Shock waves generated by confined XeCl excimer laser ablation of polyimide

We investigate shock waves generated by excimer laser ablation of sheet polyimide confined in water. The velocities of the ablation-induced pressure waves in the water are determined by an optical probe system. We measure supersonic velocities up to a few hundred microns away from the irradiated surface, indicating the formation of shock waves. We use these velocities to calculate the corresponding pressures. They are already in the kbar range at fluences comparable to the threshold of ablation. The shock pressure varies as the square root of the incident laser fluence, a behavior that is explained by the rapid heating of the confined gaseous products of ablation.The initially planar shock waves propagate, become spherical, and decay within a few hundred microns in the surrounding water to acoustic waves. During spherical expansion the shock pressure drops as the inverse of the square of the propagation distance.The shock waves generated may be relevant in explaining photoacoustic damage observed in biological tissue after excimer-ablation at corresponding irradiances. They may also be important in material processing applications of excimer laser ablation of polymers as they can lead to plastic deformation.     

Influence of laser fluence and irradiation timing of F2 laser on ablation properties of fused silica in F2-KrF excimer laser multi-wavelength excitation process

A collinear irradiation system of F₂ and KrF excimer lasers for high-quality and high-efficiency ablation of hard materials by the F₂ and KrF excimer lasers’ multi-wavelength excitation process has been developed. This system achieves well-defined micropatterning of fused silica with little thermal influence and little debris deposition. In addition, the dependence of ablation rate on various conditions such as laser fluence, irradiation timing of each laser beam, and pulse number is examined to investigate the role of the F₂ laser in this process. The multi-wavelength excitation effect is strongly affected by the irradiation timing, and an extremely high ablation rate of over 30 nm/pulse is obtained between -10 ns and 10 ns of the delay time of F₂ laser irradiation. The KrF excimer laser ablation threshold decreases and its effective absorption coefficient increases with increasing F₂ laser fluence. Moreover, the ablation rate shows a linear increase with the logarithm of KrF excimer laser fluence when the F₂ laser is simultaneously irradiated, while single KrF excimer laser ablation shows a nonlinear increase. The ablation mechanism is discussed based on these results. Received: 16 July 2001 / Accepted: 27 July 2001 / Published online: 2 October 2001     

Pulsed laser deposition—UV laser sources and applications

Progress in material research and processing industry is fueled by the technique of pulsed laser deposition (PLD). High energy excimer lasers enable this technique since every material is amenable to their high photon energies. Spectral properties, temporal pulse and laser beam parameters of state of the art excimer lasers will be compared with frequency converted Nd:YAG lasers. Both quality and longevity of the deposited layers strongly depend on the degree of accuracy achieved in the thin film ablation and subsequent deposition process.     

Effects of excimer laser illumination on microdrilling into an oblique polymer surface

In this work, we present the experimental results of micromachining into polymethy-methacrylate exposed to oblique KrF excimer laser beams. The results of low-aspect-ratio ablations show that the ablation rate decreases monotonously with the increase of incident angle for various fluences. The ablation rate of high-aspect-ratio drilling with opening center on the focal plane is almost independent of incident angles and is less than that of low-aspect-ratio ablation. The results of high-aspect-ratio ablations show that the openings of the holes at a distance from the focal plane are enlarged and their edges are blurred. Besides, the depth of a hole in the samples oblique to the laser beam at a distance from the focal plane decreases with the increase of the distance from the focal plane. The number of deep holes generated by oblique laser beams through a matrix of apertures decreases with the increase of incident angle. Those phenomena reveal the influence of the local light intensity on microdrilling into an oblique surface.     

Dynamics of excimer laser ablation of polyimide determined by time-resolved reflectivity

The time-dependent intensity profile of pulsed KrF excimer laser radiation reflected from polyimide is determined over a range of laser fluences, from well below to above the ablation threshold. The reflected laser beam is truncated once the incident laser radiation exceeds a threshold fluence, i.e., truncation depends on the energy per unit area and not on the intensity, analogous to results for the ablation threshold and the etch depth per pulse. The threshold fluence for pulse truncation corresponds to the onset of ablation. The results indicate that the truncation is not due to laser plasma interactions at these fluences. A general mechanism is discussed involving a time dependent index of refraction.     

Nanosecond pulsed laser ablation of silicon in liquids

Laser fluence and laser shot number are important parameters for pulse laser based micromachining of silicon in liquids. This paper presents laser-induced ablation of silicon in liquids of the dimethyl sulfoxide (DMSO) and the water at different applied laser fluence levels and laser shot numbers. The experimental results are conducted using 15 ns pulsed laser irradiation at 532 nm. The silicon surface morphology of the irradiated spots has an appearance as one can see in porous formation. The surface morphology exhibits a large number of cavities which indicates as bubble nucleation sites. The observed surface morphology shows that the explosive melt expulsion could be a dominant process for the laser ablation of silicon in liquids using nanosecond pulsed laser irradiation at 532 nm. Silicon surface’s ablated diameter growth was measured at different applied laser fluences and shot numbers in both liquid interfaces. A theoretical analysis suggested investigating silicon surface etching in liquid by intense multiple nanosecond laser pulses. It has been assumed that the nanosecond pulsed laser-induced silicon surface modification is due to the process of explosive melt expulsion under the action of the confined plasma-induced pressure or shock wave trapped between the silicon target and the overlying liquid. This analysis allows us to determine the effective lateral interaction zone of ablated solid target related to nanosecond pulsed laser illumination. The theoretical analysis is found in excellent agreement with the experimental measurements of silicon ablated diameter growth in the DMSO and the water interfaces. Multiple-shot laser ablation threshold of silicon is determined. Pulsed energy accumulation model is used to obtain the single-shot ablation threshold of silicon. The smaller ablation threshold value is found in the DMSO, and the incubation effect is also found to be absent.     

Synthesis of DLC films by PLD from liquid target and dependence of film properties on the synthesis conditions

DLC (Diamond-like carbon films) were prepared by pulsed laser ablation of a liquid target at substrate temperatures from 18 to 600°C using 248 nm KrF excimer laser. The sp³ hybridization state carbon formation was additionally promoted by gaseous H₂O₂ flow through the reaction chamber and substrate excitation by the same laser beam. Deposited DLC films were characterised by Raman scattering spectroscopy and atomic force microscopy (AFM). Comparative AFM and Raman study shows that the increase in the content of sp³ type bonding in DLC is in correlation with the increase of the surface roughness of the samples prepared.     

Critical role of laser wavelength on carbon films grown by PLD of graphite

The structure of thin films deposited by pulsed laser ablation (PLD) is strongly dependent on experimental conditions, like laser wavelength and fluence, substrate temperature and pressure. Depending on these parameters we obtained various kinds of carbon materials varying from dense, mainly tetrahedral amorphous carbon (ta-C), to less compact vertically oriented graphene nano-particles. Thin carbon films were grown by PLD on n-Si 〈100〉 substrates, at temperatures ranging from RT to 800°C, from a rotating graphite target operating in vacuum. The laser ablation of the graphite target was performed by a UV pulsed ArF excimer laser (λ=193 nm) and a pulsed Nd:YAG laser, operating in the near IR (λ=1064 nm). The film structure and texturing, characterised by X-ray diffraction analysis, performed at grazing incidence (GI-XRD), and the film density, evaluated by X-ray reflectivity measurements, are strongly affected both by laser wavelength and fluence and by substrate temperature. Micro-Raman and GI-XRD analysis established the progressive formation of aromatic clusters and cluster condensation into vertically oriented nano-sized graphene structures as a direct function of increasing laser wavelength and deposition temperature. The film density, negatively affected by substrate temperature and laser wavelength and fluence, in turn, results in a porous bulk configuration and a high macroscopic surface roughness as shown by SEM characterisation. These structural property modifications induce a relevant variation also on the emission properties of carbon nano-structures, as evidenced by field emission measurements. This work is dedicated to our friend Giorgio who passed away 20th August.     

Ablated gratings on borosilicate glass by 193-nm excimer laser radiation

Relief gratings of 500-nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation through the use of an excimer laser, at a wavelength of 193-nm, and a modified Mach-Zehnder interferometer. The grating fabrication process has been quantified by the use of diffraction efficiency measurements and atomic force microscope microscans and is related to the incident energy density.     

Comparative study between IR and UV laser radiation applied to the removal of graffitis on urban buildings

The present article focuses on a comparison between cleaning process of graffitis on urban buildings by using laser radiation at 308 nm (XeCl excimer laser) and 1064 nm (Nd:YAG laser). Laser-induced breakdown spectroscopy (LIBS) elemental analysis was applied as real-time diagnostic technique, safeguarding against possible damage of the substrate during ablation rate studies. The morphological analysis of the etched surfaces by optical microscopy and environmental scanning electron microscopy reveals remarkable features of interest to understand the wavelength dependence of the ablation efficiency. The ablation threshold fluences of different paints sprayed on several substrates were determined applying a photoacoustic technique. To remove graffitis from urban buildings the laser radiation at 1064 nm was observed to be the most efficient wavelength, supporting the best result.     

Effect of scanning resolution and fluence fluctuation on femtosecond laser ablation of thin films

Femtosecond-pulse laser pulses have been shown to hold great potential for high-precision micromachining. Much research has been done to characterize the laser parameters for predicting the feature size, and the most important of these is the number of pulses incident at each point of ablation. Theoretical modeling, so far, has been restricted to a single point where the number of pulses incident at each point of ablation depends on the pulse-repetition rate and the dwell time of the laser beam at that machining point. However, to make the theoretical model useful, a laser scanning system with the ability to fabricate complex microfeatures is considered in this work. In this case, the scanning resolution determines the number of pulses incident at each scanning point. This has been taken into account while presenting a theoretical and experimental analysis of the effect of the scanning resolution on the threshold fluence of the material. Results of ablation on a gold thin film were subjected to theoretical analysis to predict the feature size. In addition, the effect of the energy fluctuation of the laser on the feature size has been evaluated to predict the minimum achievable feature size for a gold thin film. PACS 42.65; 61.80     

Viscous liquid expulsion in nanosecond UV laser ablation: From “clean” ablation to nanostructures

This paper reviews recent results on modeling UV nanosecond laser ablation. Particular attention is given to a viscous liquid flow driven by ablation pressure. Based on the analysis of the Navier-Stokes equation, various strongly different manifestations of this phenomenon are explained. These are (i) a “clean” laser ablation, when the laser spot has a clean sharp spot border free of resolidified melt dross; (ii) a new form of material removal in laser ablation, expulsion on a poly(methyl methacrylate) target of long (up to 1 mm) nanofibers with a radius about 150–200 nm to the exterior of the spot under the action of a single pulse of a KrF excimer laser; and (iii) a new method of laser surface nanostructuring, the formation of a surface foam having a structure of micropores interconnected by nanofilaments with diameters of about 100 nm as a result of single-pulse KrF laser ablation of biopolymer films.     

Measurement of the elastic properties of evaporated C60 films by surface acoustic waves

Surface Acoustic Wave (SAW) pulses were excited in C₆₀ films deposited on quartz and silicon substrates using pulses from excimer lasers with wavelengths of 248 nm and 308 nm for excitation. An optical beam-deflection technique and polymer electret transducers were utilized to detect the propagation of the SAW pulse with high spatial and temporal resolution, allowing an accuracy of better than 0.1% for SAW velocity measurements. With this technique the frequency dependence of the SAW velocity was determined for a number of fullerite films and density, as well as elastic bulk properties of the films were derived by a theoretical analysis of the dispersion effect.     

Micro patterning of fused silica by laser ablation mediated by solid coating absorption

Precise patterning by laser ablation requires sufficient absorption. For weak absorbers like fused silica indirect methods using external absorbers have been developed. A novel approach using a solid SiO absorber coating is described. Irradiation by an ArF excimer laser (wavelength 193 nm) is leading to ablation of the coating and, at sufficiently high fluence, of the fused silica substrate. The remaining coating in the unexposed areas is removed afterwards by large area irradiation. The fluence threshold for substrate ablation using a 28 nm thick absorber layer is about 1.1 J/cm². Single pulse ablation rates of up to 800 nm and a surface roughness of R _a<5 nm are obtained. High resolution grating patterns with 400 nm period and a modulation depth of 80 nm are possible. The process can be described as controlled plasma mediated ablation.     

Effect of vapor attenuation in surface ablation of cobalt by pulsed UV laser

Numerical calculations based on a thermal model were presented, which describe the process of target heating and ablation of cobalt during irradiation by 30-ns laser pulses at 308 nm. The attenuation of laser by vapor has been taken into account in this model. As results of the calculations, the temperature distribution beneath the target surface and the temporal evolution of surface temperature were given. The dependence of ablation rate on laser fluence was also studied based on this model. The surface ablation of cobalt with pulsed excimer laser was investigated experimentally. Our model considering proper vapor attenuation has shown to be in good agreement with the experimental results. Received: 20 January 2000 / Accepted: 13 March 2000 / Published online: 5 July 2000     

自注入式可变短脉冲准分子激光器的理论分析

给出自注入式可变短脉冲准分子激光器运转和设计的理论基础，研究了其运行特征，设计和分析了一般商用器件实现运转要求具有的基本参数条件和实现可能。分析结果与国外最新实验结果具有较好的一致性，可用于指导器件的设计和实验，以及作为确定改善方向的基础。     

Theoretical determination of the ablation rate of metals in multiple-nanosecond laser pulses irradiation regime

A detailed understanding of the physical determinants of the ablation rate in multiple nanosecond laser pulses regime is of key importance for technological applications such as patterning and pulsed-laser deposition. Here, theoretical modeling is employed to investigate the ablation of thick metallic plates by intense, multiple nanosecond laser pulses. A new photo-thermal model is proposed, in which the complex phenomena associated to the ablation process are accounted for as supplementary terms of the classical heat equation. The pulsed laser ablation in the nanosecond regime is considered as a competition between thermal vapourization and melt ejection under the action of the plasma recoil pressure. Computer simulations using the photo-thermal model presented here and the comparison of the theoretical results with experiment indicate two different mechanisms that contribute to the decrease of the ablation efficiency. First, during the ablation process the vapour/plasma plume expanding above the irradiated target attenuates the laser beam that reaches the sample, leading to a marked decrease of the ablation efficiency. Additional attenuation of the laser beam incident on the sample is produced due to the heating of the plasma by the absorption of the laser beam into the plasma plume. The second mechanism by which the ablation efficiency decreases consists of the reduction of the incident laser intensity with the lateral area, and of the melt ejection velocity with the depth of the hole.     

Zinc oxide nanostructures grown by pulsed laser deposition

We report the use of PLD to grow different ZnO nanostructures. Very different film morphologies have been observed using different laser wavelengths to ablate the target. The influence of substrate temperature and oxygen background pressure on the film morphology has been investigated too. Smooth and rough films, hexagonal pyramids and columns have been obtained by using a KrF excimer laser (248 nm) for the target ablation, while hexagonal hierarchical structures and pencils have been obtained by using ArF (193 nm). Photoluminescence and X-ray diffraction measurements revealed the good quality of the samples, in particular of those deposited using the ArF laser beam.