4.48 nm正入射软X射线激光用Cr/C多层膜高反射镜的研制

针对4.48nm类镍钽软X射线激光及其应用实验,设计制备了工作于这一波长的近正入射多层膜高反射镜。选择Cr/C为制备4.48nm高反射多层膜的材料对,通过优化设计,确定了多层膜的周期、周期数以及两种材料的厚度比。模拟了多层膜非理想界面对高反射多层膜性能的影响。采用直流磁控溅射方法在超光滑硅基片上实现了200周期Cr/C多层膜高反射镜的制备。利用X射线衍射仪测量了多层膜结构,在德国BessyⅡ同步辐射上测量了在工作波长处多层膜反射率,测量的峰值反射率达7.5%。对衍射仪测量的掠入射反射曲线和同步辐射测量的反射率曲线分别进行拟合,得到的粗糙度和厚度比的结果相近。测试结果表明,所制备的Cr/C多层膜样品结构良好,在指定工作波长处有较高的反射峰,达到了设计要求。     

大尺寸高性能X射线双通道多层膜反射镜研制

为满足同步辐射装置中X射线单色器的需求,在直线式磁控溅射设备上制备了W/Si和Ru/C双通道多层膜反射镜。制备的W/Si多层膜和Ru/C多层膜的周期厚度均为3 nm,平均界面宽度分别为0.30 nm和0.32 nm。在320 mm长度范围和20 mm宽度范围内,W/Si多层膜膜厚误差的均方根值分别为0.30%和0.19%,Ru/C多层膜膜厚误差的均方根值分别为0.39%和0.20%。对制备的样品进行了表面形貌测试和非镜面散射测试,对比了W/Si多层膜和Ru/C多层膜的表面和界面粗糙度大小。硬X射线反射率测试结果表明,W/Si多层膜和Ru/C多层膜在8.04 keV能量点处的一级布拉格峰测试反射率分别为63%和62%,角分辨率均为2.6%。基于以上研究,在尺寸为350 mm×60 mm的高精度Si平面镜表面镀制了W/Si和Ru/C双通道多层膜,并且其被成功应用于上海同步辐射光源线站中。     

单发实验测量软X射线多层膜反射镜反射特性

 提出了一种单发实验测量软X射线波段多层膜反射镜反射特性的简易方法。实验采用激光等离子体软X射线源作为光源,用平焦场光栅谱仪分光,在光路中引入掠入射镜以消除高级次谱的影响,用软X光CCD记录,在一发激光打靶实验中,测量了设计中心波长为13.9 nm的Mo/Si多层膜反射镜的反射特性。     

单发实验测量软X射线多层膜反射镜反射特性

提出了一种单发实验测量软X射线波段多层膜反射镜反射特性的简易方法。实验采用激光等离子体软X射线源作为光源,用平焦场光栅谱仪分光,在光路中引入掠入射镜以消除高级次谱的影响,用软X光CCD记录,在一发激光打靶实验中,测量了设计中心波长为13.9 nm的Mo/Si多层膜反射镜的反射特性。     

月基极紫外相机多层膜反射镜

月基极紫外相机用于月球表面对地球等离子体层辐射出的30.4 nm谱线进行成像观测,多层膜反射镜是月基极紫外相机的重要光学元件。根据月基极紫外相机技术参数,选择了B₄C/Mg,B₄C/Mg₂Si,B₄C/Al,B₄C/Si,Mo/Si等材料,对其周期厚度、材料比例、周期数等参数进行优化。计算了以上材料组合在30.4 nm的反射率曲线。考虑到月球环境的特殊性和材料的物理化学性质,从中选择出Mo/Si和B₄C/Si两种组合,利用磁控溅射进行镀制。Mo/Si和B₄C/Si多层膜在30.4 nm反射率分别达到15.3%和22.8%。     

软X射线多层膜反射镜反射率测量

 采用线状激光等离子体作为软X光源,用具有空间分辨的掠入射光栅谱仪对正入射多层膜反射镜进行了反射率测量。谱仪测谱范围20~40nm,谱分辨0.05nm,测得50层C/Al反射镜在中心波长28.6nm处反射率为22%,带宽约为2.5nm。     

软X射线多层膜反射镜反射率测量

采用线状激光等离子体作为软X光源,用具有空间分辨的掠入射光栅谱仪对正入射多层膜反射镜进行了反射率测量。谱仪测谱范围20~40nm,谱分辨0.05nm,测得50层C/Al反射镜在中心波长28.6nm处反射率为22%,带宽约为2.5nm。     

多层膜软X光反射镜的研制

本文介绍了镍-碳多层膜软X光反射镜的设计与制造方法,特别是膜厚监控法.用俄歇谱仪分析了一个样品的剖面情况;对一些样品在1.54(?)的衍射特性和在软X光区的反射率进行了测量并与理论计算结果作了比较.     

软X射线多层膜的应用及发展

文章主要介绍了近十年来软Ｘ射线多层反射发展现状以扩制备过程中的技术难点，介绍了软Ｘ射线多层膜在软Ｘ射线光学中的的些应用。     

X光多层膜反射镜反射特性实验研究

采用在平焦场光栅谱仪后面分段记录光谱的办法成功地实现了软Ｘ光多层膜反射镜反射率的测量，实验观察了反射镜反射特性随入射角变化情况，同时对实验测量误差进行了分析。     

Effect of defects on the reflectivity of Cr/C multilayer soft X-ray mirror at 4.48 nm

Cr/C is a promising material combination for multilayer mirror in the “near water window region” (4.4-6.7 nm). In the present paper, the effect of defects on the reflectivity of Cr/C soft X-ray multilayer mirror deposited by magnetron sputtering was studied. Formation of thin interlayer due to the interdiffusion, rough interface due to the non-sharp layer and contamination of O happened during the deposition process were found by a method combined by XPS, soft X-ray reflectivity at 4.48 nm and grazing incidence hard X-ray reflectivity at 0.154 nm. The XPS results show that both interlayers (Cr-on-C and C-on-Cr) are mixture composed of C sp2, C sp3, CO, CO, CrCr and CrO bondings. No chromium carbide was found at the interlayer probably due to the blocking of oxides’ formation. Through the analysis of X-ray reflectivity, we obtained the multilayer structure parameters (thickness and roughness) and optical constants of each layer at 4.48 nm. Based on those results, a further calculation was carried out. The result shows that the formation of the thin interlayer contributes little to the decrease of the reflectivity, the rough interface decreases the reflectivity most and the contaminant (O) not only decreases the reflectivity but also shifts the position of the peak.     

软X光多层镜反射率在同步辐射源上的标定

 软X光多层镜反射率标定实验在北京同步辐射装置 上进行,利用BSRF-3W1B 束线及其反射率计靶室(主靶室)标定不同材料的多层镜样品的反射率。多层镜的标定采用波长扫描法,以得到样品反射率随波长变化的曲线。给出了21°-B₄C/Si,21°-B₄C/Mo,10°-Cr/Ti,15°- B₄C/W,10°- B₄C/W以及6.86°-B₄C/W等6块多层镜在50～1 500 eV能段上的反射率标定曲线,并将其与理论计算结果进行比较。结果表明：标定曲线与理论曲线很好地符合。影响标定结果的总不确定度的主要因素是光子能量不确定度,其次是角度不确定度,测量不确定度的影响很小。     

q软X光多层镜反射率在同步辐射源上的标定

软X光多层镜反射率标定实验在北京同步辐射装置上进行,利用BSRF-3W1B 束线及其反射率计靶室(主靶室)标定不同材料的多层镜样品的反射率.多层镜的标定采用波长扫描法,以得到样品反射率随波长变化的曲线.给出了21°-B4C/Si,21°-B4C/Mo,10°-Cr/Ti,15°- B4C/W,10°- B4C/W以及6.86°-B4C/W等6块多层镜在50～1 500 eV能段上的反射率标定曲线,并将其与理论计算结果进行比较.结果表明标定曲线与理论曲线很好地符合.影响标定结果的总不确定度的主要因素是光子能量不确定度,其次是角度不确定度,测量不确定度的影响很小.     

中心波长为28.5nm多层膜镜反射率测量

在“星光-Ⅱ”装置上以类Ne铬x射线激光作为标定源，以平场光栅谱仪为分光元件进行了285nm的Mo/Si多层膜反射镜效率测量.介绍了实验方法，给出了实验结果，本次研制的两块多层膜镜反射率分别为31%和9.6%. 关键词： x射线多层膜反射镜 反射率测量 x射线激光     

B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱ radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5°. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.     

Development of laser deposited multilayer zone plate structures for soft X-ray radiation

As a novel approach, the combination of pulsed laser deposition and focused ion beam was applied to fabricate different types of multilayer zone plate structures for soft X-ray applications. For this purpose, high quality non-periodic ZrO₂/Ti multilayers were deposited by pulsed laser deposition on planar Si substrates and on rotating steel wires with layer thicknesses according to the Fresnel zone plate law. Linear focusing optics were fabricated by cutting slices out of the multilayers by focused ion beam and placing them directly over pinholes within Si₃N₄ substrates. Additionally, it was shown that laser deposition of depth-graded multilayers on a wire is also a promising way for building up multilayer zone plates with point focus. First experiments using a table-top X-ray source based on a laser-induced plasma show that the determined focal length and spatial resolution of the fabricated multilayer Laue lens corresponds to the designed optic.     

Reflection of atto-and femtosecond X-ray pulses from aperiodic multilayer mirror

The reflection of femto-and attosecond soft and hard X-ray pulses from multilayer structures (MSs) was investigated. The conditions are formulated under which the pulse shape and duration barely change upon reflection. The MSs are optimized for the reflection of extremely short pulses, and the possibility of compressing chirped pulses is considered. It is shown that the power reflection coefficient can be appreciably larger than unity. The aperiodic MSs capable of effectively reflecting pulses containing no more than three wave periods are calculated.     

Saturated amplification of a collisionally pumped optical-field-ionization soft X-ray laser at 41.8 nm

We report the first saturated amplification of an optical-field-ionization soft x-ray laser. The amplifying medium is generated by focusing a circularly polarized 330-mJ, 35-fs, 10-Hz Ti:sapphire laser system in a few-mm cell filled with xenon. A gain of 67 cm(-1) on the 4d(9)5p-4d(9)5d transition at 41.8 nm in Pd-like xenon and a gain-length product of 15 have been inferred at saturation. This source delivers about 5 x 10(9) photons per pulse. The influence of the pumping energy and the laser polarization on the lasing output are also presented.     

在19.5 nm处高反在30.4 nm处抑制的双功能薄膜

 研究了极紫外波段的双功能光学元件。采用周期膜叠加的思想,运用遗传方法优化设计了在19.5 nm处高反,在30.4 nm处抑制的双功能多层膜。采用磁控溅射技术制备了多层膜,利用X射线衍射仪测试了多层膜的结构,在国家同步辐射实验室测试了双功能多层膜的反射特性。结果表明：制备出的双功能膜性能与设计相符,在入射角13°,19.5 nm处的反射率达到33.3%,接近传统的19.5 nm周期高反膜的反射率,并且在30.4 nm附近将反射率由1.1%降到9.6×10^-4。