Effects of substitution of group-V atoms for carbon or silicon atoms on optical properties of silicon carbide nanotubes

Silicon carbide nanotubes (SiCNTs) have broad application prospects in the field of micro-nanodevices due to their excellent physical properties. Based on first-principles, the difference between optical properties of SiCNTs where C atom or Si atom is replaced by group-V element is studied. The results show that the optical absorptions of SiCNTs doped by different elements are significantly different in the band of 600 nm-1500 nm. The differences in photoconductivity, caused by different doping elements, are reflected mainly in the band above 620 nm, the difference in dielectric function and refractive index of SiCNTs are reflected mainly in the band above 500 nm. Further analysis shows that SiCNTs doped with different elements change their band structures, resulting in the differences among their optical properties. The calculation of formation energy shows that SiCNTs are more stable when group-V element replaces Si atom, except N atom. These research results will be beneficial to the applications of SiC nanomaterials in optoelectronic devices and provide a theoretical basis for selecting the SiCNTs' dopants.     

Comparative study on transport properties and scattering mechanism of group III doped SiC nanotube

The third group of elements is the acceptor of P-type silicon carbide (SiC). Therefore, studying the transport properties of group III doped SiC nanotube (SiCNTs) and revealing the carrier scattering mechanism have important scientific significance for improving the photoelectric properties and promoting the development of SiC nano-devices. In this article, the lattice structure and transport properties of IIIA-doped SiCNTs are investigated systematically using density functional theory. According to the first principle data, we calculate the temperature characteristics of the conductivity, carrier concentration, and mobility, then, analyze the contributions of optical phonon, ionized impurity, neutral impurity and inter-carrier scattering to the mobility. The calculation results show that the conductivity of IIIA-doped SiCNTs decreased with increasing temperature in the temperature range below 200 K, above 200 K, the conductivity increases with increasing temperature. The main scattering mechanisms are optical phonon scattering and neutral impurity scattering. In application, this results will help the selection of SiCNTs acceptor.     

二维GeSe纳米片五族和七族原子掺杂的受主和施主杂质态

采用第一性原理的计算方法研究GeSe纳米片结构掺杂V和VII族元素对其电子结构、形成能和跃迁能级的影响.结果表明：无论是掺杂V族还是VII族元素,体系的形成能均随杂质半径的增加而增加.V族元素掺杂体系的跃迁能级随杂质原子半径的增加而降低,而VII元素掺杂的体系却随杂质原子半径的增加而增加.其中,F、Cl、Br和I的掺杂为n型施主浅能级杂质,而N、P和As掺杂为p型受体深能级杂质.为相关的实验研究提供了理论参考.     

纤锌矿结构ZnO中定位Ga-N共掺杂对p型掺杂效率的影响

采用第一性原理和密度泛函理论的方法,计算未掺杂、N单掺杂和Ga-N共掺杂纤锌矿结构ZnO的总能、电荷密度和能带结构.总能计算表明,Ga原子的共掺杂使总能极大地降低,从而显著提高杂质N原子在ZnO中的稳定性.电荷密度分布显示,总能的降低主要是Ga-N共掺杂后Ga原子的3d态和N原子的2p态电子之间的强杂化相互作用所致.特别是在Ga原子的负电荷和N原子的正电荷沿c轴排成一线的共掺杂构型中,较大的局域极化场的变化引起价带顶向禁带中的大分裂,降低了N受主的激活能,将空穴的浓度提高了三个量级,有效地提高p型掺杂效率.     

Rh掺杂的Ru2Si3的电子结构及光学性质

采用基于密度泛函理论的第一性原理赝势平面波计算方法,结合广义梯度近似(GGA)对Ru₂Si₃掺Rh原子的电子结构和光学性质进行了研究,计算结果表明:掺入Rh原子使得Ru₂Si₃的晶胞体积有所增大,Rh替换RuⅢ位的Ru原子使得体系处于稳定态,导电类型变为n型,静态介电函数值为ε₁(0)＝25.201 4,折射率n₀的值有所增大为5.02。     

Inadvertent impurity sheets in semiconductors

It is shown that energy levels of impurity pairs and clusters evolve to successively deeper levels as the spatial separation of the impurity atoms decreases. In particular, it is shown that clustering can drive an ordinary shallow dopant, such as a Si donor in GaAs, to a deep, localized level. Such evolution is illustrated by considering clusters of up to five Si atoms as their concentration increases. These results are obtained using a tight binding embedded cluster whose Hamiltonian is derived from a tight-binding Green's function. Going to the limit of a two-dimensional impurity sheet, a Si impurity sheet in GaAs is shown to be deep and to have an indirect bandgap. The impurity sheet results are obtained by use of a tight-binding supercell technique.     

Li 掺杂ZnO薄膜的导电和发光特性

通过将含有原子数分数为2%锂的Zn-Li合金薄膜和金属锌薄膜在500℃氮气氛中退火2h,然后在700℃氧气氛下退火1h的方法分别制备出ZnO:Li和ZnO薄膜。Hall效应测量表明,其导电类型分别为p型和n型。通过He-Cd激光器的325nm线激发,测量了样品室温和低温(12K)光致发光光谱,并根据ZnO:Li薄膜的低温发光光谱特征,计算出Li相关受主能级位于价带顶137meV处。     

Dopant-assisted concentration enhancement of substitutional Mn in Si and Ge

The influence of p- and n-type electronic dopants on Mn incorporation in bulk Si and Ge is studied using first-principles calculations within density functional theory. In Si, it is found that the site preference of a single Mn atom is reversed from interstitial to substitutional in the presence of a neighboring n-type dopant. In Ge, a Mn atom is more readily incorporated into the lattice when an n-type dopant is present in its immediate neighborhood, forming a stable Mn-dopant pair with both impurities at substitutional sites. A detailed analysis of the magnetic exchange interactions between such pairs reveals a new type of magnetic anisotropy in both systems.     

Si molecular beam Epitaxy: A model for temperature dependent incorporation probabilities and depth distributions of dopants exhibiting strong surface segregation

A model describing the incorporation of thermal dopants into single crystal films grown by molecular beam epitaxy (MBE) is presented. The model is general, accounts for dopant surface segregation during deposition, and allows dopant incorporation probabilities and depth profiles to be calculated as a function of film growth conditions (e.g. deposition rate, dopant beam flux, and growth temperature T_s). Input data to the model include thermodynamic parameters such as the free energy of segregation and dopant-surface binding energies together with kinetic parameters such as incident fluxes and dopant diffusivities. The model is applied here to Si MBE in which common dopants are typically characterized by strong surface segregation and temperature-dependent incorporation probabilities σ. Calculated values of σ(T_s) and calculated depth profiles were found to agree very well with available experimental data for both group-III acceptors and group-V donors in Si. In addition, the model predicts, in agreement with limited experimental data, that a growth parameter range exists in which abrupt doping profiles can be obtained, even for dopants which exhibit strong surface segregation. Finally, transition temperatures from equilibrium to kinetically-limited segregation are determined for several dopants.     

Influence of Electron–Phonon Interaction on the Lattice Thermal Conductivity in Single-Crystal Si

Lattice thermal conductivity can be reduced by introducing point defect, grain boundary, and nanoscale precipitates to scatter phonons of different wave-lengths, etc. Recently, the effect of electron–phonon (EP) interaction on phonon transport has attracted more and more attention, especially in heavily doped semiconductors. Here the effect of EP interaction in n-type P-doped single-crystal Si has been investigated. The lattice thermal conductivity decreases dramatically with increasing P doping. This reduction on lattice thermal conductivity cannot be explained solely considering point defect scattering. Further, the lattice thermal conductivity can be fitted well by introducing EP interaction into the modified Debye–Callaway model, which demonstrates that the EP interaction can play an important role in reducing lattice thermal conductivity of n-type P-doped single-crystal Si.     

钒掺杂W18O49纳米线的室温p型电导与NO2敏感性能

钨氧化物纳米线在高灵敏度低功耗气体传感器中极具应用潜力, 且通过掺杂改性可进一步显著改善其敏感性能. 本文以WCl₆为钨源, NH₄VO₃为掺杂剂, 采用溶剂热法合成了钒掺杂的W₁₈O₄₉纳米线. 利用扫描电镜、透射电镜、X射线衍射、X射线光电子能谱仪表征了纳米线的微结构, 并利用静态气敏性能测试系统评价了掺杂纳米线的NO₂敏感性能. 研究结果表明: 五价钒离子受主掺杂进入氧化钨晶格结构, 抑制了纳米线沿轴向的生长并导致了纳米线束的二次集聚; 室温下, 钒掺杂W₁₈O₄₉纳米线接触NO₂气体后表现出反常的p型响应特性; 随工作温度逐渐升高至约110 ℃时, 发生从p型到n型的电导特性转变; 该掺杂纳米线气敏元件对浓度低至80 ppb (1 ppb=10^-9) 的NO₂气体具有明显的室温敏感响应和良好的响应稳定性. 分析并探讨了钒掺杂W₁₈O₄₉纳米线的高室温敏感特性及其p-n电导转型机理, 认为钒掺杂W₁₈O₄₉纳米线在室温下的良好敏感响应及反常p型导电性与掺杂纳米线表面高密度非稳表面态诱导的低温气体强吸附有关. 关键词： 氧化钨 纳米线 气体传感器 室温灵敏度     

Dopant-dependence of one-step metal-induced dopant activation process in silicon

We investigate dopant-dependence of low temperature dopant activation technique in α-Si featuring one-step metal-induced crystallization (MIC) to decrease resistivity of p⁺ and n⁺ Si films by forming Ni_xSi_y. Ni not only crystallizes p-type α-Si film but also facilitates activation of boron atoms in the α-Si during the crystallization at 500 °C. However, phosphorus atoms are poorly activated because of the suppressed Ni-MIC rate in n-type α-Si. Finally, p⁺/n and n⁺/p junction diodes are demonstrated on single crystalline Si substrates by the low temperature dopant activation technique promising for high performance TFTs as well as transistors with an elevated S/D.     

Novel behavior of bond-centered muonium in heavily doped n-type silicon: Curie-like spin susceptibility and charge screening

Bond-centered muonium ( Mu(0)(BC)) has been observed in very heavily doped n-type Si:P. It exhibits a Curie-like electronic spin susceptibility which leads to a giant negative shift in the muon spin precession frequency. At high dopant levels, the Mu(0)(BC) hyperfine parameters, deduced from a model involving spin exchange with free carriers, are significantly reduced from those in intrinsic Si. This indicates that the spin density distribution for Mu(0)(BC) in metallic Si:P is altered significantly by charge screening effects, likely a general phenomenon for deep impurities in materials with high carrier concentrations.     

Impurities’ influence on complex defects annealing: divacancies in silicon

On the basis of electron Hall concentration temperature dependences in n-type silicon samples with relatively low content of oxygen (the majority impurity), it is found that divacancies are annealed through their decay, combining oxygen-stimulated dissociation with free dissociation in monovacancies. Such a mechanism is compared with direct conversion of divacancies into more complex defects by way of association with dopant atoms in p-type silicon.     

Optoelectronic properties of two-dimensional GaN adsorbed with H,N and O: A first-principle study

In this paper, we have investigated optoelectronic properties of two-dimensional GaN adsorbed with non-metal atoms: H, N and O based on first-principle. We find that adsorption of H, N and O atom on 2D GaN is achieved by chemisorption, and the most stable adsorption site is at the top of N atom. Band structure of 2D GaN after adsorbing H atom moves to low energy region and two-dimensional GaN is transformed into an n-type semiconductor. After adsorption of N atom, a new impurity energy appears at the Fermi level, and N adatom could induce magnetism into 2D GaN. Static dielectric constants of 2D GaN increase and adsorption spectrums have extend to infrared band when adsorbing H and N. Strong reflection peaks and strong adsorption peaks after adsorption are located at deep ultraviolet range, which is beneficial for optoelectronic application in the deep ultraviolet. Specifically, two-dimensional GaN adsorbed with H atom is more conducive to manufacture of nano-optoelectronic devices.     

Electrically deactivating nearest-neighbor donor-pair defects in Si

Based on first-principles density-functional calculations, we propose a class of nearest-neighbor donor pairs that are energetically favorable in highly n-type Si. These donor pairs comprise dopant atoms either fourfold coordinated at the nearest-neighbor distance or threefold coordinated through bond-breaking relaxations. For P and As dopants, the two defect states are very close in energy, less than 0.1 eV, while the threefold coordinated state is more stable by 0.24 eV for Sb dopants. The former state has a very deep donor level close to the valence band maximum, while the defect level lies deep inside the valence band for the latter. Thus, both the donor pairs are electrically inactive at very high doping levels, and they are suggested to be responsible for the observed saturation of carriers.     

B在Hg0.75Cd0.25Te中掺杂效应的第一性原理研究

基于密度泛函理论的第一性原理方法,通过形成能和束缚能的计算研究了B在Hg_0.75Cd_0.25Te 中的掺杂效应.结果表明B在Hg_0.75Cd_0.25Te中存在着两种主要形态:第一种是在完整的 Hg_0.75Cd_0.25Te材料中B稳定存在于六角间隙位置而非替位.此时,B形成容易激活的三级施主使材料表现为n型.另一种是在有Hg空位存在的Hg_0.75Cd_0.25Te中B更容易与Hg空位结合形成缺陷复合体,其束缚能达到了0.96 eV.这种复合体在Hg_0.75Cd_0.25Te材料中形成单施主也使材料表现为n型.考虑到辐照损伤形成的Hg空位受主,这种B与Hg空位的复合体是制约B离子在MCT中注入激活的一个重要因素.     

Structure, electrical and magnetic properties, and the origin of the room temperature ferromagnetism in Mn-implanted Si

The structure and the electrical and magnetic properties of Mn-implanted Si, which exhibits ferromagnetic ordering at room temperature, are studied. Single-crystal n- and p-type Si wafers with high and low electrical resistivities are implanted by manganese ions to a dose of 5 × 10¹⁶ cm^?2. After implantation and subsequent vacuum annealing at 850°C, the implanted samples are examined by various methods. The Mn impurity that exhibits an electric activity and is incorporated into the Si lattice in interstitial sites is found to account for only a few percent of the total Mn content. The main part of Mn is fixed in Mn₁₅Si₂₆ nanoprecipitates in the Si matrix. The magnetization of implanted Si is found to be independent of the electrical resistivity and the conductivity type of silicon and the type of implanted impurity. The magnetization of implanted Si increases slightly upon short-term postimplantation annealing and disappears completely upon vacuum annealing at 1000°C for 5 h. The Mn impurity in Si is shown to have no significant magnetic moment at room temperature. These results indicate that the room temperature ferromagnetism in Mn-implanted Si is likely to be caused by implantation-induced defects in the silicon lattice rather than by a Mn impurity.     

不同周期结构硅锗超晶格导热性能研究

构造了均匀、梯度、随机3种不同周期分布的硅/锗(Si/Ge)超晶格结构.采用非平衡分子动力学(NEMD)方法模拟了硅/锗超晶格在3种不同周期分布下的热导率,并研究了样本总长度和温度对热导率的影响.模拟结果表明:梯度和随机周期Si/Ge超晶格的热导率明显低于均匀周期结构超晶格;在不同的周期结构下,声子分别以波动和粒子性质输运为主;均匀周期超晶格热导率具有显著的尺寸效应和温度效应,而梯度、随机周期Si/Ge超晶格的热导率对样本总长度和温度的依赖性较小.     

Temperature-dependent 29Si NMR resonance shifts in lightly- and heavily-doped Si:P

Careful NMR measurements on a very lightly-doped reference silicon sample provide a convenient highly precise and accurate secondary chemical shift reference standard for ²⁹Si MAS-NMR applicable over a wide temperature range. The linear temperature-dependence of the ²⁹Si chemical shift measured in this sample is used to refine an earlier presentation of the paramagnetic (high-frequency) ²⁹Si resonance shifts in heavily-doped n-type silicon samples near the metal–nonmetal transition. The data show systematic decreases of the local magnetic fields with increasing temperature in the range 100–470 K for all samples in the carrier concentration range from 2×10¹⁸ cm⁻³ to 8×10¹⁹ cm⁻³. This trend is qualitatively similar to that previously observed for the two-orders of magnitude larger ³¹P impurity NMR resonance shifts in the same temperature and concentration ranges. The ²⁹Si and ³¹P resonance shifts are not related by a simple scaling factor, however, indicating that impurity and host nuclei are affected by different subsets of partially-localized extrinsic electrons at all temperatures.