Optical constants of thin oxide films on titanium

Thin oxide films on titanium formed by heating were studied by the ellipsometric method. To obtain the complex refractive index and film thicknesses, the ellipsometric measurements were performed by means of the immersing method: each sample was measured first in air and then in a liquid of known refractive index (in our case CCl₄). The optical constants and the oxide film thickness were computed by means of a computer from two pairs of ellipsometric values. To state the optical constants of clean titanium surface the graphic-computational method was proposed and applied. The measurements were carried out at two wavelengths on oxide films grown in air and dry oxygen by thermal oxidation at temperatures from 150 to 700 °C. It has been shown that when increasing the film thickness the refractive index of the film decreases, whereas the absorption coefficient is independent on the film thickness. Optical constants of oxide films growing in dry oxygen are smaller than those growing in air.     

Preparation and characterization of thermally evaporated titanium phthalocyanine dichloride thin films

Titanium phthalocyanine dichloride (TiPcCl₂) thin films are prepared on glass substrates by vacuum-sublimation technique. The optical constants of thin films are obtained by means of thin film spectrophotometry. Planar structures for the study of electrical properties are fabricated with TiPcCl₂ as active layer and silver as the contact electrodes. The effects of post-deposition annealing on the optical band gap have been studied. The optical transition is found to be direct allowed in nature. The invariance in the optical band gap shows the thermal stability of the material. The activation energies are determined using the Arrhenius plots between electrical conductivity and inverse temperature. The variation in activation energy with post-deposition annealing is investigated. The unit cell dimensions of TiPcCl₂ thin films are also determined by indexing the powder diffraction data. The variations of the surface morphology and grain size with annealing have also been studied.     

Composite titanium oxide nanocolumnar thin films for low-emissivity coating

The TiO_X thin films were grown on the glass substrate for the low-e film applications by direct-current magnetron sputtering methods. The composite nature of dielectric and metallic phases including Ti₂O₃, TiO₂ and amorphous TiOx were identified from the comparative study of x-ray diffraction and Raman spectroscopy. The coalescent nanocolumnar structure revealed from scanning electron microscopy is believed to be responsible for the absence of the interference in the transmission. Most interestingly, the narrow transmittance bands from the films were observed in the visible region, especially in the violet-blue-green color portion, which could be ideal for the applications of narrow band-pass filters or red/infrared reflectors.     

Local modification of thin oxide films on a titanium surface

It is shown that a controllable structural rearrangement of a thin titanium oxide film, accompanied by a change in the bandgap width, can be accomplished under the probe tip of a scanning tunneling microscope (STM). The mechanism of the rearrangement is considered to be the migration of cations and oxygen vacancies in the electric field of the STM.     

Excimer laser ablation of thin titanium oxide films on glass

Thin titanium dioxide films are deposited on glass substrates by magnetron sputter deposition. They are irradiated in air, by means of a KrF excimer laser. The ablation rate is measured as a function of the laser fluence per pulse, F, and of the number of pulses, N. Above a fluence threshold, the films are partially ablated. The ablated thickness does not vary linearly with N. This is the signature of a negative feedback between the film thickness and the ablation rate. The origin of this negative feedback is shown to be due to either thermal or electronic effects, or both. At high F, the film detachs from the substrate.     

Doped thin metal oxide films for catalytic gas sensors

TiO₂ and Pt doped TiO₂ thin films were grown by pulsed laser deposition on 〈0 0 1〉 SiO₂ substrates. The doped films were compared with undoped ones deposited in similar experimental conditions. An UV KrF* (λ = 248 nm, τ_FWHM ≅ 20 ns, ν = 2 Hz) excimer laser was used for the irradiation of the TiO₂ or Pt doped TiO₂ targets. The substrate temperatures were fixed during the growth of the thin films at values within the 300-500 °C range. The films’ surface morphology was investigated by atomic force microscopy and their crystalline quality by X-ray diffractometry. The corresponding transmission spectra were recorded with the aid of a double beam spectrophotometer in the spectral range of 400-1100 nm. No contaminants or Pt segregation were detected in the synthesized anatase phase TiO₂ thin films composition. Titania crystallites growth inhibition was observed with the increase of the dopant concentration. The average optical transmittance in the visible-infrared spectral range of the films is higher than 85%, which makes them suitable for sensor applications.     

Low temperature diffusion of oxygen in titanium and titanium oxide films

Work in our laboratory and elsewhere indicates that the thermal ignition characteristics of Ti-based pyrotechnics are controlled by diffusion of oxygen from a surface coating into the bulk of the metal. Diffusion of oxygen in Ti at temperatures greater than 700 K has previously been modeled using Fick's law. No work has been reported at lower temperature, and the results from previous high temperature oxidation studies are both inconsistent and insufficient to define diffusion behavior for the temperature range 400 to 800 K. We have conducted Ti oxidation experiments in oxygen ambients of 3 to 700 Torr, at temperatures from 400 to 800 K, for periods from 1 to 100 h. Oxygen concentration profiles were determined by Auger analysis combined with sputter depth profiling. Calibration of the Auger atomic concentrations were confirmed by Rutherford backscattering spectroscopic measurements. Results show growth of four distinct oxide regions which are consistent with the titanium-oxygen phase diagram. Growth of the oxide regions is independent of the oxygen partial pressure and appears to be diffusion controlled. Fick's law with a constant diffusion coefficient was assumed, and an Arrhenius expression for the oxygen diffusion coefficient in each region was evaluated from the experimental data. Activation energies for oxygen diffusion range from about 9 to 43 kcal/mol, and indicate that the thermal ignition mechanism is controlled by growth of a TiO₂ region adjacent to the gas-solid interface.     

Thickness dependent optical properties of titanium oxide thin films

TiO₂ thin films of different thickness were prepared by the Electron Beam Evaporation (EBE) method on crystal silicon. A variable angle spectroscopic ellipsometer (VASE) was used to determine the optical constants and thickness of the investigated films in the spectral range from 300 to 800 nm at incident angles of 60°, 70°, and 75°, respectively. The whole spectra have been fitted by Forouhi–Bloomer (FB) model, whose best-fit parameters reveal that both electron lifetime and band gap of TiO₂ thin film have positive correlation to the film thickness. The refractive indices of TiO₂ thin film increase monotonically with an increase in film thickness in the investigated spectral range. The refractive index spectra of TiO₂ thin films have maxima at around 320 nm and the maxima exhibit a marginally blue-shift from 327.9 to 310.0 nm with an increase in film thickness. The evolution of structural disorder in the TiO₂ thin film growth can be used to explain these phenomena.     

Growth of oxide thin films for optical gas sensor applications

Tungsten trioxide and titanium dioxide thin films were synthesised by pulsed laser deposition. We used for irradiations of oxide targets an UV KrF* (λ = 248 nm, τ_FWHM ≅ 20 ns, ν = 2 Hz) excimer laser source, at 2 J/cm² incident fluence value. The experiments were performed in low oxygen pressure. The (0 0 1) SiO₂ substrates were heated during the thin film deposition process at temperature values within the 300-500 °C range. The structure and crystalline status of the obtained oxide thin films were investigated by high resolution transmission electron microscopy. Our analyses show that the films are composed by nanoparticles with average diameters from a few to a few tens of nm. Moreover, the films deposited at substrate temperatures higher than 300 °C are crystalline. The tungsten trioxide films consist of a mixture of triclinic and monoclinic phases, while the titanium dioxide films structure corresponds to the tetragonal anatase phase. The oxide films average transmittance in the visible-infrared spectral range is higher than 80%, which makes them suitable for sensor applications.     

Post-annealing effect upon optical properties of electron beam evaporated molybdenum oxide thin films

Molybdenum oxide (MoO₃) thin films were deposited by electron beam evaporation. The chemical composition, microstructure, optical and electrical properties of MoO₃ thin films depend on the annealing temperature and ambient atmosphere. X-ray diffraction (XRD) shows that crystalline MoO₃ films can be obtained at various post-annealing temperatures from 200 to 500 °C in N₂ and O₂. X-ray photoelectron spectroscopy (XPS) results reveal that the O-1s emission peak was shifted slightly toward lower binding energies as the annealing temperature in N₂ was increased. The oxygen vacancies and conductivity of MoO₃ film increased with the annealing temperature. However, when the MoO₃ films were annealed in an atmosphere of O₂, the optical transmission, the O/Mo ratio and the photon energy increased with the annealing temperature. The results differ from those for films annealed in a N₂ atmosphere.     

Kinetics of oxygen chemisorption and its effects on electrical conductivity of thin evaporated CdS films

The mechanism and kinetics of chemisorption of oxygen on thin evaporated films of CdS have been investigated through changes in electrical conductivity caused by chemisorbed oxygen. Electrical conductivity of CdS films, when exposed to oxygen atmosphere falls exponentially with time, with a characteristic time determined by several factors such as temperature, electric field applied to the sample, illumination, etc. Electric field applied in appropriate direction is shown to enhance oxygen chemisorption. Complete theoretical treatment for these changes has been provided and the agreement between theory and experiment is shown to be excellent.     

Absorption bistability in evaporated ZnSex thin films

Intrinsic absorption bistability in ZnSe_1.36 thin films, produced by thermal evaporation is observed. The influence of laser pulse duration and resonator mirror reflectivity is studied experimentally and theoretically. Compared to ZnSe elements prepared by other methods, the evaporated films allow a longer operation wavelength of 514 nm, a low threshold power of 10 mW and a smaller element size below 10 m³.     

Structural properties of thermal evaporated SnTe thin films

Summary The morphological structure of SnTe very thin films is here studied by X-ray photoemission spectroscopy, by transmission electron spectroscopy and by X-ray diffraction. The analisys of experimental data evidences the superficial confinement of Sn, with different oxidation states, and the Te excess in the inner layers. The energy shift of the valence band peaks is attributed to modifications induced by the nonstoichiometry of the compound. Preliminary Hall and resistivity measurements seem to confirm the structural obtained results.     

Electrical properties of simultaneously evaporated Sb-Te thin films

Thin films of Sb-Te of varying compositions have been deposited on glass substrates following the three temperature method. The dc conductivity (σ), Hall coefficient (R _H) and thermoelectric power (α) of annealed samples have been measured in the temperature range 300–470°K. Films exhibit metallic as well as semiconducting characteristics withp-type conductivity. The properties are found to be dependent on composition and thickness of the film. Paper presented at the Int. Conf. and Intensive Tutorial Course on Semiconductor Materials, New Delhi, India, December 8–16, 1988.     

On the electroluminescence from evaporated thin gold films

Au films with island structure show a spot-like electroluminescence (EL) under a low dc or ac voltage. I–V characteristics and their relation to the EL, and some EL features were investigated.     

Electrical properties of thermally evaporated nickel-dimethylglyoxime thin films

Thin Bis-(dimethylglyoximato)nickel(II) [Ni(DMG)₂] films of amorphous and crystalline structures were prepared by vacuum deposition on Si (P) substrates. The films were characterised by X-ray fluorescence and X-ray diffraction. The constructed Al/Ni(DMG)₂/Si(P) metal-insulator-semiconductor devices were characterised by the measurement of the gate-voltage dependence of their capacitance and ac conductance, from which the surface states density D_it of insulator/semiconductor interface and the density of the fixed charges in the oxide were determined. The ac electrical conduction and dielectric properties of the Ni(DMG)₂-Silicon structure were studied at room temperature. The data of the ac measurements of the annealed films follow the correlated barrier-hopping CBH mode, from which the fundamental absorption bandgap, the minimum hopping distance, and other parameters of the model were determined.     

Synthesis and characterisation of cadmium titanium oxide thin films by sol-gel technique

Crack free, dense and transparent CdTiO₃ thin films have been prepared by sol-gel technique using titanium butoxide and cadmium acetate. The formation of the CdTiO₃ phase started from 500°C annealing temperature onwards. The complete orthorhombic structure of CdTiO₃ was formed on Silicon (100) substrate at an annealing temperature of 600°C for 5 h. As the annealing temperature increased from 600 to 700°C, we have observed the cadmium silicate phase at the interface of Si and CdTiO₃ phase. Structural, morphological and elemental evolution of these CdTiO₃ thin films produced by sol-gel synthesis were characterised by grazing incidence X-ray diffraction (GIXRD), tapping mode atomic force microscopy (TMAFM), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) respectively.     

Raman spectroscopy of sol–gel derived titanium oxide thin films

Raman spectra of TiO₂ films prepared via the sol–gel process were studied by UV and visible Raman spectroscopy. The evolution of the phases of TiO₂ films during annealing was investigated, and the relative intensities of the Raman bands excited with 325 nm were found to be distinct from those of the bands excited with 514 nm. The transmittance and FTIR spectra of the films annealed at different temperatures were characterized. The crystallization process of the powders and thin films treated by different annealing methods were also studied with Raman spectroscopy. The results show that the change in the relative intensities is caused by the resonance Raman effect. The anatase to rutile transition of the powder occurs at 700 °C, while that of the thin film occurs at 800 °C. The analysis of Raman band shape (peak position and full width at half‐maximum) after conventional furnace annealing and rapid thermal annealing indicates the influence of the non‐stoichiometry and phonon confinement effect. Copyright © 2011 John Wiley & Sons, Ltd.     

Structural and optical properties of thermally evaporated thin films

Chalcogenide glass Se₅₅Ge₃₀As₁₅ have amorphous structure in both as-deposited and annealed conditions. The optical properties of the as-deposited and annealed films were studied using spectrophotometric measurements of transmittance, T(λ), and reflectance, R(λ), at normal incidence of light in the wavelength range 200–2500 nm. Neither annealing temperature nor film thickness can influence spectral response on refractive index and absorption index of films. The type of electronic transition responsible for optical properties is indirectly allowed transition with energy gap of 1.94 eV and phonon energy of 40 meV. The dispersion of the refractive index is discussed in terms of the single oscillator Wemple–Didomenico (WD) model. The width of band tails of localized states into the gap (ΔE), the single oscillator energy (E_o), the dispersion energy (E_d), the optical dielectric constant (ε_∞), the lattice dielectric constant (ε_L), the plasma frequency (ω_p) and the free charge carrier concentration (N) were estimated.     

Structural and electrical properties of evaporated Fe thin films

Series of Fe thin films have been prepared by thermal evaporation onto glass and Si(1 0 0) substrates. The Rutherford backscattering (RBS), X-ray diffraction (XRD), Scanning electron microscopy (SEM) and the four point probe techniques have been used to investigate the structural and electrical properties of these Fe thin films as a function of the substrate, the Fe thickness t in the 76-431 nm range and the deposition rate. The Fe/Si samples have a 〈1 1 0〉 for all thicknesses, whereas the Fe/glass grows with a strong 〈1 0 0〉 texture; as t increases (>100 nm), the preferred orientation changes to 〈1 1 0〉. The compressive stress in Fe/Si remains constant over the whole thickness range and is greater than the one in Fe/glass which is relieved when t > 100 nm. The grain size D values are between 9.2 and 30 nm. The Fe/glass films are more electrically resistive than the Fe/Si(1 0 0) ones. Diffusion at the grain boundary seems to be the predominant factor in the electrical resistivity ρ values with the reflection coefficient R greater in Fe/glass than in Fe/Si. For the same thickness (100 nm), the decrease of the deposition rate from 4.3 to 0.3 Å/s did not affect the texture and the reflection coefficient R but led to an increase in D and a decrease in the strain and in ρ for both Fe/glass and Fe/Si systems. On the other hand, keeping the same deposition rate (0.3 Å/s) and increasing the thickness t from 76 to 100 nm induced different changes in the two systems.