical polymerization (ATRP) at room temperature. Thus, glycidyl methacrylate (GMA) polymer brushes were prepared by ATRP from the alpha-bromoester functionalized Si-H surface. Kinetic studies revealed a linear increase in GMA polymer (PGMA) film thickness with reaction time, indicating that chain growth from the surface was a controlled "living" process. The graft polymerization proceeded more rapidly in the dimethylformamide/water (DMF/H(2)O) mixed solvent medium than in DMF, leading to much thicker PGMA growth on the silicon surface in the former medium. The chemical composition of the GMA graft-polymerized silicon (Si-g-PGMA) surfaces were characterized by X-ray photoelectron spectroscopy (XPS). The fact that the epoxide functional groups of the grafted PGMA were preserved quantitatively was revealed in the reaction with ethylenediamine. The "living" character of the PGMA chain end was further ascertained by the subsequent growth of a poly(pentafluorostyrene) (PFS) block from the Si-g-PGMA surface, using the PGMA brushes as the macroinitiators.     

Infrared spectroscopic investigation of the reaction of hydrogen-terminated, (111)-oriented, silicon surfaces with liquid methanol

Fourier transform infrared spectroscopy and first principles calculations have been used to investigate the reaction of atomically smooth, hydrogen-terminated Si(111) (H-Si) surfaces with anhydrous liquid methanol. After 10 min of reaction at room temperature, a sharp absorbance feature was apparent at approximately 1080 cm(-1) that was polarized normal to the surface plane. Previous reports have identified this mode as a Si-O-C stretch; however, the first principles calculations, presented in this work, indicate that this mode is a combination of an O-C stretch with a CH3 rock. At longer reaction times, the intensity of the Si-H stretching mode decreased, while peaks attributable to the O-C coupled stretch and the CH3 stretching modes, respectively, increased in intensity. Spectra of H-Si(111) surfaces that had reacted with CD3OD showed the appearance of Si-D signals polarized normal to the surface as well as the appearance of vibrations indicative of Si-OCD3 surface species. The data are consistent with two surface reactions occurring in parallel, involving (a) chemical attack of hydrogen-terminated Si(111) terraces by CH3OH, forming Si-OCH3 moieties having their Si-O bond oriented normal to the Si(111) surface and (b) transfer of the acidic hydrogen of the methanol to the silicon surface, either through a direct H-to-D exchange mechanism or through a mechanism involving chemical step-flow etching of Si-H step sites.     

Dehydrative cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111): an ex situ tool for the modification of semiconductor surfaces

Dehydrative cyclocondensation processes for semiconductor surface modification can be generally suggested on the basis of well-known condensation schemes; however, in practice this approach for organic functionalization of semiconductors has never been investigated. Here we report the modification of hydrogen-terminated silicon surfaces by cyclocondensation. The cyclocondensation reactions of nitrobenzene with hydrogen-terminated Si(100) and Si(111) surfaces are investigated and paralleled with selected cycloaddition reactions of nitro- and nitrosobenzene with Si(100)-2x1. Infrared spectroscopy is used to confirm the reactions and verify an intact phenyl ring and C-N bond in the reaction products as well as the depletion of surface hydrogen. High resolution N 1s X-ray photoelectron spectroscopy (XPS) suggests that the major product for both cyclocondensation reactions investigated is a nitrosobenzene adduct that can only be formed following water elimination. Both IR and XPS are augmented by density functional theory (DFT) calculations that are also used to investigate the feasibility of several surface reaction pathways, which are insightful in understanding the relative distribution of products found experimentally. This novel surface modification approach will be generally applicable for semiconductor functionalization in a highly selective and easily controlled manner.     

Ultrathin cobalt silicide film formation on Si(100)

The interfacial reaction between ultrathin Co film and substrate Si(100) was studied by in situ XPS using monochromatized Al Kα. When the Co is deposited on Si(100) at room temperature, CoSi₂ is formed during the initial stage of Co deposition and then metallic Co starts to grow sequentially. For 8 ML Co deposition on Si(100) the interfacial reaction layer is relatively thin compared with the pure Co overlayer, which is not involved in the interfacial reaction in depth. The Co layers change rapidly to CoSi layers after annealing at 270°C, and then CoSi₂ layers form after annealing at 540°C for 2 min. The CoSi₂ layers are changed to CoSi₂ islands by post‐annealing at >650°C. Copyright © 2003 John Wiley & Sons, Ltd.     

Synthesis of tripod-shaped oligo(phenylene)s with multiple ethenyl groups at the bases for chemisorption on hydrogen-terminated silicon surfaces

This communication describes an efficient and convergent synthesis of monodisperse, nanometer-sized, and tripod-shaped oligo(phenylene)s with a triallylsilyl group at the base of each leg and a chlorophenyl group at the focal point of the tripod. These molecules were designed as model compounds for the study of chemisorption of rigid molecules containing multiple ethenyl groups on hydrogen-terminated silicon surfaces. The compounds were synthesized from p-chlorophenyl-tris(p-bromophenyl)silane via selective Pd-catalyzed Ishiyama-Miyaura reaction with bis(pinacolato)diboron, followed by Suzuki coupling with aryl dihalides to elongate the legs. The legs were then end-capped with triallylsilyl groups through Suzuki coupling with 4-triallyphenylboronic acid.