共查询到18条相似文献,搜索用时 78 毫秒
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根据薄膜沉积过程等离子体对光学薄膜膜蒸气分子或原子的作用,建立低压等离子体离子镀设备,并对常规光学薄膜、如硫化物、氧化物薄膜以及多层膜器件进行了系统的研究,对所制备薄膜样品的透射光谱、吸收、散射以及膜层的聚集密度等进行了全面的测试分析。实验研究表明,低压等离子体离子镀可大大提高常规光学薄膜的光机性能。 相似文献
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采用反应离子镀新工艺成功地在K9玻璃上制备了ITO(Indium Tin Oxide)透明导电膜,所制备的ITO膜在550~600nm波长范围内,典型的峰值透过率为89%,面电阻为34Ω/□。 相似文献
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光学薄膜的温度场设计 总被引:9,自引:1,他引:8
提出了光学薄膜温度场的概念,研究分析了薄膜光学性质和热,物性质对其温度场的影响,给出了相变光盘薄膜和高功率激光反射膜的具体设计,还给出了相变膜的写入,擦除功率和激光反射膜的破坏阈值。 相似文献
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光学薄膜的光热偏转信号分析 总被引:3,自引:1,他引:2
本文给出了透明基体上的单层薄膜在激光辐照下的温度分布和光热形变偏转信号的理论表达式。通过数值计算,分析了偏转信号与薄膜参数、基体参数以及调制频率之间的关系,用反射式光热偏转装置对光学薄膜的光热偏转信号进行了实验研究。结果表明,理论计算和实验结果是一致的。 相似文献
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评价了离子镀氮化钛(TiN)和Y改性氮化钛(Ti(Y)N)膜的结合强度和在酸性介质中的耐蚀性能;用X射线衍射,离子探针质谱分析(IMA),透射电子显微镜(TEM)研究它们的显微结构特征;结果表明,添加Y元素富集在Ti(Y)N与A3钢基材界面区域,并形成厚度约为20nm的亚层,Y的界面改性导致Ti(Y)N膜的X射线衍射线形略有宽化和明显的TiN相(111)面的择优生长取向;这些显微结构特征的改善导致Ti(Y)N膜比TiN膜具有更高的界面结合强度和更好的耐蚀性能。
关键词: 相似文献
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光学薄膜热膨胀系数的研究 总被引:1,自引:1,他引:0
光热位移偏转技术结合横向光热偏转技术可用于研究薄膜样品的热膨胀系数.本文以SiO_2、TiO_2、ZrO_2、MgF_2、ThF4等单层光学薄膜为例.报道相关的实验方法及实验结果. 相似文献
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Yanhui Zhao Guoqiang LinJinquan Xiao Hao DuChuang Dong Lijun Gao 《Applied Surface Science》2011,257(7):2683-2688
In this work, the effect of modulation period (Λ) on Ti/TiN multilayer films deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating is reported. The crystallography structures and cross-sectional morphology of Ti/TiN multilayer films were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. Their mechanical properties were determined via nanoindentation measurements, while the film/substrate adhesion via the scratch test. It was found that the highest hardness value reached 43 GPa for the modulation period of 54 nm, while the film/substrate adhesion also reached the highest value of 83 N. Furthermore, the hardness enhancement mechanism in the multilayer films is discussed. 相似文献
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采用脉冲偏压电弧离子镀技术在单晶硅基片及石英玻璃上制备了一系列均匀透明的Cr-O薄膜. 用场发射扫描电子显微镜、X射线衍射仪、X射线光电子谱、纳米压痕仪、紫外可见光分光光度计等方法对薄膜的表面形貌、膜厚、相结构、成分、元素的化学价态、硬度和光学性能等进行表征, 主要研究了偏压幅值对薄膜结构和性能的影响. 结果表明, 施加偏压可使薄膜的沉积质量明显提高, 其相结构由非晶态转变为晶体态, 并随着偏压幅值的增加, 由Cr2O3相向CrO相转变; 薄膜的硬度先增大后减小, 当偏压为-300 V时, 硬度达到最大值24.4 GPa; 薄膜具有良好的透光率, 最高可达72%; 当偏压为-200 V时, 薄膜的最大光学帯隙为1.88 eV. 相似文献
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Influences of nitrogen flow rate on the structures and properties of Ti and N co-doped diamond-like carbon films deposited by arc ion plating
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In this paper, Ti-C-N nanocomposite films are deposited under different nitrogen flow rates by pulsed bias arc ion plating using Ti and graphite targets in the Ar/N2 mixture gas. The surface morphologies, compositions, microstructures, and mechanical properties of the Ti-C-N films are investigated systematically by field emission scanning electron mi- croscopy (FE-SEM), x-ray photoelectron spectroscopy (XPS), grazing incident x-ray diffraction (GIXRD), Raman spectra, and nano-indentation. The results show that the nanocrystalline Ti(C,N) phase precipitates in the film from GIXRD and XPS analysis, and Raman spectra prove the presence of diamond-like carbon, indicating the formation of nanocomposite film with microstructures comprising nanocrystalline Ti(C,N) phase embedded into a diamond-like matrix. The nitrogen flow rate has a significant effect on the composition, structure, and properties of the film. The nano-hardness and elastic modulus first increase and then decrease as nitrogen flow rate increases, reaching a maximum of 34.3 GPa and 383.2 GPa, at a nitrogen flow rate of 90 sccm, respectively. 相似文献
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Synthesis of titanium nitride thin films deposited by a new shielded arc ion plating 总被引:2,自引:0,他引:2
Yanhui Zhao Guoqiang LinJinquan Xiao Wenchang LangChuang Dong Jun GongChao Sun 《Applied Surface Science》2011,257(13):5694-5697
Thin films of titanium nitride (TiN) were deposited on stainless steel substrates by a modified deposition technique, double-layered shielded arc ion plating with vicarious circular holes (DL-SAIP). The results show that the TiN film with the distance of 10 mm between the double-layered shield plates had the least droplets. The deposition rate of the films prepared with the new technique was more homogeneous than that of all the other shielded arc ion plating. The film/substrate adhesion and microhardness values of the TiN films were higher than 40 N and 18 GPa, respectively. Thus such TiN thin films can be expected in applications. 相似文献
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离子束反应溅射沉积SiO2薄膜的光学特性 总被引:1,自引:0,他引:1
主要研究采用离子束反应溅射(RIBS)制备SiO2薄膜的折射率、消光系数、化学计量比与氧气在氩氧混合工作气体中含量及其沉积速率的关系。研究结果表明:RIBS制备的SiO2薄膜在0.63 μm处折射率n= 1.48,消光系数小于10-5;随着沉积速率的增加,薄膜的折射率和消光系数随之变大,当沉积速率超过0.3 nm/s,即使是在纯氧环境溅射,折射率值也不低于1.5;通过对红外透射光谱的主吸收峰位置研究得到沉积的SiO2薄膜为缺氧型,化学计量比不超过1.8,且红外吸收峰位置和SiO2折射率存在对应关系,因此在不加热衬底情况下使用RIBS制备SiO2薄膜时,会限制沉积速率的提高。 相似文献
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研究了离子束溅射(IBS)制备的Nb2O5薄膜的光学特性、应力、薄膜微结构等特性,系统地分析了辅助离子源的离子束能量和离子束流对薄膜特性的影响.结果显示,在辅助离子源不同参数情况下,折射率在波长550 nm处为2.310—2.276,应力值为-281—-152 MPa.在合适的工艺参数下,消光系数可小于10-4,薄膜具有很好的表面平整度.与用离子辅助沉积(IAD)制备的薄膜相比,IBS制备的薄膜具有更好的光学特性和薄膜微结构.
关键词:
2O5薄膜')" href="#">Nb2O5薄膜
离子束溅射
光学特性
应力 相似文献