Influence of composition on electrical and optical properties of new chalcogenide thin films from Ge-Se-Tl system

Bulk Ge₂₀Se_80−xTl_x (x ranging from 0 to 15 at%) chalcogenide glasses were prepared by conventional melt quenching technique. Thin films of these compositions were prepared by thermal evaporation, on glass and Si wafer substrates at a base pressure of 10⁻⁶ Torr. X-ray diffraction studies were performed to investigate the structure of the thin films. The absence of any sharp peaks in the X-ray diffractogram confirms that the films are amorphous in nature. The optical constants (absorption coefficient, optical band gap, extinction coefficient and refractive index) of Ge₂₀Se_80−xTl_x thin films are determined by absorption and reflectance measurements in a wavelength range of 400-900 nm. In order to determine the optical gap, the absorption spectra of films with different Tl contents were analyzed. The absorption data revealed the existence of allowed indirect transitions. The optical band gap showed a sharp decrease from 2.06 to 1.79 eV as the Tl content increased from 0% to 15%. It has been found that the values of absorption coefficient and refractive index increase while the extinction coefficient decreases with increase in Tl content in the Ge-Se system. These results are interpreted in terms of the change in concentration of localized states due to the shift in Fermi level. DC electrical conductivity of Ge₂₀Se_80−xTl_x thin films was carried out in a temperature range 293-393 K. The electrical activation energy of these films was determined by investigating the temperature dependence of dc conductivity. A decrease in the electrical activation energy from 0.91 to 0.55 eV was observed as the Tl content was increased up to 15 at% in Ge₂₀Se_80−xTl_x system. On the basis of pre-exponential factor, it is suggested that the conduction is due to thermally assisted tunneling of the carriers in the localized states near the band edges.     

Characterization of pulsed laser deposited chalcogenide thin layers

In this work we report on pulsed laser deposition (PLD) of chalcogenide thin films from the systems (AsSe)_100−xAgI_x and (AsSe)_100−xAg_x for sensing applications. A KrF* excimer laser (λ = 248 nm; τ_FWHM = 25 ns) was used to ablate the targets that had been prepared from the synthesised chalcogenide materials. The films were deposited in either vacuum (4 × 10⁻⁴ Pa) or argon (5 Pa) on silicon and glass substrates kept at room temperature. The basic properties of the films, including their morphology, topography, structure, and composition were characterised by complementary techniques. Investigations by X-ray diffraction (XRD) confirmed the amorphous nature of the films, as no strong diffraction reflections were found. The film composition was studied by energy dispersive X-ray (EDX) spectroscopy. The morphology of the films investigated by scanning electron microscopy (SEM), revealed a particulate-covered homogeneous surface, typical of PLD. Topographical analyses by atomic force microscopy (AFM) showed that the particulate size was slightly larger in Ar than in vacuum. The uniform surface areas were rather smooth, with root mean square (rms) roughness increasing up to several nanometers with the AgI or Ag doping. Based upon the results from the comprehensive investigation of the basic properties of the chalcogenide films prepared by PLD and their dependence on the process parameters, samples with appropriate sorption properties can be selected for possible applications in cantilever gas sensors.     

Composition and electric field effects on the transport properties of Bi doped chalcogenide glasses thin films

The temperature dependence of the DC electrical conductivity σ_DC was measured in the temperature range from 300–500 K. It was found that there are double activation energies, E_σ, for Ge₂₀Se_80−xBi_x (x=0, 2.5 and 5 at%) films, while there is single activation energy for Ge₂₀Se_72.5Bi_7.5. when incorporation of Bi=7.5 at%, the pre-exponential value σ₀ decreases by about six order of magnitude, the activation energy in the extended states E_σ decreases from 0.96 to 0.09 eV. Also the effect of applied electric field was studied and observed that, activation energy in high temperature region increases with increasing electric field; this behavior can be understood assuming that the contribution to the conductivity activation process is due to conduction in the extended states and also due to hopping in the localized states. With the increasing electric field, as former process, which is having high activation energy, becomes more predominant due to the dumping of the carriers in the extended states, the effective activation energy of the system increases, in spite of the fact that the activation energy of the extended states conduction may remain constant. Finally, the electrical data suggests that the addition of bismuth produces localized states near the conduction band edge so that the electrical transport is due to hopping of electrons after being excited into localized states at the conduction band edge.     

Photoinduced changes in optical properties of Ga-Sb-Ge-Se glasses

The kinetics of photoinduced effects on Ga₅Sb₁₀Ge₂₅Se₆₀ thin film exposed to continuous wave laser radiations are studied as a function of exposure time and laser intensity. The transmission and reflection spectra of thin films before and after exposure are investigated. The optical band gap and the refractive index are derived from the above spectra. Generalized Miller's rule and linear refractive index are used to find the nonlinear susceptibility and nonlinear refractive index of the thin films. The studies show a red shift in the band gap with increase in exposure time and laser power which is attributed to the photoinduced darkening in the films.     

Oxidation-induced changes in the electro-optical properties of thin copper films

Summary The room temperature oxidation of vapour deposited copper films has been investigated as a function of film thickness and time by the sheet resistance and optical transmittance measurements. An increase of both sheet resistance and transmittance with a tendency to saturation has been observed. Time variation of the sheet resistance shows that the kinetics of oxidation could be described by a model whereby an initial logarithmic oxide growth changes to an inverse logarithmic one as time progresses; the thicker the film, the longer the change-over time. Absorption coefficients of oxidized films show that the resulting oxide is most probably Cu₂O. Evaluation of the oxidized films for possible use as transparent electrode material shows the existence of an optimum thickness value.

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Riassunto Si è studiata l’ossidazione a temperatura ambiente di pellicole di rame depositate per vaporizzazione in funzione dello spessore della pellicola e del tempo mediante la resistenza del foglio e misurazioni di trasmittenza ottica. Si è osservato un aumento sia della resistenza del foglio, sia della trasmittenza con una tendenza alla saturazione. La variazione temporale della resistenza del foglio mostra che la cinetica di ossidazione potrebbe essere descritta da un modello con cui un’iniziale crescita logaritmica dell’ossido cambia in una logaritmica inversa al crescere del tempo; più spessa è la pellicola più lungo è il tempo del cambiamento. I coefficienti di assorbimento delle pellicole ossidate mostrano che l’ossido risultante è molto probabilmente il Cu₂O. La valutazione delle pellicole ossidate per un possibile uso come materiale di elettrodo trasparente mostra l’esistenza di un valore ottimo dello spessore.

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Резюме Исследуется окисление при комнатной температуре пленок меди в зависимости от толщины пленки и времени, используя измерения сопротивления слоя и оптической прозрачности. Наблюдается увеличение сопротивления слоя и прозрачности с тенденцией к насыщению. Временное изменение сопротивления слоя показывает, что кинетика окисления может быть описана с помощью модели, согласно которой начальный логарифмический рост окисла изменяется на обратно логарифмический, когда время увеличивается; для более толстой пленки изменение происходит при больщих временах. Коэффициенты поглощения окисленных пленок показывают, что результирующий окисел представляет Cu₂O. Оценка возможности использования окисленных пленок в качестве прозрачного материала электродов указывает на существование оптимальной толщины пленки.

     

金属银极薄薄膜的光学特性

本文根据可见光区域测量的不同厚度,不同稳定情况下Ag膜透过率光谱响应曲线,结合岛状金属膜有效介质理论,讨论了Ag膜中类自由电子和束缚电子引起的等效洛伦兹振子和带间跃迁随厚度和稳定时间的变化规律。理论计算的透过率曲线与实验符合得很好。比较理论与实验,得到了不同厚度下、不同稳定情况Ag膜的光学常数。     

Microwave magnetic properties of soft magnetic thin films

We review our works that focus on the microwave magnetic properties of metallic,ferrite and granular thin films.Soft magnetic material with large permeability and low energy loss in the GHz range is a challenge for the inforcom technologies.GHz magnetic properties of the soft magnetic thin films with in-plane anisotropy were investigated.It is found that several hundreds of permeability at the GHz frequency was achieved for Co100-xZrx and Co90Nb10 metallic thin films because of their high saturation magneti...     

Structural characterization and magnetoresistance of manganates thin films and Fe-doped manganates thin films

Perovskites thin films with the composition La_0.6Ca_0.4MnO₃ doped with 20% Fe, were prepared by pulsed reactive crossed beam laser ablation, where a synchronized reaction gas pulse interacts with the ablation plume. The films were grown on various substrates and the highest colossal magnetoresistance ratio (CMR) was detected by Hall measurements for films grown on LaAlO₃ (1 0 0), which was selected as substrate for further investigations.Several growth parameters, such as substrate temperature and target to substrate distance were varied to analyze their influence on the film properties.The structure of the deposited thin films was characterized by X-ray diffraction and atomic force microscope, while Rutherford backscattering (RBS) was used to determine the film stoichiometry. The electrical properties were determined by Hall effect measurements in a magnetic field of 0.51 T.These measurements reveal that the amplitude of the CMR ratio depends strongly on the substrate and that the oxygen content influences the temperature where the transition from semiconductor to metal is observed.     

The optical properties of thin erbium films

The effective dielectric constant, ε′₂, of very thin films of erbium on sodium chloride substrates was determined from measurements of normal incidence reflectance and transmittance in the visible spectrum. ε′₂ showed a maximum which moved to longer wavelengths as the film thickness increased. Electron microscopy revealed that the film islands grew flatter and more irregular with thickness. The shape factor of the islands, F, was calculated by a modified Maxwell-Garnett method and became smaller as the film thickness increased.     

Crystalline properties and colour centres in alkali halide thin films

Abstract

Thin films of KCl, KBr, RbCl have been obtained by thermal evaporation on amorphous substrates with different deposition parameters. The crystalline structure and orientation have been determined, and the films resulted to be policrystals with high uniformity of orientation. Production of colour centres, achieved by irradiation with low-energy electrons, leads to F center concentrations barely observed in large crystals. The colouration kinetics is similar to that in the bulk, and shows after a maximum an exponential decay at high doses because of centre aggregation coupled to thermal effects. The films exhibit a bleaching process of the colour centres at room temperature, whose kinetics depends on the irradiation damage.     

Chemical synthesis of p-type nanocrystalline copper selenide thin films for heterojunction solar cells

Nanocrystalline thin films of copper selenide have been grown on glass and tin doped-indium oxide substrates using chemical method. At ambient temperature, golden films have been synthesized and annealed at 200 °C for 1 h and were examined for their structural, surface morphological and optical properties by means of X-ray diffraction (XRD), scanning electron microscopy and UV-vis spectrophotometry techniques, respectively. Cu_2−xSe phase was confirmed by XRD pattern and spherical grains of 30 ± 4 - 40 ± 4 nm in size aggregated over about 130 ± 10 nm islands were seen by SEM images. Effect of annealing on crystallinity improvement, band edge shift and photoelectrochemical performance (under 80 mW/cm² light intensity and in lithium iodide electrolyte) has been studied and reported. Observed p-type electrical conductivity in copper selenide thin films make it a suitable candidate for heterojunction solar cells.     

Structural and optoelectronic properties of amorphous GaN thin films

Amorphous gallium nitride (a-GaN) thin films were deposited on glass substrate by electron beam evaporation technique at room temperature and high vacuum using N ₂ as carrier gas. The structural properties of the films was studied by X-ray diffraction (XRD) and scanning electron microscope (SEM). It was clear from XRD spectra and SEM study that the GaN thin films were amorphous. The absorbance, transmittance and reflectance spectra of these films were measured in the wavelength range of 300–2200 nm. The absorption coefficient spectral analysis in the sharp absorption region revealed a direct band gap of E _g = 3:1 eV. The data analysis allowed the determination of the dispersive optical parameters by calculating the refractive index. The oscillator energy E ₀ and the dispersion energy E _d, which is a measure of the average strength of inter-band optical transition or the oscillator strength, were determined. Electrical conductivity of a-GaN was measured in a different range of temperatures. Then, activation energy of a-GaN thin films was calculated which equalled E _a = 0:434 eV.     

介质薄膜不同方向折射率的计算

本文应用介电椭球理论,推导出计算介质薄膜不同方向折射率的新公式.     

Synthesis and thermoelectric properties of Bi-doped SnSe thin films

Bi doped n-type SnSe thin films were prepared by chemical vapor deposition (CVD) and their structure and thermoelectric properties were studied. The x-ray diffraction patterns, x-ray photoelectron spectroscopy, and microscopic images show that the prepared SnSe thin films were composed of pure SnSe crystals. The Seebeck coefficients of the Bi-doped SnSe were greatly improved compared to that of undoped SnSe thin films. Specifically, Sn_0.99Bi_0.01Se thin film exhibited a Seebeck coefficient of -905.8μV·K^-1 at 600 K, much higher than 285.5 μV·K^-1 of undoped SnSe thin film. Further first-principles calculations reveal that the enhancement of the thermoelectric properties can be explained mainly by the Fermi level lifting and the carrier pockets increasing near the Fermi level due to Bi doping in the SnSe samples. Our results suggest the potentials of the Bi-doped SnSe thin films in thermoelectric applications.     

Ge-Sb-Se硫系薄膜制备及光学特性研究

介绍了几种常见的硫系薄膜制备方法, 根据现有实验条件采用热蒸发法和磁控溅射法制备出Ge-Sb-Se三元体系硫系薄膜, 通过台阶仪测试薄膜的厚度和表面粗糙度, 计算出两种制备方法的成膜速率, 并通过X射线光电子能谱测试了两种制备方法所得薄膜与块体靶材组分的差别. 利用Z扫描技术和分光光度计测试了热蒸发法制备所得薄膜的三阶非线性性能和透过光谱, 计算出非线性折射率、非线性吸收系数和薄膜厚度等参数. 结果表明热蒸发法制备Ge-Sb-Se薄膜具有良好的物理结构和光学特性, 在集成光学器件方面很高的应用潜力.     

Magnetizations and magneto-transport properties of Ni-doped PrFe03 thin films

The present study reports the magnetizations and magneto-transport properties of PrFel_xNixO3 thin films grown by pulsed laser ablation technique on LaA103 snbstrates. From DC M/H plots of these films, weak ferromagnetism or ferrimagnetism behaviors are observed. With Ni substitution, reduction in saturation magnetization is also seen. With Ni doping, variations in saturation field （Hs）, coercive field （Hc）, Weiss temperature （0）, and effective magnetic moment （Pelf） are seen. A small change of magnetoresitance with application of higher field is observed. Various essential parameters like density of state （Nf） at Fermi level, Mott＇s characteristic temperature （To）, and activation energy （Ea） in the presence of and in the absence of magnetic field are calculated. The present observed magnetic properties are related to the change of Fe-O bond length （causing an overlap between the oxygen p orbital and iron d orbital） and the deviation of the Fe-O-Fe angle from 180~. Reduction of magnetic domain after Ni doping is also explored to explain the present observed magnetic behavior of the system. The influence of doping on various transport properties in these thin films indicates a distortion in the lattice structure and single particle band width, owing to stress-induced reduction in unit cell volume.     

Magnetizations and magneto-transport properties of Ni-doped PrFeO_3 thin films

The present study reports the magnetizations and magneto-transport properties of PrFe1-xNixO3 thin films grown by pulsed laser ablation technique on LaAlO3substrates. From DC M/H plots of these films, weak ferromagnetism or ferrimagnetism behaviors are observed. With Ni substitution, reduction in saturation magnetization is also seen. With Ni doping, variations in saturation field(Hs), coercive field(Hc), Weiss temperature(θ), and effective magnetic moment(peff)are seen. A small change of magnetoresitance with application of higher field is observed. Various essential parameters like density of state(Nf) at Fermi level, Mott's characteristic temperature(T0), and activation energy(Ea) in the presence of and in the absence of magnetic field are calculated. The present observed magnetic properties are related to the change of Fe–O bond length(causing an overlap between the oxygen p orbital and iron d orbital) and the deviation of the Fe–O–Fe angle from 180?. Reduction of magnetic domain after Ni doping is also explored to explain the present observed magnetic behavior of the system. The influence of doping on various transport properties in these thin films indicates a distortion in the lattice structure and single particle band width, owing to stress-induced reduction in unit cell volume.     

纳米晶氧化锡薄膜的接触特性

在 Ar和 O2 气体中 ,基片温度在 15 0～ 40 0℃的条件下 ,用直流磁控溅射的方法可以制备纳米晶透明导电薄膜。实验利用 TL M模型测试了纳米晶 Sn O2 透明导电薄膜的方块电阻、单位面积薄膜的接触电阻和电极与薄膜的结合力随热处理温度的变化情况