Simultaneous optical measurement of Ge-content and carbon doping in strained epitaxial SiGe films

We use a novel analytical technique, previously shown to be able to decouple germanium and boron contents, to measure simultaneously the germanium and carbon contents of a set of carbon-doped epitaxial SiGe films. The method is based on the use of “perturbation functions” to account empirically for the effects that the dopant has upon the fundamental dielectric functions of the material. To demonstrate the technique, a matrix of 10 wafers having variation in both germanium and carbon contents was analyzed. Neglecting the presence of carbon led to large errors in germanium content, whether measured optically or by X-ray diffraction (XRD). However, using the new method the thickness, germanium and carbon contents could be derived together and very good agreement was obtained between measurements on a production-grade optical metrology tool and measurements by secondary ion mass spectrometry (SIMS). To verify the production-worthiness of the approach used, results from two different production metrology tools (i.e. two Therma-Wave Opti-Probe 5220 tools) were compared and some repeatability testing was also performed. The method holds great promise for improving run-to-run process control for advanced epitaxy processes.     

pn结电容-电压法测量应变SiGe禁带宽度

利用应变SiGe/Si异质pn结电容-电压（C-V）特性确定SiGe禁带宽度的技术.该技术根据SiGe/Si异质pn结C-V实验曲线，计算出 pn结接触电势差，并得到SiGe/Si的价带偏移量和导带偏移量，进而求得SiGe禁带宽度.该技术测试方法简便，其过程物理意义清晰，既适用于分立的SiGe/Si异质pn结，也可直接分析SiGe/Si异质结器件中的SiGe 禁带宽度.实验结果与理论计算及其他相关文献报道的结果符合较好. 关键词： SiGe/Si 异质pn结 C-V 禁带宽度     

重掺B对应变SiGe材料能带结构的影响

硅锗异质结双极晶体管(SiGe HBT)一般以重掺硼(B)的应变SiGe层作为基区.精确表征SiGe材料能带结构对SiGe HBT的设计具有重要的意义.在应变SiGe材料中，B的重掺杂一方面会因为重掺杂效应使带隙收缩，另一方面，B的引入还会部分补偿Ge引起的应变，从而改变应变引起的带隙变化.在重掺B的应变SiGe能带结构研究中，采用半经验方法，考虑了B的应变补偿作用对能带的影响，对Jain-Roulston模型进行修正，并分析了重掺杂引起的带隙收缩在导带和价带的分布.     

Weak electron acoustic double layers in a multicomponent plasma

Formation of electron acoustic double layers in a magneto-plasma with two ion species is investigated. The existence of double layers propagating almost perpendicular to the magnetic field in a plasma with two distinct ion species and cold electron is discussed.     

分子束外延生长SiGe合金中位错密度的研究

Schimmel腐蚀液腐蚀结合高倍光学显微镜观察发现，不同尺寸的掩膜窗内生长的SiGe外延层中的位错密度在整个外延层中从SiGe/Si界面到SiGe外延层表面由少到多，再由多到少明显地分成3个区，无掩膜窗限制的大面积区内的SiGe层则只呈现2个区，掩膜材料与掩膜窗尺寸不同，这3个区的位错密度也不同，掩膜形成过程中产生的应力对衬底晶格的影响，以及掩膜边界对衬底与外延层的影响是造成这种不同的根本原因。     

2D strain measurement in sub-10 nm SiGe layer with dark-field electron holography

In this paper, we carried out the two-dimensional (2D) strain measurement in sub-10 nm SiGe layer; images were obtained by dark-field electron holography (DFEH). This technique is based on transmission electron microscopy (TEM), in which dark-field holograms were obtained from a (400) diffraction spot. The measured results were compared to the X-ray diffraction (XRD) results in terms of the strain value and the depth of strain distribution in a very thin SiGe layer. Subsequently, we were able to successfully analyze the 2D strain maps along the [100] growth direction of the nanoscale SiGe region. The strain was measured and found to be in the range of 1.8–2.4%. The strain precision was estimated at 2.5 × 10⁻³. As a result, the DFEH technique is truly useful for measuring 2D strain maps in very thin SiGe layers with nanometer resolution and high precision.     

Electron spin resonance of the two-dimensional metallic state and the quantum Hall state in a Si/SiGe quantum well

We report electrically detected electron spin resonance (ESR) measurements of a high mobility two-dimensional (2D) electron system formed in a Si/SiGe quantum well, with millimeter wave in a high magnetic field . The negative ESR signal observed under an in-plane magnetic field gives direct evidence that the spin polarization leads to a resistance increase in the 2D metallic state. Suppression of spin decoherence was observed in the quantum Hall state at the Landau level filling factor ν=2. Strength of the nuclear magnetic field in the resonance is evaluated to be less than , much smaller than that reported for GaAs/AlGaAs heterostructures.     

1 MeV电子辐照对短波Hg1-xCdxTe光伏探测器的影响

 研究了1 MeV电子辐照对短波Hg_1-xCd_xTe光伏探测器的影响。通过测试电子辐照前后光伏探测器的响应光谱、信号、噪声、暗电流等性能参数，分析了电子辐照对Hg_xCdxTe光伏器件的影响机制。实验结果发现：电子辐照后器件响应光谱在短波处有变窄的趋势，但响应峰值波长和截止波长基本无变化；随着辐照剂量的增加，通过p-n结的暗电流有所增加，光伏器件的探测率有减小的趋势。     

Practical aspects of strain measurement in thin SiGe layers by (0 0 4) dark-field electron holography in Lorentz mode

Dark-field electron holography (DFEH) is a powerful transmission electron microscopy technique for mapping strain with nanometer resolution and high precision. However the technique can be difficult to set up if some practical steps are not respected. In this article, several measurements were performed on thin Si_(1−x)Ge_x layers using (0 0 4) DFEH in Lorentz mode. Different practical aspects are discussed such as sample preparation, reconstruction of the holograms and interpretation of the strain maps in terms of sensitivity and accuracy. It was shown that the measurements are not significantly dependent on the preparation tool. Good results can be obtained using both FIB and mechanical polishing. Usually the most important aspect is a precise control of the thickness of the sample. A problem when reconstructing (0 0 4) dark-field holograms is the relatively high phase gradient that characterises the strained regions. It can be difficult to perform reconstructions with high sensitivity in both strained and unstrained regions. Here we introduce simple methods to minimise the noise in the different regions using a specific mask shape in Fourier space or by combining several reconstructions. As a test, DFEH was applied to the characterization of eight Si_(1−x)Ge_x samples with different Ge concentrations. The sensitivity of the strain measured in the layers varies between 0.08% and 0.03% for spatial resolutions of 3.5–7 nm. The results were also compared to finite element mechanical simulations. A good accuracy of ±0.1% between experiment and simulation was obtained for strains up to 1.5% and ±0.25% for strains up to 2.5%.     

Comparative study of low frequency noise and hot-carrier reliability in SiGe PD SOI pMOSFETs

The stress effect of SiGe pMOSFETs has been investigated to understand the electrical properties of devices fabricated on the Si bulk and PD SOI substrates. A comparison of the drain saturation current (I_D.sat) and maximum transconductance (g_m,max) in both the SiGe bulk and the SiGe PD SOI devices clearly shows that the SiGe PD SOI is more immune from hot-carriers than the SiGe bulk. The stress-induced leakage current (SILC) is hardly detectable in ultra-thin oxide, because the increasing contribution of direct tunneling is comparable to the trap-assisted component. The SiGe PD SOI revealed degraded properties being mainly associated with the detrimental silicon-oxide interface states of the SOI structure.     

小孔等离子体运动实验方法

在间接驱动惯性约束聚变的黑腔中,辐射烧蚀的高Z等离子体的流体力学运动过程对激光注入黑腔的效率、辐射场均匀性和通过诊断口的黑腔辐射温度诊断都有显著影响。为研究诊断口在黑腔辐射场中的等离子体缩口过程,用激光产生X光辐射加热低Z泡沫填充的金黑腔诊断口,以激光辐照钛平面靶产生的2～5 keV高能段窄能区X光作为背光源,用X光分幅相机获得了源靶和小孔靶两种靶型的小孔等离子体运动过程图像,研究了X光烧蚀的小孔等离子体的流体力学运动过程,探索了定量测量小孔等离子体面密度的空间分布与时间演化过程的实验诊断方法,初步给出小孔等离子体的面密度。     

p型GaN/Al0.35Ga0.65N/GaN应变量子阱中二维空穴气的研究

对Ga面p型GaN/Al_0.35Ga_0.65N/GaN应变异质结构中形成的二维空穴气(2DHG)进行了研究.首先基于半导体-绝缘体-半导体异质结构模型确定了应变异质中的临界厚度，然后自洽求解薛定谔方程和泊松方程，计算了当中间势垒层AlGaN处于完全应变状态和半应变状态两种条件下，顶层GaN及中间层AlGaN厚度的变化对2DHG分布的影响.计算结果表明，势垒层AlGaN和顶层GaN的应变状态和厚度对极化引起的2DHG面密度及分布有重要影响.在此基础上制备了p型GaN/Al_0.35Ga_0.65N/GaN应变量子阱结构肖特基器件，并通过器件的C-V测试证实了异质结处2DHG的存在.器件响应光谱的测试结果表明，由于p型GaN/Al_0.35Ga_0.65N/GaN量子阱中强烈的极化作用和Stark效应使得器件零偏压和反向偏压时的响应光谱都向短波方向移动了10 nm，在零偏压下器件在280 nm处的峰值响应为0.022 A/W，在反向偏压为1 V时，峰值响应达到0.19 A/W，已经接近理论值. 关键词： AlGaN 二维空穴气 极化效应     

Unstable plasma characteristics in mirror field electron cyclotron resonance microwave ion source

Electron cyclotron plasma reactor are prone to instabilities in specific input power [3–7] region (150–450 watts). In this region power absorption by gas molecules in the cavity is very poor and enhanced input power gets reflected substantially without increasing ion density. There are abrupt changes in plasma characteristics when input power was decreased from maximum to minimum, it was observed that reflected power changed from <2% to ∼50%. Minimum two jumps in reflected power were noticed in this specific power region and these appear to be highly sensitive to three stub tuner position in the waveguide for this particular input power zone. Unstable plasma region of this source is found to be dependent upon the magnetic field strength. Some changes in reflected power are also noticed with pressure, flow and bias and they are random in nature.     

The electric field of an electron in an electron–hole plasma with degenerate electrons: Possibility of formation of a superconductivity state

We consider the possibility of the formation of a superconductivity state either in a semiconductor or in an electron–hole plasma with degenerate electrons due to the attractive forces between the electrons as a result of the exchange effects through the electron–hole sound wave by an analogy to the phonon waves in a solid state. We have determined an interaction potential between two electrons in a degenerate electron–hole plasma. The potential appears to be attractive at distances much larger than the Debye radius and decreases as 1/r³. We discuss the conditions in which the bound electron state, the so‐called “Cooper Pair,” in a such field can be formed.     

电子密度对等离子体光子晶体禁带特性的影响

从Maxwell方程出发,采用类似于量子力学Kronig-Penney模型求解周期势的方法,结合双水电极介质阻挡放电的实验结果,研究了电子密度ne对一维等离子体光子晶体禁带特性的影响。研究发现:电子密度对等离子体光子晶体光子禁带的位置和宽度均有重要的影响;等离子体光子晶体的禁带宽度随电子密度的增加而增大,增长速率为电子密度的函数;等离子体光子晶体的截止频率、光子禁带边缘频率随电子密度的增大而增大。给出了当等离子体光子晶体具有显著禁带宽度时的电子密度的理论临界值。     

Au等离子体M带5f-3d跃迁的电子离子碰撞激发速率系数

电子离子碰撞激发速率系数在超组态碰撞辐射模型中真实模拟非局域热动力学平衡Au激光等离子体M带谱 5f 3d跃迁中各种复杂电荷态离子的电离态特性 (譬如离子的平均电离度 ,相对丰度和能级布居数 )是必不可少的。基于准相对论多组态Hartree Fock方法和扭曲波玻恩交换近似 ,采用自编的扭曲波程序ACDW (9)和Fit(9) ,从头计算了Au等离子体M带 5f 3d电子离子碰撞激发速率系数。结果表明 :在“神光II”实验装置诊断的电子温度约 2keV ,电子密度约 6× 10 2 1cm-3 范围内 ,这些电子离子碰撞激发参数有利于采用超组态碰撞辐射模型模拟Au的激光等离子体M带 5f～ 3d细致谱的平均电离度和电荷态分布。     

Influence of reaction gas flows on the properties of SiGe:H thin film prepared by plasma assisted reactive thermal chemical vapour deposition

A new preparing technology, very high frequency plasma assisted reactive thermal chemical vapour deposition （VHFPA-RTCVD）, is introduced to prepare SiGe：H thin films on substrate kept at a lower temperature. In the previous work, reactive thermal chemical vapour deposition （I~TCVD） technology was successfully used to prepare SiGe：H thin films, but the temperature of the substrate needed to exceed 400℃. In this work, very high frequency plasma method is used to assist RTCVD technology in reducing the temperature of substrate by largely enhancing the temperature of reacting gases on the surface of the substrate. The growth rate, structural properties, surface morphology, photo- conductivity and dark-conductivity of SiGe：H thin films prepared by this new technology are investigated for films with different germanium concentrations, and the experimental results are discussed.     

不同偏置影响锗硅异质结双极晶体管单粒子效应的三维数值仿真研究

针对国产锗硅异质结双极晶体管(SiGe HBT),采用半导体器件三维计算机模拟工具,建立单粒子效应三维损伤模型,研究不同偏置状态对SiGe HBT单粒子效应的影响.分析比较不同偏置下重离子入射器件后,各端口电流瞬变峰值和电荷收集量随时间的变化关系,获得SiGe HBT单粒子效应与偏置的响应关系.结果表明:不同端口对单粒子效应响应的最劣偏置不同,同一端口电荷收集量和瞬变电流峰值的最劣偏置也有所差异.载流子输运方式变化和外加电场影响是造成这种现象的主要原因.     

Formation of a symmetric vortex configuration in a pure electron plasma trapped with a penning trap

In the formation of vortical crystal structures of electrons, the distribution of background electrons works as a “cooler” of randomly moving, intense vortices. We examine the supporting effect of background electrons to forming crystal structures from the perspective of a reduction of the vortices’ random motion.     

微波电子回旋共振等离子体阴极电子束的实验研究

介绍了实验室研制的微波电子回旋共振(ECR)等离子体阴极电子束系统及初步研究结果，该系统包括微波ECR 等离子体源、电子束引出极、聚焦线圈等。通过测量水冷靶电流和靶上的束斑尺寸，实验研究了微波ECR 等离子体阴极电子束的流强、聚束性能等随电子束系统工作条件的变化。结果表明：微波输入功率越高、引出电压越高，引出电子束流强越大；工作气压对电子束流强的影响较复杂，随气压增加呈现出先降低后升高的特点；在7×10⁻⁴Pa 的极低气压下电子束流强可达75mA，引出电压9kV；能量利用率可达0.6；调整聚焦线圈的驱动电流，电子束的束斑直径从20mm 减小到13mm，电子束流强未有明显变化。