Some aspects of plasma polymerization of fluorine-containing organic compounds. II. Comparison of ethylene and tetrafluoroethylene

Plasma polymerizations of ethylene and tetrafluoroethylene are compared. In the plasma polymerization of ethylene and of tetrafluoroethylene, glow characteristics play an important role. Glow characteristic is dependent on a combined factor of W/F_m, where W is discharge power and F_m is monomer flow rate. At higher flow rates, higher wattages are required to maintain “full glow.” In the plasma polymerization of tetrafluoroethylene, simultaneous decomposition of the monomer competes with plasma polymerization. Above a certain value of W/F_m, decomposition becomes the predominant reaction, and the polymer deposition rate decreases with increasing discharge power. ESCA results indicate that the plasma polymer of tetrafluoroethylene that is formed in an incomplete glow region (low W/F_m) is a hybrid of polymers of plasma polymerization and of plasma-induced polymerization of the monomer. Polymers formed under conditions of high W/F_m to produce “full glow” are similar, regardless of the extent of decomposition of the monomer. They contain carbons with different numbers of F(CF₃, ? CF₂? , >CF? , >C<) and carbons bonded to other more electronegative substituents.     

Distribution of polymer deposition in plasma polymerization. I. Acetylene,ethylene, and the effect of carrier gas

Factors which influence the distribution of polymer deposition in an electrodeless glow-discharge system were investigated for acetylene and ethylene. Under the conditions in which “full glow” is maintained, the distribution of polymer deposition from pure monomer flow systems is nearly independent of flow rate of monomer or of the system pressure in discharge, but is largely determined by the characteristic (absolute) polymerization rates (not deposition rate) of the monomers. Acetylene has a high tendency to deposit polymer near the monomer inlet, whereas ethylene deposits polymer more uniformly in wider areas in the reactor. The addition of carrier gas such as argon or partially copolymerizing gas such as N₂, H₂, and CCl₂F₂ was found to narrow the distribution of polymer deposition. The distribution of polymer deposition is also influenced by a glow characteristic which is dependent on flow rate and discharge power.     

Distribution of polymer deposition in plasma polymerization. III. Effect of discharge power

Distribution of polymer deposition in an inductively coupled rf discharge system is studied as a function of level of discharge power with acetylene and styrene as monomers. When a fixed flow rate is used, the discharge power has a relatively small effect on the pattern of distribution of polymer deposition as long as values of W/FM, where W is discharge wattage, F is flow rate, and M is molecular weight of monomer, are maintained above a critical level to maintain full glow in the reaction tube. It has been shown that plasma polymerization of two monomers which have different molecular weights can be compared in a fair manner by selecting conditions to yield similar value of W/FM.     

Plasma polymerization of tetrafluoroethylene. III. Reproducibility and effects of substrate and reactor materials

Plasma polylmerization occurs in plasmas surrounded by surfaces and polymer formation is one of the complicated interactions that take place between active species and molecules which constitute surfaces and gas phases. Effects of reactor wall, substrate materials, flow rate, and discharge power on polymer formation, and properties of polymer deposits were investigated by ESCA, IR (infrared) spectroscopy, and the measurement of system pressure. The effect of surface is important at the initial stage of plasma polymerization which can be easily detected by the system pressure change; however, integrated properties such as IR spectroscopy and the deposition rate show the effect in a less pronounced manner. ESCA, which reflects the properties of surface (approximately 20 A? in depth), showed the effect of surface in an even less sensitive manner. The amount and properties (including the effects of surfaces) are dependent on plasma polymerization parameter W/FM(W, wattage; F, volume flow rate; and M, molecualar weight of monomer) and the location of deposition within a reactor. IR and ESCA data clearly showed the dependence of polymer properties on W/FM; i.e., increase of W and decrease of M to be equivalent. When all these factors were kept under control, the reproducibility of plasma polymerization was found to be excellent.     

Plasma polymerization investigated by the substrate temperature dependence

Plasma polymerization of tetra fluoroethylene (TFE), perfluoro-2-butyl-tetrahydrofuran (PFBTHF), ethylene, and styrene were investigated in various combinations of monomer flow rates and discharge wattages for the substrate temperature range of ?50 to 80°C. The polymer deposition rates can be generally expressed by k₀ = Ae^?bt, where k₀ is the specific deposition rate given by k₀ = (deposition rate)/(mass flow rate of monomer), A is the preexponential factor representing the extrapolated value of k₀ at zero absolute temperature, and b is the temperature-dependence coefficient. It was found that the value of b is not dependent on the condensibility of monomer but depends largely on the group of monomer; that is, perfluorocarbons versus hydrocarbons. The values of A are dependent on domains of plasma polymerization. In the energy deficient region A is given by A = α(W/FM)ⁿ, where α is the proportionality constant, W is discharge wattage, FM is the mass flow rate, and n is close to unity. In the monomer deficient region A becomes a constant. The kinetic equation is discussed in view of the bicyclic rapid step-growth polymerization mechanisms.     

DC plasma polymerization of hexamethyldisiloxane

Hexamethyldisiloxane (HMDS) was polymerized onto metallic and insulating substrates in a parallel-plate DC reactor. The limits of the DC reactor with respect to pressure and power were determined for deposition of PP-HMDS films. In all conditions ranging from 5 Pa/0.3 W to 100 Pa/50 W, solid films were deposited. No powders or oily films were obtained under any condition in this operating range. The films were polymeric in nature,i.e., they were neither carbon-like nor SiO _x -like films. The structures and crosslink densities of the plasma films dependend strongly on the deposition conditions. The highest deposition rates, up to 2 μm per minute (or0.3 mg/cm² min), were obtained at high power, pressure, and flow rate conditions. An efficiency ɛ is introduced, defined as the fraction of the monomer that is retained in the form of a polymer deposited on the substrate. Efficiencies as high as 25% could be obtained in certain conditions. Pulsing the discharge power increased the conversion efficiency markedly, but the effect depended strongly on the monomer used. In addition to HMDS, plasma polymers were also deposited from pyrrole in pulsed conditions for comparison. A method is described for depositing films on insulators from a DC glow discharge using two wire meshes held at a negative potential.     

Diagnostic analysis of styrene plasma polymerization

For studying plasma polymerization of styrene, two in situ diagnostic methods, optical spectroscopy and mass spectroscopy, were used to measure chemical components formed in the discharge volume and their concentrations in plasma column and two sheaths. The synergetic influence of power (W), pressure (p), and monomer flow rate (F) on plasma polymerization was expressed with a composite parameter, W/pF, which is proportional to the energy transferred to styrene monomer molecule. In a certain range of W/pF, the population of C₂H₂ and H₂ produced in the discharge decreased with W/pF, while the concentration of C₈ and C₆ fragments increased, which indicates that different chemical reactions may occur in different intervals of W/pF value. The similarity in change tendency between the deposition rate, the emission intensity of CH and C₄H and mass peak vs. W/pF implies that the polymerization is controlled by the reaction in the gas phase plasma, and supports the view that initial reactive species are produced in plasma, and polymerization is performed on the substrate surface. © 1999 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 37: 325–330, 1999     

Preparation and characterization of plasma-polymerized styrene thin films

Plasma-polymerized styrene (PPS) thin films (several hundred to several thousand Å thick) have been prepared under a variety of discharge conditions in a tubular reactor inductively coupled to a radio frequency (13.56 MHz) power supply. Studies have focussed on the correlation of deposited polymer structure, evidenced both at the film surface (via XPS analysis) and in the bulk polymer (via transmission FT–IR analysis) with controllable plasma parameters (coupled rf power, monomer flow rate, monomer pressure). It has been determined that the relative number of phenyl rings incorporated into the film intact is an inverse function of the power per styrene molecule ratio. Polymer deposition rate was found to be a strong function of styrene flow rate and substrate temperature. Plausible elements of the styrene plasma polymerization mechanism will be considered.     

On the Correlation Between Deposition Rate and Process Parameters in Remote Plasma-Enhanced Chemical Vapor Deposition

Plasma-enhanced chemical vapor deposition has become one of the most important thin film deposition technologies. To avoid direct plasma exposure the substrates may be placed in the remote region. A carrier gas conveys the plasma energy to the deposition area where the reactions with the monomer molecules take place. For the engineering of such a process the modeling of the achievable deposition rate is of great interest. Among different possibilities semiempirical models provide a fast and easily utilizable tool without intensive computer simulations or the necessity of detailed knowledge about the chemistry involved. From deposition experiments with oxygen and an organosilicon monomer (hexamethyldisiloxane, HMDSO) the remote composite parameter is suggested. It combines microwave power, monomer and carrier gas flow rate, and the distance of the substrate from the plasma source. This parameter was derived from the ratio between atomic oxygen and monomer flow rate. In the parameter range considered the deposition rate is described as well ordered and the energy- and monomer-deficient regions are clearly separated.     

Fundamentals of Plasma Polymerization

The plasma polymerization of ethylene is used as an example through which to discuss the elementary steps involved in forming a polymer in an electric discharge. The relationship of the experimentally controlled variables to the rate of formation of first generation active species is discussed. These species are related, in turn, to the overall rate of polymerization through a simple model. Two asymptotic conditions are discussed which correspond to minimal and total conversion of monomer to polymer. The dependence of polymer deposition rate on monomer flow rate predicted by the model is found to correspond very closely to that observed experimentally. The predicted effect of gas pressure on polymer deposition rate also agrees with that found experimentally.     

Magnetically Enhanced 15 kHz Glow Discharge of Methane

This work deals with the luminous chemical vapour deposition (plasma polymerization) of hydrocarbon polymeric thin films in a magnetic field enhanced discharge of methane. The films were deposited on 4″ <111> single crystal silicon substrates. We investigated the influence of the different glow discharge parameters (e.g. pressure, flow rate, power input, etc.) on the deposition rate of methane and the refractive index of the resulting polymeric films, as well as the distribution of these parameters across the wafer. We used a Shinko Seiki Plasma Polymerization equipment with a bell jar reactor comprising two electrodes connected to a symmetric AC power supply of 15 kHz. Two magnetrons were formed by placing two circular shaped concentric magnetic poles behind each electrode. The substrates were attached on both sides of a rotating wheel held at a floating potential in the middle of the two electrodes. This equipment allowed us to vary a single parameter and keep the other parameters constant over the whole process. We measured the thickness and the refractive index and their distribution over the wafer. The effect of the system pressure, decoupled from the effect of flow rate, is explained by the characteristic nature of luminous gas phase and by the polymerization/deposition mechanism of luminous chemical vapour deposition.     

Kinetics of destruction of diisopropyl methylphosphonate in corona discharge

The kinetics of the destruction of diisopropyl methylphosphonate (DIMP) in corona discharge has been studied using a flow tubular coaxial wire dielectric barrier corona discharge reactor. The identification and quantitative determination of DIMP, its destruction intermediates, and phosphorus‐containing destruction products were performed using molecular beam mass spectrometry and gas chromatography/mass spectrometry. Active discharge power was varied in the range 0.01–5 W. The destruction products such as isopropyl methylphosphonate, methylphosphonic acid, and orthophosphoric acid were found on the reactor walls. The dependence of the extent of the destruction, D (D = 1 ? X / X₀, where X and X₀ are DIMP mole fractions at the outlet and the inlet of the reactor), on the specific energy deposition E_x (E_x = PF^?1 X₀^?1, where F is the carrier gas flow and P is the power dissipated in discharge reactor) was measured over the DIMP mole fraction range 60–500 ppm at the pressure of 1 bar and the temperature of 340 K. Over the range of the experimental conditions studied the destruction obeys the “pseudo‐first‐order” kinetic law: ln(1 ? D) = ?KE_x. Plausible mechanisms of the destruction are discussed. It was concluded that ion mechanism is the major one responsible for the destruction process. © 2002 Wiley Periodicals, Inc. Int J Chem Kinet 34: 331–337, 2002     

Plasma polymerization of fluoromethanes

Methane and fluoromethanes (CH_nF_4−n, 1 ≤ n ≤ 3) were subjected to an rf glow discharge plasma. All the fluoromethanes (including methane) polymerized in the plasma and formed thin films. The deposition rate of the fluoromethanes depended on their monomer structure: CH₂F₂, of which the F/H ratio is unity, showed the greatest deposition rate. The elimination of H and F atoms as H—F was found to be a key factor for the polymerization of fluoromethanes. The chemical composition of the polymerized film, measured with X-ray photoelectron spectroscopy and glow discharge emission spectroscopy, was also found to be strongly dependent on monomer structure. © 1998 John Wiley & Sons, Inc. J. Polym. Sci. A Polym. Chem. 36: 2043–2050, 1998     

Effects of Reaction Conditions on the Structure of Plasma-Polymerized Ethylene

Liquid and solid polymeric products were derived from a low-pressure glow discharge of ethylene. Polymerization pressure, discharge power, and monomer flow rate were systematically varied. Products were analyzed by infrared spectroscopy to determine the concentrations of characteristic functional groups in each. Polymer form, apparent crosslink density, and deposition rate were also reported. Structural variations and the form of the polymerization products can be explained in terms of the prevailing discharge conditions and the deposition rate, both of which are functions of the reactor operating parameters. It was found that the degree of crosslinking in rigid films of plasma polymerized ethylene is in the range of 6 to 16 chain carbons between crosslinks.     

Comparisons of glow-discharge polymerizations among tetramethylsilane,dimethyldimethoxysilane, and tetramethoxysilane

Glow-discharge polymerizations among tetramethylsilane, dimethyldimethoxysilane, and tetramethoxysilane were compared by elemental analyses and infrared spectroscopy. The elemental composition of the polymers prepared from the three monomers depended strongly on the operational conditions necessary to sustain a glow discharge, i.e., the W/FM parameter, where W is the rf power, F is the flow rate of the monomer, and M is the molecular weight of the monomer. Methoxy groups were more susceptible to glow discharge than methyl groups. Differences in chemical structure among these monomers appeared in the polymer structures formed when the glow-discharge polymerization was carried out at a low value of the W/FM parameter, while the differences disappeared at high values of the W/FM parameter, for analogous polymers. Substitution with methoxy groups was favorable for the formation of polymers of low carbon content only when the glow-discharge polymerization was performed at low values of W/FM.     

Plasma polymerization of tetrafluoroethylene. IV. Comparison of ethylene and tetrafluoroethylene by measurement of electron temperature and density of positive ions

The double probe method was applied to plasma of tetrafluoroethylene (TFE) and ethylene and the electron temperature (T_e) and density of positive ions (n_p) were measured at various discharge wattages. The probe current-probe voltage diagrams for TFE were different from those for ethylene. The shape of its diagram indicates that a considerable number of negative ions exist in TFE plasma. The levels of n_p for TFE were also nearly six times greater than those for ethylene at the same discharge current. The dependence of TFE polymer deposition and the chemical structure of the polymer, based on ESCA data on discharge current, was related to T_e and n_p measured by the probe method. The values of T_e and n_p may not be directly related to the polymer formation in a plasma; the method provides a direct measure of plasma energy density where plasma polymerization takes place, whereas it cannot be accurately estimated by the input energy of a discharge. It was found that plasma energy density based on (n_pT_e) for TFE plasma and that for ethylene differ significantly at the same level of input parameter (W/FM), where W is the discharge wattage, F is the volume flow rate, and M is the molecular weight of the monomer.     

Molecular adsorption and the chemistry of plasma-deposited thin organic films: Deposition of oligomers of ethylene glycol

Weakly ionized, radio-frequency, glow-discharge plasmas formed from methyl ether or the vapors of a series of dimethyl oligo(ethylene glycol) precursors (general formula: H-(CH₂OCH₂)_n-H;n=1 to 4) were used to deposit organic thin films on polytetrafluoroethylene. X-ray photoelecton spectroscopy (XPS) and static secondary ion mass spectrometry (SIMS) of the thin films were used to infer the importance of adsorption of molecular species from the plasma onto the surface of the growing, organic film during deposition. Films were prepared by plasma deposition of each precursor at similar deposition conditions (i.e., equal plasma power (W), precursor flow rate (F), and deposition duration), and at conditions such that the specific energy (energy/mass) of the discharge (assumed to be constrained byW/FM, whereM=molecular weight of the precursor) was constant. At constantW/FM conditions, two levels of plasma power (and, hence, twoFM levels) and three substrate temperatures were examined. By controlling the energy of the discharge (W/FM) and the substrate temperature, these experiments enabled the study of effects of the size and the vapor pressure of the precursor on the film chemistry. The atomic % of oxygen in the film surface, estimated by XPS, and the intensity of theC-O peak in the XPS C_ls spectra of the films, were used as indicators of the degree of incorporation of precursor moieties into the plasma-deposited films. Analysis of films by SIMS suggested that these two measures obtained from XPS were good indicators of the degree of retention in the deposited films of functional groups from the precursors. The XPS and SIMS data suggest that adsorption of intact precursor molecules or fragments of precursor molecules during deposition can have a significant effect on film chemistry. Plasma deposition of low vapor pressure precursors provides a convenient way of producing thin films with predictable chemistry and a high level of retention of functional groups from the precursor.     

POLYMERIZATION OF OCTAFLUOROCYCLOBUTANE IN GLOW DISCHARGE Ⅱ. ESCA AND IR CHARACTERIZATION OF POLYMER STRUCTURE*

In a capacitively coupled discharge with external electrodes, He, H_2, N_2 or Ar were used as plasmagas, polymerization of octafluorocyclobutane was carried out under different conditions by varyingdischarge power, pressure, plasma gas and plasma-gas/monomer ratio. Structure of polymerizedproducts was characterized by IR spectroscopy and ESCA measurement. It was found that therewere six elements in the products, i.e. C, F, Si, O, N and H. The probably existed groups in poly-mers wer investigated. By analyzing the resolved peaks of C_(1S) region in ESCA spectra, effect of thereaction conditions on degree of branching of the polymerized products and the relationship of thepolymer structure wth the mechanism of the competitive ablation and polymerization process werestudied. In addition, polymer deposition process occurring in glow discharge was discussed.     

Understanding the synthesis of DEGVE pulsed plasmas for application to ultra thin biocompatible interfaces

There is interest in the development of novel surface treatments for biocompatibility and non-fouling behaviors on various surfaces of in vivo devices. Polyethylene glycol thin films have shown promise as non-fouling passivation layers for such devices. Studies of the surface chemistry and non-fouling effectiveness of plasma deposited di(ethylene glycol) vinyl ether (DEGVE) films have observed that non-fouling performance is maximized when plasma deposition occurs at low values of average power, (<5 W). [Y.J. Wu, R.B. Timmons, J.S. Jen, Frank E. Molock, Non-fouling surfaces produced by gas phase pulsed plasma polymerization of an ultra low molecular weight ethylene oxide containing monomer, Colloids and Surfaces B: Biointerfaces 18 (2000) 235–248.] Chemical properties of plasma deposited films were directly attributed to the complex interactions occurring within the gas phase. In order to better understand the deposition process, as well as the significance of the conclusions drawn by Wu et al. [Y.J. Wu, R.B. Timmons, J.S. Jen, Frank E. Molock, Non-fouling surfaces produced by gas phase pulsed plasma polymerization of an ultra low molecular weight ethylene oxide containing monomer, Colloids and Surfaces B: Biointerfaces 18 (2000) 235–248.] an investigation of the gas phase behavior in DEGVE pulsed plasma discharges was performed. Infrared spectra were used to characterize the chemical composition and dissociative behavior of DEGVE plasmas across a range of average powers. This allowed for the construction of a dissociative model of the DEGVE monomer in the plasma discharge. Analysis of the observed dissociative pattern demonstrates the presence of key daughter species which would account for the observations made on deposited DEGVE films by Wu et al. [Y.J. Wu, R.B. Timmons, J.S. Jen, Frank E. Molock, Non-fouling surfaces produced by gas phase pulsed plasma polymerization of an ultra low molecular weight ethylene oxide containing monomer, Colloids and Surfaces B: Biointerfaces 18 (2000) 235–248.].     

Creation of Polymerizable Species in Plasma Polymerization

Plasma polymerization of trimethylsilane (TMS) was carried out and investigated in a direct current (dc) glow discharge. The formation of TMS plasma glow was carefully examined with optical photography as compared with an Ar dc glow discharge. It was found that there exists a significant difference in the nature of glow and how the glow is created in TMS glow discharge, which polymerizes or causes deposition, and that of monatomic gas such as Ar, which does not polymerize or deposit. In dc Ar discharge, the negative glow, which is the most luminous zone in the discharge, develops in a distinctive distance away from the cathode surface, and the cathode remains in the dark space. In a strong contrast to this situation, in TMS dc discharge, the primary glow that is termed as cathode-glow in this paper appears at cathode surface, while a much weaker negative glow as a secondary glow was observed at the similar location to where the Ar negative glow appears. The deposition results of plasma polymers and gas phase composition data of TMS in a closed reactor acquired by ellipsometry and residual gas analyzer (RGA) measurements clearly indicated that the cathode-glow in TMS glow discharge is mainly associated with chemically reactive species that would polymerize or form deposition, but the negative glow is related to species from simple gases that would not polymerize or deposit. Based on the glow location with respect to the cathode, it was deduced that the cathode-glow is due to photon emitting species created by molecular dissociation of the monomer that is caused by low energy electrons emanating from the cathode surface. The negative glow is due to the ionization and the formation of excited neutrals of fragmented atoms caused by high-energy electrons. Polymerizable species that would cause deposition of material (plasma polymers) are created mainly by the fragmentation of monomer molecules by low energy electrons, but not by electron-impact ionization of the monomer.