Effect of the target density on the cross section of charge exchange between fast ions and atoms

When fast X^q+ X^{q^ + } ions collide with atomic or molecular targets, the total charge exchange cross section decreases with increasing target density. This is because the excitation levels of resulting X^{(q - 1)+} X^{(q - 1)^ + } ions are suppressed because of ionization by target atoms. The effect of target density on the total charge exchange cross section may amount to one order of magnitude or more depending on the charge and energy of an incident ion, as well as on the density and inner shell configuration of target atoms. Numerical calculations are performed for partial (in the principal quantum number n) cross sections σ(n) and total cross sections σ_tot=Σ_nσ(n) of charge exchange in the case of collisions of fast multiply charged ions having an energy E in the range 100 keV/u-10 MeV/u with gas or solid targets.     

Angular distribution of atoms sputtered from germanium by 1–20 keV Ar ions

The angular distribution of atoms sputtered from germanium under 1–20 keV Ar⁺ ion bombardment (normal incidence) has been studied experimentally and using computer simulations. A collector technique combined with Rutherford backscattering to analyze the distribution of collected material was used. In addition, the surface topography was under control. It was found that the experimental angular distribution of sputtered atoms (E ₀=3–10 keV) could be approximated by the function cos ⁿ θ with n≈ 1.65. Such a high value of n is connected with the surface scattering of ejected atoms and a noticeable contribution of backscattered ions to the formation of the sputter flux (the mass effect). The target surface was found to be practically flat even at ion fluencies ～10¹⁸ ions/cm². The results obtained are compared with data from the literature, including our recent data on Si sputtering.     

Charge exchange in collisions between heavy low-charged ions

The probabilities and the effective cross sections of collision-induced one-electron charge exchange between singly charged and four-charged heavy Xe, Cs, Ba, Pb, Bi, and U ions at energies E>0.1 keV/u are calculated by a method of multichannel normalization in the impact parameter representation. The cross sections are rather large with a maximum σ_m≈10⁻¹⁵ cm² at relative energies E _m ≈10–30 keV/u. For collision energies E<10 keV/u, the cross sections sharply decrease with growing resonance defect of the reaction. At high energies E>1 MeV/u, the charge exchange proceeds largely by the capture of inner shell electrons of the ionic targets. The charge exchange cross sections calculated for low-charged Xe, Cs, Ba, Pb, Bi, and U ions are compared with available theoretical and experimental data.     

Stability of subatomic carbon films on metal surfaces against low-energy gas ion bombardment

The earlier developed original experimental technique for measuring and analyzing the parameters of low-frequency fluctuations of the field-emission current in metal film systems is used to measure the sputtering yield Y _f of carbon films (with a coverage Θ ranging from 1 to 4) applied on Fe, Nb, Ta, and U substrates. The value of Y _f is calculated by an expression derived within a theoretical model developed. The sputtering ratios were measured for the case when the carbon films are sputtered by H⁺ and He⁺ ions with an energy E _i between 2 and 10 keV. With Θ fixed, the energy dependences of Y _f are obtained for each of the ions. In addition, for each of the ions, the Θ dependences of Y _f are found for several values of E _i. In all the cases, the measured values of Y _f far exceed those for pure carbon. With another original technique that combines field-ion microscopy (FIM) and precise measurement of current and/or luminous properties of local regions in FIM images, the energy thresholds E _th of sputtering carbon films applied on the metal surfaces are found. The energy distributions of Y _f in the near-threshold energy range for various Θ are obtained.     

Mass spectrometry of neutral molecules sputtered from polycrystalline metals by Ar+-ions of 100–1000 eV

The flux of neutral particles sputtered from clean polycrystalline targets of 11 metals has been studied by mass spectrometry after being postionized in a low pressure hf plasma. Besides atoms Me₁, postionized metal molecules Me₂ and Me₃ have been detected. The energyE ₀ of the bombarding Ar⁺ ions has been varied between 100 and 1000 eV. Considering the different plasma influences, an attempt is made to obtain the initial composition of the beam of sputtered neutrals from the ratiosR ₂₁ andR ₃₁ of postionized molecules Me₂ and Me₃ to postionized atoms, Me₁, respectively. The influence of the bombarding energyE ₀ onR ₂₁ has been measured for all target elements, onR ₃₁ for Pd and Ag. The yields of Me₂ atE ₀=1 keV approximately appear to be proportional to the square of the total sputtering yieldS for the different target materials. This behaviour and the energy dependence ofR ₂₁ andR ₃₁ are discussed in view of a possible molecule formation process in sputtering.     

The peculiarities of the low-energy ion scattering by polycrystal targets

In the present work, experimental and computer simulation studies of low-energy (E₀ = 80-500 eV) Cs⁺ ions scattering on Ta, W, Re target surfaces and K⁺ ions scattering on Ti, V, Cr target surfaces have been performed for more accurate definition of mechanism of scattering, with a purpose of evaluation of an opportunity of use of slow ions scattering as a tool of surface layers analysis. The choice of the targets was based on the fact that the ratios of atomic masses of target atoms and ions μ = m₂/m₁ were almost the same for all cases considered and greater than 1 (direct mass ratio) however, the difference of binding energies of target atoms in the cases of Cs⁺ and K⁺ scattering was almost twice as much. It has been noticed that the dependencies of the relative energy retained by scattering ions at the maximum of energy distribution versus the initial energy E_m/E₀ (E₀) have a similar shape in all cases. The relative energy retained by scattering ions increases while the initial energy of incidence ions decreases. The curves are placed above each other relative to the binding energies of target atoms, to show what this says about the influence of binding energy on a process of scattering of low-energy ions. The correlation between value of energy change maintained by an ion for different values of E₀ in the case of scattering by targets with different masses of atoms and its binding energies is experimentally established. The contrary behavior of the E_m/E₀ (E₀) dependencies concerning the target atom binding energy quantity E_b for cases with direct (μ > 1) and inverse (μ < 1) mass ratio of colliding particles is established. The comparison of experimental energy distributions with calculated histograms shows that the binary collision approximation cannot elucidate the abnormally great shift in the maxima of relative energy distributions towards greater energy retained by scattering ions.     

Probability of ionization of sputtered particles as a function of their energy: Part I: Negative Si ions

In this study we have investigated how the probability of ionization of sputtered Si atoms to form negative ions depends on the energy of the atoms. We have determined the ionization probability from experimental SIMS energy distributions using a special experimental technique, which included de-convolution of the energy distribution with an instrumental transmission function, found by separate measurements.We found that the ionization probability increases as a power law ∼E^0.677 for particles sputtered with energies of 0-10 eV, then becomes a constant value (within the limits of experimental error) for particles sputtered with energies of 30-100 eV. The energy distributions of Si⁻ ions, measured under argon and cesium ion sputtering, confirmed this radical difference between the yields from low and high-energy ions.To explain these results we have considered ionization mechanisms that are different for the low energy atoms (<10 eV) and for the atoms emitted with higher energy (>30 eV).     

Accommodation coefficients for low-energy ions on metal surfaces

The interaction of low-energy ions (E = 3 to 100 eV) with the surface of a solid cannot be treated in terms of gas dynamics. The scattering of particles at an energy of E _o > 20 eV may be explained in terms of binary collisions with the atoms of the target. The validity of the single collision model with free surface atoms for medium energies from 10 to 100 eV and even down to 1 eV was confirmed on the basis of both experimental and computational data. This paper describes experimental studies of the secondary ion emission from the (100) and (110) faces of a Mo single crystal and both experimental and theoretical studies of alkaline ion accommodation coefficient on polycrystalline Mo within the energy range E = 3 to 50 eV with a varying direction of the primary ion beam from normal to the glancing angle of incidence (ρ = 0 to 75°). On the basis of the retarding potential method using a spherical condenser whose central electrode was the target, we measured the energy distribution of secondary ions. Calculations have been performed for the energy of scattered ions and the high energy portion of accommodation coefficient on the basis of single and double binary collisions using the Born-Mayer potential and taking into consideration the influence of adsorption forces at the surface of the target.     

Simulations of C60 bombardment of Si, SiC, diamond and graphite

Molecular dynamics simulations of the 20-keV C₆₀ bombardment at normal incidence of Si, SiC, diamond and graphite targets were performed. The unique feature of these targets is that strong covalent bonds can be formed between carbon atoms from the C₆₀ projectile and atoms in the solid material. The mesoscale energy deposition footprint (MEDF) model is used to gain physical insight into how the sputtering yields depend on the substrate characteristics. A large proportion of the carbon atoms from the C₆₀ projectile are implanted into the lattice structure of the target. The sputtering yield from SiC is ∼twice that from either diamond or Si and this can be explained by both the region of the energized cylindrical tract created by the impact and the number density. On graphite, the yield of sputtered atoms is negligible because the open lattice allows the cluster to deposit its energy deep within the solid. The simulations suggest that build up of carbon with a graphite-like structure would reduce any sputtering from a solid with C₆₀⁺ bombardment.     

高电荷态Krq+与Al表面碰撞发射可见光的研究

利用低速(V≈0.01 V_Bohr)高电荷态Kr^q+ (q=8, 10, 13, 15, 17)离子轰击金属Al表面, 获得了碰撞过程产生的300–600 nm的光谱. 实验结果表明: 低能大流强(μA/cm²量级)离子束入射金属表面, 可产生溅射原子、离子和入射离子中性化后发射的可见光. 随着入射离子势能(电荷态)增加, 碰撞过程中发射谱线的强度增强. 与激发态3d能级相比, 较高的势能可以有效地激发Al原子的电子到较高4s能级. 关键词： 高电荷态离子 可见光发射 离子与表面作用     

The energy distributions of atoms sputtered from HfC

The energy spectra of Hf and C atoms sputtered from an HfC target with a 6 keV Xe⁺ beam have been measured. It was found that the target constituents of widely different masses were sputtered with energy distributions of the same form. The results are compared with the collision cascade theory for compound targets.     

Angular-resolved energy distribution of secondary ions emitted from a silicon target sputtered by a xenon ion beam

This paper reports preliminary results obtained on an experimental apparatus dedicated to the study of angular resolved energy distribution of particles emitted from a sputtered target. Secondary ions emitted during the bombardment of a silicon target by xenon ions at a primary energy of 10keV have been studied. In its low energy part the distribution reaches a maximum around 8eV, and then decreases according to an E ^–1 law. In the range 200eV to 1000eV, a second maximum appears whose height depends on the emission angle. Apart from this range, the angular distributions have a cosine square-like shape. On the contrary, the angular distribution of ions with energy between 200eV and 1000eV is pointed in a forward direction near the specular reflection direction of the ion beam. It is assumed that the measured ions correspond to two ionic populations: secondary ions sputtered according to the linear cascade theory and recoil silicon target ions.     

The dependence of sputtering efficiency on ion energy and angle of incidence

Abstract

Earlier measurements of sputtering efficiency of polycrystalline targets (fraction of impinging ion energy leaving the target through sputtering and backscattering) have been extended to higher energies. Lead and copper targets were bombarded with several different projectiles with energies between 80 and 1200 keV. The sputtering efficiency decreases with increasing energy. This decrease is ascribed to the combined influence of changes in the scattering cross section with energy, and to electronic stopping. The results may be described as a function of the mass ratio M ₂/M ₁ and the reduced energy ? only.

The sputtering efficiency was measured as a function of angle of incidence of the bombarding ions. To ensure complete collection of sputtered and backscattered particles, it was possible to cover only the region of incidence angle from 0° to 45°. Targets of copper, silver, and lead were investigated with 17 different ion-target combinations. The sputtering efficiency increased with angle of incidence. This increase is described well by a simple interpolation formula by Sigmund.     

N2微空心阴极放电特性及其阴极溅射的PIC/MC模拟

采用两维PIC/MCC模型模拟了氮气微空心阴极放电以及轰击离子 (N₂⁺,N⁺) 的钛阴极溅射. 主要计算了氮气微空心阴极放电离子 (N₂⁺,N⁺) 及溅射原子Ti的行为分布, 并研究了溅射Ti 原子的热化过程. 结果表明: 在模拟条件下, 空心阴极效应是负辉区叠加的电子震荡; 在对应条件下, 微空心较传统空心放电两种离子 (N₂⁺,N⁺) 密度均大两个量级, 两种离子的平均能量的分布及大小几乎相同; 在放电空间N⁺的密度约为N₂⁺的1/6, 最大能量约大2倍; 在不同参数 (P, T, V)下, 轰击阴极内表面的氮离子(N₂⁺,N⁺)的密度近似均匀, 其平均能量几乎相等; 从阴极溅射出的Ti原子的初始平均能量约6.8 eV, 离开阴极约0.15 mm处几乎完全被热化. 模拟结果为N₂微空心阴极放电等离子体特性的认识提供了参考依据. 关键词： 微空心阴极放电 PIC/MC模拟 2等离子体')" href="#">N₂等离子体     

Diagnostics of sputtering processes of carbon and carbides by laser-induced fluorescence spectroscopy in the VUV at 166 nm

Measurements of velocity distributions of C, B, and Si atoms released in sputtering processes from graphite and carbide targets bombarded with noble gas ions in the 1 keV range are described. Laser-induced fluorescence spectroscopy in the VUV is applied. The VUV radiation necessary to excite the sputtered atoms is provided by stimulated anti-Stokes Raman scattering (SARS) in H₂. Surface binding energies are derived from measured velocity distributions; concentrations of sputtered particles, fluxes and sputtering yields are determined.     

Angular characteristics of processes of electron detachment from negative ions and hydrogen atoms in gases

The results of experimental measurement of spatial-angular distributions of hydrogen particles (H⁻, H⁰, H⁺) obtained in scattering of a collimated ribbon beam of H⁻ ions and H⁰(1s) atoms in He, Ar, Kr, Xe, H₂, O₂, and CO₂ gas targets for certain values of energy in the range from 0.6 to 15 MeV are reported. The experimental setup and the measurement procedure with an angular resolution of 5×10⁻⁶ rad are described. The angular characteristics of measured distributions, i.e., full width at half maximum and standard deviation, were determined. It is shown that the shape of distribution for a beam of hydrogen atoms produced by neutralization of H⁻ ions in a gas target varies with the type and thickness of the target, and the angular spread is smallest for the H₂ target. The variations in the shape of distribution are due to the contribution of scattering processes without changing the charge of particles.     

Low energy sputtering of neutral Cu2 molecules

The ratios of relative yields of neutral sputtered Cu₂ molecules to neutral sputtered Cu atoms were found to be linearly proportional to the sputtering yield of Cu, from a Cu target under bombardment by Ar⁺ ions (energy 50–90 eV), as determined by secondary neutral mass spectrometry.     

Sputtering—a review of some recent experimental and theoretical aspects

After a brief outline of the present sputtering theory for a random solid, recent results of the sputtering yieldS for polycrystalline targets are discussed, in particular in view of the influence of the projectile mass and the bombarding angle. The angle dependence ofS at low bombarding energies, and results on the angular distribution of sputtered particles for oblique ion incidence point out necessary modifications of present sputtering theories with respect to the anisotropy of the collision cascades in the solid and the influence of the target surface. The energy distribution of the neutral particles ejected along the target normals is related to the theoretically predictedE ^?2-distribution of low energy recoils in the Recent mass spectrometric studies of postionized sputtered neutrals are discussed in view of the formation of sputtered molecules and the application of sputtered neutral mass spectroscopy for surface analysis. Finally, the paper deals with ion-induced surface effects on non-elementary sputtering targets, and the protracted removal of foreign atoms from a matrix.     

On the velocity distribution of excited Fe-atoms by sputtering of iron

From the velocity distribution of excited sputtered particles detailed information on the excitation process can be obtained. In the present paper the first direct measurement of velocity distribution of excited atoms sputtered from a metal target is presented. The irradiation of the Fe-target was performed with 10keV Ar⁺-ions. The sputtered atoms were detected using pulsed laser induced fluorescence (LIF). The sputtered Fe atoms in the metastable statea ⁵ F ₅ at 0.86 eV shows a much broader distribution, than found for the ground-state atoms, but no energy threshold, implied in the statistical excitation models, was found.