Electron-phonon interaction inP-doped silicon at low temperatures

In this present work, we explain the thermal conductivity results ofP doped silicon for impurity concentration 4.7×10¹⁷ and 1.0×10¹⁸ cm^–3 by applying the theory of scattering of phonons by electrons in the mixed state i.e. both in the localised state and in the metallic state. Using Mikoshiba's inhomogeneity model we calculated the number of electrons in the bound region and in the conduction band region and using the relaxation rates of both bound electron-phonon scattering and Ziman-Kosarev theory of free electron-phonon scattering, we explain the thermal conductivity values from 2 to 40 K. The values of density-of-states effective mass and dilatation deformation potential are found to be in agreement with the experimental values for silicon, for the electron concentration in the conduction band. We have also taken into account the effect of impurity scattering due to doped impurities, along with isotope scattering.     

硅的低温电学性质

本文在20°—300°K研究了室温载流子浓度2×10¹²—1×10²⁰cm^-3含硼或磷(砷)Si的电学性质。对一些p-Si样品用弱场横向磁阻法及杂质激活能法进行了补偿度的测定,并进行了比较。从霍尔系数与温度关系的分析指出,对于较纯样品,硼受主能级的电离能为0.045eV,磷施主能级为0.045eV,在载流子浓度为10¹⁸—10¹⁹cm^-3时发现了费米简并,对载流子浓度为2×10¹⁷—1×10¹⁸cm^-3的p-Si及5×10¹⁷—4×10¹⁸cm^-3的n-Si观察到了杂质电导行为。从霍尔系数与电导率计算了非本征的霍尔迁移率。在100°—300°K间,晶格散射迁移率μ满足关系式AT^-a,其中A=2.1×10⁹,α=2.7(对空穴);或A=1.2×10⁸,α=2.0(对电子)。另外,根据我们的材料(载流子浓度在5×10¹¹—5×10²⁰cm^-3间),分别建立了一条电阻率与载流子浓度及电阻率与迁移率的关系曲线,以提供制备材料时参考之用。     

Galvanomagnetic and thermomagnetic effects in compensated gallium arsenide

The kinetic effects:-Hall effect, magnetoresistance, and Nernst-Ettinghausen effect-are examined in n-type gallium arsenide having a free electron concentration at room temperature of less than 10¹⁵ cm^–3.The work was directed toward determining the dominating scattering mechanism in compensated material.At low temperatures the scattering is predominately by impurity atoms and optical vibrations (optical phonons); at high temperatures, by acoustic phonons.With simultaneous scattering by thermal vibrations and impurity ions, for temperatures T > 300 ° K, the second mechanism plays the basic role in the longitudinal Nernst-Ettinghausen effect.     

80—500°K间InSb的电导率、霍尔效应及磁阻效应

文中报导了80—500°K间n型及p型InSb的电导率、霍尔系数及磁阻效应的测量,所用样品的杂质含量(补偿后)为4×10¹³—7×10¹⁷cm^-3。由结果的分析得出InSb的本征载流子浓度、禁带宽度及电子迁移率等数值,讨论了电子的散射机构以及强磁场下磁阻与磁场强度成一次方正比关系的可能原因。     

流体静压力对InSb输运性质的影响

在室温和流体静压力达12500公斤/厘米²下,测量了不同掺杂浓度的n型(5×10¹³—2.3×10¹⁸厘米^-3和p型(2.6×10¹⁴—6.0×10¹⁷厘米^-3)InSb的霍耳系数和电导率。分析结果发现,霍耳系数公式中散射因子随压力而减小,禁带宽的压力系数不是常数;得出禁带宽、载流子浓度、电子和空穴迁移率与压力的关系,并对压力下的载流子散射机构作了初步讨论。     

Ag偏离化学计量比Ag1－xPb18SbTe20材料的热电传输性能

采用熔融-淬火-放电等离子体烧结制备了Ag偏离化学计量比Ag_1-xPb₁₈SbTe₂₀(x=0，0.25，0.50，0.75)样品，研究了Ag含量对样品热电传输性能的影响.结果表明，随Ag含量降低，样品中出现少量第二相Sb₂Te₃，样品载流子浓度增加到5×10¹⁸cm^-3后不再增加.样品载流子迁移率随Ag含量降低先降低后增加，随着温度增加，载流子散射机理由电离杂质散射转变为声学波散射.随Ag含量降低，样品电导率增加而Seebeck系数降低，热导率增加. 关键词： 热电材料 mSbTe_m+2')" href="#">AgPb_mSbTe_m+2 SPS 散射机理     

Effect of the doping level on temperature bistability in a silicon wafer

The influence of the doping level on the effect of the temperature bistability in a silicon wafer upon radiative heat transfer between the wafer and the elements of the heating system is studied. Theoretical transfer characteristics are constructed for a silicon wafer doped with donor and acceptor impurities. These characteristics are compared with the transfer characteristics obtained during heating and cooling of wafers with the hole conduction (with dopant concentrations of 10¹⁵, 2 × 10¹⁶, and 3 × 10¹⁷ cm^?3) and electron conduction (with impurity concentrations of 10¹⁵ and 8 × 10¹⁸ cm^?3) in a thermal reactor of the rapid thermal annealing setup. It is found that the width and height of the hysteresis loop decrease with increasing dopant concentration and are almost independent of the type of conduction of the silicon wafer. The critical value of the impurity concentration of both types is 1.4 × 10¹⁷ cm^?3. For this concentration, the loop width vanishes, and the height corresponds to the minimal value of the temperature jump (～200 K). The mechanism of temperature bistability in the silicon wafer upon radiative heat transfer is discussed.     

Piezo-thermoelectromotive force in strained p-GaAs samples

Experimental data are given on the thermo-emf in strained samples of p-type gallium arsenide with hole densities of 10¹⁷ to 10¹⁹ cm^?3 in the temperature range from 77 to 400°K. It is shown that the thermo-emf in the strained samples depends on the degree of doping and orientation of the original crystals. Phonon drag is observed in strained p-GaAs samples at a temperature of about 100°K. A maximum of the dependence α=f(T) is observed in the <111> direction, and a minimum of the thermo-emf in the <100> direction. The indicated behavior of the thermo-emf can be explained by anisotropy of the hole effective masses. It is postulated that scattering of holes by acoustic lattice vibrations and by impurity ions takes place in the case of p-GaAs samples with a hole concentration of 10¹⁷ cm^?3, whereas only scattering by impurity ions takes place for samples with p=10¹⁹ cm^?3. The temperature dependence is calculated for m _p ^* =0.7 m₀ on the basis of these assumptions. The experimental dependences α₀=f(T) are used to determine the anisotropy of the hole effective masses. The maximum variation of (m _p ^* )_ε is observed in the <111> direction, and the minimum variation in the <100> direction.     

Concentration dependence of the intermediate frequency bandwidth of submillimeter heterodyne AlGaAs/GaAs nanostructures

The concentration dependence of the intermediate frequency bandwidth of heterodyne AlGaAs/GaAs detectors with 2D electron gas is measured using submillimeter spectroscopy with high time resolution at T= 4.2 K. The intermediate frequency bandwidth f_3dBfalls from 245 to 145 MHz with increasing concentration of 2D electrons n _s = (1.6-6.6) × 10[su11] cm^-2. The dependence f_3dB ≈ n _s ^- 0.04±is observed in the studied concentration range; this dependence is determined by electron scattering by the deformation potential of acoustic phonons and piezoelectric scattering.     

Estimation of various scattering parameters and 2-DEG mobilities from electron mobility calculations in the three conduction bands Γ, L and X of gallium arsenide

The electron drift mobility in Γ conduction band of GaAs has been calculated before, but for the first time, we have made attempts to estimate the electron mobilities in higher energy L and X minima. We have also calculated the value of mobility of two-dimensional electron gas needed to predict hetero-structure device characteristics using GaAs. Best scattering parameters have been derived by close comparison between experimental and theoretical mobilities. Room temperature electron mobilities in Γ, L and X valleys are found to be nearly 9094, 945 and 247 cm²/V-s respectively. For the above valleys, the electron masses, deformation potentials and polar phonon temperatures have been determined to be (0.067, 0.22, 0.39m ₀), (8.5, 9.5, 6.5 eV), and (416, 382, 542 K) as best values, respectively. The 2-DEG electron mobility in Γ minimum increases to 1.54 × 10⁶ from 1.59 × 10⁵ cm²/V-s (for impurity concentration of 10¹⁴ cm⁻³) at 10 K. Similarly, the 2-DEG electron mobility values in L and X minima are estimated to be 2.28 × 10⁵ and 1.44 × 10⁵ cm²/V-s at 10 K, which are about ∼4.5 and ∼3.9 times higher than normal value with impurity scattering present.      

Photoluminescent studies of the condensed phase in phosphorus-doped silicon

Photoluminescent studies give evidence for the existence of the electron—hole droplet in phosphorus-doped silicon in the impurity concentration range 9.0 × 10¹⁵cm^?3 ? N_D ? 4.3 × 10¹⁹cm^?3.     

Ionization mechanisms of aluminum acceptor impurity in silicon

Processes of ionization of shallow acceptor centers (ACs) in silicon are studied. In crystalline silicon samples with phosphorus (1.6×10¹³, 2.7×10¹³, and 2.3×10¹⁵cm^?3) and boron (1.3×10¹⁵cm^?3) impurities, _μAl impurity atoms were produced by implantation of negative muons. It is found that thermal ionization is the main mechanism for ionizing the Al acceptor impurity in both p-type and n-type silicon with an impurity concentration of ?10¹⁵cm^?3 at T>45 K. The thermal ionization rate of Al ACs in Si varies from ～10⁵ to ～10⁶s^?1 in the temperature range 45–55 K.     

Infrared plasma reflectivity minimum in heavily doped n-Si

This paper presents a numerical analysis of infrared (IR) plasma reflectivity minimum in ultra heavily doped (UHD) n-Si (impurity concentration N up to 6 × 10²¹cm⁻³) by using a self-consistent method (SCM) and a complex physical model. The necessity of taking into account the dependence of effective mass on impurity concentration is shown. The scattering on defects (N_def = 5 × 10¹⁷ cm⁻³) and dislocation (N_dis = 5 × 10¹¹ cm⁻²) is included. The approximate relation for the wavelength λ_m(N) of the reflectivity minimum is given. The results obtained are compared with the experimental results for n-Si and satisfactory agreement is found.     

Superconductivity of In-doped Sn0.62Pb0.33Ge0.05Te alloys

A study of the Hall and Seebeck coefficients and of resistivity has been carried out on an Sn_0.62Pb_0.33Ge_0.05Te alloy doped by 5 and 10 at. % In. A superconducting transition with the maximum critical temperature T _C～4 K has been discovered in samples with hole concentrations p≥1×10²¹ cm^?3. The dependence of T _C on hole concentration has been established to be of a threshold nature. The onset of superconductivity is accompanied practically simultaneously by a growth of the resistivity and a sharp drop of the Seebeck coefficient. These features in the experimental data indicate the existence of a band of In resonance states within the allowed valence-band spectrum and strong resonance hole scattering to impurity states. The threshold character of the T _C(p) dependence is connected with the holes filling the resonance states. A positive correlation between the resonance scattering intensity and the critical temperature is observed.     

Low temperature thermal conductivity of OH− and OD−-doped LIF single crystals

Thermal conductivity measurements between 0.1 and 70K of OH^? and OD^? doped LiF indicates resonant phonon scattering at 0.86cm^? for OH^? and 0.43cm^? for OD^?. Hydroxyl impurities trapped at divalent impurity sites do not scatter phonons resonantly and it is shown that inhomogenous distribution of strong scattering centers modify thermal conductivity curves considerably. A simple tunneling model for the isotope shift suggests an effect similar to the “polaron” model of paraelastic centers. A relaxation time for phonon scattering by OH^? is derived, showing that the ground state may be understood in terms of a direct process, underlining that this system provides a connection between the theory of paraelectric/paraelastic impurities and Jahn-Teller systems.     

Magnetic moment relaxation of a shallow acceptor center in heavily doped silicon

Results of studying the temperature dependence of the residual polarization of negative muons in crystalline silicon with germanium (9×10 ¹⁹ cm ^?3 ) and boron (4.1×10 ¹⁸ , 1.34×10 ¹⁹ , and 4.9×10 ¹⁹ cm ^?3 ) impurities are presented. It is found that, similarly to n-and p-type silicon samples with impurity concentrations up to ～10 ¹⁷ cm ^?3 , the relaxation rate ν of the magnetic moment of a _μ Al acceptor in silicon with a high impurity concentration of germanium (9×10 ¹⁹ cm ^?3 ) depends on temperature as ν～T ^q , q≈3 at T=(5–30) K. An increase in the absolute value of the relaxation rate and a weakening of its temperature dependence are observed in samples of degenerate silicon in the given temperature range. Based on the experimental data obtained, the conclusion is made that the spin-exchange scattering of free charge carriers makes a significant contribution to the magnetic moment relaxation of a shallow acceptor center in degenerate silicon at T?30 K. Estimates are obtained for the effective cross section of the spin-exchange scattering of holes (σ _h ) and electrons (σ _e ) from an Al acceptor center in Si: σ _h ～10^?13 cm² and σ _e ～8×10^?15 cm² at the acceptor (donor) impurity concentration n _a (n _d )～4×10¹⁸ cm^?3.     

Ionized impurity scattering in degenerate In2O3

Thin films of In₂O₃ are prepared by the spraying method. The concentration of charge carriers is changed from about 8×10¹⁹ cm^?3 to 5×10²⁰ cm^?3 by suitable doping with Sn. The optical effective mass is found to depend slightly on carrier concentration. Electrical and optical measurements indicate that electrons are scattered predominantly by charged impurity centres. Structural investigations show that grain boundary scattering can be neglected. The interpretation of the experimental results is mainly based on a paper by von Baltz and Escher, where analytical formulas for the imaginary part of the complex dielectric constant are given for the most important scattering mechanisms in (degenerate) semiconductors.     

The optical conductivity of free carriers in GaAs

The optical conductivity of free electrons in polar semiconducting compounds has recently been calculated by use of a generalized Boltzmann equation derived from the equation of motion of the quantum density matrix. This reduces to the quasi-classical Boltzmann transport equation in the low frequency limit: the optical conductivity thus obtained spans a spectral range from around 30cm^?1 to 1.2 × 10⁴cm^?1 in GaAs. In this paper, the optical conductivity is calculated for GaAs as a function of carrier concentration in terms of a frequency dependent relaxation time which reduces to the usual relaxation time in the limit of low frequencies and an elastic scattering mechanism. The low frequency limit of the relaxation time is used to estimate the mobility as a function of carrier concentration. The frequency dependent relaxation time is given for GaAs at 298 K over the spectral region from 45 cm^?1 to 2.3 × 10³cm^?1 for carrier concentrations from 3.4 × 10¹⁵cm^?3 to 8.7 × 10¹⁸cm^?3.     

Optical and electrical properties of GaN: Si-based microstructures with a wide range of doping levels

The optical and electrical properties of silicon-doped epitaxial gallium nitride layers grown on sapphire have been studied. The studies have been performed over a wide range of silicon concentrations on each side of the Mott transition. The critical concentrations of Si atoms corresponding to the formation of an impurity band in gallium nitride (～2.5 × 10¹⁸ cm^?3) and to the overlap of the impurity band with the conduction band (～2 × 10¹⁹ cm^?3) have been refined. The maximum of the photoluminescence spectrum shifts nonmonotonically with increasing doping level. This shift is determined by two factors: (1) an increase in the exchange interaction leading to a decrease in the energy gap width and (2) a change in the radiation mechanism as the donor concentration increases. The temperature dependence of the exciton luminescence with participating optical phonons has been studied. The energies of phonon-plasmon modes in GaN: Si layers with different silicon concentrations have been measured using Raman spectroscopy.