掺杂分子束外延GaAs薄膜表面和GaAs-GaAs界面的光反射调制谱

报道了用光反射调制谱(PR)测量掺杂分子束外延GaAs薄膜表面和界面电场的结果。分别用He-Ne激光和He-Cd激光作调制光,由于它们的穿透深度不同,可以有效地区分来自表面和界面的PR信号。由PR谱推算出薄膜表面和界面的电场。研究了薄膜干涉效应对调制光谱的影响,对界面电场的成因进行了分析和讨论。 关键词：     

Al/GaAs表面量子阱界面层的原位光调制反射光谱研究

用分子束外延（MBE）方法在GaAs表面量子阱上外延生长不同厚度的Al层，以超高真空下的原位光调制光谱（PR）作为测量手段，研究Al扩散形成的表面势垒层对于GaAs表面量子阱中带间跃迁峰位和峰形的影响.根据跃迁峰的变化，采用有效质量近似理论计算出了Al和GaAs 的互扩散长度为0.5nm，这是半导体工艺中的一个重要常数. 关键词： Al GaAs 原位光调制反射光谱（PR） 分子束外延（MBE）     

超薄层AlGaAs样品的光调制反射谱研究

用调制光谱的方法对分子束外延（MBE）生长在GaAs（100）衬底上的一组超薄层本征型Al_xGa_1-xAs层进行了原位的研究．对厚度在35nm以下的一组样品观察到了若干个跃迁峰，而对厚度在100nm的样品只观察到了一个跃迁峰．观察到的各峰随厚度的改变而变化．用台阶势模型很好地解释了实验结果 关键词：     

稳定的GaAs (2 5 1 1)高密勒指数表面的电子结构

采用格林函数方法对具有稳定结构的GaAs(2 5 11)(1×1)表面的电子结构特性进行了计算. 结果表明：对于理想的GaAs(2 5 11)表面，基本带隙内的表面态主要处在三个能量区域，即 -0.1—0.1eV，085—10eV和1.4—1.6eV之间；吸附两个As原子形成(1×1)再构后，表面态的变化主要表现在0.85—1.0eV之间的表面态完全消失.结合电子数目规则，可以确定处在 - 0.1—0.1eV之间的表面态为全部填满的阴离子悬挂键态或再构引起的As As二聚体键的表 面态，而处在1.4— 关键词： 高密勒指数表面 电子结构 电子数目规则     

高组分稀磁半导体Cd1-xMnxTe/CdTe超晶格的荧光谱研究

报道用分子束外延(MBE)技术生长的x=0.4,0.8的高组分稀磁半导体Cd1-xMnxTe/CdTe超晶格低温和室温荧光谱研究结果.基态激子跃迁能级荧光谱实验结果显示高组分超晶格中具有高量子效率和高质量光发射.对激子能级随温度的变化进行了详细研究,给出激子跃迁能量的温度系数.激子能级线型的展宽随温度变化关系可用激子-纵向光学声子耦合模型解释.与光调制反射谱实验结果进行了比较.     

Electronic structure of molecular beam epitaxy grown 1T'-MoTe_2 film and strain effect

Atomically thin transition metal dichalcogenide films with distorted trigonal(1T') phase have been predicted to be candidates for realizing quantum spin Hall effect. Growth of 1T' film and experimental investigation of its electronic structure are critical. Here we report the electronic structure of 1T'-MoTe_2 films grown by molecular beam epitaxy(MBE).Growth of the 1T'-MoTe_2 film depends critically on the substrate temperature, and successful growth of the film is indicated by streaky stripes in the reflection high energy electron diffraction(RHEED) and sharp diffraction spots in the low energy electron diffraction(LEED). Angle-resolved photoemission spectroscopy(ARPES) measurements reveal a metallic behavior in the as-grown film with an overlap between the conduction and valence bands. First principles calculation suggests that a suitable tensile strain along the a-axis direction is needed to induce a gap to make it an insulator. Our work not only reports the electronic structure of MBE grown 1T'-MoTe_2 films, but also provides insights for strain engineering to make it possible for quantum spin Hall effect.     

Photoreflectance characterization of CdTe thin films grown by Molecular Beam Epitaxy on GaAs(100)

CdTe films have been grown on top of GaAs(100) by means of Molecular Beam Epitaxy (MBE) at 300 °C substrate temperature. Different procedures for the CdTe growth and for the preparation of the GaAs substrates resulted in diverse crystalline qualities of the CdTe films. We present the results obtained from PhotoReflectance (PR) measurements of these films employing HeNe and Ar-ion lasers as modulating excitation. For Ar excitation, the ratio of CdTe to GaAs signal strength for the E ₀ transition is enhanced, allowing a differentiation of the contributions from film and substrate. Both the PR line shape and intensity are correlated to the structural quality of the CdTe films. One of the samples presented a below-band-gap transition of the GaAs substrate around 30±5 meV from E ₀ which is attributed to donor states produced by Te atoms diffused in the interface; this result demonstrates the high sensitivity of the photoreflectance technique to the structural properties of interfaces.     

Modulation spectroscopy on metamorphic InAs quantum dots

The modulation spectroscopy on 1.45 μm metamorphic InAs quantum dots (QDs) with In_0.3Ga_0.7As capping layer grown on GaAs substrate by molecular beam epitaxy (MBE) has been investigated by differential absorption (Δα), electro-reflectance (ER), and photo-reflectance (PR) spectra at different reverse bias. The optical transitions of the ground state, excited states, and wetting layers were identified and discussed. The micro-structure characterization was also analyzed by TEM and AFM. The variation of refractive index spectra (Δn) by calculating Δα spectra through Kramers–Kronig transform is obtained to study the electro-absorption behaviors. Additionally, a simple physical model is proposed to explain the experimental values between the Δn and ΔR spectra performed by two different modulation spectroscopies (Δα and ER). The built-in electric field of metamorphic InAs QDs structure was determined to analyze the Franz–Keldysh Oscillation (FKO) extreme in PR spectra with different bias.     

Optical transitions of InAs/In0.36Ga0.64As/GaAs(311B) surface quantum dots clearly identified by the piezoreflectance technique

The bilayer InAs/In_0.36Ga_0.64As/GaAs(311B) quantum dots (QDs), including one InAs buried quantum dot (BQD) layer and the other InAs surface quantum dot (SQD) layer, have been grown by molecular beam epitaxy (MBE). The optical properties of these three samples have been studied by the piezoreflectance (PzR) spectroscopy. The PzR spectra do not exhibit only the optical transitions originated from the InAs BQDs, but the features originated from the InAs SQDs. After the InAs SQDs have been removed chemically, those optical transitions from InAs SQDs have been demonstrated clearly by investigating the PzR spectra of the residual InAs BQDs in these samples. The great redshift of these interband transitions of InAs SQDs has been well discussed. Due to the suitable InAs SQD sizes and the thickness of In_0.36Ga_0.64As layer, the interband transition of InAs SQDs has been shifted to ∼1.55 μm at 77 K.     

分子束外延及溅射法制备Co/Cu多层膜结构与磁电阻的比较研究

对用分子束外延（MBE）和溅射方法制备的Co/Cu多层膜样品分别进行了结构及磁性研究．X射线分析表明两者均有良好的调制周期性，并且前者形成外延单晶结构，铁磁共振研究表明了面内六次各向异性对称的存在，说明此超晶格具有完整的面内二维结构．磁电阻测量发现，溅射制备的多层膜具有较高的磁电阻值并明显地随Cu层厚度而振荡，相应的室温磁电阻峰值分别为27%，24%，14%；而MBE制备的超晶格的磁电阻较小，其第二峰的数值只有7%．MBE超晶格界面处可能具有超顺磁性，对磁电阻和磁化强度的不同的外场依赖关系有一定的影响． 关键词：     

锗硅量子阱中近带边光跃迁的理论和实验研究

本文研究了SiGe/Si量子阱中近带边光跃迁的产生机制,对由杂质无规分布引起的近带边光跃迁给出了一个物理模型。用此模型计算了光跃迁偶极矩,给出了跃迁偶极矩的上限。提出了未掺杂SiGe/Si量子阱中近带边光跃迁的一种跃迁机制,认为是Ge原子周围波函数畸变的集体行为。用MBE方法生长了掺杂SiGe/Si量子阱材料,在低温下观测到近带边光跃迁。     

FRANZ-KELDYSH OSCILLATION FROM THE SPACE CHARGE REGION OF MBE GaAs FILMS

We have investigated doped MBE GaAs films using photoreflectance (PR) spec-troscopy. Special spectral structures have been observed in the vicinity of the funda-mental band gap, which are quite different from the Franz-Keldysh oscillation (FKO) from uniform electric fields under flatband modulations. Numerical analysis has been performed for FKO from electric fields in the space charge region under non-flatband modulations. Some typical FKO line shapes are illustrated. For moderately doped samples the calculated line shapes are basically consistent with experiments. The surface electric field and the Fermi level pinning have also been deduced from exper-iments.     

Diffusion and deformations in heterosystems with GaN/AlN superlattices, according to data from EXAFS spectroscopy

Multilayered samples with extremely narrow GaN quantum wells in an AlN host are synthesized via ammonia MBE. The parameters of the microstructure are determined by means of EXAFS spectroscopy, high-resolution electron microscopy, and low-angle scattering. Their relationship to the morphology of GaN/AlN superlattices is established. The influence of growth conditions and the thickness of superlattices on their optical properties and mixing in the near-boundary layers is established.     

Determination of the optical constants of metals and semiconductors by combining ellipsometry with electron spectroscopy microscopy and X-ray specular reflection analysis

The optical constants n(λ) and k(λ) of metals and semiconductors can be determined by spectroellipsometry, however, their apparent values are considerably affected by the roughness and oxide overlayer thickness dof the sample. Aluminium thin film samples of high perfection and very low roughness (<1 nm) have been studied by cross-disciplinary experimental methods: X-ray specular reflection analysis for determining the structure and thickness of the natural (hydrated) oxide overlayer and roughness of the substrate; plasmon electron energy loss spectroscopy supplied d. For calibration of the d measurements a special thin film multilayer system was developed, suitable for preparing cross-sectional samples for resolution transmission electron microscopy. Knowing the roughness and d-data, the optical constants n(λ) and k(λ) of aluminium were determined by spectroellipsometry in the spectral range λ=365–633 nm. Experimental results and a nomogram are presented for evaluating n(λ) and k(λ). The dependence of the ellipsometric optical constants on roughness and d is discussed. Very good agreement of the optical constants with the corrected ellipsometric results of Blanco and the synchrotron spectroscopy data of Hagemann was found. The cross-disciplinary methods can be applied to metals and semiconductors covered with an overlayer.     

Mössbauer-Effect Study of Metastable c-FeSi Synthesized by Molecular Beam Epitaxy (MBE) and by Ion Implantation

Conversion electron Mössbauer spectroscopy (CEMS) has been applied to the study of the metastable c-FeSi phase (i.e. an iron silicide with CsCl lattice structure) that was synthesized by implantation of Si + ions of 50 keV in energy into f -Fe (95% 57 Fe) near room temperature with a nominal dose of 5 2 10 17 cm m 2 , and by molecular beam epitaxy (MBE). Iron silicide layers with different stoichiometry (FeSi 0.85 , FeSi, Fe 0.85 Si) were grown by codeposition of 57 Fe and Si onto an Fe buffer layer on MgO(100). For all FeSi layers the defective CsCl structure was observed after annealing at different temperatures. X-ray diffraction measurements were performed to determine the structure and epitaxial relationship of the c-FeSi films. The lattice parameter perpendicular to the film plane was found to be 2.77(5) Å. CEMS measurements revealed a lower than cubic site symmetry of the iron atoms for both the c-FeSi layers synthesized by ion implantation and by MBE. The formation of nearly undistorted c-FeSi after annealing is favored by excess Fe atoms in the deposited film.     

分子束外延GaN薄膜的X射线光电子能谱和俄歇电子能谱研究

用XPS和AES电子能谱的方法对等离子体辅助分子束外延(MBE)生长的GaN薄膜进行了表面分析和深度剖析.发现红外分子束外延(RFMBE)生长的富镓GaN薄膜实际表面存在O和C吸附层,C主要为物理吸附,而O在GaN表面形成局域化学键产生氧络合物覆盖层,并形成一定的深度分布.杂质O在GaN带隙中导带底形成杂质带同时引入深受主能级,使得带隙变窄室温光吸收谱向低能方向移动,光致发光谱出现宽带发光峰.从而影响GaN薄膜的电学和光学性质 关键词： GaN薄膜 X射线光电子能谱 俄歇电子能谱 表面分析     

Analysis of amorphous-nano-crystalline multilayer structures by optical, photo-deflection and photo-current spectroscopy

Thin film structures consisting of nano-crystalline and amorphous silicon layers deposited on glass by plasma enhanced chemical vapour deposition have been studied by optical spectroscopy methods (transmittance, photo-thermal deflection spectroscopy and photo-current spectroscopy) while structure was examined by Raman spectroscopy. The nano-crystalline layers were grown on the same amorphous layers, using different radio-frequency (RF) discharge powers, leading to different structural and optical properties. The energy dependence of the absorption coefficient above the band gap agrees well to the bimodal size distribution of crystals and crystal fraction estimated by Raman spectroscopy. For energies below the band gap, the comparison of the absorption of the bi-layer systems with respect to single amorphous layer reveals that the samples produced at higher RF discharge present a higher disorder degree (Urbach edge increases) and higher number of structural defects (absorption related to the defects increases).     

组合注入质子导致不对称耦合双量子阱截面混合效应研究

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Raman scattering of polycrystalline GaSb thin films grownby co-evapouration process

<正>This paper reports that GaSb thin films have been co-deposited on soda-lime glass substrates.The GaSb thin film structural properties are characterized by Raman spectroscopy.The Sb-A_1g/GaSb-TO ratio decreases rapidly with the increase of substrate temperature,which suggests a small amount of crystalline Sb in the GaSb thin film and suggests that Sb atoms in the thin film decrease.In Raman spectra,the transverse optical（TO） mode intensity is stronger than that of the longitudinal optical（LO） mode,which indicates that all the samples are disordered.The LO/TO intensity ratio increases with increasing substrate temperature which suggests the improved polycrystalline quality of the GaSb thin film.A downshift of the TO and LO frequencies of the polycrystalline GaSb thin film to single crystalline bulk GaSb Raman spectra is also observed.The uniaxial stress in GaSb thin film is calculated and the value is around 1.0 GPa.The uniaxial stress decreases with increasing substrate temperature.These results suggest that a higher substrate temperature is beneficial in relaxing the stress in GaSb thin film.     

Investigation of various optical transitions in GaAs/Al0.3Ga0.7As double quantum ring grown by droplet epitaxy

This work examines the optical transitions of a GaAs double quantum ring (DQR) embedded in Al_0.3Ga_0.7As matrix by photoreflectance spectroscopy (PR). The GaAs DQR was grown by droplet epitaxy (DE). The optical properties of the DQR were investigated by excitation‐intensity and temperature‐dependent PR. The various optical transitions were observed in PR spectra, whereas the photoluminescence (PL) spectrum shows only the DQR and GaAs band emissions. The various optical transitions were identified for the GaAs near‐band‐edge transition, surface confined state (SCS), DQR confined state, wetting layer (WL), spin–orbital split (E_GaAs + Δ_o), and AlGaAs band transition. PR spectroscopy can identify various optical transitions that are invisible in PL. The PR results show that the GaAs/AlGaAs DQR has complex electronic structures due to the various interfaces resulting from DE.