Substrate temperature influenced physical properties of silicon MOS devices with TiO2 gate dielectric

DC reactive magnetron sputtering technique was employed for deposition of titanium dioxide (TiO₂) films. The films were formed on Corning glass and p‐Si (100) substrates by sputtering of titanium target in an oxygen partial pressure of 6×10^?2 Pa and at different substrate temperatures in the range 303 – 673 K. The films formed at 303 K were X‐ray amorphous whereas those deposited at substrate temperatures ≥ 473 K were transformed into polycrystalline nature with anatase phase of TiO₂. Fourier transform infrared spectroscopic studies confirmed the presence of characteristic bonding configuration of TiO₂. The surface morphology of the films was significantly influenced by the substrate temperature. MOS capacitor with Al/TiO₂/p‐Si sandwich structure was fabricated and performed current–voltage and capacitance–voltage characteristics. At an applied gate voltage of 1.5 V, the leakage current density of the device decreased from 1.8 × 10^?6 to 5.4 × 10^?8 A/cm² with the increase of substrate temperature from 303 to 673 K. The electrical conduction in the MOS structure was more predominant with Schottky emission and Fowler‐Nordheim conduction. The dielectric constant (at 1 MHz) of the films increased from 6 to 20 with increase of substrate temperature. The optical band gap of the films increased from 3.50 to 3.56 eV and refractive index from 2.20 to 2.37 with the increase of substrate temperature from 303 to 673 K. Copyright © 2012 John Wiley & Sons, Ltd.     

Preparation and Characterization of TiO2 Thin Films by Sol-Gel Method

Titanium dioxide (TiO₂) thin films have been deposited on silicon and glass substrates by the sol-gel process using titanium iso-propoxide [Ti(O-i-C₃H₇)₄]. The bond configuration of the TiO₂ thin films was analyzed by using FTIR in the wavenumber range from 400 to 4000 cm^–1. The spectral transmittance of as-deposited TiO₂ films deposited on fused silica glass was measured in the wavelength range from 200 to 900 nm. X-ray diffraction measurements were performed to determine the crystallinity of the TiO₂ films. As-deposited films were amorphous. As the film was annealed at higher temperature, the structure was transformed from amorphous to the anatase crystalline state. The chemical composition of the deposited film was investigated using X-ray photoelectron spectroscopy (XPS). The films are essentially stoichiometric with carbon as the dominant impurity on the surface. Raman spectra show the characteristic of TiO₂ anatase phase. The electrical properties of the TiO₂ films were measured using capacitance-voltage (C-V) and current-voltage techniques. From C-V measurements, the dielectric constants were calculated to be approximately 26 for the as-deposited films and 75–82 for films annealed at 700°C in different atmosphere. For the as-deposited samples, the breakdown voltage was 2.7 MV/cm, and for an electric field of 1 MV/cm, the leakage current was 5 × 10^–5 A/cm² and the resistivity was 2.2 × 10¹⁰ -cm.     

Charge referencing issues in XPS of insulators as evidenced in the case of Al‐Si‐N thin films

Accurate charge referencing in XPS of insulating specimens is a delicate issue. This difficulty is illustrated in the case of Al‐Si‐N composite thin films deposited by reactive magnetron sputtering with variable composition from pure aluminum nitride to pure silicon nitride. The samples were mounted with Au‐coated metallic clamps. Argon sputter cleaning was required to remove a surface native oxide before analysis. For charge referencing implanted argon atoms from the sputter gas and a small amount of gold re‐deposited from the metallic clamps onto the specimen surface during sputter cleaning were evaluated. For the argon atoms, a surprisingly large chemical shift (～1 eV) and a significant peak broadening (0.6 eV) of the Ar 2p_3/2 photoelectron line were found with varying the Si content of the films. This could be related to chemical and structural changes of the Al‐Si‐N films. Hence implanted argon could not be used for charge referencing of Al‐Si‐N samples. In contrast to the implanted argon, the Au 4f_7/2 line width of the gold re‐deposited onto the sample surface did not depend on the Si content of Al‐Si‐N films. A constant energy shift (～1.2 eV) of the Au 4f_7/2 line as compared with bulk gold was, however, found, which was related to the size of gold particles formed on the insulating films. Therefore gold could be reliably used to study chemical shifts of sample‐relevant species in Al‐Si‐N films, but the absolute binding energies of Al 2p, Si 2p and N 1s photoelectrons could not be determined. Copyright © 2011 John Wiley & Sons, Ltd.     

Preparation and characterization of thin TiO2-films on gold/mica

Flat and highly (111) oriented gold and silver films were prepared by physical vapour deposition (PVD) using optimized deposition parameters. On these films, which were characterized with atomic force microscopy (AFM), scanning tunneling microscopy (STM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), titanium dioxide films were deposited by electron beam evaporation and dip coating. Dip coating from titanium tetraisopropoxide solutions resulted in films with different morphology and coverage depending on the alkoxide concentration (0.009 mol/L – 0.60 mol/L) and the post-treatment. Scanning electron microscopy (SEM) and AFM revealed that the deposited TiO₂ consists of amorphous, highly porous islands when the applied alkoxide concentration is high (0.05 mol/L – 0.6 mol/L). At higher temperatures these amorphous TiO₂ islands sintered significantly and crystallized to anatase. In contrast, transparent TiO₂ films were obtained from low concentrated alkoxide solutions (< 0.01 mol/L) which covered the whole substrate, similar to electron beam evaporated thin films. Sputter profiles with ion scattering spectroscopy (ISS) indicated that the film thickness is in the range of 2 nm when alkoxide solutions with a concentration of 9 mmol/L are used. The deposition of TiO₂ by electron beam evaporation normally resulted in significantly reduced TiO₂ films, completely oxidized ones were obtained when deposition was performed at elevated oxygen partial pressures (p(O₂) > 2 × 10^–5 mbar).     

Synthesis of Mesoporous TiO2/SiO2 Hybrid Films as an Efficient Photocatalyst by Polymeric Micelle Assembly

Thermally stable mesoporous TiO₂/SiO₂ hybrid films with pore size of 50 nm have been synthesized by adopting the polymeric micelle‐assembly method. A triblock copolymer, poly(styrene‐b‐2‐vinyl pyridine‐b‐ethylene oxide), which serves as a template for the mesopores, was utilized to form polymeric micelles. The effective interaction of titanium tetraisopropoxide (TTIP) and tetraethyl orthosilicate (TEOS) with the polymeric micelles enabled us to fabricate stable mesoporous films. By changing the molar ratio of TEOS and TTIP, several mesoporous TiO₂/SiO₂ hybrid films with different compositions can be synthesized. The presence of amorphous SiO₂ phase effectively retards the growth of anatase TiO₂ crystal in the pore walls and retains the original mesoporous structure, even at higher temperature (650 °C). These TiO₂/SiO₂ hybrid films are of very high quality, without any cracks or voids. The addition of SiO₂ phase to mesoporous TiO₂ films not only adsorbs more organic dyes, but also significantly enhances the photocatalytic activity compared to mesoporous pure TiO₂ film without SiO₂ phase.     

Electrochromic properties of sputtered TiO2 thin films

TiO₂ thin films were deposited on ITO/Glass substrates by the rf magnetron sputtering in this study. The electrochromic properties of TiO₂ films were investigated using cyclic voltammograms (CV), which were carried out on TiO₂ films immersed in an electrolyte of 1 M LiClO₄ in propylene carbonate (PC). As- deposited TiO₂ thin film was amorphous, while the films post-annealed at 300~600°C contained crystallized anatase and rutile. With the increase of the annealing temperature, the surface roughness of film increased from 1.232 nm to 1.950 nm. Experimental results reveal that the processing parameters of TiO₂ thin films will influence the electrochromic properties such as transmittance, ion-storage capacity, inserted charge, optical density change, coloration efficiency and insertion coefficient.     

A new method for deposition nitrogen‐doped TiO2 nanofibers with mixed phases of anatase and rutile

A new method for deposition nitrogen‐doped TiO₂ nanofibers films was proposed. By using atmospheric pressure plasma jet generated by dual‐frequency power sources, the morphologies of these TiO₂ films were investigated by scanning electron microscopy. The structures of these films were characterized by X‐ray diffraction and Raman Shift Spectroscopy. The elemental composition of these films [Colour figure can be viewed at wileyonlinelibrary.com ] were characterized by means of X‐ray photoelectron spectroscopy. The optical absorption of these films were studied by UV‐vis absorbance spectra. These results indicated that the nitrogen‐doped nanofibers TiO₂ films have mixed phases of anatase and rutile. They also display narrow band gap. The I‐V characteristics curves exhibited good conductivity ability. Optical emission spectroscopy (OES) was measured to analyze the active group.     

Thermal and hydrothermal stability of flame hydrolytically synthesized SiO2/TiO2 mixed oxides

The phase stability of the two TiO₂ modifications (anatase and rutile) in fumed SiO₂/TiO₂ nano-composites (0–24.8 wt-% silica) under thermal and hydrothermal conditions was investigated by X-ray powder diffraction, transmission electron microscopy (TEM) and gas adsorption methods (BET). The results show that the phase transformation from anatase to rutile type of structure and the growth of anatase crystallites are significantly retarded by mixing small amounts of SiO₂ into TiO₂, while the specific surface area is maintained. The SiO₂/TiO₂-composites reveal a remarkable shift in the anatase to rutile transformation temperature from approx. 500 °C (pure TiO₂) to approx. 1000 °C (samples with SiO₂ contents of more than 10%). The rate of phase transformation from anatase to rutile is enhanced under hydrothermal conditions compared to conventional thermal treatment, e.g. pure titania (AEROXIDE^® TiO₂ P25) annealed under hydrothermal conditions (100 g/m³ absolute humidity, 4 h at 600 °C) had a rutile content of 85%, while the same specimens annealed in absence of humidity contained only 46% rutile. However, the difference in rate of phase transformation became less pronounced when the silica content in SiO₂/TiO₂-composites was further increased.TEM results showed that the surface of the anatase crystallites was covered with silica. This averts coalescence of anatase crystallites and keeps them under a critical size during the annealing process. When the crystal domains grew larger, a rapid conversion to rutile took place. The critical size of anatase crystallites for the phase transformation was estimated to be 15–20 nm.     

Photocatalytic reduction of nitrate over TiO2 and Ag-modified TiO2

This research work presents the efficiency of the TiO₂ and Ag–TiO₂ thin films prepared by the sol–gel method and coated onto the surface of 304 stainless steel sheets used in the photocatalytic nitrate reduction processes. The Ag–TiO₂ thin films had the weight by weight (w/w) ratio of Ag⁺/TiO₂ of 0.1% as Ag atom. The XRD results showed that the crystalline phase structure of TiO₂ on the Ag–TiO₂ thin films was anatase. The optical band gaps of the TiO₂ and 0.1% Ag–TiO₂ thin films were respectively 3.27 and 2.70 eV, while the surface of the prepared catalysts was hydrophobic with the respective average water contact angles of 94.8° and 118.5° for the TiO₂ and 0.1% Ag–TiO₂ thin films. The net efficiencies of photocatalytic nitrate reduction of TiO₂ and 0.1% Ag–TiO₂ were 41.4% and 70.0%, respectively. The loading of Ag only influenced the nitrate removal efficiency without affecting the stoichiometric ratio of formate to nitrate. The net stoichiometric ratio of formate to nitrate of all experiments was 2.8:1.0, which is close to the stoichiometric ratio of 2.5:1.0 of the nitrate reduction to nitrite and then to nitrogen gas.     

Thermal stability of anatase TiO2 aerogels

Titanium dioxide (TiO₂) aerogels were prepared with sol–gel ambient pressure drying method by using titanium tetrachloride (TiCl₄) as precursor and tetraethoxysilane as modifier, calcinated at different temperature and characterized by X‐ray diffraction, transmission electron microscopy and small angle X‐ray scattering. The results showed that the TiO₂ aerogels remained amorphous under 500 °C, changed to anatase from 600 °C and further changed to rutile from 900 °C. Between 60 °C and 500 °C, the primary particles within the samples concentrated mainly upon small sizes, enlarged and diverged remarkably above 600 °C. The crystalline grains grew and agglomerated with the rise of the calcination temperature. The TiO₂ aerogels at a temperature higher than 800 °C have better stability than anatase because of the formation of partial Ti―O―Si bonds. Copyright © 2016 John Wiley & Sons, Ltd.     

Photocatalytic Nanocomposite Films Fabricated by Layer‐by‐Layer Self‐assembly of TiO2 Nanoparticles and Lignosulfonates

Photocatalytic multilayer nanocomposite films composed of anatase TiO₂ nanoparticles and lignosulfonates (LS) were fabricated on quartz slides by the layer‐by‐layer (LBL) self‐assembly technique. X‐ray photoelectron spectroscopy (XPS), UV‐vis spectroscopy and atomic force microscopy (AFM) were used to characterize the TiO₂/LS multilayer nanocomposite films. Moreover, the photocatalytic properties (decomposition of methyl orange and bacteria) of multilayer nanocomposite films were investigated. XPS results indicated that the intensities of titanium and sulfur peaks increased with the LBL deposition process. A linear increase in absorbance at 280 nm was found by UV‐Vis spectroscopy, suggesting that stepwise multilayer growth occurs on the substrate and this deposition process is highly reproducible. AFM images showed that quartz slide was completely covered by TiO₂ nanoparticles when a 10‐bilayer multilayer film was formed. The decomposition efficiency of methyl orange by TiO₂/LS multilayer films under the same UV irradiation time increased linearly with the number of TiO₂ layers, and the results of decomposition of bacteria under UV irradiation showed that TiO₂/LS multilayer nanocomposite films exhibited excellent decomposition activity of bacteria (Escherichia coil).     

Preparation of Cr‐doped TiO2/SiO2 Photocatalysts and their Photocatalytic Properties

Cr‐doped TiO₂/SiO₂ nanostructured materials were prepared employing a layer‐by‐layer assemblym technique. TiO₂ colloids were synthesized by a sol‐gel method using TiCl₄ as a precursor. The experimental results showed that sphere‐type TiO₂ particles on SiO₂ exhibited uniform shape and a narrow size distribution. The amount of Ti (wt %) increased as a function of the number of the coating layers. The coatingv layers was composed of anatase titania nanocrystals at 550 °C. The onset of band‐gap transition for Crdoped TiO₂/SiO₂ showed a red shift compared with that for the undoped TiO₂/SiO₂. And the photocatalytic activity of Cr‐doped TiO₂/SiO₂ was higher than that of undoped sample.     

Dye degradation studies of Mo‐doped TiO2 thin films developed by reactive sputtering

TiO₂ thin films with various Mo concentrations have been deposited on glass and n‐type silicon (100) substrates by this radio‐frequency (RF) reactive magnetron sputtering at 400°C substrate temperature. The crystal structure, surface morphology, composition, and elemental oxidation states of the films have been analyzed by using X‐ray diffraction, field emission scanning electron microscopy, atomic force microscopy, and X‐ray photoelectron spectroscopy, respectively. Ultraviolet‐visible spectroscopy has been used to investigate the degradation, transmittance, and absorption properties of doped and undoped TiO₂ films. The photocatalytic degradation activity of the films was evaluated by using methylene blue under a light intensity of 100 mW cm⁻². The X‐ray diffraction patterns show the presence of anatase phase of TiO₂ in the developed films. X‐ray photoelectron spectroscopy studies have confirmed that Mo is present only as Mo⁶⁺ ions in all films. The Mo/TiO₂ band gap decreases from ~3.3 to 3.1 eV with increasing Mo dopant concentrations. Dye degradation of ~60% is observed in Mo/TiO₂ samples, which is much higher than that of pure TiO₂.     

Nanostructured ZrO2-Coated TiO2 Electrodes for Dye-Sensitised Solar Cells

Thin films of ZrO₂ were deposited on nanostructured anatase TiO₂ electrodes via sol-gel route and utilised in the assembly of a dye-sensitised solar cells (DSSCs) forming nanostructured core-shell networks. The ZrO₂-coated TiO₂ electrodes were characterised by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and constructing a DSSC. The characterisation concluded that core-shell morphologies were produced with varying ZrO₂ shell thickness without altering the anatase TiO₂ core. When a DSSC was constructed from the ZrO₂:TiO₂ core-shell electrode, the efficiency increased to 2.27% from 0.42% for the uncoated TiO₂ electrode. As the ZrO₂ shell thickness increased, the cell efficiency was reduced.     

The effect of annealing temperatures on surface properties,hydroxyapatite growth and cell behaviors of TiO2 nanotubes

Well‐ordered TiO₂ nanotubes were prepared by the electrochemical anodization of titanium in an ethylene glycol electrolyte containing 1 wt% NH₄F and 10 wt% H₂O at 20 V for 20 min, followed by annealing. The surface morphology and crystal structure of the samples were examined as a function of the annealing temperature by field emission scanning electron microscopy (FE‐SEM) and X‐ray diffraction (XRD), respectively. Crystallization of the nanotubes to the anatase phase occurred at 450 °C, while rutile formation was observed at 600 °C. Disintegration of the nanotubes was observed at 600 °C and the structure vanished completely at 750 °C. Electrochemical corrosion studies showed that the annealed nanotubes exhibited higher corrosion resistance than the as‐formed nanotubes. The growth of hydroxyapatite on the different TiO₂ nanotubes was also investigated by soaking them in simulated body fluid (SBF). The results indicated that the tubes annealed to a mixture of anatase and rutile was clearly more efficient than that in their amorphous or plain anatase state. The in vitro cell response in terms of cell morphology and proliferation was evaluated using osteoblast cells. The highest cell activity was observed on the TiO₂ nanotubes annealed at 600 °C. Copyright © 2010 John Wiley & Sons, Ltd.     

X-ray diffraction study of TiO2 thin films on mica

Thin layers of polycrystalline TiO₂ were deposited on flaky muscovite and phlogopite particles. Deposition was performed in water slurry using aqueous TiCl₄ as titanium source. The effect of heat treatments on the structure of TiO₂ thin films was investigated at different layer thicknesses. On muscovite mica the films crystallized as anatase TiO₂. On phlogopite mica the increasing layer thickness favored partial rutile formation at higher calcination temperatures, although the films could not be converted to pure rutile. The preferred orientation of the TiO₂ films was evident. The most intense reflections were measured from (004) and (105) planes. The crystallite size of TiO₂ was strongly dependent on calcination temperature and TiO₂ layer thickness. It varied between 15 and 47 nm for films deposited on phlogopite, and 15 and 57 nm for films deposited on muscovite.     

Antibacterial metal implant with a TiO2‐conferred photocatalytic bactericidal effect against Staphylococcus aureus

Photocatalysis with anatase Titanium dioxide (TiO₂) under ultraviolet A (UVA) has a well recognized bactericidal effect. There have been a few reports, however, on the effects of photocatalysis on bio‐implant‐related infections. The purpose of present study was to evaluate the photocatalytic bactericidal effects of anatase TiO₂ on Staphylococcus aureus (S. aureus) associated with surgical site infections. TiO₂ films were synthesized on commercially pure titanium substrates and SUS316 stainless steel using a plasma source ion implantation method followed by annealing. The chemical composition of the surface layers was determined using GXRD and XPS. The disks were seeded with cultured S. aureus and exposed to UVA illumination from black light. The bactericidal effect of the TiO₂ films was evaluated by counting the survived colonies statistically. A structural gradient anatase type TiO₂ layer formed on all substrates. The viability of the bacteria on the photocatalytic TiO₂ film coated on titanium was suppressed to 7.0% at 30 minutes and 5.5% at 45 minutes, whereas that on a similarly coated stainless steel was suppressed to 45.8% at 30 minute and 28.6% at 45 minutes (ANOVA: p < 0.05). Complete bacterial inactivation was achieved after 90 minutes on titanium and after 60 minutes on stainless steel. The photocatalytic bactericidal effect of TiO₂ is useful for sterilizing the contaminated surfaces of bioimplants. Copyright © 2008 John Wiley & Sons, Ltd.     

A comparative XPS and UPS study of VOx layers on mineral TiO2(001)‐anatase supports

Four vanadium oxide layers on mineral TiO₂(001)‐anatase supports with different thickness (3–33 Å) were prepared with reactive d.c. magnetron sputtering and were extensively studied with photoelectron spectroscopy. Al Kα radiation and 150 eV synchrotron radiation were used as excitation sources. The evolution of the 2p, 3s and 3p core level line shapes of V and Ti as a function of the vanadium oxide thickness was studied, as well as the O1s and O2s core lines and the valence band. All the V2p spectra of the deposited vanadium oxide layers consist of at least 60% V⁵⁺, the rest being V⁴⁺. The V3p region is complicated by multiplet splitting, which prevents the determination of the vanadium oxidation state. The V3p multiplet splitting is different for the two excitation energies. No reduction of the titania support surface due to the vanadium oxide deposition was observed. Copyright © 2006 John Wiley & Sons, Ltd.     

Mapping of the Photoinduced Electron Traps in TiO2 by Picosecond X‐ray Absorption Spectroscopy

Titanium dioxide (TiO₂) is the most popular material for applications in solar‐energy conversion and photocatalysis, both of which rely on the creation, transport, and trapping of charges (holes and electrons). The nature and lifetime of electron traps at room temperature have so far not been elucidated. Herein, we use picosecond X‐ray absorption spectroscopy at the Ti K‐edge and the Ru L₃‐edge to address this issue for photoexcited bare and N719‐dye‐sensitized anatase and amorphous TiO₂ nanoparticles. Our results show that 100 ps after photoexcitation, the electrons are trapped deep in the defect‐rich surface shell in the case of anatase TiO₂, whereas they are inside the bulk in the case of amorphous TiO₂. In the case of dye‐sensitized anatase or amorphous TiO₂, the electrons are trapped at the outer surface. Only two traps were identified in all cases, with lifetimes in the range of nanoseconds to tens of nanoseconds.     

Turning Redundant Ligands into Treasure: A New Strategy for Constructing MIL‐53(Al)@Nanoscale TiO2 Layers

A strategy for in situ fabrication of nanoscale‐thin layers of anatase TiO₂ coated on the metal–organic framework (MOF) material, MIL‐53(Al), is developed. The preparation conditions for crystallized TiO₂ are normally incompatible with the thermal and chemical stability of MOFs. Based on our strategy, we found that the redundant organic ligands (1,4‐benzenedicarboxylic acid, H₂BDC) within the pores of the as‐synthesized MOF play a key function in the protection and support of the framework during hydrothermal loading of the TiO₂ precursor, as well as in preventing the infiltration of the precursor into the pores. After annealing, a nanoscale‐thin layer of highly crystalline anatase TiO₂, with a thickness of 6–10 nm, was successfully attached to the external surface of the MIL‐53(Al) crystals, while the porous framework remains intact. The core–shell structure of the MOF@TiO₂ nanocomposite endows the resulting materials with additional optical response and enhanced moisture and chemical stability.