关于闭合及偏置PCM结构约束带状电子注可行性的研究

通过理论分析和数值计算证明了闭合PCM结构可以在窄边和宽边两个横方向上对接近真实情形的带状注束流进行有效约束,实现电子注的长距离稳定传输.提出了匹配电子注宽边方向横向磁聚焦力与带状注内空间电荷力的方法,这可用于确定闭合PCM聚焦结构的纵向周期长度以及截面尺寸.所做计算还显示出闭合PCM结构横截面的宽边方向尺度可以独立调节以达到最优的匹配.此外,进一步证明了偏置PCM结构不能有效约束带状电子注.本工作表明闭合PCM结构用于限制带状注束流具有很大潜力并且有助于指导实际的工程实践.     

Electro-flow focusing: the high-conductivity low-viscosity limit

Electro-flow focusing, a technique combining the features of electrospray (ES) and flow focusing (FF), provides a reliable tool to reach parametrical microjetting ranges not attainable by ES or FF alone under specific operational regimes (liquid properties and flow rate). In this Letter, we provide not only a closed theoretical model predicting the diameter of a high electrical conductivity electro-flow focused liquid microjet, but also its convective or absolute instability, linked to the jetting-to-dripping transition and the minimum liquid flow rate that can be ejected in steady jetting regime, in which the smallest droplets are issued. Good agreement is found with experimental values.     

Toward the subdiffraction focusing limit of optical superresolution

A superresolving three-zone plate is applied to a Fresnel diffractive lens. It is shown that for radial incident polarization this combination produces a focal spot approaching superresolution allowed subdiffractive limit of 0.36lambda/NA for focusing. For media responsive to longitudinal field component only, our phase engineering scheme results in a focal spot size of 0.368lambda/NA. When used with a solid immersion lens, the scheme can generate the smallest focal spot available for passive optics.     

Electrostatic electron focusing in the betatron

The possibility of using the field generated by electrostatic quadrupole electrodes to increase the focusing force in the working chamber of a betatron is considered. It is shown that with a number of quadrupoles N 3 focusing in the axial direction, for an equal number of quadrupoles focusing in the radial direction at electrode voltage U 15 kV during injection and the initial stage of the cycle an increase in focusing force to the limits of rigid focusing is possible. Experimental testing was performed with an operating betatron. A pair of electrodes with azimuthal extent of 26° located above and below the beam being accelerated was used, with the second electrode pair formed by the conductive chamber coating. An increase in radiation intensity of 30% was achieved.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 5, pp. 81–85, May, 1984.     

Tight focusing of spirally polarized vortex beams

The tight focusing of spirally polarized focused vortex beams is analyzed numerically based on the vectorial Debye theory. The expressions for the electric field and the orbital angular momentum of focused beams are derived. It is shown that the intensity distribution in the focal plane is dependent on the specific spirally polarized state and the coefficient of the spiral polarization function. By presenting the phase contours of the component polarized in the radial direction, it is found that the radii of dislocation lines will increase with the increase of the power of the spirally polarization function. It is reveled that the same orbital angular momentum can be obtained for different spirally polarized state at certain distance along the propagation direction in the focal region. Besides, the orbital angular momentum distributions for different polarized states have fewer crossover points with each other for higher topological charge. The influence of the spirally polarized state on the orbital angular momentum in the focal plane is also studied.     

Electrostatic focusing of intense charged particle beams

Methods of forming solutions of the Maxwell equations for an electric field concerning the problem of focusing intensive charged particle beams are considered.     

Flat electron beams

Electrons from a source in a solenoidal magnetic field emerge from that field with a characteristic angular momentum. This behavior can be used to produce a flat ribbon-like electron beam with zero thickness (to first order). We show that this can be done using a quadrupole triplet and provide analytical expressions for the focal length of each lens. Solutions can be found over a wide range of practical values of the parameters.     

轴对称矢量光束聚焦特性研究现状及其应用

轴对称矢量光束是一种空间非均匀偏振光束, 中心光强为零, 经物镜聚焦后能在焦点附近产生空间场分量. 在高变迹系数光学系统成像情况下, 与线偏光、圆偏光相比, 径向偏振光与光瞳滤波技术及图像复原技术结合, 能获得较小焦斑, 提高横向分辨力. 介绍了轴对称矢量光束的特性, 基于电偶极子辐射模型和矢量衍射理论研究了轴对称矢量光束经高数值孔径物镜聚焦后的特性, 系统介绍了基于轴对称矢量光束实现光斑紧聚焦的几种方法, 并简述了轴对称矢量光束在差动共焦超分辨成像领域的研究设想. 关键词： 差动共焦显微技术 紧聚焦 光瞳滤波 轴对称矢量光束     

Aspherical lens shapes for focusing synchrotron beams

Aspherical surfaces required for focusing collimated and divergent synchrotron beams using a single refractive element (lens) are reviewed. The Cartesian oval, a lens shape that produces perfect point‐to‐point focusing for monochromatic radiation, is studied in the context of X‐ray beamlines. Optical surfaces that approximate ideal shapes are compared. Results are supported by ray‐tracing simulations. Elliptical lenses, rather than parabolic, are preferred for nanofocusing X‐rays because of the higher peak and lower tails in the intensity distribution. Cartesian ovals will improve the gain when using high‐demagnification lenses of high numerical aperture.     

强流电子束聚焦数值模拟

采用粒子模拟（PIC）方法模拟了强流电子束在薄磁透镜中的聚焦。建立了强流电子束的聚焦模型,模拟了神龙一号加速器某次实验的结果,得到的模拟结果非常接近实验值,证明采用建立的PIC模型模拟强流束经过磁透镜时的聚焦是可信的。应用此模型模拟了电子束参数（入射半径、发射度、能散度、相位角等）对焦斑直径的影响, 结果表明：在模拟条件下,电子束平行入射时最佳束包络半径位于20.0~22.5 mm;发射度和能散度对焦斑直径的影响和理论公式吻合得较好;只有入射电子束包络半径和相位角匹配时才能得到小的焦斑直径。     

双近贴聚焦微光像增强器分辨力理论极限问题研究

分辨力和MTF是微光像增强器的2个重要参数。根据线性系统傅里叶频谱理论,分析了微光像增强器的MTF和分辨力特性。 计算出理想条件下,基于光阴极/MCP/荧光屏3部件结构以及带内电子增益机制的光阴极/荧光屏2部件结构的近贴聚焦像管的理论极限分辨力。它们分别是96.6lp/mm和98.1lp/mm。该结果可供人们改进像管MTF及分辨力特性时参考。     

On focusing of terahertz radiation beams and pulses

We show that, for terahertz (THz) radiation, the effective focal length of a lens differs significantly from its geometrical-optics (nominal) focal length. As a pulse of THz radiation with a bell-shaped (Gaussian) transverse profile is incident on a lens, the field-amplitude distribution in the nominally focal plane of the lens may radically change, up to the formation of dips in the paraxial region. These changes in the spatiotemporal shape of the beam (pulse) may considerably distort the results of pulsed THz spectroscopy. These distortions can be minimized by using media with anomalous dispersion, including metamaterials.     

Tight focusing of axially symmetric polarized vortex beams

Tight focusing of axially symmetric polarized vortex beams is studied numerically based on vector diffraction theory. The mathematical expressions for the focused fields are derived. Simulation results show that the focused fields and phase distributions at focus are largely influenced by both the polarization order and topological charge of the incident beams. Moreover, focal spots with flat-topped or tightly-focused patterns can be flexibly achieved by carefully choosing the polar- ization order and the topological charge, which confirms the potential of such beams in wide applications, such as optical tweezers, laser printing, lithography, and material processing.     

强流电子束聚焦数值模拟

采用粒子模拟（PIC）方法模拟了强流电子束在薄磁透镜中的聚焦。建立了强流电子束的聚焦模型,模拟了神龙一号加速器某次实验的结果,得到的模拟结果非常接近实验值,证明采用建立的PIC模型模拟强流束经过磁透镜时的聚焦是可信的。应用此模型模拟了电子束参数（入射半径、发射度、能散度、相位角等）对焦斑直径的影响, 结果表明:在模拟条件下,电子束平行入射时最佳束包络半径位于20.0~22.5 mm;发射度和能散度对焦斑直径的影响和理论公式吻合得较好;只有入射电子束包络半径和相位角匹配时才能得到小的焦斑直径。     

New limit on the electron electric dipole moment

We present the result of our most recent search for T violation in 205Tl, which is interpreted in terms of an electric dipole moment of the electron d(e). We find d(e) = (6.9 +/- 7.4)x10(-28)e cm, which yields an upper limit /d(e)/ < or = 1.6x10(-27)e cm with 90% confidence. The present apparatus is a major upgrade of the atomic beam magnetic-resonance device used to set the previous limit on d(e).