Influence of LiBr on photoluminescence properties of porous silicon

A new method has been developed to improve the photoluminescence intensity of porous silicon (PS), which is first time that LiBr is used for passivation of PS. Immersion of the PS in a LiBr solution, followed by a thermal treatment at 100 °C for 30 min under nitrogen, leads to a nine fold increase in the intensity of the photoluminescence. The atomic force microscope (AFM) shows an increase of the nanoparticle dimension compared to the initial dimension of the PS nanostructure. The LiBr covers the nanoparticles of silicon without changing the wavelength distribution of the optical excitation and emission spectra. Moreover, a significant decrease of reflectivity was observed for the wavelength in the range of 350-500 nm.     

Effects of thermal oxidation on the photoluminescence properties of porous silicon

The effects of thermal oxidation on the photoluminescence (PL) properties of powdered porous silicon (PSi) are studied using X-ray photoelectron spectroscopy (XPS). It is found that the PL intensity is steeply quenched after annealing at and recovered at above . The XPS intensity of oxides formed on the PSi surface is also found to strongly depend on the annealing temperature. The comparison between the annealing temperature dependence of PL intensity and that of the oxide XPS intensity suggests that the formation of thin disordered SiO₂ layer accompanies the quenching of the PL intensity, and that the formation of thick high-quality SiO₂ layer results in the PL intensity recovery. These results indicate that the thickness and quality of SiO₂ layer play a crucial role in the PL properties of thermally oxidized PSi.     

Ellipsometric characterization of nanocrystals in porous silicon

Porous silicon layers (PSLs) were prepared by electrochemical etching of p-type single-crystalline silicon (c-Si) wafers having different dopant concentrations to obtain systematically changing sizes of nanocrystals (walls). The microstructure of the porous material was characterized using spectroscopic ellipsometry with multi-layer effective medium approximation (EMA) models. The dielectric function of PSL is conventionally calculated using EMA mixtures of c-Si and voids. The porosity is described by the concentration of voids. Some PSL structures can be described only by adding fine-grained polycrystalline silicon (nc-Si) reference material to the EMA model. Modified model dielectric functions (MDF) of c-Si have been shown to fit composite materials containing nanocrystalline regions, either by fitting only the broadening parameter or also other parameters of the parametric oscillator in MDF. The broadening parameter correlates with the long-range order in the crystalline material, and, as a consequence, with the size of nanocrystals. EMA and MDF models were used to describe systematically changing nanostructure of PSLs. Volume fraction of nc-Si in EMA and broadening parameter in MDF provide information on the nanocrystal size. The longer-term goal of this work is to provide a method for the quantitative characterization of nanocrystal size using quick, sensitive and non-destructive optical techniques.     

Peculiarities of photoluminescence of porous silicon with luminescent liquid crystal fillers

Photoluminescence spectra of porous silicon filled by luminescent liquid crystals 5CB and H109 were investigated. It was observed that there were photoluminescence bands corresponding to both porous silicon and liquid crystal in experimental spectra. In addition, the band corresponding to porous silicon increases in comparison with photoluminescence of porous silicon without the filler. Experimental results are explained by the radiating and nonradiating energy transfer from liquid crystal to porous silicon.     

Tunable photoluminescence of porous silicon by liquid crystal infiltration

The photoluminescence (PL) of porous silicon films has been investigated as a function of the amount of liquid crystal molecules that are infiltrated into the constricted geometry of the porous silicon films. A typical nematic liquid crystal 4-pentyl-4′-cyanobiphenyl was employed in our experiment as the filler to modify the PL of porous silicon. It is found that the originally red PL of porous silicon films can be tuned to blue by simply adjusting the amount of liquid crystal molecules in the microchannels of the porous films. The chromaticity coordinates are calculated for the recorded PL spectra. The mechanism of the tunable PL is discussed. Our results have demonstrated that the luminescent properties of porous silicon films can be efficiently tuned by liquid crystal infiltration.     

Influence of the humidity conditions on the reflectivity spectrum of a porous silicon microcavity

We have designed and fabricated a porous silicon (PS) microcavity that shows a reflectivity resonance around 3 μm in between two spectral regions with high reflectivity values. The microcavity has been simulated following the photonic crystals formalism, which results in good agreement with the measured spectrum. The reflectivity spectrum of the microcavity has been analyzed under different humidity conditions. We demonstrate that the reflectivity resonance shifts to higher wavelengths and that the reflectivity decreases when the humidity increases. In addition, the reflectivity spectrum of the as-prepared device is recovered when the humidity returns to the initial laboratory conditions. Finally, the effect on the reflectivity spectrum of a condensed water layer at the surface of the microcavity is also analyzed.     

Study of photoconductivity and photoluminescence of organic/porous silicon complexes

In this paper, time-varying photoconductivity (PC) and the photoluminescence (PL) of different complexes were studied. Due to thick polymer layer hindering light penetrating into porous silicon (PS) layer, intrinsic PS luminescence in polymer/PS system disappeared. The physical origin of PL may be related to the recombination mechanisms involving surface defect states such as silicon oxide, siloxene. Due to carrier transfer controlled by different energy barrier, different devices prepared from different doped Si wafer showed opposite current-voltage characteristic.     

Influence of alkali metallization (Li, Na and K) on photoluminescence properties of porous silicon

We present results for alkali metallization effects on photoluminescence (PL) properties of porous silicon (PS). The metallization of PS was realized by immersion plating in solutions containing 3 mM LiNO₃, KNO₃ and NaNO₃ metal salts. The surface bond configuration of PS was monitored by Fourier transmission infrared spectroscopy (FTIR) and it was found that the PS surface was oxidized after metallization. Surface properties of PS were investigated by field emission scanning electron microscopy (FE-SEM) and it was found that the PS surface was covered by alkali metals for short immersion times. The PL intensity increased for critical immersion times and PL spectrum shifted to high energy region with the metallization. The experimental results suggest a possibility that the metallization provides a relatively easy way to achieve an increase in the PL intensity and oxidation of the PS surface.     

Depth dependence of photoluminescence and chemical bonding in porous silicon

Porous silicon (PS) is studied by stepwise peeling of the surface layer to clarify the non-uniformity in the photoluminescence (PL) and correlate it with the in-depth chemical bonding and structure of the 30 μm thick layer. The PL intensity grows by an order of magnitude after the peeling off of the first 10 μm and decreases five times in the next 5 μm while the peak maximum position shifts from 730 to 800 nm. X-ray photoelectron spectroscopy (XPS) measurements show that Si–Si and Si–O bonds are present both on the surface and below, and the preferential oxidation state of silicon changes from 3+ and 4+ on the surface to 1+ and 2+ below 10 μm. Using Raman spectroscopy silicon nanocrystals are shown to exist. Their mean size can be estimated at about 3 nm. These results show that the strongest PL comes from a region in the PS layer where silicon nanocrystallites are surrounded by oxides with a low level of oxidation and not from the strongly oxidized surface layer.     

Effect of rapid thermal treatment on photoluminescence of surface passivated porous silicon

The photoluminescence of porous silicon with and without carbon deposition fabricated by plasma-enhanced chemical vapor deposition technique has been investigated. After the deposition, the rapid thermal processes in the temperature ranging from 500 to 1100 °C have been carried out. It was found that after the carbon deposition a new intense blue emission appeared. The rapid thermal processes at 800and 900 °C could enhance the blue emission, while the other rapid thermal processes quenched it. Finally, the mechanism for the effect of carbon deposition and rapid thermal processes on photoluminescence properties of porous silicon was discussed.     

Quenching influence of cell culture medium on photoluminescence and morphological structure of porous silicon

In this work, the degradation of visible photoluminescence of porous silicon (PSi) under the influential actions of cell culture medium has been mainly studied in order to comprehend the quenching mechanisms necessitating the cell growth on spongy-like-silicon structures, which could form either micro- and/or nano-dimensional morphologies after stain-etching of the poly- or single-crystalline Si surfaces. Quenching effect of the neuron culture medium on visibly luminescent and non-luminescent porous silicon is found to be quite obvious so that this step of the culture process, especially, over nanostructured silicon is extremely essential for a variety of bionanotechnological applications.     

Morphological changes in porous silicon nanostructures: non-conventional photoluminescence shifts and correlation with optical absorption

In this paper, we show that the photoluminescence (PL) shifts of p-type porous silicon (PS) are mainly attributed to some morphological changes related to anodisation conditions. We discuss how differences in the stirring and nature of the electrolytic solution can lead to morphological changes of the PS layers. It has been found that when PS is formed in pure aqueous HF solution, it can exhibit a non-conventional and reproducible “porosity – PL peak relationship”. By correlating the PL spectral behaviour and PS morphology throughout a quantum-confinement model, we explain both conventional and non-conventional PL shifts. Correlation of PL and optical absorption (OA) shows that the PL peak energy and the optical absorption edge of PS exhibit the same trend with size effect. The spectral behaviour of OA with regard to that of PL is well analysed within the quantum-confinement model throughout the sizes and shapes of the nanocrystallites forming PS. The value of the effective band gap energy determined from the calculated lowest PL energy almost corresponds to that estimated from the optical absorption coefficient. These results suggest that the lowest radiative transition between the valence band and the conduction band corresponds to the largest luminescent wires, and that the radiative recombination process leading to the PL emission occurs in the c-Si crystallite core.     

The role of surface oxidation on luminescence degradation of porous silicon

This study reports a comparative analysis on time dependent degradation of photoluminescence (PL) spectra of porous silicon (PS) during dark-aging (DA) and photo-aging (PA). Fourier Transform Infrared (FTIR) spectroscopy studies have been performed to get an insight on possible chemical changes in the PS surface. It has been found that SiH_x bonds decrease progressively while SiO_x bonds increase. FTIR and PL measurements revealed presence of blue shifts in the PL spectra during the aging stages (PA and DA). While the PL intensity of dark aged PS shows a decrease during the first 3 weeks and an increase afterwards, the PL intensity decreases continuously for photo-aged PS. The change in the PL spectra has been investigated by overlapping of two different PL bands which are reflective of oxidation of PS surface and size of Si naonocrystallites. A possible bond configuration model about the oxidation of PS surface has also been proposed. The results are interpreted in terms of quantum size effects in PS and the influence of the surface composition.     

Characterization of porous silicon prepared by powder technology

In this study, we have proposed the powder technology as new method for preparation of bulk porous silicon. Formation of porous silicon by high-energy ball milling followed by pressing and sintering was studied by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy (XPS). A crystalline wafer with (1 1 1) orientation was extensively ball milled up to 72 h leading to a decrease in average crystallite size up to 15 nm. The most significant reduction of crystallite size was observed after milling process for about 24 h. The nanopowders were then pressed into pellets at a pressure up to 400 MPa and sintered at 1173 K for 60 min in a high purity argon atmosphere. Results showed that after sintering the material became porous with uniform porosity in whole volume, independently of the sinter size. It is not possible to prepare such porous materials using the conventional electrochemical etching, where the porous structure depth usually does not exceed tens of micrometers. Core-level XPS studies showed very good agreement between peak positions of the sintered porous silicon and in-situ prepared polycrystalline 20 nm-Si thin film or single-crystalline Si (1 1 1) wafer. Furthermore, the valence band spectra measured for sintered samples are broader compared to those measured for the Si (1 1 1) wafer or polycrystalline Si thin film. On the other hand, the shape and broadening of the valence bands measured for the sintered samples are in very good agreement with those reported for electrochemically prepared porous silicon.     

Controlling surface states and photoluminescence of porous silicon by low-energy-ion irradiation

Porous silicon (PS) was irradiated by three kinds of low-energy ions with different chemical activity, namely argon ions, nitrogen ions and oxygen ions. The chemical activity of ions has significant effect on the surface states and photoluminescence (PL) properties of PS, The photoluminescence quenching after argon ions and nitrogen ions irradiation is ascribed to the broken Si-Si bonds, while the PL recovery is attributed to the oxidation of Si-H back bonds. Oxygen ions irradiation leads to the formation of a SiO_x layer with oxygen defects and PS shows different PL evolution than PS irradiated by argon ions and nitrogen ions.     

Tunability of the photoluminescence in porous silicon due to different polymer dielectric environments

In this report we demonstrate control over porous silicon (PSi) emission properties by changing the dielectric environment surrounding the silicon crystallites, as well as provide information on the effects of pore infiltration of PSi. This is achieved by making PSi–polymer nanocomposites by diffusing or polymerizing a range of varying dielectric constant polymers into the pores. The degree of modification in photoluminescence (PL) depends on the dielectric constant of the polymers. By increasing the dielectric constant of the environment surrounding the crystallites, a blue shift in PL as high as 222 meV has been observed. The blue shift is attributed to the high dielectric constant of the polymers relative to PSi, which causes a partial screening of the excitons allowing the excitonic levels to shift closer to the bandgap. The shift in excitonic levels increases when the dielectric constant of the polymer increases. PSi–polymer nanocomposites also exhibit an increase in PL intensity, which suggest that the inert infiltrated polymers are able to passivate existing nonradiative channels.     

Preparation of silica nanowires using porous silicon as Si source

This very paper is focusing on the preparation of silica nano-wires via annealing porous silicon wafer at 1200 °C in H₂ atmosphere and without the assistant metal catalysts. X-ray diffraction, X-ray energy dispersion spectroscopy, scanning electron microscopy, high-resolution transmission electron microscopy and selected area diffraction technology have been employed for characterizing the structures, the morphology and the chemical components of the nano-wires prepared, respectively. It is found that the diameter and the length of the nano-wires were about 100 nm and tens micron, respectively. Meanwhile, it is also necessary to be pointed out that silica NWs only formed in the cracks of porous wafers, where the stress induced both by the electro-chemical etching procedure for the porous silicon preparation and nanowires growth procedure is believed to be lower than that at the center of the island. Therefore, a stress-driven mechanism for the NWs growth model is proposed to explain these findings.     

Annealing and amorphous silicon passivation of porous silicon with blue light emission

The photoluminescence (PL) of the annealed and amorphous silicon passivated porous silicon with blue emission has been investigated. The N-type and P-type porous silicon fabricated by electrochemical etching was annealed in the temperature range of 700-900 °C, and was coated with amorphous silicon formed in a plasma-enhanced chemical vapor deposition (PECVD) process. After annealing, the variation of PL intensity of N-type porous silicon was different from that of P-type porous silicon, depending on their structure. It was also found that during annealing at 900 °C, the coated amorphous silicon crystallized into polycrystalline silicon, which passivated the irradiative centers on the surface of porous silicon so as to increase the intensity of the blue emission.     

Er Doping conditions of planar porous silicon waveguides

EDX and infrared photoluminescence (IR PL) analyses performed on erbium-doped porous silicon waveguides (PSWG) were studied using different doping conditions. Both parameters of the cathodisation electrochemical method used for Er incorporation and parameters of thermal treatments required for Er optical activation were taken into consideration. Firstly, by varying the current density and the time of cathodisation, we have shown that a current density of 0.1 mA/cm² for 10 min allows homogeneous Er doping to be achieved throughout the depth of the guiding layer. Then, the PL intensity at 1.53 μm was studied as a function of the oxidation time at 900 °C and Er diffusion temperature for 60 min. Increasing the oxidation time up to 1 h allows PL to be enhanced due to active Si-O-Er complex formation whereas an oxidation time of 2 h induces a decrease in PL because of Er segregation. Moreover, an increase in the diffusion temperature induces an optimal distribution of optically active Si-Er-O complexes inside the crystallites. When the temperature is too high, a PSWG densification and Er segregation occurs inducing a decrease in PL due to energy transfer phenomena.     

Optimization of porous silicon preparation technology for SERS applications

A series of porous silicon samples prepared at different etching parameters, namely etchant composition, etching time and current density, was investigated as substrates for surface-enhanced Raman scattering (SERS). Silver nanostructures were deposited on porous silicon by immersion plating method and Rhodamine 6G was used as analyte. The relation between the etching parameters, morphology of porous silicon surface and its SERS efficiency after silver deposition is examined. We show that a high HF content in the etchant allows the formation of a film with close-packed silver nanocrystals, which possess strong surface enhancement properties.