Ion source with a cold magnetron cathode and magnetic plasma compression

The operating principles, design, and characteristics of an ion source with a cold magnetron cathode and magnetic plasma compression are described. The source is intended for the injector of a linear proton accelerator.     

Hydrogen ion source with a cold magnetron cathode and magnetic plasma compression

A hydrogen ion source designed for the injector of a 16-MeV linear proton accelerator with an average beam current of ∼100 μA is presented. New design approaches allowing an improvement in the operating parameters of the ion source are proposed. The results of experimental tests of a source prototype operating in a pulsed mode with a repetition rate of 1–10 Hz and pulse duration of 100–600 μs are described.     

Electron beam generation in a magnetron diode with metal secondary-emission cathode

The effects of electric and magnetic field intensities, the triggering-pulse droop rate, and the electrode diameter on the processes of electron beam formation and generation were studied experimentally. The results of mathematical simulation of the secondary-emission multiplication of the electron flow are presented. Tubular electron beams with a wall thickness of 1.5–2 mm, a current density of 1–70 A/cm², and a particle energy of 5–100 keV were obtained. It was shown that several electron bunches could be obtained during a single voltage pulse.     

Rapid start of oscillations in a magnetron with a "transparent" cathode

We report on the improvement of conditions for the rapid start of oscillations in magnetrons by increasing the amplitude of the operating wave that is responsible for the capture of electrons into spokes. This amplitude increase is achieved by using a hollow cathode with longitudinal strips removed, thereby making the cathode transparent to the wave electric field with azimuthal polarization. In addition, an optimal choice of the number and position of cathode strips provide favorable prebunching of the electron flow over the cathode for fast excitation of the operating mode. Particle-in-cell simulations of the A6 magnetron demonstrate these advantages of this novel cathode.     

相对论磁控管透明阴极的仿真与实验

基于一个6腔异腔结构相对论磁控管,运用粒子模拟仿真软件,对同轴阴极和透明阴极的特性进行仿真和实验研究。经仿真优化,设计并制作了一支3个带的透明阴极。粒子模拟结果表明,在相同条件下透明阴极比同轴阴极电子群聚时间大大缩短,起振时间大幅减小,整管效率提高约1倍,输出微波频谱更纯,模式竞争更小。实验结果表明,相同条件下,应用透明阴极所得到的微波脉宽较宽,在S波段获得721 MW的微波功率输出。说明应用透明阴极能缩短相对论磁控管起振时间,与粒子模拟结果相符。     

Calculation of the erosion profile of a cathode for magnetron ion-sputtering systems

A method is proposed for calculating the cathode erosion profile in planar magnetron ion-sputtering systems. The method uses integral characteristics of the magnetic and electric fields and does not require detailed information on the spatial characteristics of the discharge plasma. The calculated results are compared with experimental cathode profiles for rectangular and circular planar ion-sputtering systems.     

相对论磁控管透明阴极技术作用机理研究

透明阴极技术对相对论磁控管振荡启动过程具有显著影响,但其加速启动过程的作用机理仍有待深入研究。对采用扇形单元透明阴极的L波段相对论磁控管进行数值模拟,分析了场分布模式和带电粒子空间运动规律,发现透明阴极与实心阴极在磁控管振荡启动过程的差异。可见透明阴极带来的静电场角向分量与外加轴向磁场引起的洛伦兹力,对初始工作状态的电子具有向阳极加速漂移的作用。采用透明阴极的相对论磁控管的电子轮辐外缘更贴近阳极,群聚电子在轴向上具有随距离连续变化的速度分布,使得电子与高频电磁场的能量交换更加充分。对扇形阴极单元的个数与张角组合的匹配效果进行了模拟,给出了磁控管振荡建立阶段静电场角向分量对阴极电子发射与漂移运动的作用规律。透明阴极的设计需要与磁控管慢波结构相匹配,以得到最优化的工作状态。     

Fast generation of an electron beam in a magnetron gun with a secondary-emission metallic cathode

The formation of an electron layer and the generation of an electron beam in magnetron guns where secondary emission is triggered by nanosecond pulses are studied. In the guns with small cross sizes, hollow electron beams with an outer diameter of 3–6 mm are generated. The beam current is 1–2 A, and the cathode voltage is 5–7 kV. Results obtained indicate that the generation of nanosecond beam-current pulses is a possibility.     

Rapid formation of an electron beam in a magnetron gun with a secondary-emission metallic cathode

The initial stage of forming the electron sheath and electron beam generation in magnetron guns for the case when the secondary emission process is triggered by nanosecond pulses is considered. In the guns with small transverse sizes, tubular electron beams with an outer diameter of 4–6 mm and a current of 1–2 A are produced at a cathode voltage of 5–10 kV. It is shown that the formation of the electron cloud and beam current pulse front for a time of ≥2 ns is a possibility.     

平面磁控阴极用于PEPC等离子体放电实验研究

平面磁控阴极用于大面积等离子体放电具有大幅降低放电电压和放电气压的优点 ,是PEPC首选的放电途径。通过对不同尺寸、不同磁场强度和不同气压状态下放电实验研究表明 :在较宽的磁场强度范围内都可实现全口径的均匀等离子体放电 ,电极几何尺寸的小量变化对放电均匀性的影响不大。给出了满足 30 0 mm× 30 0 mm放电腔的放电参数。     

Sputtering the surface of a He-Ne laser cathode

The results from analyzing the surface of an aluminum cathode by means of atomic force microscopy (AFM) and Auger electron spectroscopy (AES) are presented. Cathode surface sputtering is simulated via the Monte Carlo method using the SRIM program. Factors affecting the formation of the surface relief of cold cathodes under the action of bombarding ions are discussed along with the main mechanisms of surface modification and ways of enhancing the stability of the material with respect to the action of ions.     

Parallel operation of microhollow cathode discharges

Parallel operation of DC microhollow cathode discharges in argon at pressures up to several hundred torr was obtained without individual ballast at low currents, where the slope of the current-voltage characteristic is positive. By using semi-insulating silicon as anode material, we were able to extend the range of stable operation over the entire current range, including that with negative differential resistance. This opens the possibility to utilize microhollow cathode discharge arrays in flat panel lamps     

透明阴极实现相对论磁控管跳频的仿真

基于一个6腔同腔结构相对论磁控管, 透明阴极金属条个数与磁控管腔数相同时相对论磁控管易于工作在2模式, 减少为腔体数目一半时易于工作在模式, 提出了旋转扇形透明阴极金属条角向位置实现相对论磁控管中心频率跳变的方案。经仿真优化, 设计了外径15 mm, 6个扇形金属条的透明阴极, 每个扇形金属条的角向宽度为20。运用粒子模拟软件, 仿真分析了角向位置金属条与阳极块相对应及金属条与谐振腔相对应两种情况, 在工作磁场保持0.75 T, 调节工作电压在600~800 kV内变化时, 模拟结果表明, 相对论磁控管可以很稳定地分别工作在 2模式和模式, 即通过旋转透明阴极实现相对论磁控管频率跳变。     

透明阴极实现相对论磁控管跳频的仿真北大核心CSCD

基于一个6腔同腔结构相对论磁控管,透明阴极金属条个数与磁控管腔数相同时相对论磁控管易于工作在2π模式,减少为腔体数目一半时易于工作在π模式,提出了旋转扇形透明阴极金属条角向位置实现相对论磁控管中心频率跳变的方案.经仿真优化,设计了外径15mm,6个扇形金属条的透明阴极,每个扇形金属条的角向宽度为20°.运用粒子模拟软件,仿真分析了角向位置金属条与阳极块相对应及金属条与谐振腔相对应两种情况,在工作磁场保持0.75T,调节工作电压在600~800kV 内变化时,模拟结果表明,相对论磁控管可以很稳定地分别工作在2π模式和π模式,即通过旋转透明阴极实现相对论磁控管频率跳变.     

Investigations of electron beam characteristics using an accelerator based on a magnetron gun with a secondary-emission cathode

The reliability and service life of accelerating installations are substantially determined by the lifetime of electron sources. The accelerator under consideration has a magnetron gun with a channel-free cold secondary-emission cathode in crossed fields as an electron source [1, 2]. In the present work, the data of the electron beam parameters obtained in the accelerator based on the magnetron gun with a secondary-emission cathode are given, and possible secondary uses are suggested. The text was submitted by the authors in English.     

全腔输出半透明阴极相对论磁控管的结构改进和性能提升

对全腔输出半透明阴极相对论磁控管做了进一步的改进,并对其进行了物理分析和三维全电磁粒子模拟研究。通过半透明阴极结构的改进,即改变阴极角向方位和阴极发射面高度参差设计以及局部参数优化,使得在较宽的工作参数范围内,器件起振初期可能出现的模式竞争得到抑制,起振时间进一步缩短,同时输出效率得到较大提高。在注入电子束电压和电流分别约为518 kV和4.1 kA、外加磁场为0.575 T时,模拟在S波段获得了效率大于66%、功率约1.42 GW的微波输出。同时还给出了电子束电压和外加磁场等参数在一定范围内变化时对输出性能的影响规律。研究结果可应用于高效紧凑型相对论磁控管的实验研究。     

Ion energies at the cathode of the DC planar magnetron sputtering discharge

The energy distribution of the ions striking the cathode of the dc planar magnetron system was measured over a range of the typical sputtering conditions (magnetic field of 0.07–0.13 T, argon pressure of 0.01–10 Pa, discharge voltage of 250–600 V). The results obtained allow us to conclude that the major part of the incident ion flux originates in the cathode fall region. The theoretical model developed in terms of mobility theory makes it possible to evaluate the cathode fall voltage and its dependence on the sputtering conditions. It was found that the normalized integral form of the incident ions, energy spectrum is practically independent of the sputtering discharge parameters.     

Heating of condensation surface during magnetron sputtering

Chromium films deposited by magnetron sputtering on non-heated substrates from non-thermalized atoms crystallize in regular bcc Cr phase, with non-uniform microstructure and lattice constant along the thickness. These non-uniformities decrease with elevation of the substrate temperature and vanish at a certain value. However films deposited on non-heated substrates from thermalized atoms crystallize in a low-temperature Cr phase and have almost uniform microstructure. We have developed a model explaining this effect, which is based on the supposition of the formation of a “hot” layer on the growth surface during deposition, whose temperature depends on the flux of energy delivered to the condensation surface and can be noticeably higher than the substrate temperature. Detailed investigation of the structure of Cr films deposited at various temperatures and energy fluxes delivered to the growth surface, correlate well with the above model.