Growth and magnetism of Ni nanoparticles in Ni/Al2O3/Si or Si3N4 multilayers

We report on the fabrication of Ni/Al₂O₃/Si and textured Ni/Al₂O₃/Si₃N₄ multilayers containing Ni nanoparticles that exhibit significantly improved results. The secondary phases arising from thermal reaction between Ni and Si can be remarkably suppressed with increasing layers of Al₂O₃ and deposition of Ni/Al₂O₃ multilayers on Si₃N₄ substrates. Atomic force microscopy shows the formation of large as well as nanoclusters of Ni when grown on Si, whereas textured Ni nanoparticles are formed on Si₃N₄ substrates. The magnetization measurements on Ni/Al₂O₃/Si containing a single buffer layer of Al₂O₃ shows higher coercivity field with magnetic nanowire-like behavior, whereas with several Al₂O₃ alternate layers almost a superparamagnetic-like behavior is observed. However, significantly improved magnetic hysteresis was observed in textured Ni/Al₂O₃/Si₃N₄ multilayers due to preferred alignment of Ni nanocrystallites.     

Wet etching and passivation of GaSb-based very long wavelength infrared detectors

The etching and passivation processes of very long wavelength infrared (VLWIR) detector based on the InAs/GaSb/AlSb type-II superlattice have been studied. By studying the effect of each component in the citric acid solution (citric acid, phosphoric acid, hydrogen peroxide, deionized water), the best solution ratio is obtained. After comparing different passivation materials such as sulfide + SiO₂, Al₂O₃, Si₃N₄ and SU8, it is found that SU8 passivation can reduce the dark current of the device to a greater degree. Combining this wet etching and SU8 passivation, the R₀A of VLWIR detector with a mesa diameter of 500 μm is about 3.6 Ω ·cm² at 77 K.     

无杂质空位扩散法造成InGaAsP/InP多量子阱结构带隙蓝移规律的研究

采用光荧光谱(PL)和光调制反射谱(PR)的方法,研究了由Si₃N₄、SiO₂电介质盖层引起的无杂质空位(IFVD)诱导的InGaAsP四元化合物半导体多量子阱(MQWs)结构的带隙蓝移。实验中Si₃N₄、SiO₂作为电介质盖层,用来产生空位,再经过快速热退火处理(RTA)。实验结果表明:多量子阱结构带隙蓝移和退火温度、复合盖层的组合有关。带隙蓝移随退火温度的升高而加大。InP、Si₃N₄复合盖层产生的带隙蓝移量大于InP、SiO₂复合盖层。而InGaAs、SiO₂复合盖层产生的带隙蓝移量则大于InGaAs、Si₃N₄复合盖层。同时,光调制反射谱的测试结果与光荧光测试的结果基本一致,因此,PR谱是用于测试带隙变化的另一种方法。     

Time-dependent response of interface states determined by using differential isothermal transient spectroscopy

A method based on the differential analysis of the isothermal transients is proposed to study the dynamical properties of the charging and discharging of interface states, and several possibilities of using this method are shown. The results obtained in SiO₂/Si and Si₃N₄/SiO₂/Si samples are in agreement with the existence of a spatial and energy distribution of interface states within the insulator. From the experimental data, the concentration of traps within the insulator at 35 Å is estimated to be 5×10⁹ cm^-2 eV^-1, with a tunneling cross section 10^-19 cm², at E_c-E ≈ 0.2 eV.     

Atomic-layer-deposited Al_2O_3 and HfO_2 on InAlAs: A comparative study of interfacial and electrical characteristics

Al_2O_3 and HfO_2 thin films are separately deposited on n-type InAlAs epitaxial layers by using atomic layer deposition(ALD).The interfacial properties are revealed by angle-resolved x-ray photoelectron spectroscopy(AR-XPS).It is demonstrated that the Al_2O_3 layer can reduce interfacial oxidation and trap charge formation.The gate leakage current densities are 1.37×10~6 A/cm~2 and 3.22×10~6 A/cm~2 at+1V for the Al_2O_3/InAlAs and HfO_2/InAlAs MOS capacitors respectively.Compared with the HfO_2/InAlAs metal-oxide-semiconductor(MOS) capacitor,the Al_2O_3/InAlAS MOS capacitor exhibits good electrical properties in reducing gate leakage current,narrowing down the hysteresis loop,shrinking stretch-out of the C-V characteristics,and significantly reducing the oxide trapped charge(Q_(ot)) value and the interface state density(D_(it)).     

紫外波段SiO2/Si3N4介质膜分布式布拉格反射镜的制备与研究

采用光学传递矩阵方法设计了紫外波段SiO₂/Si₃N₄介质膜分布式布拉格反射镜, 并利用等离子体增强化学气相沉积技术在蓝宝石(0001)衬底上制备了SiO₂/Si₃N₄介质膜分布式布拉格反射镜. 光反射测试表明, 样品反射谱的峰值波长仅与理论模拟谱线相差10 nm, 并随着反射镜周期数的增加而蓝移. 由于SiO₂与Si₃N₄具有相对较大的折射率比, 因而制备的周期数为13的样品反射谱的峰值反射率就已大于99%. 样品反射谱的中心波长为333 nm, 谱峰的半高宽为58 nm. 样品截面的扫描电子显微镜和表面的原子力显微镜测量结果表明, 样品反射谱的中心波长蓝移是由子层的层厚和界面粗糙度的变化引起的. X射线反射谱表明,子层界面过渡层对于反射率的影响较小, 并且SiO₂膜的质量比Si₃N₄差, 也是造成反射率低于理论值的原因之一.     

46.2W连续输出808nm高功率无铝半导体激光线阵模块

利用InGaAs/InGaAsP应变量子阱外延材料制作出高功率半导体激光器线阵模块,前腔面镀制了单层Al₂O₃,后腔面镀制了Al₂O₃/5(HfO₂/SiO₂)/HfO₂,采用无氧铜热沉和高效率的液体冷却器散热。在室温下,驱动电流50A时输出功率高达46.2W,最高电光转换效率41.3%,斜率效率1.15W/A。器件中心激射波长810nm,波长温度系数为0.28nm/℃,光谱半峰全宽(FWHM)₃nm,寿命突破11732h。     

微通道板离子壁垒膜粒子阻透特性的蒙特卡罗模拟

在三代微光像管中,微通道板(MCP)输入面上覆盖一层超薄离子壁垒膜(IBF),目的是保护光电阴极,延长像管使用寿命.为了深入研究离子壁垒膜的特性,本文对Al2O3和SiO2两种离子壁垒膜的粒子阻透能力进行了蒙特卡罗模拟,结果表明:5 nm厚Al2O3和SiO2离子壁垒膜的死电压分别为230 ～240 V和220～230...     

Dynamical heterogeneity and diffusion in high-density Al2O3·2SiO2 melts

Dynamical heterogeneity (DH) in high-density Al₂O₃·2SiO₂ melts has been studied in a model containing 3025 atoms via molecular dynamics (MD) simulation and at the fixed density of 4.0 g/cm³. Non-Gaussian parameter of atomic species in the system has been found and discussed. We found a clear evidence of the existence of DH in high-density Al₂O₃·2SiO₂, which has specific features differed from those observed in the lower-density one. The most mobile and immobile atoms in the system have a tendency to form clusters and temperature dependence of their mean cluster size was found. On the other hand, diffusion constant of atomic species in the system has been calculated at temperatures ranged from 3150 to 7000 K. Calculations show that at relatively not high temperatures, temperature dependence of diffusion constant shows an Arrhenius law and at higher temperatures it shows a power law: D∝(T−T_C)^γ. Diffusion data of high-density melts have been compared with those for the low-density ones. Diffusion mechanism in the system has been discussed via the temperature dependence of diffusion constant ratio and activation energy. And we found the existence of cooperative diffusion mechanism in the system.     

负电荷层对a-IGZO TFT阈值电压的影响

采用脉冲直流磁控溅射的方式沉积In-Ga-Zn-O (IGZO)膜层作为TFT的有源层.在TFT沟道处的有源层和绝缘层的界面上, 通过溅射法制作一定厚度的负电荷层对阈值电压(V_th)进行调制, 使得V_th由-3.8 V升高至-0.3 V, 器件由耗尽型向增强型转变.通过增加Al₂O₃作为负电荷层, 可有效地将V_th控制在0 V附近, 并且提高其器件稳定性, 得到较好的电学特性:电流开关比I_on/I_off>10⁹, 亚阈值摆幅SS为0.2 V/dec, 阈值电压V_th为-0.3 V, 迁移率μ为9.2 cm² /(V·s).     

基于Al_2O_3/MoO_3复合阳极缓冲层的倒置聚合物太阳能电池的研究

采用旋涂Al_2O_3前驱体溶液和低温退火的方法在活性层上形成Al_2O_3薄膜,并与MoO_3结合形成Al_2O_3/MoO_3复合阳极缓冲层,制备了以聚3-己基噻吩:[6.6]-苯基-C_(61)-丁酸甲酯(P3HT:PC_(61)BM)为活性层的倒置聚合物太阳能电池,并通过改变Al_2O_3前驱体溶液的浓度来分析复合阳极缓冲层对器件性能的影响.结果发现,Al_2O_3/MoO_3复合阳极缓冲层能有效调控倒置聚合物太阳能电池的光电性能及其稳定性.当Al_2O_3前驱体溶液的浓度为0.15%时,器件光伏性能达到最优值,与MoO_3单缓冲层的器件相比,光电转换效率(PCE)由3.85%提高到4.64%;经过80天老化测试后,具有复合阳极缓冲层的器件PCE保留为初始值的76%,而单缓冲层的器件PCE已经下降到50%以下.器件性能得到改善的原因是Al_2O_3/MoO_3复合阳极缓冲层增强了倒置太阳能电池器件阳极对空穴的收集能力,同时钝化了器件活性层,从而提升了太阳能电池器件的光伏性能及其稳定性.     

InGaAs/Si3N4 interface obtained in ultrahigh vacuum multipolar plasma: In-situ control by ellipsometry and electrical characterization

A multipolar plasma passivation scheme controlled by in-situ ellipsometry has been developed to produce a high electrical quality InGaAs/Si₃N₄ interface. We have demonstrated the possibility to remove all native oxides at the InGaAs surface by heating the sample at 240°C, then using the action of a multipolar H₂ plasma at 185°C, without optical degradation of the surface. The passivation by a native nitride layer is then performed using a N₂ plasma, and Si₃N₄ is deposited. The treatment induces a reduction of the density of interface states N_ss(E), and also a change of the nature of these interface states as shown by a reduction in the capture cross section σ_n(E).     

Al_2O_3薄层修饰SiN_x绝缘层的IGZO-TFTs器件的性能研究

采用原子层沉积工艺(ALD)生长均匀致密的三氧化二铝(Al2O3)薄层对氮化硅(Si Nx)绝缘层进行修饰,研究了铟镓锌氧薄膜晶体管(IGZO-TFTs)器件的性能。当Al2O3修饰层厚度为4 nm时,绝缘层-有源层界面的最大缺陷态密度相比于未修饰器件降低了17.2%,器件性能得到显著改善。场效应迁移率由1.19 cm2/(V·s)提高到7.11 cm2/(V·s),阈值电压由39.70 V降低到25.37 V,1 h正向偏压应力下的阈值电压漂移量由2.19 V减小到1.41 V。     

First-principles Study on the Magnetic,Half-metal and Thermoelectric Transport Properties of Inorganic-Organic Hybrid Compounds [C4N2H12][Fe4Ⅲ(HPO3)2(C2O4)3]

The electronic structure, magnetic and half-metal properties of inorganic-organic hybrid compound [C₄N₂H₁₂][Fe₄^Ⅲ(HPO₃)₂(C₂O₄)₃] are investigated by using the full-potential linearized augmented plane wave (FPLAPW) method within density-functional theory (DFT) calculations. The density of states (DOS), the total energy of the cell and the spontaneous magnetic moment of [C₄N₂H₁₂][Fe₄^Ⅱ(HPO₃)₂(C₂O₄)₃] are calculated. The calculation results reveal that the low-temperature phase of [C₄N₂H₁₂][Fe₄^Ⅲ(HPO₃)₂(C₂O₄)₃] exhibits a stable ferromagnetic (FM) ground state, and we find that this organic compound is a half-metal in FM state. In addition, we have calculated antiferromagnetically coupled interactions, revealing the existence of antiferromagnetic (AFM), which is in agreement with the experiment. We have also found that [C₄N₂H₁₂][Fe₄^Ⅲ(HPO₃)₂(C₂O₄)₃] is a semiconductor in the AFM state with a band gap of about 0.40 eV. Subsequently, the transport properties for potential thermoelectric applications have been studied in detail based on the Boltzmann transport theory.     

基于P掺杂SiO2为栅介质的超低压侧栅薄膜晶体管

在室温下利用等离子体增强化学气相沉积法(PECVD)制备的颗粒膜P掺杂SiO₂为栅介质, 使用磁控溅射方法利用一步掩模法制备出一种新型结构的侧栅薄膜晶体管. 由于侧栅薄膜晶体管具有独特的结构, 在射频磁控溅射过程中, 仅仅利用一块镍掩模板, 无需复杂的光刻步骤, 就可同时沉积出氧化铟锡(ITO)源、漏、栅电极和沟道, 因此, 这种方法极大地简化了制备流程, 降低了工艺成本. 实验结果表明, 在P掺杂SiO₂栅介质层与沟道层界面处形成了超大的双电层电容(8 μF/cm²), 这使得这类晶体管具有超低的工作电压1 V, 小的亚阈值摆幅82 mV/dec、高的迁移率18.35 cm²/V·s和大的开关电流比1.1×10⁶. 因此, 这种P掺杂SiO₂双电层超低压薄膜晶体管将有望应用于低能耗便携式电子产品以及新型传感器领域. 关键词： 2')" href="#">P掺杂SiO₂ 侧栅薄膜晶体管 双电层(EDL) 超低压     

电荷俘获存储器的过擦现象

基于密度泛函理论的第一性原理平面波超软赝势方法和VASP软件对电荷俘获存储器过擦现象进行了分析研究.通过形成能的计算,确定了含有氮空位缺陷的Si3N4和含有间隙氧缺陷的Hf O2作为研究的对象;俘获能的计算结果表明两种体系对电子的俘获能力比对空穴的大,因而对两体系擦写载流子确定为电子.分别计算了Hf O2和Si3N4擦写前后的能量、擦写前后电荷分布变化、吸附能和态密度,以说明过擦的微观机理.对能量和擦写电荷变化的研究,表明Si3N4相比于Hf O2,其可靠性较差,且Si3N4作为俘获层,在一个擦写周期后,晶胞中电子出现减少现象;界面吸附能的研究表明,Si3N4相比于Hf O2在缺陷处更容易与氧进行电子交换;最后,通过对态密度的分析表明Si3N4和Hf O2在对应的缺陷中均有缺陷能级俘获电子,前者为浅能级俘获,后者为深能级俘获.综上分析表明,Si3N4在氮空位的作用下,缺陷附近原子对电子的局域作用变弱,使得Si3N4作为俘获层时,材料本身的电子被擦出,使得擦操作时的平带偏移电压增大,导致存储器发生过擦.本文的研究结果揭示了过擦的本质,对提高电荷俘获存储器的可靠性以及存储特性有着重要的指导意义.     

新型FED荧光粉MSi2N2O2∶Eu2+(M=Sr,Ba)的发光性能

采用高温固相法合成了一系列新型绿色FED(Field Emission Display)荧光粉MSi2N2O2∶Eu2+(M=Sr,Ba),研究了该荧光粉在不同电压和电流密度下的发光特性.在电子束激发下,SrSi2N2O2:Eu2+的发射主峰位于541 nm,属于黄绿光发射;BaSi2N2O2∶Eu2+的发射主峰位于4...     

沟道层厚度对室温制备的In2O3薄膜晶体管器件性能的影响

在室温下采用直流磁控溅射以SiO₂/Si为衬底制备了不同沟道层厚度的底栅式In₂O₃薄膜晶体管,讨论了沟道层厚度对底栅In₂O₃薄膜晶体管的电学性能的影响。实验结果表明:器件的特性与沟道层厚度有关,最优沟道层厚度的In₂O₃薄膜晶体管为增强型,其阈值电压为2.5 V,开关电流比约为10⁶,场效应迁移率为6.2 cm²·V^-1·s^-1。     

Influence of the transparency of tunnel barriers in Nb/Al2O3/Al/Al2O3/Nb junctions on transport properties

The transparency of the tunnel barriers in double-barrier junctions influences the critical current density and the form of the current–voltage characteristics (IVC). Moreover, the barrier asymmetry is an important parameter, which has to be controlled in the technological process. We have performed a systematic study of the influence of the barrier transparency on critical current, I_C, and normal resistance, R_N, by preparing SIS and SINIS junctions under identical technological conditions and comparing their transport properties. We have fabricated Nb/Al₂O₃/Nb and Nb/Al₂O₃/Al/Al₂O₃/Nb devices with different current densities using a conventional fabrication process, varying pressure and oxidation time. The thickness of the Al middle electrode in all Nb/Al₂O₃/Al/Al₂O₃/Nb junctions was 6 nm. Patterning of the multilayers was done using conventional photolithography and the selective niobium etching process. The current density of SIS junctions was changed in the range from 0.5 to 10 kA/cm². At the same conditions the current density of SINIS devices revealed 1–100 A/cm² with non-hysteretic IVC and characteristic voltages, I_CR_N, of up to 200 μV. By comparing the experimental and theoretical temperature dependence of the I_CR_N product we estimated the barrier transparency and its asymmetry. The comparison shows a good agreement of experimental data with the theoretical model of tunneling through double-barrier structures in the dirty limit and provides the effective barrier transparency parameter γ_eff≈300. A theoretical framework is developed to study the influence of the barrier asymmetry on the current–phase relationship and it is proposed to determine the asymmetry parameter by measuring the critical current suppression as function of applied microwave power. The theoretical approach to determine the non-stationary properties of double-barrier junctions in the adiabatic regime is formulated and the results of calculations of the I–V characteristics are given in relevant limits. The existence and the magnitude of a current deficit are predicted as function of the barrier asymmetry.     

全光谱照明LED中的蓝绿色荧光粉研究

采用高温固相法合成了BaSi₂O₂N₂:Eu²⁺蓝绿色荧光粉,在440~460 nm蓝光激发下,该荧光粉发射峰值波长488 nm的蓝绿色光。通过共掺杂微量Mg²⁺和Ge⁴⁺离子,BaSi₂O₂N₂:Eu²⁺蓝绿色荧光粉的热猝灭性能显著提升。在蓝光芯片激发下,使用BaSi₂O₂N₂:Eu²⁺蓝绿色荧光粉搭配Y₃（Al,Ga）₅O₁₂:Ce³⁺黄绿色荧光粉以及CaAlSiN₃:Eu²⁺红色荧光粉,可以封装色温6 500 K、显色指数Ra达到96.5、所有特殊显色指数R1~R15都大于90的全光谱白光LED。通过封装老化测试,Mg²⁺和Ge⁴⁺离子掺杂的BaSi₂O₂N₂:Eu²⁺蓝绿色荧光粉较未掺杂的荧光粉老化性能提升近1倍。