Development of an intense pulsed metallic ion beam source

Intense pulse metallic ion beams (Al⁺, Cu⁺, and Pb⁺) were produced by a magnetically insulated ion diode having a metal anode. Metal ion plasmas on the anode could be generated through enhanced electron bombardment by using a radial cathode. The energy, current density, and duration time of the lead ion beam were 30~140 keV, ~7.5 A/cm² (total ion current ⩾0.5 kA), and 800 ns, respectively. The ion current density exceeded the space-charge-limited current by a factor of 50. The lead ions in the first-to-sixth states of ionization were detected by a Thomson-parabola ion-spectrometer together with light loss, such as C⁺ and O ⁺. The ratio of the ion current of heavy metals to the total ion current was measured using a magnetic mass analyzer with a charge collector. The ratio was about 90% for a lead ion beam and 20~50% for Al and Cu ion beams     

A two-component model for the electron distribution function in ahigh-current pseudospark or back-lighted thyratron

Temperature, energy, and densities of two electron distribution function components, including an isotropic bulk part and an anisotropic beam, are analyzed for a hydrogen pseudospark and/or back-lighted thyratron switch plasma with a peak electron density of 1-3×10¹⁵ cm^-3 and peak current density of ≈10⁴ A/cm². Estimates of a very small cathode-fall width during the conduction phase and high electric field strengths lead to the injection of an electron beam with energies ⩾100 eV and density of 10¹³-10¹⁴ cm^-3 into a Maxwellian bulk plasma. Collisional and radiative processes of monoenergetic beam electrons, bulk plasma electrons and ions, and atomic hydrogen are modeled by a set of rate equations, and line intensity ratios are compared with measurements. Under these high-current conditions, for an initial density n_H2=10¹⁶ cm^-3 and electron temperature of 0.8-1 eV, the estimated beam density is ≈10¹³ -10¹⁴ cm^-3. These results suggest the possibility of producing in a simple way a very high-density electron beam     

Pulse intense metal-ion diode with a vacuum arc plasma anode

An intense pulsed ion beam of metal was extracted from a magnetically insulated ion diode operated in a mode of plasma prefill generated from a vacuum arc discharge, anode plasma source. With this ion diode, an intense metal-ion beam of a high melting-point metal (Ta) was obtained. A variety of operational modes appeared, depending on the amount of plasma in the diode gap at the initiation of the high-voltage pulse. The energy, current, and duration time of the ion beam were 20~100 keV, ~1 kA, and 1 μs, respectively. Measurements of ions were performed with an ion energy analyzer or a biased ion collector located at the end of a long drift tube and a Thomson parabola ion spectrometer. The Ta ions in the first to fifth states of ionization were detected accompanied by C⁺, O⁺, F⁺, and H⁺ . A Ta ion beam current of about half the total ion flux was obtained in this experiment     

Acoustic double layers in multispecies plasma

Particle simulation in a one-dimensional bounded system is used to examine the formation of acoustic double layers in the presence of two ion species. Double-layer formation depends critically on the details of the distribution functions of the supporting ion populations, and their relative drifts with respect to the electrons. The effect of having two ion components, an H⁺ and an O⁺ beam, on double-layer evolution from ion acoustic turbulence driven by an electron drift relative to the H⁺ beam of ≈0.5u _e, where uu_e is the electron thermal speed, is examined. The ratio of ion drifts is taken to be consistent with acceleration by a quasi-static auroral potential drop (i.e. V _H/V_O=√M_O/ M_H=4.0). Acoustic double layers form in either ion species on the time scale τ≈100ω_ps^-1, where ω_ps is the ion plasma frequency for species `s' and s=H or O, and for drifts relative to the electrons lower than that required for double layer formation in simulations of single ion component plasma     

射频离子源束流特性分析

介绍了为HL-2A 装置设计的引出束功率为1MW 的射频离子源研制情况。目前,在测试平台上,该离子源已经成功引出了束能量和束电流分别为35keV 和12.4A、束质子比为79%、脉宽为100ms 的氢离子束,达到了其设计束功率的44%。用红外热成像的方法测量了离子束能量密度分布。结果表明,在距离引出系统地电极 1.3m 处,束密度分布遵循高斯分布。引出束的最佳导流系数为1.689×10^–6A•V^-3/2 左右,随射频功率改变有较小的变化。根据这些实验结果,采取了相关改进措施来改善离子源的引出束性能。     

Atomic collision processes relevant for heavy ion beam probes

Atomic collision processes of fast Tl and Cs ions with particles in a high temperature fusion plasma are investigated. At low beam energies (<5 MeV), ion impact collisions and charge exchange processes can be neglected compared to electron ionization processes. At beam energies above 5 MeV and high plasma ion temperatures, collisions with ions start to contribute significantly to signal generation and attenuation. Also, collisions with the neutral background gas in the beamlines can attenuate the ion beam significantly and lower the signal level, if the vacuum pressure is above 10^-4 Torr. For the heavy ion beam probes operating today, only electron impact ionization processes are important and accurate predictions of the secondary signal level and electron density profile measurements are possible because of the good knowledge of electron impact ionization cross sections for Cs ⁺ and Tl⁺ ions     

Electron beam extraction from a broad-beam vacuum-arc metal plasmasource

We describe experiments demonstrating the formation of a high current electron beam from a vacuum arc plasma. A preexisting vacuum arc ion source was used, with the extraction voltage reversed in polarity so as to form an electron beam rather than an ion beam; no other changes were required. The beam formed was of energy up to 33 keV, beam current up to 70 A, beam diameter about 10 cm, pulse width 500 μs, and energy density up to 25 J/cm². This kind of source can be used for material surface modification     

像散椭圆高斯光束的M2因子矩阵的理论与实验研究

对像散椭圆高斯光束, 传统的M²因子测量采用M_x²和M_y²来描述光束质量. 当光束绕z轴旋转, M_x²和M_y²会随之变化, 单纯采用M_x²和M_y²来评价激光光束质量并不唯一. 为此采用了像散椭圆高斯光束的M²因子矩阵, 理论推导出了在同一坐标系下光场绕z轴旋转不同角度后的M²因子矩阵, 找出了光场旋转前后的M²因子矩阵元的不变量关系. 数值模拟、 实验测量得到M²因子矩阵主对角元随光斑旋转角度的变化轨迹曲线, 及反对角元随旋转角度的变化规律. 理论推导与实验结果相符. 结果表明, 像散椭圆高斯光束在主方向上时M_x²与M_y²之和最小; 在其他方向上的M_x², M_y²之和大于在主方向上的M_x², M_y²之和; 反对角元随旋转角度呈周期变化, 在主方向上为零. 关键词： M²因子矩阵')" href="#">M²因子矩阵 像散椭圆高斯光束 实验测量 矩阵光学     

Transmission of low-energy (< 10 eV) O ions through Au films on TiO2(110)

In an attempt to identify the fundamental processes that influence ion transport through metallic surface layers, we have studied the transmission of O⁺ ions through discontinuous Au films adsorbed on TiO₂(110). A low energy (< 10 eV) O⁺ ion beam is generated via electron stimulated desorption when an Au-dosed TiO₂(110) substrate is bombarded with a focused 250 eV electron beam. Low energy ion scattering data indicate that Au evaporated under ultrahigh vacuum conditions at 300 K forms three-dimensional clusters on TiO₂(110). As the Au coverage increases, the formation of Au clusters on TiO₂(110) blocks a fraction of the TiO₂ surface and the O⁺ yield is attenuated. However, for high coverages (≥30% Au covered substrate) the O⁺ signal decreases at a faster rate than the TiO₂ open area fraction. We attribute the attenuation of the O⁺ yield for high Au coverages mainly to blocking of O⁺ by Au clusters, to deflection of trajectories by the image force between ions and Au clusters, and to charge transfer between desorbing O⁺ and neighboring Au clusters.     

Secondary ion emission from clean and K-covered Ni surfaces near threshold impact energies

Clean and K-covered Ni surfaces are bombarded with low energy (10–500 eV) beams of He⁺, Ne⁺, Ar²⁺, and Kr⁺ ions, and the emitted ion yield is measured as a function of beam energy. The apparent threshold energies for K⁺ and Ni⁺ emission are proportional to the ionic binding energies of K⁺ and Ni⁺ to the Ni surface. From comparison of the ion and neutral yield curves, it is suggested that these ions are emitted via momentum transfer collisions similar to neutral sputtering.     

射频离子源离子束成分光谱测量

为HL-2A 装置中性束注入器研制了引出束功率为1MW 的射频离子源。在测试平台上,实验离子源已经成功引出了束能量和束电流分别为35keV 和12.4A、束质子比为79%、脉宽为100ms 的氢离子束,达到了设计束功率要求的44%。在射频离子源实验平台上,利用多普勒频移光谱方法测量了离子源引出束流成分比例,对比了束流成分和射频离子源引出束流之间的关系。实验数据分析表明,在10A 引出束流的情况下,离子流成分 H⁺ ₁、H⁺ ₂ 和H⁺ ₃ 分别为75%、18%和7%。并且当引出束流从3.3A 升至10.4A 时,H⁺ ₁ 从37%升至78%,而H⁺ ₃ 则从19%降至9%。     

Nitrogen ion spectrum from a low energy plasma focus device

The nitrogen ion spectrum generated from a low energy Mather-type Plasma Focus device is reported. The main species of ions present are N ⁺¹, N⁺², and N⁺³. It is found that its relative concentrations at a distance of several cm from the ion source are in agreement with those predicted for an equilibrium charge-state of the beam, and hence the spectrum of the neutral nitrogen is also derived. By taking into account the lateral spread of the beam due to multiple elastic scattering with the background gas, the derivation of absolute values for the total ion spectrum within the investigated energy range (>170 keV), the total number and total energy of the fast particles has been obtained     

Ion beam enhanced deposition of AINxOy alloys on InP

AIN_xO_y alloy films are deposited on InP by low energy (20 eV) ion beam enhanced reactive evaporation of aluminum in ultra-high vacuum. The resistivity of the films ranges between 10¹⁵ and 10¹⁶ Ω cm and the dielectric strength exceeds 10⁶ V/cm. The energy of the ions is kept below the threshold energy (found to be in the range 20–100 eV) beyond which ion bombardment of InP surface results in irreversibly degraded electronic properties. Despite this precaution, further improvement of interface properties (implying lowering of ion energy and appropriate post-annealing schemes of the structures) are required for a full development of this technique, which is compatible with the molecular beam epitaxy technology.     

低速Xe~(q+)(4≤q≤20)离子与Ni表面碰撞中的光辐射

实验中测量了0.38V_(Bohr)(460 keV)高电荷态Xe~(q+)(4≤q≤20)离子轰击高纯Ni表面发射的400-510 nm光谱.实验结果包括NiⅠ原子谱线,NiⅡ离子谱线,以及入射离子中性化发射的XeⅠ,XeⅡ和XeⅢ谱线.研究了谱线XeⅡ410.419,XeⅢ430.444,XeⅡ434.200,XeⅡ486.254,NiⅠ498.245,NiⅠ501.697,NiⅠ503.502,NiⅠ505.061和NiⅠ508.293 nm的光子产额随着入射离子电荷态的变化.结果表明,入射离子中性化和溅射Ni原子发射谱线的光子产额随着入射离子电荷态的增加而增加,其趋势与入射离子势能一致.     

Influences on the beam propagation ratio M

A beam is described by its transverse power density distribution, its wavefront, and its transverse distribution of coherence. The beam propagation ratio, M², is expressed as the square root of the sum of each of the three beam attributes. The shape of the power density distribution governs the diffraction of the beam. The stronger it is modulated, the higher the M². In comparison to an non-aberrated beam, the M² of a beam with an aberrated wavefront is increased. Similarly, the M² of a partially coherent beam is higher than the one of a fully coherent one. A concise formula is derived. The components of M² of a mixture of Hermite–Gaussian beams and of a spherically aberrated Gaussian beam are given as examples.     

Production of high-current large-area H- beams by abucket-type ion source equipped with a magnetic filter

A negative-ion-based neutral beam injection (NBI) system is planned for plasma heating of the Large Helical Device (LHD). We have developed a negative ion source, which is 1/3 the scale of the source for the NBI. A magnetic filter held was generated by external permanent magnets to lower the electron temperature in a large-area bucket plasma source (35 cm×62 cm) for efficient H^- production. We investigated the magnetic field configuration and found a low electron temperature high density plasma (<1 eV, 10¹²/cm³) could be achieved with an optimized configuration, The filter strength (B_max=70 G, line-integral flux=780 G cm at the center axis of the source) was proved to be enough to lower the electron temperature below 1 eV at high arc discharge power (100 kW) and low pressure (0.4 Pa). We injected cesium vapor into the plasma source to enhance H^- production efficiency and obtained a 16.2-A H^- beam current (31 mA/cm², 47 kV) using a large-area, four-grid electrostatic extraction system (25 cm×50 cm). This satisfied the development target (>15 A: 1/3 current of LHD ion source). Based on the results, we are designing a negative ion source for the LHD     

Setup of a dipole trap for all-optical trapping

Micromotion induced by the radio-frequency field contributes greatly to the systematic frequency shifts of optical frequency standards. Although different strategies for mitigating this effect have been proposed, trapping ions optically has the potential to provide a generic solution to the elimination of micromotion. This could be achieved by trapping a single ion in the dipole trap composed of a highpower laser field. Here, we present the setup of the dipole trap composed of a 532 nm laser at a power of 10 W aiming to optically trap a single ~(40)Ca~+ and we observe an AC-Stark shift of the fluorescence spectrum line of ～22 MHz caused by the 532 nm dipole beam. The beam waist of the dipole laser is several microns, which would provide a dipole potential strong enough for all-optical trapping of a single ~(40)Ca~+ ion.     

A short history of heavy ion beam probing

The author describes some aspects of research on controlled thermonuclear fusion as an energy source, starting in the late 1950s. There was a need for new diagnostic techniques for studying high temperature plasmas. The author proposed a diagnostic for measuring plasma density by probing a deuterium plasma with a deuterium beam and measuring the proton production from the D-D nuclear reaction. By the mid 1960s, it was possible to do so. After carrying out a D-D measurement, the author suggested switching over to an H₂⁺ beam and looking for an H⁺ signal. The H+ was loud and clear and that was the last of the nuclear measurements. One of the first things done using the molecular break-up of the H₂⁺ to measure the density of the hollow cathode arc plasma was a study of a coherent instability. The frequency response wasn't sufficient to measure the instability directly, so a Langmuir probe was used to detect the instability. The Langmuir probe gave a signal from a fixed spatial location but the beam probe signal was swept across the plasma giving 2D spatial resolution. This was the first detailed mapping of a plasma instability. Attempts to apply the ion beam probe to measuring the plasma current density in the ST Tokamak are described. Heavy ion beam probing measurements using hollow cathode arcs as target plasmas made it possible to measure T_e at low temperatures and to identify space potential fluctuations. Installation of a beam probe on the Laser Initiated Target Experiment are described, along with work on the ELMO Bumpy Torus, the VERSATOR Tokamak, TMX, TEXT, ISX-B, the Ergodic Magnetic Limiter and ATF     

利用强流ISOL束研究20Na的奇异衰变模式(英文)

北京放射性离子束装置（Beijing Radioactive Ion-beam Facility,BRIF）是基于在线同位素分离器技术的国家大科学平台。在BRIF装置上利用100 MeV的质子束轰击较厚的反应靶产生放射性核素;反应产物经离子源电离和在线分离,在线同位素分离段可引出100~300 keV的放射性核束,质量分辨率达20 000。在基金委科学仪器基础研究专项的支持下,建成了多用途的衰变实验终端,包括束流传输管道、通用靶室、带电粒子和γ探测器、集成电子学和数据获取系统等。利用100 MeV的质子束轰击MgO厚靶产生了流强高达1×105 pps的20Na放射性核束。通过高效率地同时测量β,γ和α,第一次直接观测到20Na非常稀有的β-γ-α衰变模式。Beijing Radioactive Ion-beam Facility(BRIF) has been commissioned as the national Radioactive Ion Beam(RIB) facility based on the Isotope Separator On Line(ISOL) technique since 2016. At BRIF, the radioactive nuclides are produced by the proton beam of 100 MeV bombarding a thick-target, the reaction products diffusing out of the target are ionized by an ion source and delivered to the online mass separator. In addition to the post-accelerated radioactive ion beams, BRIF can provide low-energy ISOL beams of 100 to 300 keV with a mass resolution of 20 000. A general-purpose decay station has been built including the ISOL beam transport line, a conventional reaction chamber, charge-particle and γ detectors with integrated electronics and data acquisition system. An intense 20Na ISOL beam up to 1×105 pps was produced by using the 100 MeV proton beam bombarding a MgO thick target. With high-efficiency measurements of β, γ and α simultaneously, very rare β-γ-α decay mode in 20Na has been directly observed for the first time in the present work.     

Microstructural analysis of hard amorphous carbon films deposited with high-energy ion beams

Hard amorphous carbon films produced using high-energy (ca. 30 keV) ion beam deposition of CH₃⁺ and CH₄⁺ on silicon wafers, have been investigated by Positron Annihilation Spectroscopy (PAS), the results are correlated with Raman Spectroscopy and Electrical Resistivity measurements. The microstructural modifications of the films as a function of the annealing temperature in the 300–600°C range have been studied. The evolution of the fractions of sp² and sp³ bonds is described and related to the changes of the open volume defect distribution and the graphitization process.