New method for measuring beam profiles using a parametric X-ray pinhole camera

We propose a new method for measuring electron beam profiles using parametric X-ray radiation. In this method, a pinhole is placed between the source of parametric X-ray radiation and a two-dimensional X-ray detector, and the beam profile can be reconstructed on the detector, i.e., based on the principle of a pinhole camera. The profiles are in good agreement with the results obtained using a standard method with optical transition radiation. This method may prove useful to measure profiles of electron beams with short bunch lengths in recent advanced linear accelerators.     

13.9 nm马赫贞德干涉仪用软X射线分束镜研究

 介绍了13.9 nm马赫贞德干涉仪用软X射线分束镜的设计、制备与性能检测。基于分束镜反射率和透过率乘积最大的评价标准,设计了13.9 nm软X射线激光干涉实验用多层膜分束镜。采用磁控溅射方法在有效面积为10 mm×10 mm、厚度为100 nm的Si3N4基底上镀制了Mo/Si多层膜,制成了多层膜分束镜。利用X射线掠入射衍射的方法测量了Mo/Si多层膜的周期。用扩束He-Ne激光束进行的投影成像方法定性分析了分束镜的面形精度,利用光学轮廓仪完成了分束镜面形精确测量。利用北京同步辐射装置测量了分束镜反射率和透射率,在13.9 nm处,分束镜反射率和透过率乘积达4%。使用多层膜分束镜构建了软X射线马赫贞德干涉仪,并应用于13.9 nm软X射线激光干涉实验中,获得了清晰的含有C8H8等离子体电子密度信息的动态干涉条纹。     

利用光学渡越辐射进行强流束诊断

 描述了光学渡越辐射用于束流诊断的理论依据，介绍了利用光学渡越辐射对18MeV，2.7kA的强流脉冲电子束进行诊断的实验方案。在解决了在强流束测量中强背景干扰等问题后，获得了光学渡越辐射的特征图案，据此测量了强流脉冲束的剖面、能量、发散角和发射度。初步的实验结果表明，光学渡越辐射方法是强流束诊断的一种有效手段。     

Determining the divergence of an ultra-relativistic electron beam from the diffracted transition radiation in a single-crystal target

We have studied the possibilities of using diffracted transition radiation excited by a relativistic electron beam in a single-crystal target to determine the beam divergence. For this purpose, we investigated the expressions we had previously derived that describe the angular density of diffracted transition radiation excited by a relativistic electron beam crossing a thin single-crystal plate. In our calculations, we used the two-parameter model distribution function to represent the angular distribution of ultra-relativistic electrons in the beam. For determining the beam divergence parameters, the methods of two-dimensional objective function minimization were used. The model calculations we performed confirm the efficiency of the above-mentioned methods for determining the divergence of a relativistic electron beam.     

13.9nm软X射线激光用大面积多层膜分束镜研制

 基于分束镜反射率和透射率的乘积为衡量标准的原则,设计了13.9nm软X射线激光干涉测量所需的多层膜分束镜，用磁控溅射法在有效面积达10mm×10mm，厚100nm的氮化硅窗口上镀制Mo/Si多层膜,实现了分束镜制作。用表面轮廓仪实测分束镜面形精度达到nm量级，同步辐射反射率计测试表明,分束镜的反射率和透射率乘积约4%。     

三种高密度强流束亮度测量技术

利用已经建成的4 MeV LIA注入器,结合时间分辨测量系统研究了三种测量技术：发射度测量法、无场准直器和磁场准直器测量法。介绍了强流束亮度定义和典型方法理论分析及测量技术的物理概念,提出了用于猝发多脉冲电子束发射度测量装置的设计与调试,通过对时间分辨测量系统的分幅相机记录的光强度分布信息处理,得到电子束束斑均方根半径和发射角,分析某一时刻数据,即可得到电子束某一时刻发射度,从而获得多脉冲电子束时间分辨发射度。在4 MeV LIA注入器上对多脉冲电子束流的发射度进行测量,得到电子束归一化均方根发射度约为114 mmmrad、双脉冲456 mmmrad的归一化发射度。最后结合电子束的高斯分布初步分析并给出均方根发射度、实测发射度和边发射度的关系。     

光学渡越辐射测量中能量分辨精度分析

 基于光学渡越辐射原理的用于高能强流电子束束流参数在线测量及诊断系统,具有时间响应快、分辨率高等特点,可以测量电子束的束剖面、发散角、能量等多个参数。分析了测量系统的结构参数（包括了透镜的焦距、成像面位置、CCD像元尺寸）对电子束能量测量精度的影响,并在理论上模拟了电子束的发散角的影响。还根据系统数据的特点,阐述了数据噪声对能量测量结果精度的影响,指出了光学渡越辐射测量中电子束能量分辨精度受到多种因素的影响,需要在数据处理时考虑修正。     

合肥光源逐圈束流位置监测系统中的定时系统

定时系统是合肥光源逐圈束流位置监测和相空间测量系统中的重要组成部分，其主要目的是为数据采集卡提供与环内电子束团同步的时钟信号。该系统包含高速ECL时钟成形、分频电路、程控延时电路、控制模块等部分。可实现延时范围0～220ns，最小延时步距0.5ns，调整精度0.1ns，时钟抖动小于200ps。系统控制软件基于客户/服务器结构，操作灵活、方便。     

光束质量因子测量的不确定度分析

 介绍了激光光束质量因子的定义以及测量原理,分析了光束质量因子的数学模型中各个量的不确定度来源以及评定方法,并以实验数据为基础,对具体的实验数据进行了分析计算。提出了减小激光光束质量因子测量不确定度的途径,包括统一激光束直径的确认方法,保证测量条件的稳定以及提高光束质量测量系统的测量精度等。     

X射线TICT在复合材料工件检测中的射束硬化拟合校正研究

X射线TICT中,X射线透射物质时,发生了能谱硬化现象。使图像重建时出现伪影。因此必须进行修正。文中对X射线硬化现象进行了分析,探讨了X射线TICT在检测复合材料工件中, X射线射束和与透射厚度的关系, 并根据Beer定律和X射线与物质作用的特点, 通过获取X射线射束和数据,首先拟合出射束和与透射厚度的关系式, 然后推导出X射线射束和校正为单色射线射束和的等效厚度与透射厚度的关系及其等效方法, 最终得出X射线TICT在检测复合材料工件中X射线等效单色射线的衰减系数的射束硬化拟合值, 再对此衰减系数拟合值进行卷积反投影重构, 即可有效消除X射线TICT在检测复合材料工件中射束硬化造成的影响。     

Longitudinal phase-space coating of beam in a storage ring

In this Letter, I report on a novel scheme for beam stacking without any beam emittance dilution using a barrier rf system in synchrotrons. The general principle of the scheme called longitudinal phase-space coating, validation of the concept via multi-particle beam dynamics simulations applied to the Fermilab Recycler, and its experimental demonstration are presented. In addition, it has been shown and illustrated that the rf gymnastics involved in this scheme can be used in measuring the incoherent synchrotron tune spectrum of the beam in barrier buckets and in producing a clean hollow beam in longitudinal phase space. The method of beam stacking in synchrotrons presented here is the first of its kind.     

A Real-time System For Measuring Spot Size of High Energy Accelerator Using Thick Pinhole Imaging

In order to easily measure the beam spot size of high energy electron accelerators with internal target enclosed,a real–time system, based on thick pinhole imaging technique, is employed. The experimental result on a 15MeV electron linear accelerator is also presented. In this paper the principle of thick pinhole imaging and the processing of data are introduced. The usual "sandwich" method needs to develop X-ray films, while debugging the accelerator parameters it will take a lot of time. On the contrary, X–ray pinhole imaging method can make a real–time measuring: as the accelerator parameters change, we can observe the beam profile's variation on the computer screen. Then when debugging we can have a definite object in view, and adjust the accelerator parameters more efficiently.     

Telescope illumination and beam measurements for submillimeter astronomy

Submillimeter receivers which operate in the highest frequency atmospheric windows must still be mounted on large infrared and optical telescopes. Finding the optimum submillimeter wave illumination for these large telescopes is simplified by their effectively perfect optical surfaces and long focal lengths, but is complicated by telescope optics which have been optimized for non-tapered beams. In order to determine the effects of changing illumination edge taper, we calculated idealized aperture and beam efficiencies for telescopes which are used for submillimeter astronomical observations. The optimum illumination edge taper for the large infrared telescopes is near 10 dB, somewhat less than for classical radio telescopes, and is not very critical as long as it is between 10 and 13 dB.We also present an accurate method for measuring the sizes of, and deviations from, Gaussian beam pattern distributions by using astronomical sources which have sizes comparable with the beam.     

Complex elemental analysis of heterogeneous objects

A complex method of local microanalysis of samples, in which the analysis conditions depend on the orientation of the boundaries of heterogeneous objects, has been considered. X-ray and electron spectroscopy methods are simultaneously used. Application of special instrumental methods for recording X-ray and electron spectra makes it possible to determine the elemental composition of samples in cuts and near interphase boundaries with a high accuracy. Such a possibility is realized due to the development of a method and equipment providing simultaneous recording secondary radiations in two mutually opposite directions with a change in the azimuthal direction with respect to the point of analysis, without loss of the beam positioning point, through application of microtomography.     

Damage behavior and atomic migration in MgAl2O4 under an 80 keV scanning focused probe in a STEM

With the dramatic improvement in the spatial resolution of scanning transmission electron microscopes over the past few decades, the tolerance of a specimen to the high-energy electron beam becomes the limiting factor for the quality of images and spectra obtained. Therefore, a deep understanding of the beam irradiation processes is crucial to extend the applications of electron microscopy. In this paper, we report the structural evolution of a selected oxide, MgAl₂O₄, under an 80 keV focused electron probe so that the beam irradiation process is not dominated by the knock-on mechanism. The formation of peroxyl bonds and the assisted atomic migration were studied using imaging and electron energy-loss spectroscopic techniques.     

Research and development of an electron beam focusing system for a high-brightness X-ray generator

A new type of rotating anticathode X-ray generator, where an electron beam of up to 60 keV irradiates the inner surface of a U-shaped Cu anticathode, has achieved a beam brilliance of 130 kW mm(-2) (at 2.3 kW). A higher-flux electron beam is expected from simulation by optimizing the geometry of a combined-function-type magnet instead of the fringing field of the bending magnet. In order to minimize the size of the X-ray source the electron beam has been focused over a short distance by a new combined-function bending magnet, whose geometrical shape was determined by simulation using the Opera-3D, General Particle Tracer and CST-STUDIO codes. The result of the simulation clearly shows that the role of combined functions in both the bending and the steering magnets is important for focusing the beam to a small size. FWHM sizes of the beam are predicted by simulation to be 0.45 mm (horizontal) and 0.05 mm (vertical) for a 120 keV/75 mA beam, of which the effective brilliance is about 500 kW mm(-2) on the supposition of a two-dimensional Gaussian distribution. High-power tests have begun using a high-voltage 120 kV/75 mA power supply for the X-ray generator instead of 60 kV/100 mA. The beam focus size on the target will be verified in the experiments.     

Fabrication of Silicon-Blazed Gratings for Couplers

To our knowledge, no blazed grating has been fabricated in silicon (Si) at a pitch of less than half a micron. In this article, we report the fabrication of Si-blazed gratings at the period of 400 nm, using electron beam lithography and ion beam etching techniques. The blazed grating is extremely useful as a grating coupler in integrated optics, operating at the telecommunication wavelength of 1.3 mum, because very high output efficiency of the grating coupler is expected. This will allow coupling to thin film devices in silicon, previously not regarded as promising because coupling to them was very inefficient.     

13.9 nm马赫贞德干涉仪用软X射线分束镜研究

介绍了13.9 nm马赫贞德干涉仪用软X射线分束镜的设计、制备与性能检测。基于分束镜反射率和透过率乘积最大的评价标准,设计了13.9 nm软X射线激光干涉实验用多层膜分束镜。采用磁控溅射方法在有效面积为10 mm×10 mm、厚度为100 nm的Si3N4基底上镀制了Mo/Si多层膜,制成了多层膜分束镜。利用X射线掠入射衍射的方法测量了Mo/Si多层膜的周期。用扩束He-Ne激光束进行的投影成像方法定性分析了分束镜的面形精度,利用光学轮廓仪完成了分束镜面形精确测量。利用北京同步辐射装置测量了分束镜反射率和透射率,在13.9 nm处,分束镜反射率和透过率乘积达4%。使用多层膜分束镜构建了软X射线马赫贞德干涉仪,并应用于13.9 nm软X射线激光干涉实验中,获得了清晰的含有C8H8等离子体电子密度信息的动态干涉条纹。     

Fabrication of Silicon-Blazed Gratings for Couplers

To our knowledge, no blazed grating has been fabricated in silicon (Si) at a pitch of less than half a micron. In this article, we report the fabrication of Si-blazed gratings at the period of 400 nm, using electron beam lithography and ion beam etching techniques. The blazed grating is extremely useful as a grating coupler in integrated optics, operating at the telecommunication wavelength of 1.3 mum, because very high output efficiency of the grating coupler is expected. This will allow coupling to thin film devices in silicon, previously not regarded as promising because coupling to them was very inefficient.     

Atomic Beam Density Measurement for Spectroscopic Investigations

This paper presents a simple and effective method for obtaining the beam density, that is the number of atoms per unit volume of the beam, by measuring the change in the electrical resistance of a uniform strip of iron which is placed in the beam.