Room-temperature chemisorption and thermal evolution of 1,1-dichloroethylene and monochloroethylene on Si(111)7 x 7: formation of vinylidene and vinylene adspecies

The room-temperature (RT) adsorption and thermal evolution of 1,1-dichloroethylene (1,1-C2H2Cl2 or iso-DCE) and monochloroethylene (C2H3Cl or MCE) on Si(111)7 x 7 have been studied by vibrational electron energy loss spectroscopy and thermal desorption spectrometry (TDS). The presence of the Si-Cl stretch at 510 cm(-1) suggests that upon adsorption iso-DCE dissociates via C-Cl bond breakage on the 7x7 surface to form mono-sigma-bonded 1-chlorovinyl (ClC=CH2) and/or di-sigma-bonded vinylidene (: C=CH(2)) adspecies. Upon annealing to 450 K, the 1-chlorovinyl adspecies undergoes further dechlorination to vinylidene adspecies, which may be converted to di-sigma-bonded vinylene (HC=CH) before dehydrogenating to hydrocarbon fragments above 580 K. TDS studies reveal both molecular desorption of iso-DCE near 350 K and C2H2 fragments near 700 K, and the presence of the latter confirms the existence of the di-sigma-bonded vinylene adspecies. Like the other chlorinated ethylene homologues, iso-DCE also exhibits TDS features of an etching product SiCl2 at 800-950 K and a dehydrochlorination product HCl at 700-900 K. Unlike iso-DCE, MCE is found to adsorb on the 7 x 7 surface predominantly through a [2 + 2] cycloaddition mechanism at RT, with similar di-sigma bonding structure as ethylene. The thermal evolution of MCE however follows that of iso-DCE, with the formation of vinylene above 580 K. Despite the lack of TDS feature attributable to HCl, weaker SiCl2 TDS feature could be observed at 800-950 K. For both iso-DCE and MCE, strong recombinative desorption of H2 is observed near 780 K. The differences in the Cl content among iso-DCE, MCE, and ethylene therefore play a key role in the RT chemisorption and thermally driven chemical processes on Si(111)7 x 7.     

Continuous-time photon-stimulated desorption spectroscopy studies on soft x-ray-induced reactions of CF3Br adsorbed on Si(111)-7×7

Continuous-time core-level photon-stimulated desorption (PSD) spectroscopy was used to study the soft x-ray-induced reactions of CF(3)Br molecules adsorbed on Si(111)-7×7 near the Si(2p) edge (98-110 eV). The monochromatic synchrotron radiation was employed as a soft x-ray light source in the photon-induced reactions and also as a probe for investigating the produced fluorination states of the bonding surface Si atom in the positive-ion PSD spectroscopy. Several different surface coverages were investigated. The PSD spectra from the low-CF(3)Br-covered surfaces show the production of surface SiF species, while those from the high-CF(3)Br-covered surfaces depict the formation of surface SiF, SiF(2), and SiF(3) species. The photolysis cross section of the submonolayer CF(3)Br-covered surface is determined as ～4.3×10(-18) cm(2). A comparison with the results on CF(3)Cl/Si(111)-7×7 surface is discussed.     

Soft x-ray photoreactions of CF3Cl adsorbed on Si(111)-7x7 studied by continuous-time photon-stimulated desorption spectroscopy near F(1s) edge

The continuous-time core-level photon-stimulated desorption (PSD) spectroscopy was employed to monitor the monochromatic soft x-ray-induced reactions of CF3Cl adsorbed on Si(111)-7x7 near the F(1s) edge (681-704 eV). Sequential F+ PSD spectra were measured as a function of photon exposure at the CF3Cl-covered surface (dose=0.3x10(15) molecules/cm2, approximately 0.75 ML). The F+ PSD and total electron yield (TEY) spectra of molecular solid CF3Cl near the F(1s) edge were also measured. Both F+ PSD and TEY spectra show two features at the energy positions of 690.2 and 692.6 eV, and are attributed to the excitations of F(1s) to 11a1[(C-Cl)*] and (8e+12a1)[(C-F)*] antibonding orbitals, respectively. Following Auger decay, two holes are created in the F(2p) lone pair and/or C-F bonding orbitals forming the 2h1e final state which leads to the F+ desorption. This PSD mechanism, which is responsible for the F+ PSD of solid CF3Cl, is employed to interpret the first F+ PSD spectrum in the sequential F+ PSD spectra. The variation of spectrum shapes in the sequential F+ PSD spectra indicates the dissipation of adsorbed CF3Cl molecules and the formation of surface SiF species as a function of photon exposure. From the sequential F+ PSD spectra the photolysis cross section of the adsorbed CF3Cl molecules by photons with varying energy (681-704 eV) is determined to be approximately 1.0x10(-17) cm2.     

Photon-stimulated desorption of F(-) ions from CF(3)Cl adsorbed on Si(111)-7x7

We report the photon-stimulated desorption of negative ions induced by direct dipolar dissociation and dissociative electron attachment. The photon-stimulated desorption of F(-) ions from CF(3)Cl physisorbed on a Si(111)-7x7 surface at 30 K in the photon energy range 12-35 eV was studied. The F(-) ion yield exhibits four resonances, at 12.8, 16.2, 19.5, and 22.3 eV, quite unlike the gas phase photodissociation cross section. The intensities of these resonances depend strongly on the CF(3)Cl coverage in a manner which varies from peak to peak. The resonances at 19.5 and 22.3 eV, which have a significant enhancement in the monolayer regime, are due to electron mediated dipolar dissociation of adsorbed CF(3)Cl molecules. The enhancement is attributed to surface electron attachment following molecular excitation. A significant enhancement in the monolayer regime has also been observed for the resonances at 12.8 and 16.2 eV. These two resonances are ascribable to a combination of electron mediated dipolar dissociation and dissociative electron attachment driven by photoelectrons generated in the neighboring molecules.     

Binding of glycine and L-cysteine on Si(111)-7 x 7

The adsorption of glycine and l-cysteine on Si(111)-7 x 7 was investigated using high-resolution electron energy loss spectroscopy (HREELS) and X-ray photoelectron spectroscopy (XPS). The observation of the characteristic vibrational modes and electronic structures of NH3+ and COO- groups for physisorbed glycine (l-cysteine) demonstrates the formation of zwitterionic species in multilayers. For chemisorbed molecules, the appearance of nu(Si-H), nu(Si-O), and nu(C=Omicron) and the absence of nu(O-H) clearly indicate that glycine and l-cysteine dissociate to produce monodentate carboxylate adducts on Si(111)-7 x 7. XPS results further verified the coexistence of two chemisorption states for each amino acid, corresponding to a Si-NH-CH2-COO-Si [Si-NHCH(CH2SH)COO-Si] species with new sigma-linkages of Si-N and Si-O, and a NH2-CH2-COO-Si [NH2CH(CH2SH)COO-Si] product through the cleavage of the O-H bond, respectively. Glycine/Si(111)-7 x 7 and l-cysteine/Si(111)-7 x 7 can be viewed as model systems for further modification of Si surfaces with biological molecules.     

正、负离子碳氟-碳氢表面活性剂混合水溶液的表面活性

1　前言碳氟表面活性剂是目前所有表面活性剂中表面活性最高的一类 ,具有很多碳氢表面活性剂无法取代的特殊用途[1] 。但是碳氟表面活性剂由于合成困难 ,价格昂贵 ,实际应用受到限大限制。研究表明 ,通过碳氟表面活性剂与碳氢表面活性剂的复配 ,有可能减少碳氟表面活性剂的用量而保持其表面活性 [1] 。在所有表面活性剂混合体系中 ,正、负离子表面活性剂混合体系具有最强的协同效应 [2 ] 。但由于正、负离子表面活性剂混合溶液一般在很低浓度即形成沉淀 ,对碳氟表面活性剂更是如此。因此目前有关碳氟—碳氢混合表面活性剂的研究主要集中在同…     

Coupling versus surface-etching reactions of alkyl halides on GaAs(100): I. CF3CH2I reactions

We report the rich surface chemistry exhibited by the reactions of 1,1,1-trifluoroethyl iodide (CF3CH2I) adsorbed onto gallium-rich GaAs(100)-(4 x 1), studied by temperature-programmed desorption (TPD) and low-energy electron diffraction (LEED) studies and X-ray photoelectron spectroscopy (XPS). CF3CH2I adsorbs molecularly at 150 K but dissociates, below room temperature, to form a chemisorbed monolayer of CF3CH2 and I species. Recombinative desorption of molecular CF3CH2I competes with the further reactions of the CF3CH2 and I chemisorbed species. The CF3CH2 species can either undergo beta-fluoride elimination to yield gaseous CF2=CH2 or it can undergo self-coupling to form the corresponding higher alkane, CF3CH2CH2CF3. A second coupling product, CF3CH2CH=CF2, is also evolved, and it is postulated that migratory insertion of the liberated CF2=CH2 into the surface-carbon bond of the chemisorbed CF3CH2 is responsible for its formation. The iodines, formed by C-I scission in the chemisorbed CF3CH2I, and the fluorines, derived from beta-fluoride elimination in CF3CH2, react with the surface gallium dimers, and Ga-As back-bonds to generate five etch products (GaF, AsF, GaI, AsI, and As2) that desorb in the temperature range of 420 to >600 K. XPS data reveal that the surface stoichiometry remains constant throughout the entire annealing temperature range because of the desorption of both gallium- and arsenic-containing etch products, which occur sequentially. In this article, plausible mechanisms by which all products form and the binding sites of these reactions in the (4 x 1) reconstruction are discussed. Factors that control the rate constants of etch product versus hydrocarbon product formation and in particular how they impact on the respective desorption temperatures will be discussed.     

The interfacial properties of MgCl(2) thin films grown on Si(111)7 x 7

Photoelectron spectroscopy with synchrotron radiation and low energy electron diffraction (LEED) were used in order to study the MgCl(2)Si(111) system. At submonolayer coverage of MgCl(2), a new LEED pattern was observed corresponding to a (sqr rt 3 x sqr rt 3)R30 degrees overlayer superimposed on the underlying reconstructed Si(111)7 x 7. The surface species at this stage are mainly molecular MgCl(2) and MgCl(x) (x<2) or MgO(x)Cl(y) attached to the Si substrate through Cl bridges coexisting with monodentate SiCl. The interfacial interaction becomes more pronounced when the submonolayer coverage is obtained by annealing thicker MgCl(2) layers, whereby desorption of molecular MgCl(2) is observed leaving on the nonreconstructed silicon surface an approximately 0.2 ML thick MgCl(x) layer which again forms the (sqr rt 3 x sqr rt 3 )R30 degrees superstructure.     

Study by scanning tunneling microscopy of hydrogen adsorption and desorption on Si111 7 x 7 at room temperature and at high temperature

An overview is given on the use of scanning tunneling microscopy (STM) for investigation of the adsorption of hydrogen on Si(111)7 x 7 both at room temperature and at elevated temperature to finally obtain a hydrogen-saturated surface of Si(111). The initial stages are characterized by high reactivity of Si adatoms of the 7 x 7 structure. After adsorption of hydrogen on the more reactive sites in the beginning of the adsorption experiments a regular pattern, which is different for room and elevated temperature, is observed for the less reactive sites. In agreement with previous work, local 1 x 1 periodicity of the rest atom layer and the presence of di- and trihydride clusters is observed for hydrogen-saturated surface. STM has also been used to characterize surfaces from which the hydrogen atoms have been removed by thermal desorption. Finally, tip-induced desorption by large positive sample-bias voltages and by increasing the tunneling current will be described.     

On the importance of ions and ion-molecule reactions to plasma-surface interface reactions

Ions are known to be key players in many plasma processes, including anisotropic etching, film deposition and surface modification. The relationship between plasma ions, film properties, and surface interactions of other plasma species is not, however, well known. Using our Imaging of Radicals Interacting with Surfaces (IRIS) technique, along with plasma ion mass spectrometry (PI-MS), and surface analysis data, we have measured the effects of ion bombardment on the surface interactions of SiF2 in SiF4 plasmas and of CF2 in C3F8 and C4F8 plasmas. SiF2 is a known product of F-atom etching of Si, and CF2 has also been cited as a product of fluorocarbon etching of Si. With both molecules, we measure surface generation when the surface is bombarded by all the plasma species. Removal of ions from the plasma molecular beam results in a net decrease in surface generation for both molecules at all powers. Results in both systems are compared with the gas-phase ion-molecule reaction data of Armentrout and coworkers. Preliminary guided-ion beam mass spectrometry results taken in the Armentrout laboratories for the Ar+ + C3F8 reaction system are also presented.     

In-situ FTIR studies on self-assembled monolayers of surfactant molecules adsorbed on H-terminated Si(111) surfaces in aqueous solutions

The adsorption of a surfactant, sodium di-2-ethylhexyl sulfosuccinate (SDES), [C4H9CH(C2H5)CH2OCO][C4H9CH(C2H5)CH2OCOCH2]CHSO3- Na+, in an aqueous solution on an atomically flat H-terminated Si(111) [abbreviated as H-Si(111)] surface with a hydrophobic property was investigated by in-situ FTIR measurements. Immersion of the H-Si(111) surface in a solution of 1.0 x 10(-2) M SDES for more than 2 h led to formation of a self-assembled monolayer (SAM) with the alkyl chains having a tendency to be assembled perpendicular to the Si surface. The in-situ FTIR observation revealed that the adsorption was nearly complete about 60 min after the start of the immersion, and after that the adsorbed molecules changed their arrangement into an ordered mode. The Si-H peak in the FTIR spectrum remained unchanged with time in aqueous surfactant solution, in contrast to the case of immersion in pure water, indicating that the adsorbed surfactant protects the H-Si(111) surface from oxidation. No structural change in the SAM was observed when a negative potential of -700 mV vs Ag/AgCl was applied to the Si, whereas the adsorbed molecules changed their arrangement, accompanied by their substantial desorption and oxidation of the Si surface, when a positive potential of +700 mV was applied.     

Atmospheric chemistry of perfluoroaldehydes (CxF2x+1CHO) and fluorotelomer aldehydes (CxF2x+1CH2CHO): quantification of the important role of photolysis

The UV absorption spectra of CF(3)CHO, C(2)F(5)CHO, C(3)F(7)CHO, C(4)F(9)CHO, CF(3)CH(2)CHO, and C(6)F(13)CH(2)CHO were recorded over the range 225-400 nm at 249-297 K. C(x)F(2)(x)(+1)CHO and C(x)F(2)(x)(+1)CH(2)CHO have broad absorption features centered at 300-310 and 290-300 nm, respectively. The strength of the absorption increases with the size of the C(x)F(2)(x)(+1) group. There was no discernible (<5%) effect of temperature on the UV spectra. Quantum yields for photolysis at 254 and 308 nm were measured. Quantum yields at 254 nm were 0.79 +/- 0.09 (CF(3)CHO), 0.81 +/- 0.09 (C(2)F(5)CHO), 0.63 +/- 0.09 (C(3)F(7)CHO), 0.60 +/- 0.09 (C(4)F(9)CHO), 0.74 +/- 0.08 (CF(3)CH(2)CHO), and 0.55 +/- 0.09 (C(6)F(13)CH(2)CHO). Quantum yields at 308 nm were 0.17 +/- 0.03 (CF(3)CHO), 0.08 +/- 0.02 (C(4)F(9)CHO), and 0.04 +/- 0.01 (CF(3)CH(2)CHO). The quantum yields decrease with increasing size of the C(x)F(2)(x)(+1) group and with increasing wavelength of the photolysis light. The photolysis quantum yield at 308 nm for CF(3)CHO measured here is a factor of at least 8 greater than that reported previously. Photolysis is probably the dominant atmospheric fate of C(x)F(2)(x)(+1)CHO (x = 1-4) and is an important fate of C(x)F(2)(x)(+1)CH(2)CHO (x = 1 and 6). These results have important ramifications concerning the yield of perfluorocarboxylic acids in the atmospheric oxidation of fluorotelomer alcohols.     

Improvements in the detection and analysis of CF3-containing compounds in the background atmosphere by gas chromatography-high-resolution mass spectrometry

An improved method for the gas chromatography/mass spectrometry analysis of CF3-containing compounds in air is described. This method replaces a GS-Q porous layer open tubular (PLOT) column previously used with a 30 m x 0.32 mm GS-GasPro PLOT column. For this exceedingly volatile set of compounds the GS-GasPro column provides improved peak shapes, better signal-to-noise responses and no coelution of compounds. These improvements have allowed eleven CF3-containing compounds to be detected in background air, including CF4 (FC 14), C2F6 (FC 116), CF3Cl (CFC 13), CF3H (HFC 23), CF3Br (Halon 1301), C3F8 (FC 218), CF3CF2Cl (CFC 115), CF3CHF2 (HFC 125), CF3CH3 (HFC 143a), CF3CH2F (HFC 134a), and CF3CFCl2 (CFC 114a). Three of these compounds have not been previously detected in background air, to our knowledge. Quantitative determinations for each of these compounds in the background atmosphere of Montana are also reported.     

On the presence or absence of geminal Si...N interactions (alpha-effect) in pentafluorophenylsilyl compounds with SiCN, SiNN and SiON backbones

The silanes C6F5SiF2CH2NMe2 (1), C6F5SiF2N(SiMe3)NMe2 (2) and C6F5SiF2ONMe2 (3) with pentafluorophenyl substituents and geminal N atoms have been prepared by the reaction of C6F5SiF3 with LiCH2NMe2, LiN(SiMe3)NMe2 and LiONMe2, respectively. The compounds have been characterised by spectroscopic methods and crystal structure determination. Comparison of measured and calculated IR spectra has provided insight into the conformational composition of the vapour of . Whereas and show interactions between the geminal Si and N atoms, does not. Further analysis of the bonding situation has been undertaken by quantum chemical calculations of the rotation and bending potentials of the C6F5SiF2-X-NMe2 units.     

Evidence of dissociative collision induced diatomic and triatomic hydrogen ion formation from hydrocarbon ion interaction with silicon surface

A singly charged hydrocarbon ion CH(x) (+) (x=0,1,2,3,4) was extracted from an electron bombardment type ion source using methane as the reagent gas and irradiated onto the Si(100) surface at glancing angle. Scattered ion spectrometry using an electrostatic energy analyzer revealed that H(+), H(2) (+), and H(3) (+) ions were clearly formed at the scattering angle of 15 degrees , associated with dissociative collisions of hydrocarbon ion species of incidence energy of 1000 eV. The formation of H(3) (+) was tentatively interpreted as resulting from combination of excited atomic hydrogen produced by dissociative collisions of CH(4) (+) ions with Si(100) surface.     

Photoassisted adsorption of allylamine and 1-butene on H:Si(111) studied by surface vibrational spectroscopies

Ultraviolet photoassisted adsorption of terminally double-bonded molecules, allylamine (CH2=CH-CH2-NH2) and 1-butene (CH2=CH-CH2-CH3), on hydrogen-terminated silicon (111) surface was attempted to obtain adsorbates covalently terminating the surface Si atoms. The adsorption process was monitored by high-resolution electron energy loss spectroscopy, multiple internal infrared reflection-absorption spectroscopy, and Auger electron spectroscopy. Allylamine adsorbates emerged upon delivery of allylamine gas under ultraviolet irradiation. The N-H bonds in allylamine were evidenced to survive over the photoadsorption process by vibrational analysis and by the reaction with ketene. CH3- groups were detected at low coverage, indicating anchoring of the organic moieties by the secondary (sec-) type carbon atoms, which were taken over by the primary (n-) type with increasing coverage. C-D bonds were detected after deposition on deuterium-terminated Si(111) upon incorporation of Si-terminating H into the hydrocarbon part of adsorbates. In the case of 1-butene, not only the C=C end but also the CH3- end of a molecule might attach on Si, resulting in emergence of adsorbates composed of CH2 groups. The newly obtained adsorbates are prospective as a material applied for nanolithography, fine electrochemistry, and nano-biotechnology.     

碳氟-碳氢表面活性剂混合水溶液在油面上铺展

本文研究RfCONH(CH2)3N(C2H5)2CH3I/CnH2n 1,COONa及RfCOONa/CmH2m 1N(CH3)3Br(Rf=F[CF(CF3)CF2O]2CF(CF3);n=7,8.11,13;m=8,10,12)两类正，负离子碳氟－碳氢表面活性剂混合水溶液在油面上的铺展及对油面的密封性能。研究表明在碳氟表面活性剂中加入异电性碳氢表面活性剂可大大降低碳氟表面活性剂水溶液的铺展浓度，也可使一些因素表面张力较高而不能铺展的碳氟表面活性剂水溶液在油面上铺展。在碳氟表面活性剂中加入异电性碳氢表面活性剂可提高水膜对油面的密封性。若在混合表面活性剂中加入黄原胶，水膜的密封性能更好。     

Controlled growth of Zn nano-dots on a Si(111)-7x7 surface saturated with C2H5OH

Metal atoms bonded with Si adatoms on the Si(111)-(7x7) surface undergo migration by hopping adjacent Si-rest atoms with dangling bond. By saturated adsorption of Si(111)-(7x7) surface with C(2)H(5)OH, the whole Si-rest atoms and a half of Si adatoms are occupied with Si-H and Si-OC(2)H(5), so that the Zn atoms adsorbed on this surface cannot migrate by hopping. When Zn atoms were deposited on this surface, ca. 5 nm Zn dots were grown in the hexagonal spacing of ca. 5.4 nm width around the corner holes, which work as a mold. This is quite different from the growth of honeycomb layers composed of Zn(3) clusters on the clean Si(111)-(7x7) surface. The dots grow up to nine (1.97 nm) to 13 layers (2.64 nm) by keeping their size, which implies a layer-by-layer growth of dots in the mold, where the growth is controlled by the kinetics instead of energetic feasibility.     

Organometallic chemistry of fluorinated allenes

Reaction of 1,1-difluoroallene and tetrafluoroallene with a series of transition metal complex fragments yields the mononuclear allene complexes [CpMn(CO)(2)(allene)] (1), [(CO)(4)Fe(allene)] (2), [(Ph(3)P)(2)Pt(C(3)H(2)F(2))] (4), [Ir(PPh(3))(2)(C(3)H(2)F(2))(2)Cl] (5), and the dinuclear complexes [mu-eta(1)-eta(3)-C(3)H(2)F(2))Fe(2)(CO)(7)] (3), [Ir(PPh(3))(C(3)H(2)F(2))(2)Cl](2) (6), and [mu-eta(2)-eta(2)-C(3)H(2)F(2))(CpMo(CO)(2))(2)] (9), respectively. In attempts to synthesize cationic complexes of fluorinated allenes [CpFe(CO)(2)(C(CF(3))=CH(2))] (7a), [CpFe(CO)(2)(C(CF(3))=CF(2))] (7b) and [mu-I-(CpFe(CO)(2))(2)][B(C(6)H(3)-3,5-(CF(3))(2))(4)] were isolated. The spectroscopic and structural data of these complexes revealed that the 1,1-difluoroallene ligand is coordinated exclusively with the double bond containing the hydrogen-substituted carbon atom. 1,1-Difluoroallene and tetrafluoroallene proved to be powerful pi acceptor ligands.     

Photofragmentation of SiF4 upon Si 2p and F 1s core excitation: cation and anion yield spectroscopy

We have studied the fragmentation dynamics of core-excited SiF4 by means of soft-x-ray photoexcitation and partial positive and negative ion yield measurements around the Si L2,3-shell and F K-shell ionization thresholds. All detectable ionic fragments are reported and we observe significant differences between the various partial ion yields near the Si 2p threshold. The differences are similar to our previous results from CH3Cl showing more extended fragmentation in correspondence to transitions to Rydberg states. At variance with smaller systems, we observe negative ion production in the shape resonance region. This can be related to the possibility in a relatively large system to dissipate positive charge over several channels.