Mechanism of current leakage through metal/n-GaN interfaces

Detailed current–voltage–temperature (I–V–T) measurements were performed on the Schottky diodes fabricated on MOVPE-grown n-GaN layers. A large deviation from the thermionic emission (TE) transport was observed in the reverse I–V curves with a large excess leakage. From the calculation based on the thermionic-field emission (TFE) model, it was found that the tunneling plays an important role in the carrier transport across the GaN Schottky barrier even for doping densities as low as 1×10¹⁷ cm⁻³. A novel barrier-modified TFE model based on presence of near-surface fixed charges or surface states is proposed to explain the observed large reverse leakage currents.     

Ti/Al p-GaN Schottky barrier height determined by C–V measurements

Data are presented on the rigorous method of capacitance–voltage (C–V) measurements to the barrier height of Ti/Al p-GaN Schottky junction. For a sample with Hall concentration of 5.5 × 10¹⁶/cm³ the upper limit of the modulation frequency leading the full response of the activated carriers is defined as 1.5 kHz from the capacitance versus modulation frequency (C–f) plot. The activation energy of the Mg acceptors determined from the temperature-dependent C–f plot is 0.12 eV. The barrier height estimated with this activation energy and the intercept voltage of the 1/C²–V plot drawn with the 1.5 kHz C–V data is 1.43 eV at 300 K and 1.41 eV at 500 K. This is the most reliable barrier height ever reported. A reliable room temperature C–V doping profile is demonstrated using the 1.5 KHz modulation, which is sensitive enough to resolve the presence of a 15 nm thin highly doped (8 × 10¹⁸/cm³) layer formed near the surface.     

The dependence of I–V and C–V characteristics on temperature in the H-terminated Pb/p-Si(1 0 0) Schottky barrier diodes

The current–voltage (I–V) and capacitance–voltage (C–V) characteristics of H-terminated Pb/p-Si/Al contacts fabricated by us have been measured in the temperature range of 77–300 K. The experimental values of the barrier height (BH) Φ_bo and the ideality factor n for the device range from 0.674 and 1.072 eV (at 300 K) to 0.352 and 2.452 eV (at 77 K), respectively. The ideality factors become larger with lowering temperature while the barrier height decreases. The Φ_bo(n) plot shows a linear dependence in the temperature range of 77–300 K that can be explained by the barrier inhomogeneity at the metal/semiconductor interface. The extrapolation of the linear Φ_bo(n) plot to n = 1 has given a homogeneous barrier height of approximately 0.713 eV for the Pb/p-Si(1 0 0) contact. A Φ_bo versus 1/T plot was drawn to obtain evidence of a Gaussian distribution of the BHs, and values of and σ_s = 80.5 mV for the mean BH and zero-bias standard deviation have been obtained from this plot, respectively. Then, a modified versus 1/T plot gives and A^* as 0.828 eV and 54.89 A/cm² K², respectively. Furthermore, an average value of −0.687 meV/K for the temperature coefficient has been obtained, the value of −0.687 meV/K for hydrogen terminated p-type Si differs from those given for p-type Si without hydrogen termination in the literature.     

Electrical peculiarities in Al/Si/Ge/…/Ge/Si and Al/SiGe/Si structures

The current–voltage (I–V) and capacitance–voltage (C–V) behaviour of different Si/Ge multilayers and SiGe single layers prepared on p-type Si substrates by magnetron sputtering and annealing, has been studied in the temperature range of 80–320 K by using Al Schottky contacts as test structures. Although a significant influence of the microstructure of the Si/Ge multilayers and SiGe layers was obtained on the electrical behaviour of the structures, the structures exhibited similar specific features.     

I–V Characteristics of an array of discrete Josephson junction and effect of a localized defect

In this paper, we present analytical and numerical studies of one-dimensional (1D) arrays of Josephson junctions. We use a perturbative approach to derive the I–V characteristics of the array and predict the appearance of current singularities. Numerical treatment gives a very close agreement with our analytical previsions when the discreteness parameter is small. A numerical study of junction with localized inhomogeneity in the Josephson critical current density is carried out. As a general trend, it comes out that these inhomogeneities conserve the linear branches as well as the current steps of the I–V characteristics. However, depending on the location of the defect and its type (microshort or microresistance), the range of the current steps varies and shows a peak at the middle of the array.     

Nb/Au/(1 1 0)YBa2Cu3O7−δ Josephson junctions: evidence against atomic scaled “corner junctions”

We report on I–V characteristics for in situ formed Nb/Au/(1 1 0)YBa₂Cu₃O_7−δ (YBCO) Josephson junction, where the homoepitaxial (1 1 0)YBCO film shows ultra-smooth surface morphology. The field dependence of critical supercurrent I_c shows anisotropic large junction behavior with normal Fraunhofer patterns expected from BCS model of d_x²−y² wave superconductors. This strongly suggests that the Nb/Au/(1 1 0)YBCO junctions cannot be regarded as atomic scaled corner junctions, in contrast with (0 0 1)/(1 1 0)YBCO grain boundary junctions to show “π-junction” with a pronounced dip near zero fields in field modulation of I_c.     

Pressure–temperature studies on conductivity of TlX(X=Cl,Br,I) compounds:: I: phase diagram. II: ionic mobility

We have measured the conductivity σ of TlX(X=Cl, Br, I) compounds up to 5.3 GPa and between 300–823 K. The σ–T dependence for all compounds can be divided into three distinct regions: (i) low temperature (LT), <400 K, with unusual negative σ–T dependence, (ii) intermediate temperature (IT), 400<650 K, with positive σ–T dependence and (iii) high temperature (HT), T>650 K, with positive σ–T dependence. The σ–T isobars were used to construct the T–P solid phase diagram for each compound. The LT region data indicate a new meta-stable phase in the 1.0–3.5 GPa range. The LT→IT transition is characterized by an inverse σ–T dependence followed by normal Arrhenius behavior up to and including the HT region. The extrapolation to 1 atm of the P-dependent boundary between IT and HT regions above 3 GPa for each compound in the P–T plot yields a value close to its respective normal (1 atm) T_melt suggesting a solid order–disorder transition type paralleling -AgI behavior. The abrupt drop in conductivity in the LT region for P between 2.5–4.1 GPa of all compounds is at variance with the Arrhenius behavior observed for unperturbed ion migration implying the appearance of a second factor overriding the Arrhenius temperature dependence. Normal Arrhenius σ–T dependence prevails in both IT and HT regions with Q_c values of 85–100 kJ mol⁻¹ and 50–75 kJ mol⁻¹, respectively. The higher conductivities at 0.4 GPa for TlBr and TlI relative to their 1 atm data and the increasing σ with P are in strong contrast to the normal σ-P behavior of TlCl. The dependence of activation volume ΔV^‡ on T for TlCl, i.e. ΔV^‡>0, shows abnormally high values with a maximum at 500 K for P<3.0 GPa but reasonable ΔV^‡ values appear above 3.0 GPa. The ΔV^‡–T dependence for both TlBr and TlI with ΔV^‡<0 is incompatible with an ion transport mechanism suggesting an electronic conduction process and implying an ionic–metallic transition at higher pressures. These contrasting conductivity features are discussed and interpreted in terms of electronegativity differences and bonding character rather than structure.     

Interlayer tunnelling in Bi2Sr2CaCu2O8+δ single crystals

We present measurements of the intrinsic quasi-particle conductivity along the c-axis of 2212-BSCCO single-crystal mesa structures in the superconducting and normal states. Direct measurement of the mesa temperature enables corrections to be made for self-heating and permits the acquisition of reliable I–V characteristics over a wide range of temperatures and voltages. Unlike a conventional superconductor, there is no evidence for any change in the quasi-particle conductivity at T_c, consistent with precursor pairing of electrons in the normal state. At low temperatures the initial low-voltage linear conductivity exhibits a T² dependence, approaching a limiting value at zero temperature.     

DNA-based organic-on-inorganic semiconductor Schottky structures

A sandwich device has been fabricated from DNA molecular film by solution processing located between Al and p-type silicon inorganic semiconductor. We have performed the electrical characteristics of the device such as current–voltage (I–V), capacitance–voltage (C–V) and capacitance–frequency (C–f) at room temperature and in dark. The DNA-based structure has showed the rectifying behavior. From its optical absorbance spectrum, it has been seen that DNA has been a semiconductor-like material with wide optical band energy gap of 4.12 eV and resistivity of 1.6 × 10¹⁰ Ω cm representing a p-type conductivity.     

On the barrier inhomogeneities of polyaniline/p-Si/Al structure at low temperature

The current–voltage (I–V) characteristics of Au/polyaniline(PANI)/p-Si/Al structures were determined at various temperatures in the range of 90–300 K. The evaluation of the experimental I–V data reveals a decrease of the zero-bias barrier height (BH) and an increase of the ideality factor (n) with decreasing temperature. It was shown that the occurrence of a Gaussian distribution of then BHs is responsible for the decrease of the apparent BH, increase of the ideality factor n due to barrier height imhomogeneities that prevail at the interface. A Φ_b0 versus 1/T plot has been drawn for evidence of the Gaussian distribution of the barrier height, and and σ₀ = 0.0943 V for the mean barrier height and zero-bias standard deviation, respectively, have been obtained from this plot. Thus, a modified versus 1/T plot gives and A^* as 0.885 eV and A^* = 55.80 A/K² cm², respectively. Hence, it can be concluded that Au/PANI/p-Si/Al structure has a good rectifying contact and the temperature dependence of I–V characteristics of the rectifying contact on p-Si successfully have been explained on the basis of TE mechanism with Gaussian distribution of the barrier heights.     

Phase transition from solid to liquid phase of vortex lattice in YBa2Cu3O7 thin films

We measured voltage V versus current I curves with a function of temperature T and magnetic field H for YBa₂Cu₃O₇ single-crystalline thin films. The characteristics of the pinning type was found to be changed with the change in T, in contradiction to Kramer's scaling law. Furthermore, we analyzed I–V curves in terms of the flux creep model proposed by Anderson and Kim. In low H region the product of flux bundle volume v_d and its jump distance l decreased with the increase of H, while in high H region the product increased rapidly with H, suggesting a rapid increased of interaction length between vortices. These results imply all evidence of an occurence of vortex liquid phase in the high H regime. We showed that the transition region between the above two regimes is located in the vicinity of H at which the critical current density begins to decrease rapidly with the increase of H.     

Surface structure analysis based on the exclusive use of the specular LEED spot – a theoretical study

The exclusive use of the specularly reflected beam (the (0,0) spot) may be a more practical way of collecting data for a LEED I–V structure analysis under certain experimental conditions. In this paper we discuss the special properties of the (0,0) spot intensity and test its sensitivity towards structural changes for the model system CO/Ni(1 1 1) within the framework of a R factor analysis. It is found that the (0,0) spot can, indeed, be used for a reliable structure determination if the energy range is increased by collecting data at different polar and azimuthal angles of incidence. The R factor contrast is, however, reduced with respect to a conventional LEED I–V analysis.     

Direct measurement of electron transport features in cytochrome c via V–I characteristics of STM currents

The morphology of and electron tunneling through single and cluster cytochrome c molecules deposited on self-assembled dodecanthiol monolayer film on a gold substrate have been studied experimentally using scanning tunneling microscopy (STM) and scanning tunneling spectroscopy. STM images of a single cytochrome c molecule revealed a globular structure with a diameter of 4 nm and height of 1.5 nm. A spectroscopic study obtained by recording tunneling current–bias voltage (V–I) curves revealed that the STM current increases stepwise at asymmetric threshold sample bias voltages of +100 mV and –200 mV.     

Description peculiarities of viscous and elastic properties of dense molecular liquids on the basis of the model of Lennard-Jones (n−6) fluid

Results previously obtained in molecular dynamics experiment with Lennard-Jones (n−6) (L-J (n−6)) fluid were applied for the determination of viscous and elastic properties of real molecular fluids (shear viscosity coefficient and pressure). Parameters σ and of real liquids (liquid hydrocarbons) were determined by fitting p–ρ–T data of model fluids to experimental p–ρ–T data of real liquids. Using the data obtained in that way, parameters σ and viscous and elastic characteristics of real liquids were determined. The comparison of experimental and calculated viscous and elastic characteristics revealed lesser dependence of viscous properties from n in comparison with elastic properties.     

Barrier height engineering of Ag/GaAs(100) Schottky contacts by a thin organic interlayer

Thin films of 3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA) were used as an interlayer for the electronic modification of Ag/n-GaAs(100) Schottky contacts. The electronic properties were investigated recording in situ current–voltage (I–V) and capacitance–voltage (C–V) characteristics. For H-plasma treated substrates the effective barrier height decreases from 0.81 to 0.64 eV as a function of the PTCDA layer thickness (d_PTCDA). In the case of the sulphur passivated GaAs the effective barrier height first increases and then decreases, the overall range being 0.54–0.73 eV. The substrate treatment leads to a different alignment between the band edges of the GaAs and the molecular orbitals of the PTCDA, making it possible to determine the energy position of the LUMO transport level.     

Analysis of frequency-dependent series resistance and interface states of In/SiO2/p-Si (MIS) structures

In this work, the investigation of the interface state density and series resistance from capacitance–voltage (C–V) and conductance–voltage (G/ω−V) characteristics in In/SiO₂/p-Si metal–insulator–semiconductor (MIS) structures with thin interfacial insulator layer have been reported. The thickness of SiO₂ film obtained from the measurement of the oxide capacitance corrected for series resistance in the strong accumulation region is 220 Å. The forward and reverse bias C–V and G/ω−V characteristics of MIS structures have been studied at the frequency range 30 kHz–1 MHz at room temperature. The frequency dispersion in capacitance and conductance can be interpreted in terms of the series resistance (R_s) and interface state density (D_it) values. Both the series resistance R_s and density of interface states D_it are strongly frequency-dependent and decrease with increasing frequency. The distribution profile of R_s–V gives a peak at low frequencies in the depletion region and disappears with increasing frequency. Experimental results show that the interfacial polarization contributes to the improvement of the dielectric properties of In/SiO₂/p-Si MIS structures. The interface state density value of In/SiO₂/p-Si MIS diode calculated at strong accumulation region is 1.11×10¹² eV⁻¹ cm⁻² at 1 MHz. It is found that the calculated value of D_it (≈10¹² eV⁻¹ cm⁻²) is not high enough to pin the Fermi level of the Si substrate disrupting the device operation.     

Dynamical spin susceptibility of the d–p model in the over doping region

Dynamical spin susceptibility χ^s(q,ω) of the d–p model in the over doping region is investigated by using the auxiliary boson technique. It includes higher order terms of the 1/N-expansion within the random phase approximation (RPA) of the local vertex, where frequency dependence of the quasi-particle interaction is taken into account. The incommensurate spin fluctuation is obtained due to the nesting effect in the low energy region (ωω^*), whereas the commensurate one in the high energy region (ωω^*), the characteristic energy ω^* is estimated to be about 30 meV. Both of the spin–lattice relaxation rate 1/T₁ and the spin–spin relaxation rate 1/T_g monotonically increase as T decreases, while the spin Knight shift K is almost independent of T.     

Asymmetric double-barrier S–I1–N–I2–S Josephson heterojunctions: experiment and theory

Double-barrier highly asymmetric Nb–Al oxide–Al–Nb oxide–Nb structures with reproducible characteristics were fabricated. The heterocontacts with the middle Al layer thickness ranging from 4 to 6 nm exhibited a well-defined d.c. Josephson supercurrent I_c at 4.2 K and characteristic voltages V_c=I_cR_N (R_N is the normal resistance, V_c defines the response time of the junction) from 0.3 to 0.4 mV. Two prominent features in the quasiparticle current–voltage curves have been observed: a so-called ‘knee' in the energy-gap region and an additional (to the linear voltage dependence) current at higher biases. They are discussed within a simple Landauer–Büttiker scattering approach to the phase-coherent quasiparticle transport in a quasiballistic S–I₁–N–I₂–S heterostructure with an extremely great difference between the barrier transparencies.     

Nonlinear behavior of V–I curves at low temperatures in nanoparticles of La2/3B1/3MnO3 with B=Ca,Sr

We measure voltage–current curves at low temperature in La_2/3B_1/3MnO₃ samples (B=Ca,Sr). The powder oxides were prepared by different wet-chemical routes and low calcination temperatures were used for nanoparticles formation. We studied samples prepared by three different synthesis methods: gel-combustion, urea sol–gel and liquid-mix. Although the average particle size was almost the same for all the samples (30 nm), we found different behaviors in the V–I curves depending on the synthesis route. The obtained data are analyzed in the electronic tunneling picture.