二维GeSe纳米片五族和七族原子掺杂的受主和施主杂质态（英文）

采用第一性原理的计算方法研究GeSe纳米片结构掺杂Ⅴ和Ⅶ族元素对其电子结构、形成能和跃迁能级的影响.结果表明:无论是掺杂Ⅴ族还是Ⅶ族元素,体系的形成能均随杂质半径的增加而增加.Ⅴ族元素掺杂体系的跃迁能级随杂质原子半径的增加而降低,而Ⅶ元素掺杂的体系却随杂质原子半径的增加而增加.其中,F、Cl、Br和I的掺杂为n型施主浅能级杂质,而N、P和As掺杂为p型受体深能级杂质.为相关的实验研究提供了理论参考.     

原子替位掺杂对单层Janus WSeTe电子结构的影响

基于第一性原理计算系统地研究了氮族、卤族和3d过渡金属元素(Ti, V, Cr, Mn, Fe, Co)替位掺杂对单层Janus过渡金属硫族化合物WSeTe电子结构的影响.通过对能带结构、电荷转移以及磁性的分析,发现氮(卤)族原子替位掺杂单层WSeTe会发生本征半导体-p (n)型半导体的转变, Ti, V原子替位掺杂单层WSeTe会发生半导体-金属的转变.由于电荷转移以及氮族原子掺杂时价带顶的能带杂化现象,卤族和氮族非金属元素掺杂时价带顶G点附近的Rashba自旋劈裂强度在同一主族随着掺杂原子原子序数的增大而增大. 3d过渡金属元素掺杂会产生能谷极化和磁性,其中Cr, Mn原子替位掺杂会产生高于100 meV的能谷极化,并且Cr,Mn, Fe元素掺杂在禁带中引入了电子自旋完全极化的杂质能级.研究结果对系统地理解单层WSeTe掺杂模型的性质具有重要意义,可以为基于单层WSeTe的电子器件设计提供理论参考.     

非金属N和过渡金属(Mo, Ru, Rh, Pd)掺杂SnO2磁性的第一性原理研究

本文基于第一性原理方法,对非金属元素(N)与过渡金属元素(Mo, Ru, Rh, Pd)掺杂SnO₂的电子结构和磁学性质进行计算分析.结果表明：形成能与过渡金属原子半径密切相关,随着过渡金属原子半径的增加,形成能在降低,其中N-Mo掺杂体系形成能最低,故该体系最容易掺杂形成;能带结构分析表明,由于掺杂体系自旋向上/向下杂质能级的数量和分布均不对称,掺杂体系均有磁性产生;进一步探究态密度可知,体系产生磁性的原因是过渡金属原子和N原子之间产生p-d轨道杂化,最外层电子轨道上的空位及单电子相互耦合所导致.结果表明,由于掺杂原子的引入,SnO₂体系产生磁性,并且掺杂体系呈现亚铁磁性,其中N-Rh掺杂体系的磁性最好,其磁矩为1.88μB,有望成为良好的稀磁半导体材料.     

Mn-N共掺p型ZnO的第一性原理计算

基于密度泛函理论的第一性原理平面波超软赝势法对ZnO(Mn,N)体系的晶格结构、形成能、态密度以及电荷密度进行了计算和理论研究.研究结果表明,Mn和N共掺杂ZnO体系具有更低的杂质形成能和更高的化学稳定性,更加适合p型掺杂.Mn和N以1:2的比例掺杂时,体系的形成能降低,体系更稳定;同时,体系中形成双受主能级缺陷,使得杂质固溶度增大,体系中载流子数增多,p型化特征更明显.此外,研究发现相比于N单掺杂ZnO体系,Mn和N原子共掺杂ZnO体系有更多的杂质态密度穿越费米能级,在导带与价带之间形成更宽的受主N 2p的杂质态,同时空穴有效质量变小.与Mn-N共掺杂体系相比,Mn-2N共掺杂体系的受主杂质在费米能级附近的态密度更加弥散,非局域化特征明显.因此,Mn-N共掺杂有望成为p型掺杂的更有效的手段.     

密度泛函理论研究硫族元素取代对单层Ag2S结构和电子性质的影响

本文利用第一性原理计算讨论了硫族元素掺杂单层Ag₂S的缺陷形成能和电子性质.缺陷形成能反映了在富Ag条件下的掺杂更容易.计算得到的带隙、Mulliken布居和态密度展示出了其相应结构的电子性质.与纯单层的Ag₂S相比,Se/Te掺杂Ag₂S后的带隙显示出其电导率变化不大.基于Mulliken原子和键布居,研究了硫族元素掺杂后Ag₂S中的共价性.此外,通过讨论态密度,分析了能级的移动和电子的贡献.     

Ⅲ族元素掺杂对SnO2电子结构及电学性能的影响

采用密度泛函理论研究了Ⅲ族元素掺杂对SnO2电子结构及电学性能的影响.态密度分析结果表明,以替代位存在的Ⅲ族杂质均使SnO2的费米能级明显向低能态方向移动,使得价带顶不完全填满,因此在SnO2中均充当受主作用.部分态密度分析结果表明,相对于掺Al的SnO2,Ⅲ族元素中的Ga及In对费米能级附近态密度贡献较大,其主要贡献来自Ga3d态或In4d态,这预示着在SnO2中掺Ga或In能实现更好的p型掺杂效果.电离能计算结果进一步表明,在Al,Ga及In三种元素中,替位In有最小的电离能(0.06 eV),这说明其在SnO2中能形成最浅的受主能级,因而在同等掺杂情况下,可引入最高浓度的空穴,从而实现最佳的p型掺杂效果.     

不同价态Mn掺杂InN电子结构、磁学和光学性质的第一性原理研究

采用密度泛函理论体系下的广义梯度近似GGA+U平面波超软赝势方法,在构建了纤锌矿结构的InN超胞及三种不同有序占位Mn~(2+),Mn~(3+)价态分别掺杂InN超胞模型,并进行几何优化的基础上,计算了掺杂前后体系的电子结构、能量以及光学性质.计算结果表明:Mn掺杂后体系总能量和形成能降低,稳定性增加,并在费米能级附近引入自旋极化杂质带,体系具有明显的自旋极化现象.掺杂不同价态的Mn元素对体系电子结构和磁学性质产生了不同的影响.电子结构和磁性分析表明掺杂体系的磁性来源于p-d交换机制和双交换机制的共同作用,Mn~(3+)价态掺杂有利于掺杂体系的居里温度达到室温以上.与未掺杂InN相比,不同价态Mn元素掺杂后体系的静态介电函数显著增大,掺杂体系介电函数虚部和吸收光谱在低能区域出现了较强的新峰,分析认为这些新峰主要来自与费米能级附近自旋极化杂质带相关的跃迁.     

替位杂质对贵金属(111)表面稳定性影响的分子动力学研究

采用嵌入原子方法的原子间相互作用势，通过分子动力学方法研究了过渡族金属Cu，Ag，Au，Ni，Pd，Pt(111)表面的相互替位掺杂对表面稳定性的影响，计算了替位掺杂体系的表面能与表面空位形成能，探讨了影响表面稳定性的因素及其变化规律. 计算表明：替位杂质对表面能变化的影响主要是替位杂质的凝聚能和原子半径，而影响空位形成能变化的原因除凝聚能和原子半径外，合金溶解热具有重要的作用. 此外，通过替位杂质导致的体系表面能变化对合金体系的偏析行为进行了预测，理论预测与实验结果符合很好. 关键词： 替位杂质 贵金属 表面能 表面空位形成能     

B-N共掺杂改善p型ZnO的理论分析

采用基于密度泛函理论的第一性原理赝势法对B缺陷在ZnO中的存在形式进行了理论分析,对B-N共掺杂ZnO体系的晶格结构、杂质形成能、杂质态密度及电子结构进行了系统的研究.研究表明,B缺陷在掺杂体系中主要以BZn的形式存在,这种结构会引起相应的晶格收缩;研究发现与以往的N掺杂相比,共掺结构具有更低的杂质形成能和更高的化学稳定性,因此更加适合掺杂.此外,共掺能够形成更低的受主能级,因而减小了受主的杂质电离能,提高了受主态密度;研究显示共掺结构下的杂质N原子与体相Zn原子之间的键合能力提高,受主原子得电子的能力增强,因此B-N共掺有望成为一种更为有效的p型掺杂手段.     

第一性原理计算绝缘体-金属转变临界掺杂浓度:Co重掺杂Si体系

基于密度泛函理论的第一性原理方法,本文旨在探索确定绝缘体-金属转变临界浓度的理论计算方法.以Co重掺杂Si为研究对象,构建并计算了10个Co不同掺杂浓度模型的晶体结构、杂质形成能及其电子性质.发现在Co掺杂Si体系的带隙中形成了杂质能级,杂质能级的位置和宽度随着Co浓度的增加呈线性变化.当Co掺杂浓度较高时杂质形成能逐渐稳定,且杂质能级穿过费米能级使体系表现出金属性.综合杂质形成能的变化趋势,以及杂质能级极小值与费米能级间的距离条件,可预测出发生绝缘体-金属转变的Co掺杂浓度为2.601Wingdings 2MC@10~(20) cm~(-3),与实验结果相一致.上述两条依据应用于S重掺杂Si体系和Se重掺杂Si体系同样成立.     

B在Hg0.75Cd0.25Te中掺杂效应的第一性原理研究

基于密度泛函理论的第一性原理方法,通过形成能和束缚能的计算研究了B在Hg_0.75Cd_0.25Te 中的掺杂效应.结果表明B在Hg_0.75Cd_0.25Te中存在着两种主要形态:第一种是在完整的 Hg_0.75Cd_0.25Te材料中B稳定存在于六角间隙位置而非替位.此时,B形成容易激活的三级施主使材料表现为n型.另一种是在有Hg空位存在的Hg_0.75Cd_0.25Te中B更容易与Hg空位结合形成缺陷复合体,其束缚能达到了0.96 eV.这种复合体在Hg_0.75Cd_0.25Te材料中形成单施主也使材料表现为n型.考虑到辐照损伤形成的Hg空位受主,这种B与Hg空位的复合体是制约B离子在MCT中注入激活的一个重要因素.     

Impurity characteristics of group V and VII element-doped two-dimensional ZrSe2 monolayer

Through first-principles calculations, we investigate the electronic structures, formation energy and transition level of the selected group V and VII impurities in the two-dimensional ZrSe₂ monolayer. Our results indicate that group V and VII atoms substituting Se atom can be easier under Zr-rich experiment conditions. Moreover, group V element substituting doping can induce p-type carrier due to their negative formation energy and shallow transition level, while group VII doping can not be effective to induce the n-type impurities. In particular, N substituting Se exhibits the lowest formation energy and shallowest transition level, which indicates that N impurities can offer effective p-type carriers in the ZrSe₂ monolayer.     

Impurities’ influence on complex defects annealing: divacancies in silicon

On the basis of electron Hall concentration temperature dependences in n-type silicon samples with relatively low content of oxygen (the majority impurity), it is found that divacancies are annealed through their decay, combining oxygen-stimulated dissociation with free dissociation in monovacancies. Such a mechanism is compared with direct conversion of divacancies into more complex defects by way of association with dopant atoms in p-type silicon.     

提高单层GeSe对H2O气体传感性能的第一性原理研究

采用第一性原理计算方法,通过在单层GeSe上施加双轴向应变、外加电场、掺Ag等途径来探索提高单层GeSe对H₂O分子传感性能的有效方法,并从微观角度阐明内在机理.计算结果表明,-1.0 V/?的外加电场能有效降低H₂O分子在单层GeSe的吸附能并使二者之间的电荷转移量增加11倍,显著提高了单层GeSe对H₂O分子的响应速度和敏感性.研究结果为进一步设计并制成二维GeSe基湿度传感器提供了理论依据.     

Magnetic properties of AlN monolayer doped with group 1A or 2A nonmagnetic element: First-principles study

The electronic structure, magnetic properties, and mechanism of magnetization in two-dimensional(2D) aluminum nitride(AlN) monolayer doped with nonmagnetic elements of group 1A(Li, Na, K) or group 2A(Be, Mg, Ca) were systematically investigated using first-principles studies. Numerical results reveal that the total magnetic moments produced by group 1A and group 2A nonmagnetic doping are 2.0μB and 1.0μB per supercell, respectively. The local magnetic moments of the three N atoms around the doping atom are the primary moment contributors for all these doped AlN monolayers. The p orbital of the dopant atom contributes little to the total magnetic moment, but it influences adjacent atoms significantly, changing their density of states distribution, which results in hybridization among the p orbitals of the three closest N atoms, giving rise to magnetism. Moreover, the doped AlN monolayer, having half-metal characteristics,is a likely candidate for spintronic applications. When two group 1A or group 2A atoms are inserted, their moments are long-range ferromagnetically coupled. Remarkably, the energy of formation shows that, if the monolayer has been grown under N-rich conditions, substitution of a group 2A atom at an Al site is easier than substitution of a group 1A atom.     

Interaction of dopant atoms with stacking faults in silicon

The width of a stacking fault ribbon bound by a pair of partial dislocations in silicon crystals was unchanged when boron and gallium atoms of p-type dopant were agglomerated nearby the ribbon by annealing, even though the width increased when n-type dopant atoms were agglomerated as previously reported [Y. Ohno, Y. Tokumoto, I. Yonenaga, Thin Solid Films, accepted for publication]. The origin of the width-increase in n-type crystals was proposed as the reduction of the stacking fault energy, from 58±5 down to 46±5 mJ/m², due to an electronic interaction between the ribbon and the n-type dopant atoms, and the interaction energy was estimated to be 0.15±0.05 eV. On the other hand, the interaction of p-type dopant atoms with stacking faults was not detected.     

Structural,electronic,and magnetic behaviors of 5d transition metal atom substituted divacancy graphene:A first-principles study

Structural, electronic, and magnetic behaviors of 5d transition metal(TM) atom substituted divacancy(DV) graphene are investigated using first-principles calculations. Different 5d TM atoms(Hf, Ta, W, Re, Os, Ir, and Pt) are embedded in graphene, these impurity atoms replace 2 carbon atoms in the graphene sheet. It is revealed that the charge transfer occurs from 5d TM atoms to the graphene layer. Hf, Ta, and W substituted graphene structures exhibit a finite band gap at high symmetric K-point in their spin up and spin down channels with 0.783 μB, 1.65 μB, and 1.78 μB magnetic moments,respectively. Ir and Pt substituted graphene structures display indirect band gap semiconductor behavior. Interestingly, Os substituted graphene shows direct band gap semiconductor behavior having a band gap of approximately 0.4 e V in their spin up channel with 1.5 μB magnetic moment. Through density of states(DOS) analysis, we can predict that d orbitals of 5d TM atoms could be responsible for introducing ferromagnetism in the graphene layer. We believe that our obtained results provide a new route for potential applications of dilute magnetic semiconductors and half-metals in spintronic devices by employing 5d transition metal atom-doped graphene complexes.     

Dopant-modulated pair interaction in cuprate superconductors

A comparison of recent experimental STM data with single-impurity and many-impurity Bogoliubov-de Gennes calculations strongly suggests that random out-of-plane dopant atoms in cuprates modulate the pair interaction locally. This type of disorder is crucial to understanding the nanoscale electronic inhomogeneity observed in BSCCO-2212, and can reproduce observed correlations between the positions of impurity atoms and various aspects of the local density of states such as the gap magnitude and the height of the coherence peaks. Our results imply that each dopant atom modulates the pair interaction on a length scale of order one lattice constant.     

Different substitutions lead to differences in the transport and recombination properties of group V doped SiCNTs

Silicon carbide nanotubes (SiCNTs) has attractive application prospects in the field of micro-nanodevices. Based on first-principle, we find that a shallow and a deep impurity levels appearing when a group-V element replaces a C, while only one deep impurity level appears when a group-V replaces a Si. This indicates that different electronic properties will be generated when group-V replace different sites of SiCNTs. Further numerical simulation results show that when dopant replaces C, the conductivity is about an order of magnitude higher than dopant replaces Si, and the conductivity increase with increasing temperature; the non-equilibrium minority carrier lifetime decrease with increasing temperature, when group-V replace the C, they are strong n-type, when replace the Si, they are in weak n-type and strong p-type. These results will help reveal the doping mechanism of SiC nanomaterials and the selection of dopants, and provide a theoretical basis for the preparation of micro-nanodevices.     

Electronic structures,magnetic properties and band alignments of 3d transition metal atoms doped monolayer MoS2

Utilizing first-principles calculations, the electronic structures, magnetic properties and band alignments of monolayer MoS₂ doped by 3d transition metal atoms have been investigated. It is found that in V, Cr, Mn, Fe-doped monolayers, the nearest neighboring S atoms (S_NN) are antiferromagnetically polarized with the doped atoms. While in Co, Ni, Cu, Zn-doped systems, the S_NN are ferromagnetically coupled with the doped atoms. Moreover, the nearest neighboring Mo atoms also demonstrate spin polarization. Compared with pristine monolayer MoS₂, little change is found for the band edges' positions in the doped systems. The Fermi level is located in the spin-polarized impurity bands, implying a half-metallic state. These results provide fundamental insights for doped monolayer MoS₂ applying in spintronic, optoelectronic and electronic devices.