Changes produced in the electrical resistivity of ErH2 thin films when converted to ErH3 due to hydrogen treatment

The resistivity of thin films (80–200 Å) of ErH₂ increases sharply when heated for 2 h at 300 °C in vacuum in the presence of hydrogen gas at 10^–2 Torr. This confirms that the films, originally metallic conductor, have become converted to semiconducting ErH₃ which is in conformity with the structural studies. The negative values of TCR also indicate the semiconducting nature of the hydrogen treated films. Activation energies of the films have been evaluated.     

Depth profiling of copper thin films by resonant laser ablation

In Resonant Laser Ablation (RLA), material is related and selectively ionized by a low-energy pulse from a tunable laser. The selectivity and efficiency allow detection and quantitation at very low concentrations. We demonstrate that RLA has potential use in profiling thin layer and multilayer structures. Quantitative results are reported on the analysis of 20 and 100 Å copper thin films on Si(110) surfaces. Removal rates range from 10^–3 to 10^–2 Å/shot. Prospects for interrogation of dopants and impurities are also evaluated.     

Thermal oxidation of n-type ZnN films made by -sputtering from a zinc nitride target, and their conversion into p-type films

Transparent p-type thin films, containing zinc oxide phases, have been fabricated from the oxidation of n-type zinc nitride films. The zinc nitride thin films were deposited by rf-magnetron sputtering from a zinc nitride target in pure N₂ and pure Ar plasma. Films deposited in Ar plasma were conductive (resistivity 4.7×10⁻² Ω cm and carrier concentrations around 10²⁰ cm⁻³) Zn-rich Zn_xN_y films of low transmittance, whereas Zn_xN_y films deposited in N₂ plasma showed high transmittance (>80%), but five orders of magnitude lower conductivity. Thermal oxidation up to 550 C converted all films into p-type materials, exhibiting high resistivity, 10²–10³ Ω cm, and carrier concentration around 10¹³ cm⁻³. However, upon oxidation, the Zn_xN_y films did not show the zinc oxide phase, whereas Zn-rich Zn_xN_y films were converted into films containing ZnO and ZnO₂ phases. All films exhibited transmittance >85% with a characteristic excitonic dip in the transmittance curve at 365 nm. Low temperature photoluminescence revealed the existence of exciton emissions at 3.36 and 3.305 eV for the p-type zinc oxide film.     

Dielectric constant and current transport for HfO2 thin films on ITO

The dielectric constant and leakage current mechanisms for HfO₂ thin films deposited on indium–tin–oxide using reactive rf sputtering deposition were examined. Indium–tin–oxide was selected as the bottom metal as it is of interest as an electrode in transparent field-effect transistor development. The dielectric constant of HfO₂ films was approximately 20 and did not vary significantly with deposition conditions. Temperature-dependent leakage current measurements indicate that Schottky emission is the dominant transport mechanism in films deposited at low temperature and/or low oxygen pressure. The HfO₂/indium–tin–oxide barrier height was extracted to be 1.1±0.2 eV. Films deposited at high temperature and/or oxygen pressure deviate from the Schottky emission model, presumably due to the formation of polycrystalline material with grain boundary conduction. PACS  73.61.Ng; 73.50.Lw; 77.55.+f     

Integration of GaN thin films to SiO2–Si(100) substrates by laser lift-off and wafer fusion method

A process methodology has been adopted to bond GaN thin films to Si(100) substrates using the combination of laser lift-off and direct wafer fusion. Using optimum excimer laser conditions, 2–10 μm of GaN is lifted-off from sapphire. The lifted-off thin film is cleared from gallium residual and then suitably treated in a hydrofluoric, nitric and acetic acid mixture to render the surface hydrophilic. This treatment provides van der Waals bonds to immediately contact bond with SiO₂–Si(100) substrate at room temperature. The bonds are further strengthened by a high temperature annealing at 650 C for 2 h. The structural and mechanical characteristics of the bonded structure reveal uniform and high quality bonding. The optical characteristics of the transferred bonded film on SiO₂–Si(100) substrate exhibit similar properties to that of GaN on sapphire. In a similar manner, high-brightness blue LEDs were transferred from sapphire to SiO₂–Si(100) substrate with no deterioration in the electrical and optical performance of the device.     

Processing of W/Si and Si/W bilayers and multilayers with single and multiple excimer-laser pulses

Interdiffusion phenomena, thermal damage and ablation of W/Si and Si/W bilayers and multilayers under XeCl-excimer laser (=308 nm) irradiation at fluences of 0.15, 0.3 and 0.6 J/cm² were studied. Samples were prepared by UHV e-beam evaporation onto oxidized Si. The thickness of W and Si layers and the total thickness of the structures were 1–20 nm and 40–100 nm, respectively. 1 to 300 laser pulses were directed to the same irradiation site. At 0.6 J/cm² the samples were damaged even by a single laser pulse. At 0.3 J/cm² WSi₂ silicide formation, surface roughening and ablation were observed. The threshold for significant changes depends on the number of pulses: it was between 3–10 pulses and 10–30 pulses for bilayers with W and Si surfaces, respectively, and more than 100 pulses for multilayers with the same total thickness of tungsten. At 0.15 J/cm² the periodicity of the multilayers was preserved. Temperature profiles in layered structures were obtained by numerical simulations. The observed differences of the resistance of various bilayers and multilayers against UV irradiation are discussed.     

Magnetoconductivity of thin epitaxial silver films

The magnetoconductance (MC) of thin epitaxial Ag films on Si(111) surfaces is studied as a function of film thickness (1–125 monolayers (ML)) at 20 K under ultra high vacuum (UHV) conditions. Three different regimes of magnetoconductance are observed depending on the degree of disorder in the films which is controlled by film thickness and annealing procedures. Thick films (d>3 ML) with diffuse electron transport show in the case of large elastic scattering times ₀ a classical, negative MC B ² and in the case of small ₀ a positive MC due to weak localization effects. The MC of thin films (d<2 ML) which have a conductance smaller than e ²/h, i.e. localized electron states, is negative again.     

Conversion electron Mossbauer spectroscopy of very thin iron films; Ultra-high vacuum equipment and preliminary measurements

The apparatus for preparation of ultra-thin iron films, heat and ion beam treatment, SIMS and LEED analysis and in situ CEMS measurements at vacuum better than 10^–8 Torr, has been constructed and tested. Preliminary data for thin iron films (3 Å - 30 Å), obtained by evaporation of⁵⁷Fe atoms on hot Si and Mo substrates are discussed.     

Infrared Optical Characterization of PLT Thin Films for Applications in Uncooled Infrared Detectors

Lanthanum-modified lead titanate (PLT) thin films have been grown directly on Pt/Ti/SiO₂/Si (100) and LaNiO₃/Si (100) substrates by a modified sol-gel method. X-ray diffraction analysis shows that the PLT thin films are polycrystalline. The infrared optical properties of the thin films were investigated using infrared spectroscopic ellipsometry (IRSE) in the spectral range of 2.5–12.5 m. By fitting the measured ellipsometric parameter (tan and cos) data with a three phase model (air/PLT/Pt) for the PLT thin films on Pt/Ti/SiO₂/Si (100) and a four phase model (air/PLT/LNO/Si) for the PLT thin films on LaNiO₃/Si (100) substrates, and a derived classical dispersion relation for the thin films, the optical constants and thicknesses of the thin films have been simultaneously obtained. The refractive index and extinction coefficient of the PLT thin films on Pt/Ti/SiO₂/Si (100) substrates are slightly larger than those on LaNiO₃/Si (100) substrates. Given the infrared semitransparent metal of Nickel currently used, the absorption of the Ni/PLT/Pt and Ni/PLT/LNO/Si multilayer thin films in this study is very large around 3.0 m and 5.7 m wavelength range and decrease to 15% or 20% in the 8–12.5 m wavelength region.     

Reactive pulsed laser deposition and laser induced crystallization of SnO2 transparent conducting thin films

Transparent conducting SnO₂ thin films with a thickness between 1000–2000 Å were deposited on glass, quartz and silicon substrates using standard pulsed laser deposition techniques with two different targets (Sri and SnO₂) and with three different laser wavelengths (1.06, 0.532 and 0.266 ) from a Q-switched Nd: YAG laser. Tin dioxide films with optical transmission over most of the visible spectrum exceeding 80% were obtained using a Sn target and a background oxygen pressure of 20 Pa. The electrical resistivity () depended strongly on the substrate temperature during deposition, with the lowest values of of about 10^–2 -cm obtained when the substrate was maintained at 400°C during deposition. Using SnO₂ targets, predominantly amorphous phase SnO₂ films were deposited on Si substrates and then transformed into polycrystalline Sn₃O₄ by laser induced crystallization ( = 1.06 m). Whereas these later films were essentially non-conducting as deposited ( > 400 -cm), the electrical resistivity was permanently reduced after laser induced crystallization by a factor greater than 1000 to a value of approximately 4 × 10^–1 -cm.     

Studies of the promising material CoSi2 on GaAs substrates

The thermal stability of CoSi₂ thin films on GaAs substrates has been studied using a variety of techniques. The CoSi₂ thin films were formed by depositing Co(500 Å) and Si(1800 Å) layers on GaAs substrates by electron-beam evaporation followed by annealing processes, where the Si inter-layer was used as a diffusion/reaction barrier at the interface. The resistivity of CoSi₂ thin films formed is about 30 cm. The Schottky barrier height of CoSi₂/n-GaAs is 0.76 eV and the ideality factor is 1.14 after annealing at 750° C for 30 min. The CoSi₂/GaAs interface is determined to be thermally stable and the thin film morphologically uniform on GaAs after 900° C/30 s anneal. The CoSi₂ thin films fulfill the requirements in GaAs self-aligned gate technology.     

Micro-Raman spectroscopy in polycrystalline CuInSe2 formation

The crystalline formation of CuInSe₂ thin films has been investigated using micro-Raman spectroscopy and AES composition analysis. It is confirmed that the Raman peaks are stongly dependent on the surface morphology and the Cu:In:Se ratio. In the films annealed at 315°C, crystalline grains larger than 2 m show Raman peaks at 174 cm^–1 and 258 cm^–1. The In content is very low and the Cu:Se ratio is about 1:1 in these grains. The low In concentration is thought to be due to the formation of In₂O₃ on the surface. On the other hand, random structures of 1–2 m grains found in films annealed at temperatures below 305°C show peaks at 174 cm^–1 and 186 cm^–1 instead of 258 cm^–1 and have a Cu:In:Se ratio of 1:1:3–4. Thus the 186 cm^–1 peak is thought to be related to a Cu, In-deficient phase when compared to stoichiometric CuInSe₂. The optimum annealing condition was found by analyzing the Raman spectra and composition of different crystalline CuInSe₂ grains. Films annealed under this condition exhibited a clear Raman peak at 174 cm^–1 and consisted of clusters of crystals less than 1 m in size.     

Silicon carbide synthesis with energy pulses

Polycrystalline SiC layers were synthesized through nanosecond pulse heating of thin carbon films deposited on single-crystalline silicon wafers. The samples were submitted to electron beam irradiation (25 keV, 50 ns) at various current densities in vacuum (10^–4mbar) and to XeCl excimer laser pulses (308 nm, 15ns) in air. Rutherford backscattering spectrometry (RBS) showed that in the e-beam annealed samples mixing of the elements at the interface starts at current densities of about 1200 A/cm². The mixed layer thickness increases almost linearly with current density. From the RBS spectra a composition of the intermixed layers close to the SiC compound was deduced. Transmission electron microscopy (TEM) and electron diffraction studies clearly evidenced the formation of SiC polycrystals. Using the XeCl excimer laser, intermixing of the deposited C film with the Si substrate was observed after a single 0.3 J/cm² pulse. Further analysis evidenced the formation of SiC nanocrystals, embedded in a diamond film.     

New high-resolution electrostatic electron spectrometer for conversion electron Mössbauer spectroscopy

The construction and performance of a new electron spectrometer using an electrostatic 90°-spherical deflection analyzer (SDA) is described. The spectrometer is suited for depth-selective conversion-electron Mössbauer spectroscopy (DCEMS) on surfaces and thin films in ultra-high vacuum (UHV) at temperatures ranging between 40–1000K using K- and L-conversion electrons of⁵⁷Fe. The spectrometer is designed for 2% electron-energy resolution and about 5% (of 4) transmission for 7.3 keV K-conversion electrons of⁵⁷Fe. The energy resolution has been confirmed experimentally. We demonstrate that DCEMS in general and our instrument in particular are capable of detecting a thin (50 Fe Å) Mössbauer-inert buried oxide layer located at the surface of a stainless steel substrate and covered by an Fe/Cr bilayer.     

Oxygen diffusion through thin Pt films on Si(100)

We have investigated the diffusion of oxygen through evaporated platinum films on Si(100) upon exposure to air using substrates covered with Pt films of spatially and continuously varying thickness (0–500 Å). Film compositions and morphologies before and after silicidation were characterized by modified crater edge profiling using scanning Auger microscopy, energy-dispersive X-ray microanalysis, scanning tunneling microscopy, and transmission electron microscopy. We find that oxygen diffuses through a Pt layer of up to 170 Å forming an oxide at the interface. In this thickness range, silicide formation during annealing is inhibited and is eventually stopped by the development of a continuous oxide layer. Since the platinum film consists of a continuous layer of nanometer-size crystallites, grain boundary diffusion of oxygen is the most probable way for oxygen incorporation. The diffusion constant is of the order of 10^–19 cm²/s with the precise value depending on the film morphology.     

Fabrication and properties of ZnO:Cu and ZnO:Ag thin films

Thin films of ZnS and ZnO:Cu were grown by an original metal–organic chemical vapour deposition (MOCVD) method under atmospheric pressure onto glass substrates. Pulse photo-assisted rapid thermal annealing of ZnO:Cu films in ambient air and at the temperature of 700–800 C was used instead of the common long-duration annealing in a vacuum furnace. ZnO:Ag thin films were prepared by oxidation and Ag doping of ZnS films. At first a closed space sublimation technique was used for Ag doping of ZnO films. The oxidation and Ag doping were carried out by a new non-vacuum method at a temperature >500 C. Crystal quality and optical properties were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM), and photoluminescence (PL). It was found that the doped films have a higher degree of crystallinity than undoped films. The spectra of as-deposited ZnO:Cu films contained the bands typical for copper, i.e. the green band and the yellow band. After pulse annealing at high temperature the 410 and 435 nm photoluminescent peaks were observed. This allows changing of the emission colour from blue to white. Flat-top ZnO:Ag films were obtained with the surface roughness of 7 nm. These samples show a strong ultraviolet (UV) emission at room temperature. The 385 nm photoluminescent peak obtained is assigned to the exciton–exciton emission.     

Optical CO gas sensing using nanostructured NiO and NiO/SiO2 nanocomposites fabricated by PLD and sol–gel methods

Several kinds of NiO-based nanostructured films were prepared by pulsed-laser deposition (PLD) and sol–gel method, and CO sensing properties (1%, balanced by N₂) of these films were studied. The sensitivity, defined as a difference of optical transmittance by gas atmospheric change (T=T(CO)-T(air)), increased with increasing NiO content for the sol–gel prepared films, and increased with the film thickness for the laser deposited NiO films. Sol–gel films exhibited shorter response time than NiO films prepared by PLD under low Ar pressure of 6.7×10^-2 Pa indicating a better gas permeability. A shorter response time was also obtained upon raising argon pressure from 6.7×10^-2 Pa to 8.0 Pa during laser ablation due to the morphological change. Covering a NiO film even with a very thin (0.8 nm) layer of SiO₂ by sputtering drastically reduced the CO sensitivity. The multilayered NiO/SiO₂ films were substantially less sensitive to the CO gas than NiO films due to the same reason. Sensing mechanism of the NiO films is due to catalytic CO oxidation that reduces the concentration of adsorbed O₂ species and results in optical transmittance increase upon change in the environment from air to CO. PACS 81.15.Fg; 81.20.Fw; 83.85.Gk     

Optical bistability in fluorescein dyes

Optical bistability has been observed in highly concentrated fluorescein dye solutions and in thin (1 m) doped polymeric films. At concentrations larger than 10^–5 mole/l dye dimers are formed. For fluorescein dye, the dimer-monomer equilibrium constant is 10⁵ l/mole so that most of the dye species are in the dimer form. At 480 nm the dimer absorption cross section is 10^–18 cm²/molecule, while that for the dye monomer molecule is 7.6×10^–17 cm²/molecule. Upon laser excitation dimers dissociate to form monomers thus providing a highly nonlinear laser induced absorption. This high nonlinear absorption coefficient can be utilized for optically bistable response of the dye system.Optical bistability was observed by placing dye solutions or dye thin films inside a Fabry-Perot resonator and exciting it with 480 nm dye laser pulses of 10 ns duration. The effect is more pronounced in 10^–4 mole/l fluorescein than in 10^–6 mole/l fluorescein in which dimer formation is not that efficient.In disodium fluorescein no significant dimer formation is observed even at 10^–3 mole/l dye concentration. The observed bistability both in solution and in thin films can be explained in terms of recent models for optical bistability in nonlinearly absorbing molecular systems.     

Raman-spectroscopy study of PbTiO3 thin films grown on Si substrates by metalorganic chemical vapor deposition

Raman spectra have been investigated in PbTiO₃ thin films grown on Si by metalorganic chemical vapor deposition. A large grazing-angle scattering technique was taken to measure the temperature dependence of Raman spectra below room temperature. All Raman modes in the thin films are assigned and compared with those in the bulk single crystal, a newA ₁(TO) soft mode at 104 cm^–1 was recorded which satisfies the Curie-Weiss relation ² =A(T _c –T). Intensities of theA ₁(1TO) andE(1TO) modes were anomalously strengthened with increasing temperature. Raman modes for the thin films exhibit remarkable frequency downshift and upshift which is related to the effect of internal stress.     

Reactive Ion Beams Sputtering of Vanadium Oxides Films for Uncooled Microbolometer

Vanadium oxides thin films for uncooled bolometric detectors have been fabricated on Si₃N₄-film-coated Si substrates by low temperature reactive ion beam sputtering in a controlled oxygen atmosphere. The typical growth temperature is kept at 200°C during sputtering, which is compatible with the post-CMOS technology. The as-deposited film exhibits sheet resistance and temperature coefficient resistant of 32 k and –0.025 K^–1 at room temperature, respectively.