The catalytic reduction of NO by H2 on Ru(0 0 0 1): Observation of NHads species

Adsorption of NO and the reaction between NO and H₂ were investigated on the Ru(0 0 0 1) surface by X-ray photoelectron spectroscopy (XPS). Surface composition was measured after NO adsorption and after the selective catalytic reduction of nitric oxide with hydrogen in steady-state conditions at 320 K and 390 K in a 30:1 mixture of H₂ and NO (total pressure = 10⁻⁴ mbar). After steady-state NO reduction, molecularly adsorbed NO in both the linear on-top and threefold coordinations, NH_ads and N_ads species were identified by XPS. The coverage of the NH_ads and N_ads species was higher after the reaction at 390 K than the corresponding values at 320 K. Strong destabilisation of N_ads by O_ads was detected. A possible reaction mechanism is discussed.     

Morphological change of D2O layers on Ru(0 0 0 1) probed with He atom scattering

The morphological change of D₂O layers on a Ru(0 0 0 1) surface has been investigated on the basis of He atom scattering. With the increase of D₂O exposure on Ru(0 0 0 1) at 111 K, the intensity of a specularly reflected He beam continuously decreases up to the exposure of 1.0 L (Langmuir). At the D₂O coverage of 1.0 adsorbed layer (∼1.5 L), which is characterized by temperature-programmed desorption measurements, the formation of the (√3 × √3)R30° superstructure as a result of the diffusion of D₂O on the surface was confirmed by He atom diffraction. With the further increase of D₂O exposure, at 2-3 adsorbed layers, the disordered structure was found to be on the surface at 111 K. The morphological change of the disordered layers was observed during annealing, and discussed in detail.     

CO adsorption on epitaxially grown Pt layers on Ru(0 0 0 1)

The adsorption of CO on epitaxially grown Pt films of variable thickness has been studied using infrared-absorption spectroscopy, scanning tunnelling microscopy and thermal desorption spectroscopy. Depending on the number of pseudomorphic Pt layers (N_Pt = 1-4) the internal and external CO stretching modes (ν_C-O and ν_Pt-CO, respectively) display characteristic frequency shifts due to the vanishing influence of the underlying Ru(0 0 0 1) substrate and Pt/Ru interface. For thicker layers (N_Pt ? 5) when this influence has become negligible, the compressive stress within the Pt film is gradually relieved, leading to a dislocation network. The structural heterogeneity during the ongoing relaxation process of the Pt film is reflected in the ν_C-O line shape; no line broadening is observed for either pseudomorphic or very thick films (N_Pt ? 15). For N_Pt ? 3 the adsorption of CO on Pt/Ru(0 0 0 1) films closely resembles CO on Pt(1 1 1), with residual deviations in line position and desorption temperatures gradually converging to zero.     

A comparative study of clean and Bi-stabilized InP(1 0 0)(2 × 4) surfaces by the core-level photoelectron spectroscopy

The bismuth-stabilized (2 × 4)-reconstructed InP(1 0 0) surface [Bi/InP(1 0 0)(2 × 4)] has been studied by synchrotron-radiation core-level photoelectron spectroscopy. The spectra are compared with previous core-level data obtained on a clean InP(1 0 0)(2 × 4) surface. The findings support that the P 2p surface-core-level shift (SCLS) of the clean InP(1 0 0)(2 × 4), which has higher kinetic energy than the bulk emission, arises from the third-layer P atoms and that the second P 2p SCLS, which has lower kinetic energy than the bulk, arises from the top-layer P atoms. Similar In 4d SCLSs are found on the clean and Bi-stabilized InP(1 0 0)(2 × 4) surfaces, indicating that these shifts contain contributions of the In atoms that lie in the second and/or fourth layers. In addition to this, the results improve our understanding of the atomic structure of the Bi/InP(1 0 0)(2 × 4) surface and lead to refined surface models which include Bi-Bi and Bi-P dimers.     

Thermal decomposition mechanisms of tungsten nitride CVD precursors on Cu(1 1 1)

Chemisorption and thermal decomposition of metallorganic chemical vapor deposition precursors, (t-BuN)₂W(NHBu-t)₂, bis(tert-butylimido)bis(tert-butylamido)tungsten (BTBTT) and (t-BuN)₂W(NEt₂)₂, bis(tert-butylimido)bis(diethylamido)tungsten (BTBDT), on Cu(1 1 1) have been investigated by means of thermal desorption spectroscopy (TDS) and synchrotron-based X-ray photoelectron spectroscopy (SR-XPS) under ultrahigh vacuum conditions. The precursors remain intact upon chemisorption on Cu(1 1 1) at 100 K, and at 300 K both precursors decompose readily via the characteristic hydride abstraction/elimination pathways to produce two stable surface intermediates for each precursor. For BTBTT, one species is W(=NBu-t)₃ and the other is proposed to be a bridged amido complex, [(t-BuN)₂W(μ-NBu-t)]₂. In comparison, a W-imine complex and a W-N-C metallacycle are two intermediates produced from BTBDT. Annealing toward 800 K further decomposes the intermediates and the detectable desorption species are completely derived from the ligands. The desorption products from BTBTT include t-butylamine generated from α-H abstraction, isobutylene from γ-H elimination, acetonitrile from β-methyl elimination, and molecular hydrogen. In addition to these desorption species, BTBDT produces hydrogen cyanide and imine (EtN = CHMe) via β-H elimination, not possible with BTBTT due to the absence of β-H in the ligands. Eventually, tungsten nitrides incorporating oxygen atoms and a small amount of graphitic carbons are formed and the stoichiometry is approximated as WN_1.5O_0.1. Oxygen incorporation, driven by a large oxide formation enthalpy, is sensitively dependent on the moisture exposure in UHV environment.     

The chemistry of C2 perfluoroalkyl iodide on the Cu(1 1 1) single crystal surface

The thermal chemistry of perfluoroethyl iodide (C₂F₅I) adsorbed on Cu(1 1 1) has been investigated by temperature-programmed reaction/desorption (TPR/D), reflection-absorption infrared spectroscopy (RAIRS), and X-ray photoelectron spectroscopy (XPS). I 4d and F 1s XPS spectra show that dissociative adsorption of C₂F₅I to form the surface-bound perfluroethyl (Cu-C₂F₅) moieties occurs at very low temperature (T < 90 K), while the C-F bond cleavage in adsorbed perfluroethyl (Cu-C₂F₅) begins at ca. 300 K. XPS and TPR/D studies further reveal that the reactions of ^βCF₃^αCF_2(ad) on Cu(1 1 1) are strongly dependent on the surface coverage. At high coverages (?0.16 L exposure), the adsorbed perfluroethyl (Cu-C₂F₅) evolves, via α-F elimination, into the surface-bound tetrafluoroethylidene moieties (CuCF-CF₃) followed by a dimerization step to form octafluoro-2-butene (CF₃CFCFCF₃) at 315 K as gas product. The surface-bound (Cu-C₂F₅) decomposes preferentially, at low coverages (?0.04 L), via consecutive α-F abstraction to afford intermediate, trifluoroethylidyne (CuCCF₃), resulting in the final coupling reaction to yield hexafluoro-2-butyne (CF₃CCCF₃) at 425 K. However, at middle coverages (ca. 0.08-0.16 L exposure), the adsorbed perfluroethyl (Cu-C₂F₅) first experiences an α-F elimination and then prefers to loss the second F from β position to yield the intermediate of Cu-CF₂-CFCu (μ-η,η-perfluorovinyl), which may further evolve into hexafluorocyclobutene (CF₂CFCFCF₂) at 350 K through cyclodimerization reaction. Our results have also shown that the surface reactions to yield the products, CF₃CFCFCF₃ and CF₃CCCF₃, obey first-order kinetics, whereas the formation of CF₂CFCFCF₂ follows second-order kinetics.     

In situ XPS study of Pd(1 1 1) oxidation. Part 1: 2D oxide formation in 10 mbar O2

The oxidation of the Pd(1 1 1) surface was studied by in situ XPS during heating and cooling in 3 × 10⁻³ mbar O₂. A number of adsorbed/dissolved oxygen species were identified by in situ XPS, such as the two dimensional surface oxide (Pd₅O₄), the supersaturated O_ads layer, dissolved oxygen and the R 12.2° surface structure.Exposure of the Pd(1 1 1) single crystal to 3 × 10⁻³ mbar O₂ at 425 K led to formation of the 2D oxide phase, which was in equilibrium with a supersaturated O_ads layer. The supersaturated O_ads layer was characterized by the O 1s core level peak at 530.37 eV. The 2D oxide, Pd₅O₄, was characterized by two O 1s components at 528.92 eV and 529.52 eV and by two oxygen-induced Pd 3d_5/2 components at 335.5 eV and 336.24 eV. During heating in 3 × 10⁻³ mbar O₂ the supersaturated O_ads layer disappeared whereas the fraction of the surface covered with the 2D oxide grew. The surface was completely covered with the 2D oxide between 600 K and 655 K. Depth profiling by photon energy variation confirmed the surface nature of the 2D oxide. The 2D oxide decomposed completely above 717 K. Diffusion of oxygen in the palladium bulk occurred at these temperatures. A substantial oxygen signal assigned to the dissolved species was detected even at 923 K. The dissolved oxygen was characterised by the O 1s core level peak at 528.98 eV. The “bulk” nature of the dissolved oxygen species was verified by depth profiling.During cooling in 3 × 10⁻³ mbar O₂, the oxidised Pd²⁺ species appeared at 788 K whereas the 2D oxide decomposed at 717 K during heating. The surface oxidised states exhibited an inverse hysteresis. The oxidised palladium state observed during cooling was assigned to a new oxide phase, probably the R 12.2° structure.     

Surface chemistry of HfI4 on Si(1 0 0)-(2 × 1) studied by core level photoelectron spectroscopy

The chemistry of HfI₄ adsorbed on the Si(1 0 0)-(2 × 1) surface has been studied by core level photoelectron spectroscopy in ultra-high vacuum. Two stable surface intermediates are identified: HfI₃ and HfI₂, both of which remain upon heating to 690 K. The dissociation of HfI₄ is accompanied by the formation of SiI. In addition, HfI₄ is observed up to 300 K. Complete desorption of iodine occurs in the temperature regime 690-780 K. Deposition of HfI₄ at 870 K results in a layer consisting of metallic Hf, whereas deposition at 1120 K results in the formation of Hf silicide. The results indicate that the metallic Hf formed at 870 K is in the form of particles. Oxidation of this film by O₂ at low pressure does not result in complete Hf oxidation. This suggests that complete oxidation of Hf is a critical step when using HfI₄ as precursor in atomic layer deposition.     

Chlorinated ethenes at Cu(1 1 0): adsorption, dissociation and reactions of trans-1,2-dichloroethene

The adsorption and reactions of trans-1,2-dichloroethene on Cu(1 1 0) have been investigated using reflection absorption infrared spectroscopy, temperature programmed desorption and molecular beam adsorption reaction spectroscopy. These data reveal that the behaviour of the system is critically affected by temperature and can be described in terms of three main regimes: Regime I, which occurs over 85-165 K, represents molecular adsorption in the monolayer and the multilayer where the trans-1,2-dichloroethene adsorbs with its molecular plane oriented largely parallel to the metal surface; Regime II, extending over the temperature range 170-280 K, is dominated by desorption/dechlorination events which are first initiated at 171 K, then poisoned rapidly and re-initiated at the much higher temperature of 263 K, culminating in the creation of adsorbed acetylene and Cl atoms on the surface; Regime III, spanning the temperature range of 280-500 K, is governed by the behaviour of the C₂H₂ molecular intermediate at the surface which, if created at low temperatures, trimerises to form benzene that subsequently desorbs. However, when created at high temperature, direct desorption of C₂H₂ competes effectively with the trimerisation process.     

The dissimilar twins - a comparative, site-selective in situ study of CO adsorption and desorption on Pt(3 2 2) and Pt(3 5 5)

The adsorption and desorption of CO on stepped Pt(3 2 2) = Pt(S)-[5(1 1 1) × (1 0 0)] and Pt(3 5 5) = Pt(S)-[5(1 1 1) × (1 1 1)] were investigated using in situ high-resolution X-ray photoelectron spectroscopy at BESSY II, which allows to clearly distinguish between different step and terrace adsorption sites. For the two surfaces, with the same nominal terrace width of five atomic rows, but different step orientation, significant differences are observed. While for Pt(3 5 5) CO adsorption at steps only occurs at on-top sites, on Pt(3 2 2) both step on-top and bridge sites are occupied, albeit with a significantly lower coverage (0.07 vs. 0.13 ML at 200 K). On both surfaces terrace sites are only occupied when the step sites are almost saturated confirming the enhanced binding energy at step sites. CO adsorbed at the (1 1 1) steps on Pt(3 5 5) is more strongly bound than on the (1 0 0) steps on Pt(3 2 2), which is attributed to the different electronic and geometric structure of the steps. The relative occupation of terrace and step sites at a given coverage remains the same between 120 and 290 K on Pt(3 5 5) K, but shows major changes on Pt(3 2 2), between step on-top and bridge sites as well as terrace on-top and bridge sites. On Pt(3 5 5) a smaller CO terrace coverage is found (0.36 vs. 0.40 ML on Pt(3 2 2) at 200 K), mainly due to the lower occupation of terrace bridge sites. For Pt(3 2 2), an ordered adsorbate phase is deduced from a c(4 × 2)-like LEED pattern, which indicates adsorbate order beyond the extension of a single terrace. A model for this structure is proposed.     

Tuning the chemical functionality of a gas sensitive material: Water adsorption on SnO2(1 0 1)

Photoemission and density functional theory studies show that water adsorbs dissociatively on the SnO₂(1 0 1) surface in the presence of terminating oxygen atoms and molecularly if these surface oxygen atoms are removed. The different chemical surface responses of these two bulk terminations of SnO₂ also change the water induced band bending and consequently the conductivity of the gas sensing material.     

Characterisation of the interaction of glycine with Cu(1 0 0) and Cu(1 1 1)

Reflection-absorption infrared spectroscopy (RAIRS) has been used to characterise the interaction of standard and fully deuterated glycine with Cu(1 0 0) and Cu(1 1 1). RAIRS shows clearly that the surface interaction leads to formation of the adsorbed deprotonated glycinate (NH₂CH₂COO-) species, with some evidence for changes in orientation with coverage previously seen on Cu(1 1 0). Qualitative low energy electron diffraction observations were also conducted to characterise the long-range ordering, although effects of electron-beam-induced radiation damage limited the information obtained. Nevertheless, the results do suggest some subtle isotopic-mass-related structural variations. The results are discussed in the context of previously published scanning tunnelling microscopy and photoelectron diffraction measurements.     

In situ XPS study of Pd(1 1 1) oxidation at elevated pressure, Part 2: Palladium oxidation in the 10 mbar range

The oxidation of the Pd(1 1 1) surface was studied by in situ XPS during heating and cooling in 0.4 mbar O₂. The in situ XPS data were complemented by ex situ TPD results. A number of oxygen species and oxidation states of palladium were observed in situ and ex situ. At 430 K, the Pd(1 1 1) surface was covered by a 2D oxide and by a supersaturated O_ads layer. The supersaturated O_ads layer transforms into the Pd₅O₄ phase upon heating and disappears completely at approximately 470 K. Simultaneously, small clusters of PdO, PdO seeds, are formed. Above 655 K, the bulk PdO phase appears and this phase decomposes completely at 815 K. Decomposition of the bulk oxide is followed by oxygen dissolution in the near-surface region and in the bulk. The oxygen species dissolved in the bulk is more favoured at high temperatures because oxygen cannot accumulate in the near-surface region and diffusion shifts the equilibrium towards the bulk species. The saturation of the bulk “reservoir” with oxygen leads to increasing the uptake of the near-surface region species. Surprisingly, the bulk PdO phase does not form during cooling in 0.4 mbar O₂, but the Pd₅O₄ phase appears below 745 K. This is proposed to be due to a kinetic limitation of PdO formation because at high temperature the rate of PdO seed formation is compatible with the rate of decomposition.     

Density functional theory investigation of CN on Cu(1 1 1), Ni(1 1 1) and Ni(1 0 0)

The adsorption of CN on Cu(1 1 1), Ni(1 1 1) and Ni(1 0 0) has been investigated using density functional theory (DFT). While experimental studies of CN on Cu(1 1 1) show the molecular axis to be essentially parallel to the surface, the normally-preferred DFT approach using the generalised gradient approximation (GGA) yields a lowest energy configuration with the C-N axis perpendicular to the surface, although calculations using the local density approximation (LDA) do indicate that the experimental geometry is energetically favoured. The same conclusions are found for CN on Ni(1 1 1); on both surfaces bonding through the N atom is always unfavourable, in contrast to some earlier published results of ab initio calculations for Ni(1 1 1)/CN and Ni(1 0 0)/CN. The different predictions of the GGA and LDA approaches may lie in subtly different relative energies of the CN 5σ and 1π orbitals, a situation somewhat similar to that for CO adsorbed on Pt(1 1 1) which has proved challenging for DFT calculations. On Ni(1 0 0) GGA calculations favour a lying-down species in a hollow site in a geometry rather similar to that found experimentally and in GGA calculations for CN on Ni(1 1 0).     

Aromatic interactions in the close packing of phenyl-imides at Cu(1 1 0) surfaces

The oxidation of aniline at Cu(1 1 0) surfaces at 290 K has been studied by XPS and STM. A single chemisorbed product, assigned to a phenyl imide (C₆H₅N(a)), is formed together with water which desorbs. Reaction with preadsorbed oxygen results in a maximum surface concentration of phenyl imide of 2.8 × 10¹⁴ mol cm⁻² and a surface dominated by domains of three structures described by , and unit meshes. However, concentrations of phenyl imide of up to 3.3 × 10¹⁴ mol cm⁻² were obtained from the coadsorption of aniline and dioxygen (300:1 mixture) resulting in a highly ordered biphasic structure with and domains. Comparison of the STM and XPS data shows that only half the phenyl imides at the surface are imaged. Pi-stacking of the phenyl rings is proposed to account for this observation.     

Elastic origin of the O/Cu(1 1 0) self-ordering evidenced by GIXD

We have studied by grazing incidence X-ray diffraction the self-ordering of the Cu-CuO stripe pattern. By comparing the experimental results to molecular dynamics simulations and anisotropic linear elastic calculations, we have been able to determine the atomic relaxations within the Cu substrate. The results show the importance of the crystalline anisotropy in the relaxation field. These relaxations are due to the surface stress difference Δσ between oxygen-covered and bare Cu(1 1 0) regions. For the different oxygen coverages studied, we have always found Δσ=1.0±0.1 N m⁻¹. This surface stress difference is shown to be the origin of the self-ordering.     

The electronic structure and reactivity of the oxygen-modified Mo2C(0 0 0 1) surface

Oxygen adsorption on Mo₂C(0 0 0 1) has been investigated with angle-resolved photoemission spectroscopy (ARPES). When the surface is reacted with O₂, the O 2p-induced states are formed at 4.1 and 5.3 eV at the point. The emissions around the Fermi level are also intensified by oxygen adsorption, which is due to the formation of a partially filled state. It is found that the reactivity of the surface toward H₂O adsorption is much enhanced by pre-adsorption of oxygen. The reactivity is found to be maximized at θ_O ∼ 0.2.     

Photoelectron spectroscopy study of oxygen adsorption on Mo2C(0 0 0 1)

Oxygen adsorption on the α-Mo₂C(0 0 0 1) surface has been investigated with X-ray photoelectron spectroscopy and valence photoelectron spectroscopy utilizing synchrotron radiation. It is found that oxygen adsorbs dissociatively at room temperature, and the adsorbed oxygen atoms interact with both Mo and C atoms to form an oxycarbide layer. As the O-adsorbed surface is heated at ≧800 K, the C-O bonds are broken and the adsorbed oxygen atoms are bound only to Mo atoms. Valence PES study shows that the oxygen adsorption induces a peculiar state around the Fermi level, which enhances the emission intensity at the Fermi edge in PES spectra.     

Reaction of O2 with the boron-terminated TaB2(0 0 0 1) surface

X-ray photoelectron spectroscopy has been used to study the clean TaB₂(0 0 0 1) surface and its reaction with O₂. In agreement with previous studies, XPS indicates that the clean surface is boron terminated. The topmost boron layer shows a chemically shifted B 1s peak at 187.1 eV compared to a B 1s peak at 188.6 eV for boron layers below the surface. The 187.1-188.6 eV peak intensity ratio and its variation with angle between the crystal normal and the detector is well described by a simple theoretical model based on an independently calculated electron inelastic mean free path of 15.7 Å for TaB₂. The dissociative sticking probability of O₂ on the boron-terminated TaB₂(0 0 0 1) surface is lower by a factor of 10⁴ than for the metal-terminated HfB₂(0 0 0 1) surface.