Si离子注入和H等离子体处理对单晶Si中空腔生长的影响研究

室温下首先采用160keVHe离子注入单晶Si样品到剂量5×10¹⁶ions/cm²,部分样品再接受80keVSi离子辐照到较高的剂量5×10¹⁵ions/cm²或接受高密度H等离子体处理.应用透射电镜观测分析了800℃高温退火引起的空腔的形成形貌.结果表明,附加Si离子辐照或H等离子体处理会影响Si中空腔的生长.就Si离子附加辐照而言,由于辐照引入富余的间隙子型缺陷,因此,它会抑制空腔的生长,而高密度H等离子体处理则有助于空腔的生长.定性地讨论了实验结果.     

离子注入掺杂锐钛矿TiO2薄膜的光学性能

 在玻璃基体上,采用射频磁控溅射方法在不同的基体温度下制备了TiO₂薄膜,然后在薄膜中注入注量分别为5×1016, 1×1017和5×1017/cm2的N离子以制备N掺杂的TiO₂薄膜。X射线衍射结果表明：制备出的TiO₂薄膜为锐钛矿型。X射线光电子能谱研究结果表明：注入的N离子与TiO₂晶粒相互作用,形成了含氮的TiO_xN_2-x化合物,从而改变了TiO₂薄膜的吸收边;随N离子注量增加,吸收边移动更明显;同时,由于氮离子注入产生的辐照缺陷使TiO₂薄膜在紫外和可见光区的吸收也明显增强。     

VIOLET LIGHT-EMISSION FROM Ge+-IMPLANTED SiO2 FILMS ON Si SUBSTRATE

Germanium ions were implanted into SiO₂ films which were thermally grown on crystalline Si at an energy of 60 keV and with doses of 1×10¹⁵ and 1×10¹⁶ cm^-2.Under an ultraviolet excitation of ～5.0 eV,the implanted f ilms annealed at various temperatures exhibit intense violet luminescence with a peak at 396 nm.It is ascribed to the T₁→S₀ transition in GeO,which was formed during implantation and annealing process.     

Investigation of PL properties of C-doped SiO2/Si samples after high energy Pb ion irradiation

Amorphous SiO₂ thin films with about 400—500 nm in thickness were thermally grown on single crystalline silicon. These SiO₂/Si samples were firstly implanted at room temperature (RT) with 100 keV carbon ions to 2.0×10¹⁷, 5.0×10¹⁷ or 1.2×10¹⁸ ions/cm², then irradiated at RT by 853 MeV Pb ions to 5.0×10¹¹, 1.0×10¹², 2.0×10¹² or 5.0×10¹² ions/cm², respectively. The variation of photoluminescence (PL) properties of these samples was analyzed at RT using a fluorescent spectroscopy. The obtained results showed that Pb-ion irradiations led to significant changes of the PL properties of the carbon ion implanted SiO₂ films. For examples, 5.0×10¹² Pb-ions/cm² irradiation produced huge blue and green light-emitters in 2.0×10¹⁷ C-ions/cm² implanted samples, which resulted in the appearance of two intense PL peaks at about 2.64 and 2.19 eV. For 5.0×10¹⁷ carbon-ions/cm² implanted samples, 2.0×10¹² Pb-ions/cm² irradiation could induce the formation of a strong and wide violet band at about 2.90 eV, whereas 5.0×10¹² Pb-ions/cm² irradiation could create double peaks of light emissions at about 2.23 and 2.83 eV. There is no observable PL peak in the 1.2×10¹⁸ carbon-ions/cm² implanted samples whether it was irradiated with Pb ions or not. All these results implied that special light emitters could be achieved by using proper ion implantation and irradiation conditions, and it will be very useful for the synthesis of new type of SiO₂-based light-emission materials.     

Ar离子辐照非晶态合金引起的尺寸变化

利用兰州重离子加速器(HIRFL)提供的2.79MeV/u Ar离子,在50K以下的低温辐照了Fe₄₇Ni₂₉V₂Si₆B₁₆等4种非晶态合金样品,室温下使用光学显微镜对辐照前、后的同一样品拍照,对比测量了样品的宏观尺寸. 结果表明:在辐照剂量为1.5×10¹⁴离子/cm²时,非晶态合金形变不明显,测量到的样品宽度相对增长Δb/b₀均小于1.0%;当辐照剂量增加到1.6×10¹⁵离子/cm²时,所有非晶态合金样品都发生了显著的形变,其宽度相对增长分布在4.3%—12.0%之间,对此结果进行了定性的分析.     

电子束在VO2薄膜中引起的价态、相结构和光学性能的改变

 利用能量为1.7MeV, 注量分别为1.25×10¹³/cm², 1.25×10¹⁴/cm², 1.25×10¹⁵/cm²的电子束辐照VO₂薄膜,采用XPS, XRD等测试手段对电子辐照前后的样品进行分析,并研究了电子辐照对样品相变过程中光透射特性的影响。结果表明电子辐照引起VO₂薄膜中V离子出现价态变化现象,并使薄膜的X射线衍射峰发生变化。电子辐照在样品中产生的这些变化显著改变了VO₂薄膜的热致相变光学特性。     

离子辐照产生的空位型缺陷对Si中B原子热扩散的影响

使用二次离子质谱仪分析了附加的空位型缺陷对单晶Si中注入B原子热扩散的影响. Si中B原子是通过30keV B离子室温注入而引入的, 注入剂量为2×10¹⁴cm^－2. Si中附加的空位型缺陷通过两种方式产生: 一是采用40或160keV He离子注入单晶Si到剂量5×10¹⁶cm^－2,并经800°C退火1h; 二是采用0.5MeV F或O离子辐照单晶Si到剂量5×10¹⁵cm^－2.结果显示, 不同方式产生的附加的空位型缺陷均能抑制注入的B原子在随后热激活退火中发生瞬间增强扩散效应, 并且抑制的效果依赖于离子的种类和离子的能量. 结合透射电子显微镜和卢瑟福背散射分析结果对以上抑制效应进行了定性的讨论.     

快重离子辐照引起Ni/SiO2界面原子混合及相变研究

在室温下用308 MeV的Xe离子和853 MeV的Pb离子辐照Ni/SiO2样品, 用卢瑟福背散射和X射线衍射技术对样品进行了分析。 通过分析Ni/SiO2样品中元素成分分布和结构随离子辐照剂量和电子能损的变化, 探索了离子辐照在Ni/SiO2样品中引起的界面原子混合与结构相变现象。 实验结果显示, Xe和Pb离子辐照均能引起明显的Ni原子向SiO2基体的扩散并导致界面附近Ni, Si和O原子的混合。 实验观测到低剂量Xe离子辐照可产生NiSi2相, 而高剂量Xe离子辐照则导致了Ni3Si和NiO相的形成。 根据热峰模型, Ni原子的扩散和新相的形成可能由沿离子入射路径强电子激发引起的瞬间热峰过程驱动。Ni/SiO2 interface were irradiated at room temperature with 308 MeV Xe ions to 1×1012, 5×1012 Xe/cm2 and 853 MeV Pb ions to 5×1011 Pb/cm2, respectively. These samples were analyzed using Rutherford Backscattering Spectrometry (RBS) and X ray diffraction spectroscopy (XRD), from which the intermixing and phase change were investigated. The obtained results show that both Xe and Pb ions could induce diffusion of Ni atoms to SiO2 substrates and result in intermixing of Ni with SiO2. Furthermore, 1.0×1012 Xe/cm2 irradiation induced the formation of NiSi2 and 5.0×1012 Xe/cm2 irradiation created Ni3Si and NiO phases. The diffusion of Ni atoms and the formation of new phase may be driven by a transient thermal spike process induced by the intense electronic energy loss along the incident ion path.     

电子通量对ZnO/K2SiO3热控涂层光学性能的影响

 研究了电子通量对ZnO/K₂SiO₃热控涂层光学性能的影响。分别采用通量为5×10¹¹/cm²·s，8×10¹¹/cm²·s，1×10¹²/cm²·s 和5×10¹²/cm²·s的电子对试样进行辐照。电子辐照下涂层的光学性能发生了退化，并且发现了退化涂层在空气中的“漂白”现象。分析了ZnO/K₂SiO₃热控涂层光学性能的退化机制，同时讨论了电子通量对太阳光谱吸收系数的影响。实验结果发现，在5×10¹¹～1×10¹²/cm²·s的电子通量范围内，电子通量对ZnO/K₂SiO³热控涂层光学性能的影响相同。因此在这个电子通量范围内，采用加速地面试验来模拟空间的电子辐照效应是有效的。     

Raman scattering investigation of C-doped a-SiO_2 after high energy heavy ion irradiations

Thermally grown amorphous SiO₂ films were implanted at room temperature with 100 keV C-ions to 5.0×10¹⁷ or 1.2×10¹⁸ ions/cm². These samples were irradiated at room temperature with 853 MeV Pb-ions to 5.0×10¹¹, 1.0×10¹², 5.0×10¹² ions/cm², or with 308 MeV Xe-ions to 1.0×10¹², 1.0×10¹³, 1.0×10¹⁴ ions/cm², respectively. Then the samples were investigated using micro-Raman spectroscopy. From the obtained Raman spectra, we deduced that Si--C bonds and sp² carbon sites were created and nano-inclusions may also be produced in the heavy ion irradiated C-doped SiO₂. Furthermore, some results show that Pb ion irradiations could produce larger size inclusions than Xe ions and the inclusion size decreased with increasing the irradiation fluence. The possible modification process of C-doped a-SiO₂ under swift heavy ion irradiations was briefly discussed.     

Sm3+在玻璃中的发光以及Sb6+、Ce6+、Gd3+对Sm3+发光性质的影响

本文研究了单掺(Sm3+,Ce3+、Gd3+.Sb3+、双掺(Sm3++Ce3+、Sm3++Gd3+,Sm3++Sb3+)和兰掺(Sm3++Gd3++Ce3+)约四十余种不同玻璃的发射谱和激发谱.探讨了玻璃成份和掺杂离子浓度对Sm3+发光性质的影响以及Ce3+,Gd3+、Sb3+、Ce3++Gd3+对Sm3+的敏化作用。     

Study on relationship of luminescence in CaS:Eu,Sm and dopants concentration

In order to study different characteristic luminescence of Eu²⁺ and Sm³⁺, delayed photoluminescence (DPL) and infrared stimulated luminescence (ISL) spectra of CaS doped with europium and samarium have been investigated. The influence of Eu and Sm concentration on luminescence of Eu²⁺ in photoluminescence (PL) and ISL was respectively studied. It was found that, at low doping levels, PL emission intensity of Eu²⁺ increased linearly with increment of Eu, while decreased linearly with increment of Sm. However, further increment of Eu and Sm in CaS:Eu,Sm could not increase either the luminescent centres of Eu²⁺ or electron trapping sites of Sm³⁺. Different local environment of Eu²⁺ and Sm³⁺ in the lattice position is thought to be the cause of all observed luminescence phenomena. Finally, the maximum emission in ISL was obtained at 1000 ppm europium and 750 ppm samarium.     

Sm~(3+)在玻璃中的发光以及Sb~(6+)、Ce~(6+)、Gd~(3+)对Sm~(3+)发光性质的影响

本文研究了单掺(Sm~(3+),Ce~(3+)、Gd~(3+).Sb~(3+)、双掺(Sm~(3+)+Ce~(3+)、Sm~(3+)+Gd~(3+),Sm~(3+)+Sb~(3+))和兰掺(Sm~(3+)+Gd~(3+)+Ce~(3+))约四十余种不同玻璃的发射谱和激发谱.探讨了玻璃成份和掺杂离子浓度对Sm~(3+)发光性质的影响以及Ce~(3+),Gd~(3+)、Sb~(3+)、Ce~(3+)+Gd~(3+)对Sm~(3+)的敏化作用。     

低能离子束横向发射度的测量及分析

The transverse emittance of an ion beam describes its transverse size as the particles are transported from a source to a target.It allows for predicting beam losses in limiting apertures and the beam focus size at the target.Various definitions and issues are discussed.The most common and emerging measuring techniques are presented,including their advantages.Several methods of emittance data analysis,their accuracy and trustworthiness,are discussed.     

空心圆管端点附近等离子体源离子注入过程中鞘层的时空演化

等离子体源离子注入过程中，鞘层的演化规律直接影响到离子注入到材料中的深度进而影响材料表面的性质和结构，对材料的不同部位这种影响是不同的.利用无碰撞两维流体动力学模型，研究了有限上升时间的电压脉冲作用下，共轴放置附加零电极的半无限空心圆管端点附近等离子体源离子注入过程中，鞘层的时空演化规律.通过计算得到了鞘层内随时间变化的电势分布和离子密度分布，计算了端点附近材料表面处的离子流密度分布和注入剂量分布随时间的变化规律.计算机模拟结果显示了空心圆管内部、外部及端点表面处的离子流密度分布和注入剂量分布存在很大差异.     

Improvement of the Applicability, Efficiency, andPrecision of the Penning Trap Mass Spectrometer ISOLTRAP

With the Penning trap mass spectrometer ISOLTRAP, close to 200 nuclides have already been investigated and their masses determined with a typical relative precision of δm/m=10⁻⁷. Recently, ISOLTRAP's beam preparation system was replaced by an RFQ ion beam cooler and buncher. The principle and the characteristics of this new beam preparation system will be presented. It is planned to use ions of various carbon clusters C⁺ _n (n>1) as reference ions for mass measurements. Apart from negligible molecular binding energies, these clusters have masses that are exact multiples of the unified atomic mass unit. This will allow ISOLTRAP to carry out absolute mass measurements as well as to investigate possible mass-dependent systematic errors. The results of tests of the production, transport, and trapping of such carbon clusters will be presented. This revised version was published online in July 2006 with corrections to the Cover Date.     

ECR ion source based low energy ion beam facility

Mass analyzed highly charged ion beams of energy ranging from a few keV to a few MeV plays an important role in various aspects of research in modern physics. In this paper a unique low energy ion beam facility (LEIBF) set up at Nuclear Science Centre (NSC) for providing low and medium energy multiply charged ion beams ranging from a few keV to a few MeV for research in materials sciences, atomic and molecular physics is described. One of the important features of this facility is the availability of relatively large currents of multiply charged positive ions from an electron cyclotron resonance (ECR) source placed entirely on a high voltage platform. All the electronic and vacuum systems related to the ECR source including 10 GHz ultra high frequency (UHF) transmitter, high voltage power supplies for extractor and Einzel lens are placed on a high voltage platform. All the equipments are controlled using a personal computer at ground potential through optical fibers for high voltage isolation. Some of the experimental facilities available are also described.     

强流高电荷态Pb离子束的产生与优化研究

随着原子物理及表面物理研究的发展,电荷态金属离子束的需求日益增多. 近来,中国科学院近代物理研究所,14.5GHz LECR3,离子源实验平台上, 以炉子法产生的铅离子束作为研究对象, 进行了一系列,ECR,离子源关键参数(如：磁场、炉子功率、掺气等)影响高电荷态铅离子束产额的实验研究, 在此基础上, 调整优化了,LECR3,离子源的状态参数, 从而获得了强流高电荷态铅离子束,18eμa ²⁰⁷Pb³⁰⁺,和6.7eμa ²⁰⁷Pb³⁷⁺.     

半圆形容器等离子体源离子注入过程中离子动力学的两维PIC计算机模拟

利用两维particle-in-cell方法研究了半圆形容器表面等离子体源离子注入过程中鞘层的时空演化规律. 详尽考察了鞘层内随时间变化的电势分布和离子密度分布规律,离子在鞘层中的运动轨迹和运动状态,得到了半圆容器内、外表面和边缘平面上各点离子注入剂量分布规律,获得了工件表面各点注入离子的入射角分布规律. 研究结果揭示了半圆容器边缘附近鞘层中离子聚焦现象,以及离子聚焦现象导致工件表面注入剂量分布和注入角度分布存在很大不均匀的基本物理规律. 关键词： 等离子体源离子注入 鞘层 两维particle-in-cell方法 离子运动轨迹     

线状钛激光等离子体的光谱特性

通过研究线状激光等离子体的轴向光谱，辨认和归类了一些高离化态钛离子的谱线，并发现钛等离子与表层氧化物离子体的相互作用导致轴向发射光谱强度变化的现象。