Effects of ion implantation on intermediate range order: IR spectra of silica

The reflectance spectra of ion implanted SiO₂ glasses has been measured from 5000 cm⁻¹ to 400 cm⁻¹. The silica was implanted with Ti, Cr, Mn, Fe, Cu and Bi to nominal doses ranging from 1×10¹⁵ ions/cm² to 1.2×10¹⁷ ions/cm² at an energy of 160 keV and currents of approximately 2.6 μA/cm². Changes in the intensity of the 1232 cm⁻¹ and 1015 cm⁻¹ vibrational modes are attributed to changes in the intermediate range order (IRO) and to changes in the concentration of non-bridging oxygen (NBO) defects in the implanted layer. These changes are ion and dose dependent. The differing effects on IRO and NBO are attributed to the chemical interaction of the implanted ions with the substrate.     

Effects of ArF excimer irradiation on single energy and multi energy Ge ion implanted silica

Some of the effects of ArF excimer irradiation on the optical bands produced by single energy (4 MeV) and multi energy (highest energy 4 MeV) Ge implantations in silica (Type III) have been determined. Ge ions were implanted at 4 MeV with nominal doses of 1.25, 2.5 and 5.0×10¹⁵ ions/cm². A second series of samples was made using implant energies ranging from 4 to 0.7 MeV. The doses at each energy were varied to maintain an approximate constant implant species concentration with the total number of ions implanted being 10×10¹⁵ and 5×10¹⁵ cm⁻² for concentrations of 0.042 and 0.021 at.%, respectively. The optical absorption was measured from 2.8 to 6.5 eV. The absorption of samples was then measured after 6.4 eV ArF excimer radiation with a fluence of 44 mJ/cm² per pulse for pulse totals of 3, 11 and 31. We fit the observed spectra for the as-implanted samples and the samples after each ArF exposure to the minimum number of bands attributed to intrinsic states in SiO₂ required to fit the data within ±2%. The magnitude and response of these absorption bands to the ArF irradiation was a function of dose and implant conditions.     

Changes in the refractive index of fused silica due to implantation of transition-metal ions

The changes in the refractive index of high purity silica glass produced by implantation of Ti⁺, Cr⁺, Mn⁺, Fe⁺ and Cu⁺ ions at 160 keV were measured using ellipsometry at a wavelength of 633 nm. Implantation doses ranged from 10¹⁵ to 6 × 10¹⁶ ions cm⁻². At the highest doses, a relative increase in refractive index of approximately 15% for implanted Cu ions and an increase of about half that for implanted Cr, Mn and Fe ions are observed. These variations in index probably result from colloid formation. For implanted Ti, virtually no change in the measured index of refraction was observed even at the highest doses.     

Ion-implanted treatment of (Ba,Sr)TiO3 films for DRAM applications

The effects of ion implantation on the properties of spin-on sol–gel Ba_0.7Sr_0.3TiO₃ (BST) thin films were studied by implanted Ar⁺, N⁺, and F⁺ doses. The F⁺-implanted BST samples present leakage current density <10⁻⁶ A/cm² at 2.5 V and dielectric constant 450. The leakage current of F⁺-implanted BST samples was reduced about one order of magnitude as compared with that of samples with implanted Ar⁺, N⁺ or without implantation. The thickness shrinkage from 135 to 115 nm was observed in F⁺-implanted BST films (before annealing treatment) and a respective increase in the refractive index from 1.84 to 2.05 was measured. After annealing the implanted samples, the changes of thickness and refractive index depend on the concentration of implanted dose. Based on an infrared transmission study of the samples we suggest that the ion-implanted samples with smaller dose (5×10¹⁴ cm⁻²) have fewer −OH contaminants than the non-implanted or implanted samples with the larger doses (1×10¹⁵ cm⁻²). Based on the results presented, we conclude that suitable ion implantation densifies the spin-on sol–gel BST films and reduces the −OH contaminants in the films.     

Disclination loops observed in ion irradiated Ni---Mo amorphous films and their fractal characteristics

Ni₆₅Mo₃₅ amorphous alloy films were obtained by 200 keV xenon ion mixing of multilayered Ni---Mo films at room temperature with doses greater than 7 × 10¹⁴ Xe/cm². When the dose was increased to 7 × 10¹⁵ Xe/cm², corresponding to the amorphous-to-crystalline phase transition, many odd lines were observed, for the first time, in transmission electron micrographs of the ion mixed amorphous matrix. After excluding other possible explanations, these lines were attributed to disclination loops, which can be considered as an analogue of dislocations in crystalline materials. Scaling analysis showed that the loops featured self-similarity and had a common fractal dimension, D_f, of 1.20 for a particular length scale.     

A novel technique to reduce the concentration of carbon in LEC gallium arsenide

An in-situ method has been developed to reduce the concentration of carbon in the liquid encapsulated growth of gallium arsenide. Sublimated As₂O₃ was bubbled through a GaAs melt to remove carbon via the production of CO₂. When a melt of known high starting carbon concentration ( 30 × 10¹⁴ atoms/cm³) was bubbled with As₂O₃, the subsequent crystal contained 4 × 10 ¹⁴ carbon atoms/cm³. This low carbon crystal was subsequently carbon doped and regrown, demonstrating the ability to return As₂O₃ treated GaAs to desired carbon concentrations and electrical properties.     

Ion implantation effects in heavy metal fluoride glasses

Samples of a heavy metal fluoride glass (BInZnYbTGa) were subjected to argon and nitrogen irradiations of energies of 50 and 100 keV and fluences of 5×10¹⁶ and 1×10¹⁷ ions/cm². A 10 keV Ar irradiation at the ion dose of 1×10¹⁷/cm² was also performed. Modifications induced by the implants were characterized by nuclear microanalysis, electron spectroscopy, scanning electron microscopy and optical techniques. Surface precipitation of Th and Ba, as well as F and In depletion, were detected. Correlated modifications of the optical transmittance and reflectance were observed.     

Gettering properties of PrO2 in In0.53Ga0.47As LPE growth

Praseodymium oxide was used for the gettering of background impurities from the melt, during In_0.53Ga_0.47As/InP LPE growth. The low amount of PrO₂ in the growth solution enables one to prepare n-type In_0.53Ga_0.47As epitaxial layers with electron concentration in the range of 2 × 10¹⁴ to 2 × 10¹⁶ cm^-3 and electron mobilities of 11,000 and 8400 cm²/V·s, respectively. These results were achieved without long time baking of the melt; homogenization lasted only 1 h. The electrical parameters and photoluminescence spectra of the grown layers are presented.     

Comparative analysis of characteristics of Si, Mg, and undoped GaN

We have grown undoped, Si- and Mg-doped GaN epilayers using metalorganic chemical vapor deposition. The grown samples have electron Hall mobilities (carrier concentrations) of 798 cm²/V s (7×10¹⁶ cm⁻³) for undoped GaN and 287 cm²/V s (2.2×10¹⁸ cm⁻³) for Si-doped GaN. Mg-doped GaN shows a high hole concentration of 8×10¹⁷ cm⁻³ and a low resistivity of 0.8 Ω cm. When compared with undoped GaN, Si and Mg dopings increase the threading dislocation density in GaN films by one order and two orders, respectively. Besides, it was observed that the Mg doping causes an additional biaxial compressive stress of 0.095 GPa compared with both undoped and Si-doped GaN layers, which is due to the incorporation of large amount of Mg atoms (4–5×10¹⁹ cm⁻³).     

Growth by self-flux method and post-annealing effect of Bi2Sr2Ca1Cu2Ox single crystals

Post-annealing effects on superconducting characteristics have been studied in Bi₂Sr₂Ca₁Cu₂O_x single crystals grown by a conventional flux method. Also, favorable growth conditions and the effect of the pre-sintering process on the starting materials for flux growth have been examined. The best superconducting behavior is obtained in post-annealed crystals grown from pre-sintered powder materials. The critical current density J_c estimated from magnetization hysteresis in annealed crystals grown with pre-sintered materials is roughly 8×10⁵ A/cm² (Hc) and 5×10⁴ A/cm² (Hc) at 4.2 K at zero field.     

Monte Carlo simulations of Meyer-Neldel effect on carrier time-of-flight in a-Si:H

We present Monte Carlo simulations of multiple-trapping transport with Meyer-Neldel effect in a-Si:H assuming exponential band tails. The transit time t_T, and the dispersion parameters, ₁ and ₂, before and after the transit time, are extracted from the simulated currents. The simulations show that including the Meyer-Neldel effect improves the agreement of ₁ and ₂ with experimental data, both at low and high temperatures and fits the time-of-flight drift mobility measurements. Best fits to the data yield T₀ = 263 K, T_{MN = 464 K}, v₀₀ = 5 × 10⁹ s⁻¹ and μ₀ = 4 cm² V⁻¹ s⁻¹ for electrons and T₀ = 409 K, T_{MN = 809 K}, v₀₀ = 6.5 × 10¹⁰ s⁻¹ and μ₀ = 0.5 cm² V⁻¹ for holes.     

Growth and spectral properties of Nd-doped Sr3Y(BO3)3 crystal

A new crystal of Nd³⁺:Sr₃Y(BO₃)₃ with dimension up to 25×35 mm² was grown by Czochralski method. Absorption and emission spectra of Nd³⁺: Sr₃Y(BO₃)₃ were investigated . The absorption band at 807 nm has a FWHM of 18 nm. The absorption and emission cross sections are 2.17×10⁻²⁰ cm² at 807 nm and 1.88×10⁻¹⁹ cm² at 1060 nm, respectively. The luminescence lifetime τ_f is 73 μs at room temperature     

Growth and spectral properties of Nd:LaVO4 crystal

This paper reports the growth and spectral properties of 3.5 at% Nd³⁺:LaVO₄ crystal with diameter of 20×15 mm² which has been grown by the Czochralski method. The spectral parameters were calculated based on Judd–Ofelt theory. The intensity parameters Ω_λ are: Ω₂=2.102×10⁻²⁰ cm², Ω₄=3.871×10⁻²⁰ cm², Ω₆=3.235×10⁻²⁰ cm². The radiative lifetime τ_r is 209 μs and calculated fluorescence branch ratios are: β₁(0.88μm)=45.2, β₂(1.06μm)=46.7, β₃(1.34μm)=8.1. The measured fluorescence lifetime τ_f is 137 μm and the quantum efficiency η is 65.6%. The absorption band at 808 nm wavelength has an FWHM of 20 nm. The absorption and emission cross sections are 3×10⁻²⁰ and 6.13×10⁻²⁰ cm², respectively.     

多孔坩埚温度梯度法生长Ho,Y∶CaF2晶体及其光谱性能

采用自主设计改造的温梯炉,成功生长了不同浓度Ho³⁺、Y³⁺掺杂的CaF₂及Sr_xCa_1-xF₂晶体,晶体尺寸约为ϕ15 mm×55 mm,生长周期约为6 d,能够实现7种不同浓度晶体的同步生长,并选取其中的4%(原子数分数)Ho,4%Y∶CaF₂晶体进行分析,吸收测试表明,该晶体448 nm和643 nm处吸收峰的吸收截面分别是1.13×10^-20 cm²和0.84×10^-20 cm², J-O理论分析得到了晶场强度参数Ω_t(t=2、4、6)、辐射跃迁几率、荧光分支比和辐射寿命。在448 nm氙灯激发下,经计算得到该晶体在546 nm、650 nm 和752 nm处的发射截面分别为10.450×10^-21 cm²、8.737×10^-21 cm²和5.965×10^-21 cm²,测得⁵F₄和⁵F₅能级的寿命分别为33.5 μs和17.7 μs。在640 nm LD泵浦激发下,经计算得到该晶体2 031 nm处发射截面为5.375×10^-21 cm²,2 847 nm处发射截面为10.356×10^-21 cm²,测得⁵I₇和⁵I₆ 能级的寿命分别为4.37 ms 和1.85 ms。以上结果表明,多孔坩埚温梯法能够大大提高激光晶体稀土离子掺杂浓度筛选的效率,加快新型激光晶体材料的研发速度。     

Growth of carbon-doped base GaAs/AlGaAs HBT by gas-source MBE using TEG, TEA, TMG, AsH3, and Si2H6

High-performance carbon-doped-base GaAs/AlGaAs heterobipolar transistors (HBTs) were grown by gas-source MBE using only gaseous sources including dopant sources. The AlGaAs emitter layer was doped with Si from uncracked SI₂H₆ (n = 9 × 10¹⁷ cm^-3), and the base layer (92.5 nm) was doped with carbon from TMG (p = 4 × 10¹⁹ cm^-3). From SIMS analysis it was confirmed that a well-defined emitter-base junction with sharp carbon profile was obtained. The base-current ideality factor from the Gummel plot was 1.47, and the emitter-base junction ideality factor was 1.12. A high DC current gain of 53 was obtained at a current density of 4 × 10⁴ A/cm². The device characteristics of our carbon-doped HBTs were found to be stable under current stress.     

SiC epitaxial layer growth in a novel multi-wafer vapor-phase epitaxial (VPE) reactor

Experimental results are presented for SiC epitaxial layer growths employing a unique planetary SiC-VPE reactor. The high-throughput, multi-wafer (7×2″) reactor, was designed for atmospheric and reduced pressure operation at temperatures up to and exceeding 1600°C. Specular epitaxial layers have been grown in the reactor at growth rates ranging from 3–5 μm/h. The thickest layer grown to date is 42 μm thick. The layers exhibit minimum unintentional n-type doping of 1×10¹⁵ cm⁻³, and room temperature mobilities of 1000 cm²/V s. Intentional n-type doping from 5×10¹⁵ cm⁻³ to >1×10¹⁹ cm⁻³ has been achieved. Intrawafer layer thickness and doping uniformities (standard deviation/mean at 1×10¹⁶ cm⁻³) are typically 4 and 7%, respectively, on 35 mm diameter substrates. Moderately doped, 4×10¹⁷ cm⁻³, layers, exhibit 3% doping uniformity. Recently, 3% thickness and 10% doping uniformity (at 1×10¹⁶ cm⁻³) has been demonstrated on 50 mm substrates. Within a run, wafer-to-wafer thickness deviation averages 9%. Doping variation, initially ranging as much as a factor of two from the highest to the lowest doped wafer, has been reduced to 13% at 1×10¹⁶ cm⁻³, by reducing susceptor temperature nonuniformity and eliminating exposed susceptor graphite. Ongoing developments intended to further improve layer uniformity and run-to-run reproducibility, are also presented.     

The growth and physics of ultra-high-mobility two-dimensional hole gas on (311)A GaAs surface

We report on the molecular beam epitaxy growth of modulation-doped GaAs-(Ga,Al)As heterostructures on the (311)A GaAs surface using silicon as the acceptor. Two-dimensional hole gases (2DHGs) with low-temperature hole mobility exceeding 1.2×10⁶ cm² V⁻¹ s⁻¹ with carrier concentrations as low as 0.8×10¹¹ cm⁻² have been obtained. This hole mobility is the highest ever observed at such low densities by any growth technique. We also report the first observation of persistent photoconductivity in a 2DHG. An analysis of the number density and temperature dependence of the mobility leads us to conclude that the mobility is limited by phonon scattering above 4 K and interface scattering at lower temperatures.     

Cation site occupation by Ag/Na ion-exchange in R2O–Al2O3–SiO2 glasses

Ag⁺/Na⁺ ion-exchanged R₂O–Al₂O₃–SiO₂ glasses with uniform concentration profile of Ag⁺ and Na⁺ were prepared by heat treatment in molten silver salt followed by holding at the same temperature in an ambient atmosphere. Their glass transition temperature (T_g) and thermal expansion coefficient (TEC) were measured and structures were investigated using ²⁹Si-MAS NMR, ²⁷Al-MAS NMR, IR and Raman spectroscopies. Both T_g and TEC decreased with increase of the exchange ratio, but T_g was still above the ion-exchange temperature of 400°C even for the fully exchanged sample. The ²⁹Si- and ²⁷Al-MAS NMR spectra were mostly unchanged and no sign of the structural alteration of the glass network was observed. On the other hand, the vibrational spectra showed remarkable peak shifts depending on the exchange ratio. From these structural results, it was found that when the exchange ratio was low, the introduced Ag⁺ ions were stabilized at the non-bridging oxygen (NBO) site, and then Na⁺ ions in AlØ₄ site were exchanged by Ag⁺ ions after full replacement of NBO sites, where Ø represents the bridging oxygen.     

Tin and tellurium doping of InAs using SnTe in molecular beam epitaxy (MBE)

Tin telluride (SnTe) was utilized as an n-type dopant in the MBE growth of InAs epitaxial layers on GaAs substrates. The highest carrier concentration obtained was 2.9 × 10¹⁹ cm^-3 and the carrier density could be varied over three orders of magnitude by changing the SnTe source temperature. The highest mobilities obtained were 16,900 and 23,300 cm²/V … s at 300 and 77 K, respectively, for carrier concentration of 5 × 10¹⁶ cm^-3. Both Sn and Te were incorporated in the layers as determined by secondary ion mass spectroscopy (SIMS) analysis and the total concentration of Sn and Te were the same as the carrier density in the layer.     

Ba3Bi2(PO4)4∶Tb3+荧光粉的制备与性能研究

利用高温固相反应法制备出Ba₃Bi_2-x(PO₄)₄∶xTb³⁺(x=0.05,0.1,0.15,0.3,0.4,0.5)绿色荧光粉。通过X射线衍射仪、扫描电子显微镜、积分球式分光光度计和荧光光谱仪等对样品进行了分析。结果表明,所制备的样品均为Ba₃Bi₂(PO₄)₄纯相,Ba₃Bi_1.7(PO₄)₄∶0.3Tb³⁺的带隙估计值为4.21 eV。当激发光的波长为377 nm时,样品的发射光谱的波峰位于543 nm、584 nm和619 nm处,分别对应于Tb³⁺的⁵D₄→⁷F₅、⁵D₄→⁷F₄和⁵D₄→⁷F₃的能级跃迁。随着Tb³⁺掺杂浓度的增加,样品的发光强度先增强后减弱,当x=0.3时,发光强度最大。计算表明最近邻离子在Ba₃Bi_2-x(PO₄)₄∶xTb³⁺荧光粉的浓度猝灭中起主要作用。随着测试温度的升高,发光强度变化不大,表明样品具有优异的热稳定性能。CIE色坐标图表明所制备的样品可以被紫外光有效激发而发出绿光。