Admetal-induced substrate surface restructuring during metal-on-metal electrochemical deposition studied by in situ scanning tunneling microscopy

Based on time-dependent in situ scanning tunneling microscopy (STM) studies, we demonstrate that for Ni on Ag(111) and Ru on Au(111), electrochemical metal-on-metal deposition can result in pronounced substrate surface restructuring. For Ni/Ag(111), we observe that at low deposition flux and low coverage, Ni submonolayer islands at steps are partly embedded in the Ag terraces, whereas at higher deposition flux and higher coverage, substrate restructuring results in the formation of monolayer bays in the Ag terraces. We suggest that this restructuring process proceeds predominantly via step edge diffusion of Ag atoms. For Ru/Au(111), the formation of fjords and monolayer holes in the Au terraces is observed at low and high Ru coverage, respectively. The importance of the Au surface mobility for the restructuring process is demonstrated by comparing experiments in H₂SO₄ and HCl solutions, in which Au exhibits strongly different surface mobilities. For this system, restructuring involves Au diffusion along Au steps, Au atom detachment from the Au steps, and upward exchange diffusion. According to these observations and their comparison with similar findings for vacuum deposition, we conclude that this restructuring requires (i) a high substrate surface mobility and (ii) a stronger bonding of substrate atoms to deposit islands than to the substrate.     

Influence of copper crystal surface on the CVD growth of large area monolayer graphene

We study the influence of the surface structure of copper single crystals on the growth of large area monolayer graphene by chemical vapor deposition (CVD) in ultra-high vacuum (UHV). Using atomic-resolution scanning tunneling microscopy (STM), we find that graphene grows primarily in registry with the underlying copper lattice for both Cu(111) and Cu(100). The graphene has a hexagonal superstructure on Cu(111) with a significant electronic component,whereas it has a linear superstructure on Cu(100). Graphene on Cu(111) forms a microscopically uniform sheet, the quality of which is determined by the presence of grain boundaries where graphene grains with different orientations meet. Graphene grown on Cu(100) under similar conditions does not form a uniform sheet and instead displays exposed nanoscale edges. Our results indicate the importance of the copper crystal structure on the microstructure of graphene films produced by CVD.     

High-rate synthesis of graphene by a lower cost chemical vapor deposition route

Chemical vapor deposition (CVD) reaction from metal particles to produce graphene has seldom been reported so far. In this paper, the CVD growth of graphene was conducted under ambient pressure without a dedicated stage for reduction treatment. Interestingly, copper nanoparticles supported on MgO prepared by simple impregnation were able to efficiently catalyze graphene. Quantification of the prepared graphene was carefully conducted. For the optimized conditions, 1000 °C for 30 min, high content of graphene (up to 27 at.%) could be produced. Our method shows high efficiency and growth rate of graphene, produced at much lower cost compared to the existing methods.     

Effects of substrate defects on the carbon cluster formation in graphene growth on Ni(111) surface

The growth of graphene by chemical vapor deposition on transition metal has shown promise in this regard. The main hurdle for further improvement is the lack of complete understanding of the atomistic processes involved in the early growth stages, which is conceivable because there are too many factors affecting the growth process. Using first-principles calculations, we investigate the effect of substrate defects on the graphene nucleation on the Ni(111) surface. Our calculations reveal that the defects on substrates can induce the carbon aggregation, and the corresponding structures are completely different from that on the perfect Ni surface. We also compare the critical cluster sizes for the transition from one-dimensional carbon chains to two-dimensional graphene flakes in the growth sequence. Our investigations on the effects of substrate defects would be extremely useful for the future experimental synthesis of high-quality graphene.     

不同衬底条件下石墨烯结构形核过程的晶体相场法研究

利用可描述气-固转变的三模晶体相场模型,在原子尺度上研究了不同衬底条件下石墨烯结构的形核过程.结果表明:无论衬底存在与否,气态原子均是先聚集为无定形过渡态团簇,随着气态原子的不断堆积和固相团簇中原子位置的不断调整,过渡态团簇逐渐转变为有序的石墨烯晶核,在此过程中,五元环结构具有重要的过渡作用;石墨烯在结构匹配较好的衬底(如面心立方(face-centered cubic,FCC)结构(111)和(110))上生长时,可形成几乎没有结构缺陷单晶石墨烯岛;在无衬底或结构匹配性较差的衬底(如FCC结构(100)面)上生长时,形成的石墨烯岛结构缺陷和晶界较多,不利于高质量石墨烯的制备.     

Lamp-assisted CVD of carbon micro/nano-structures using metal catalysts and CH2I2 precursor

Carbon micro/nanofibers and nanotubes were deposited via chemical vapor deposition (CVD) using CH₂I₂ precursor and different metal catalysts (Pd, Ni, Fe, Co and Mn) on Si (1 0 0) substrates. A versatile and low-cost IR lamp technique is employed to induce the deposition process. With this method carbon features could be obtained already at temperatures much lower than with common techniques. Palladium metal was deposited by laser-assisted CVD from a liquid solution of the ammine complex and the 3d metals by thermal evaporation. Large-scale periodicity of nano-sized metal catalysts, and subsequently of carbon deposits was obtained by using monolayers of polystyrene microspheres as mask. The carbon structures were analyzed by SEM and micro-Raman spectroscopy.     

Scalable synthesis of graphene on single crystal Ir(111) films

We have investigated single crystal Ir(111) films grown heteroepitaxially on Si(111) wafers with yttria-stabilized zirconia (YSZ) buffer layers as possible substrates for an up-scalable synthesis of graphene. Graphene was grown by chemical vapor deposition (CVD) of ethylene. As surface analytical techniques we have used scanning tunneling microscopy (STM), low-energy electron diffraction, scanning electron microscopy, and atomic force microscopy. The mosaic spread of the metal films was below 0.2° similar to or even below that of standard Ir bulk single crystals, and the films were basically twin-free. The film surfaces could be improved by annealing so that they attained the perfection of bulk single crystals. Depending on the CVD conditions a lattice-aligned graphene layer or a film consisting of different rotational domains were obtained. STM data of the non-rotated phase and of the phases rotated by 14° and 19° were acquired. The quality of the graphene was comparable to graphene grown on bulk Ir(111) single crystals.     

Comparative study on graphene growth mechanism using Ni films,Ni/Mo sheets,and Pt substrates

We demonstrate a comparative study on graphene growth mechanism using various catalytic metal substrates such as Ni thin films, Ni-deposited Mo (Ni/Mo) sheets, and Pt sheets during chemical vapor deposition (CVD). Depending on the substrates, two kinds of graphene growth mechanisms that involve either precipitation or surface adsorption of carbon have been reported. We synthesized graphene, focusing especially on the initial growth stage during CVD, by varying synthesis parameters such as synthesis time, amount of feedstock, and cooling rate after synthesis. We concluded that precipitation-driven synthesis is dominant in the case of Ni substrates whereas adsorption-driven growth is dominant in the Ni/Mo system. In the case of the Pt substrate, which is generally believed to grow by carbon precipitation, graphene growth by adsorption was found to be dominant. We believe that our results will contribute to a clearer understanding of the graphene synthesis mechanism, and development of manufacturing routes for controllable synthesis of high-quality graphenes.     

Synthesis of epitaxial graphene on rhodium from 3-pentanone

The synthesis of high quality single layer graphene on rhodium, g/Rh(111), is reported. The graphene layers are grown at 1060 K by low pressure chemical vapor deposition (CVD) using 3-pentanone as a precursor molecule. The presented growth technique shows an easy high quality production method for epitaxial graphene monolayers. The chemical composition and structural properties of such self-assembled monolayers were characterized by X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED). Scanning Tunneling Microscopy (STM) confirms the formation of a 3 nm super cell and a unique surface morphology which establishes the potential of g/Rh(111) as a template for molecules.     

Comparative study of the nature of chemical bonding of corrugated graphene on Ru(0001) and Rh(111) by electronic structure calculations

Recently, atomic resolved scanning tunneling microscopy investigations revealed that, depending on the substrate (Ni(111), Ru(0001), Ir(111), Pt(111), Rh(111)), graphene overlayer might present regular corrugation patterns, with periodically repeated units of a few nanometers. Variations of the interactions at the interface and the modulation of the local electronic properties are associated with the exact atomic arrangement of the carbon pairs with respect to the metal atoms of the substrate. Better understanding of the atomic structure and of the chemical bonding between graphene and the underlying transition metal is motivated by the fundamental scientific relevance of such systems, but it is also crucial in the perspective of possible applications. With the present work, we propose model systems for the two interfaces showing the most pronounced corrugation patterns, i.e. graphene/Ru(0001) and graphene/Rh(111). Our goal is to understand the nature of the interactions by means of electronic structure calculations based on Density Functional Theory. Our simulations qualitatively reproduce very well experimental results such as the STM topographies and the electrostatic potential maps, and quantitatively provide the closest agreement that has been published so far. The detailed analysis of the electronic structure at the interface highlights similarities and differences by changing the supporting transition metal. Our results point to a fundamental role of the hybridization between the π orbitals of graphene with the d band of the metal in determining the specific corrugation of the adsorbed monolayer. It is shown that differences in the response of the graphene electronic structure to the interaction with the metal can hinder the hybridization and lead to substantially different structures.     

Purity and resistivity improvements for electron-beam-induced deposition of Pt

Electron-beam-induced deposition (EBID) of platinum is used by many researchers. Its main application is the formation of a protective layer and the “welding material” for making a TEM lamella with a focused ion beam thinning process. For this application, the actual composition of the deposition is less relevant, and in practice, both the mechanical strength and the conductivity are sufficient. Another important application is the creation of an electrical connection to nanoscale structures such as nano-wires and graphene. To serve as an electrical contact, the resistivity of the Pt deposited structure has to be sufficiently low. Using the commonly used precursor MeCpPtMe₃ for deposition, the resistivity as created by the basic process is 10⁺⁵–10⁺⁶ higher than the value for bulk Pt, which is 10.6 µΩ cm. The reason for this is the high abundance of carbon in the deposition. To improve the deposition process, much attention has been given by the research community to parameter optimization, to ex situ or in situ removal of carbon by anneal steps, to prevention of carbon deposition by use of a carbon-free precursor, to electron beam irradiation under a high flux of oxygen and to the combination with other techniques such as atomic layer deposition (ALD). In the latter technique, the EBID structures are used as a 1-nm-thick seed layer only, while the ALD is used to selectively add pure Pt. These techniques have resulted in a low resistivity, today approaching the 10–150 µΩ cm, while the size and shape of the structure are preserved. Therefore, now, the technique is ready for application in the field of contacting nano-wires.     

Strain-induced pseudo-magnetic fields and charging effects on CVD-grown graphene

Atomically resolved imaging and spectroscopic characteristics of graphene grown by chemical vapor deposition (CVD) on copper are investigated by means of scanning tunneling microscopy and spectroscopy (STM/STS). For CVD-grown graphene remaining on the copper substrate, the monolayer carbon structures exhibit ripples and appear strongly strained, with different regions exhibiting different lattice structures and electronic density of states (DOS). In particular, ridges appear along the boundaries of different lattice structures, which exhibit excess charging effects. Additionally, the large and non-uniform strain induces pseudo-magnetic field up to ~ 50 T, as manifested by the DOS peaks at quantized energies that correspond to pseudo-magnetic field-induced integer and fractional Landau levels. In contrast, for graphene transferred from copper to SiO₂ substrates after the CVD growth, the average strain on the whole diminishes, so do the corresponding charging effects and pseudo-magnetic fields except for sample areas near topological defects. These findings suggest feasible nano-scale “strain engineering” of the electronic states of graphene by proper design of the substrates and growth conditions.     

Graphene-graphite phase transition at the surface of a carbonized metal

A phase transition leading to the transformation of a graphene layer into a multilayer graphite film at the surface of a carbonized metal has been experimentally studied on the atomic level under ultrahigh-vacuum conditions. It has been shown that this process is governed by dynamic equilibrium between edge atoms of graphene islands and a chemisorbed carbon phase, two-dimensional carbon “gas,” and is observed in the temperature range of 1000–1800 K. The features of the phase transition at the surfaces Ni(111), Rh(111), and Re(10-10) are similar, although the specific kinetic characteristics of the process depend on the properties of the substrate. It has been shown that change in the emissivity of the substrate after the formation of a multilayer graphite film increases the rate of the phase transition and leads to a temperature hysteresis.     

Phonon dispersion of quasi-freestanding graphene on Pt(111)

High-resolution electron energy loss spectroscopy has been used to probe phonon dispersion in quasi-freestanding graphene epitaxially grown on Pt(111). Loss spectra clearly show different dispersing features related to both acoustic and optical phonons. The present results have been compared with graphene systems which strongly interact with the substrate, i.e. the nearly-flat monolayer graphene (MLG)/Ni(111) and the corrugated MLG/Ru(0001). We found that the phonon dispersion of graphene/Pt(111) reproduces well the behavior of pristine graphite. This could be taken as an indication of the negligible interaction between the graphene sheet and the underlying Pt substrate. The softening of out-of-plane modes observed for interacting graphene/metal interfaces does not occur for the nearly-free-standing graphene/Pt(111).     

Electronic structure of the Au-intercalated graphene/Ni(111) surface

We report the electronic structure of the Au-intercalated graphene/Ni(111) surface using angle-resolved photoemission spectroscopy and low energy electron diffraction. The graphene/Ni(111) shows no Dirac cone near the Fermi level and a relatively broad C 1s core level spectrum probably due to the broken sublattice symmetry in the graphene on the Ni(111) substrate. When Au atoms are intercalated between them, the characteristic Dirac cone is completely recovered near the Fermi level and the C 1s spectrum becomes sharper with the appearance of a 10?×?10 superstructure. The fully Au-intercalated graphene/Ni(111) surface shows a p-type character with a hole pocket of ～0.034?Å^?1 diameter at the Fermi level. When the surface is doped with Na and K, a clear energy gap of ～0.4?eV is visible irrespective of alkali metal.     

Intercalation of germanium oxide beneath large-area and high-quality epitaxial graphene on Ir(111) substrate

Epitaxial growth on transition metal surfaces is an effective way to prepare large-area and high-quality graphene.However,the strong interaction between graphene and metal substrates suppresses the intrinsic excellent properties of graphene and the conductive metal substrates also hinder its applications in electronics.Here we demonstrate the decoupling of graphene from metal substrates by germanium oxide intercalation.Germanium is firstly intercalated into the interface between graphene and Ir(111) substrate.Then oxygen is subsequently intercalated,leading to the formation of a GeO_x layer,which is confirmed by x-ray photoelectron spectroscopy.Low-energy electron diffraction and scanning tunneling microscopy studies show intact carbon lattice of graphene after the GeO_x intercalation.Raman characterizations reveal that the intercalated layer effectively decouples graphene from the Ir substrate.The transport measurements demonstrate that the GeO_x layer can act as a tunneling barrier in the fabricated large-area high-quality vertical graphene/GeO_x/Ir heterostructure.     

Ag/Si（111）超薄膜光学二次谐波强度变化与结构相变研究

在130-830K温度范围内,系统研究了Si（111）-√3×√3-Ag和Si（111）-3×1-Ag超薄膜重构表面的光学二次谐波的温度依赖性,分析了信号强度的变化和表面结构之间的关联.结果表明,对于Si（111）-3×3-Ag结构薄膜表面而言,在130K到320 K的温度范围内,表面光学二次谐波信号强度的变化中没有出...     

Raman fingerprint of doping due to metal adsorbates on graphene

The properties of single-layer graphene are strongly affected by metal adsorbates and clusters on graphene. Here, we study the effect of a thin layer of chromium (Cr) and titanium (Ti) metals on chemical vapor deposition (CVD)-grown graphene by using Raman spectroscopy and transport measurements. The Raman spectra and transport measurements show that both Cr and Ti metals affect the structure as well as the electronic properties of the CVD-grown graphene. The shift of peak frequencies, intensities and widths of the Raman bands are analyzed after the deposition of metal films of different thickness on CVD-grown graphene. The shifts in G and 2D peak positions indicate the doping effect of graphene by Cr and Ti metals. While p-type doping was observed for Cr-coated graphene, n-type doping was observed for Ti-coated graphene. The doping effect is also confirmed by measuring the gate voltage dependent resistivity of graphene. We have also found that annealing in Ar atmosphere induces a p-type doping effect on Cr- or Ti-coated CVD-grown graphene.     

Graphene domain boundaries on Pt(111) as nucleation sites for Pt nanocluster formation

The growth of Pt nanoclusters on a graphene layer on Pt(111) was studied with ultra high vacuum scanning tunneling microscopy. Different periodicities in the moiré patterns of the graphene layer are observed corresponding to different orientations with respect to the Pt(111) lattice. Various graphene orientations are possible because of a relatively weak graphene–Pt interaction. Following Pt deposition onto the graphene-covered surface, small Pt nanoclusters are observed to preferentially form along the moiré domain boundaries. The weak interaction of graphene with Pt(111) leads to a weak corrugation in the superlattice compared to other transition metals, such as Ru, but it is found even this weak corrugation is sufficient to serve as a template for the formation of mono-dispersed one-dimensional Pt nanocluster chains. These Pt nanoclusters are relatively stable and only undergo agglomeration at annealing temperatures above 600 K.     

Pb液滴在Ni基底润湿铺展行为的分子动力学模拟

采用分子动力学方法研究了Pb液滴在Ni(100)晶面、(110)晶面和(111)晶面的铺展润湿行为. 结果表明: Pb液滴在Ni(100)及(111)基底上的润湿铺展现象呈各向同性, 而在Ni(110)基底上的润湿铺展现象呈明显的各向异性, 且这种各向异性源于Ni(110)晶面点阵结构上Pb原子沿不同晶向的扩散机制及速度的明显差异; Pb液滴在Ni(111)晶面上铺展时, 未发生表面合金化, 液滴铺展动力学描述近似满足 R² ∝ t, 而液滴在(100)晶面和(110)晶面上铺展时表面产生合金化现象, 铺展动力学关系近似满足 R⁴ ∝ t, 且液滴在(100)晶面上的铺展速度高于(110)晶面上的铺展速度. 关键词： 分子动力学 润湿各向异性 铺展膜 扩散机制