择优取向MgO缓冲层上制备的硅基Ba0.7Sr0.3TiO3薄膜的结构和性能研究

分别采用sol-gel法和磁控溅射法在Si(001)单晶衬底上制备出(111)和(001)取向的MgO缓冲层薄膜,随后在其上生长Ba0.7Sr0.3TiO3(BST30)铁电薄膜.通过X射线衍射,扫描电子显微镜,原子力显微镜等方法研究了薄膜的微结构.实验结果发现,在较厚的MgO(001)缓冲层上可长出(101)取向的BST30薄膜,而在较薄的MgO(111) 缓冲层上则表现出(101)和(111)取向相互竞争的现象,随着MgO(111)缓冲层厚度的增加,BST30薄膜的(101)取向被抑制,而(001)取向逐渐增强.利用反射率测定仪、阻抗分析仪研究了BST30薄膜的光学和电学性能. 通过改进的单纯形法拟合反射率曲线,得到了BST30及其MgO缓冲层薄膜的光学常数, 由BST30薄膜的电压-电流特性(I-V曲线),发现MgO缓冲层对BST30薄膜的漏电流有明显的阻隔作用,可以有效消除BST30膜层的p-n结效应.     

化学气相沉积制备MgB2超导薄膜

本文报道了利用化学气相沉积技术制备MgB2超导薄膜.首先在MgO(111)基片上化学气相沉积一层B膜,然后在Mg蒸气环境下对B膜进行后退火处理.退火后得到的MgB2薄膜在MgO(111)基片上呈随即取向生长,Mg、B原子比接近于1∶2.4;薄膜表面光滑致密,晶粒粒度约为0.5μm.电阻测量和直流磁测量表明薄膜超导转变温度为38K,转变宽度仅为0.1K.毕恩公式计算结果显示MgB2薄膜的临界电流密度在0T、10K时高达2×107A/cm2.     

温度对Si衬底上低压MOCVD外延生长ZnS薄膜质量的影响

用低压MOCVD系统在(111)Si衬底上,用两步生长方法(改变/流量比)在300～400℃时外延生长了ZnS单晶薄膜。随着衬底温度的降低,ZnS薄膜结晶质量提高,并在300℃生长时获得结晶完整性较好的(111)ZnS单晶薄膜。文中讨论了衬底温度对薄膜质量的影响。     

HWE生长PbTe单晶薄膜及生长机理的研究

本文介绍了一种简单的热壁外延(HWE)装置,和利用它在BaF2(111)衬底上生长PbTe(111)单晶薄膜的工艺,并讨论了生长机理.     

氧化钙薄膜中缺陷诱导的高居里温度铁磁性研究

通过脉冲激光沉积在(111)取向钇稳定的氧化锆(YSZ)衬底上制备了氧化钙(CaO)薄膜.室温下磁滞回线的实验观测数据表明CaO薄膜具有明显的铁磁性.X射线衍射和X射线光电子能谱分析表明,CaO薄膜为(111)取向,没有杂质相.在高真空条件下生长和退火的CaO薄膜都表现出铁磁性磁化行为,而在相应的CaO靶材上没有检测到...     

择优取向MgO缓冲层上制备的硅基Ba0.7Sr0.3TiO3薄膜的结构和性能研究

分别采用sol-gel法和磁控溅射法在Si（001）单晶衬底上制备出（111）和（001）取向的MgO缓冲层薄膜,随后在其上生长Ba_0.7Sr_0.3TiO₃（BST30）铁电薄膜.通过X射线衍射,扫描电子显微镜,原子力显微镜等方法研究了薄膜的微结构.实验结果发现,在较厚的MgO（001）缓冲层上可长出（101）取向的BST30薄膜,而在较薄的MgO（111） 缓冲层上则表现出（101）和（111）取向相互竞争的现象,随着MgO（111）缓冲 关键词： 0.7Sr_0.3TiO₃')" href="#">Ba_0.7Sr_0.3TiO₃ 铁电薄膜 择优取向 sol-gel     

Al2O3衬底MgB2超薄膜的研究

我们利用混合物理化学气相沉积法(Hybrid physical-chemical vapor deposition简称为HPCVD)在(000l)Al2O3衬底上制备了系列干净的MgB2超薄膜,并通过R-T测量、SEM测量、M-T测量、XRD测量对它们进行了表征,探究了其超导电磁性能和薄膜的生长机制.其中的7.5nm厚的MgB2超薄膜为已报导的蓝宝石衬底上生长的性能最高的超薄膜.     

MgO(111)上NbN和AlN薄膜的生长研究

在制备NbN/AlN/NbN隧道结的工艺过程中,为了获得具有优质单晶结构的NbN薄膜,我们在MgO(111)基片上探索了直流溅射法制备NbN薄膜的生长工艺条件,XRD研究分析表明,我们获得了单晶结构良好的NbN薄膜;为了支持作为上电极的NbN薄膜的生长,也需要良好的AlN薄膜用作势垒层,我们采用射频磁控溅射设备和纯净的Al靶对AlN薄膜进行了制备研究.实验结果表明,所获得的AlN薄膜具有六方c-轴取向,并讨论了衬底和薄膜界面处可能的结构情况.     

Si衬底上磁控溅射法生长MgO薄膜

我们用射频磁控溅射方法,在Si(100)单晶衬底上生长MgO薄膜,借助X射线衍射(XRD)分析发现,我们获得了两种不同晶体结构的MgO薄膜,分别是常规的晶格常数为0.421nm的MgO薄膜和晶格常数为0.812nm的新结构的MgO薄膜.我们研究了溅射气压、衬底温度等工艺参数对两种晶体结构择取的影响.实验表明,高的溅射气压和高的衬底温度有利于晶格常数为0.812nm的新结构的MgO相的形成.在高的气压和温度下,我们制备出了晶格常数为0.812nm,具有很好的4次对称性的MgO外延薄膜.利用原子力显微镜(AFM)研究了这种薄膜的表面形貌.     

硅衬底MgB_2-B-MgB_2超导SNS约瑟夫森结的制备与特性

利用两步原位电子束蒸发技术,在Si(111)衬底上制备了MgB2-B-MgB2超导SNS约瑟夫森夹心结.夹心硼(B)层厚度从10nm到80nm范围内MgB2-B-MgB2/Si(111)薄膜表现出明显的SNS约瑟夫森结特性,而在5nm和100nm处薄膜分别是整体超导和正常金属特性.在同一温度下,随着硼层厚度的增加,临界结电流减小,对同一厚度下,临界结电流随着温度的增加而减小.同时,实验指出,夹心硼SNS超导MgB2约瑟夫森结的电流-电压(I-V)曲线具有回滞现象,符合SM模型.     

MgB2超导多层膜的制备方案

简要叙述了MgB2的发展和制备历史,通过对不同衬底材料上MgB2的反应情况的总结概括以及对不同衬底材料和MgB2的晶体结构和晶格常量的比较,提出一种MgB2超导多层膜的制备方案.     

Synthesis,structure, and electrochemical properties of epitaxial perovskite La0.8Sr0.2CoO3 film on YSZ substrate

Epitaxial films of the perovskite, La_0.8Sr_0.2CoO₃ (LSC), for SOFCs cathode were deposited on yttria-stabilized zirconia (YSZ) single crystals by pulsed laser deposition method. The films were characterized by thin-film X-ray diffraction measurement, atomic force microscopy (AFM), transmission electron microscope (TEM), and ac impedance spectroscopy. The film orientations depend on the substrate planes. The LSC films on the YSZ (100) and (111) substrates showed the (110) orientation with different twin structures, while those on the YSZ (110) had (100) and (112) orientations. Surface morphology of the films also depends on the substrate orientations. These films showed different electrode properties depending on the orientations. The relationships between the properties, the film orientations, surface morphology, and lattice misfit are discussed.     

Enhancement of the superconducting transition temperature of MgB2 by a strain-induced bond-stretching mode softening

We report a systematic increase of the superconducting transition temperature T(c) with a biaxial tensile strain in MgB2 films to well beyond the bulk value. The tensile strain increases with the MgB2 film thickness, caused primarily by the coalescence of initially nucleated discrete islands (the Volmer-Weber growth mode.) The T(c) increase was observed in epitaxial films on SiC and sapphire substrates, although the T(c) values were different for the two substrates due to different lattice parameters and thermal expansion coefficients. We identified, by first-principles calculations, the underlying mechanism for the T(c) increase to be the softening of the bond-stretching E(2g) phonon mode, and we confirmed this conclusion by Raman scattering measurements. The result suggests that the E(2g) phonon softening is a possible avenue to achieve even higher T(c) in MgB2-related material systems.     

(Ce0.8Sm0.2O2-δ/Y2O3:ZrO2)N超晶格电解质薄膜的制备及表征

采用脉冲激光沉积技术(PLD), 在MgO单晶基底上, 依次沉积氧化钐掺杂的氧化铈(Ce_0.8Sm_0.2O_2-δ, SDC)和钇稳定氧化锆(8 mol%Y₂O₃:ZrO₂, YSZ)制备了五种(SDC/YSZ)_N (N=3, 5, 10, 20, 30) 超晶格电解质薄膜. 利用X射线衍射(XRD)、高分辨透射电子显微镜(HR-TEM)和交流阻抗对其形貌、相结构和电学性能进行了表征. 结果显示, (SDC/YSZ)_N超晶格电解质薄膜之间形成了明显的界面和较好的超晶格结构; 薄膜表面颗粒生长均匀、致密、平滑, 在薄膜的界面处没有元素相互扩散也未出现裂纹, 外延生长良好; 电导率随着(SDC/YSZ)_N超晶格电解质界面数的增加而增加, 而活化能则随之减少, 是较为理想的低温固体氧化物燃料电池电解质.     

生长温度对立方MgZnO薄膜生长取向和紫外光吸收特性的影响

利用脉冲激光沉积技术在非晶石英衬底上制备立方结构MgZnO薄膜,并研究MgZnO薄膜结晶特性、光学带隙随生长温度的变化情况。当生长温度从150℃升高到700℃时,MgZnO薄膜的生长取向由（200）向（111）转变。在600℃以下,MgZnO薄膜光学带隙的变化规律与晶格中Mg和Zn原子比例的变化趋势是一致的;而当温度升至700℃时,虽然MgZnO晶格中Mg和Zn原子比例降低,但由于平均晶粒尺寸变大,薄膜的光学带隙反而上升。在300℃和700℃晶格匹配的情况下,获得了单一（200）和（111）取向的立方MgZnO薄膜。     

Thickness-dependent orientation evolution in nickel thin films grown on yttria-stabilized zirconia single crystals

Microstructure evolution along with crystallographic orientation change as a function of film thickness was investigated in Ni thin films grown on (100) yttria-stabilized zirconia (YSZ) single crystal substrates. Texture development with two different orientation relationships, OR1: Ni {111}//YSZ {100} and OR2: Ni {100}//YSZ {100}, cube on cube orientation were identified by X-ray diffraction and transmission electron microscopy depending on the film thickness. The observed orientation transition reveals the existence of a critical thickness (～320?nm) favoring two different orientations in sputtered Ni films on YSZ (100) substrate.     

Fabrication of YBCO／YSZ and YBCO／MgO thick films using electrophoretic deposition with top-seeded melt growth process

Superconducting thick films were grown on single crystals MgO and YSZ by electrophoretic deposition with Y_2BaCuO_5(Y211) addition. YBCO thick films were then accomplished by sintering the precursor films above the peritectic temperature. Single crystals of MgO (3×3×0.5 mm^3) were used as top-seed to control crystal structure of the thick films. As shown by scanning electron microscopy, the morphologies of YBCO/YSZ and YBCO/MgO thick films are spherulitic texture and platelet type. The critical temperature is ～89 K for the YBCO/YSZ thick film; the onset transition temperature is 86.4 K and the transition width is ～3 K for YBCO/MgO thick film. The critical current densities (as determined by Bean model) are, in A/cm^2, 3870 (77 K) for YBCO/YSZ thick films and 2399 (77 K) for YBCO/MgO thick films, which are comparable to the best J_c reported of the thick films prepared by the same method.     

等离子辅助后处理对锰掺杂氮化钛薄膜磁特性的影响

The ferromagnetic manganese doped TiN films were grown by plasma assisted molecular beam epitaxy on MgO(001) substrates. The nitrogen concentration and the ratio of manganese at Ti lattice sites increase after the plasma annealing post treatment. TiN(002) peak shifts toward low angle direction and TiN(111) peak disappears after the post treatment. The lattice expansion and peak shift are mainly ascribed to the reduction of nitrogen vacancies in films. The magnetism was suppressed in as-prepared sample due to the pinning effect of the nitrogen vacancies at defect sites or interface. The magnetism can be activated by the plasma implantation along with nitrogen vacancies reduce. The decrease of nitrogen vacancies leads to the enhancement of ferromagnetism.