Surface characterisation and electrochemical behaviour of porous titanium dioxide coated 316L stainless steel for orthopaedic applications

Porous titanium dioxide was coated on surgical grade 316L stainless steel (SS) and its role on the corrosion protection and enhanced biocompatibility of the materials was studied. X-ray diffraction analysis (XRD), atomic force microscopy (AFM), Fourier transform infrared (FTIR) spectroscopy, scanning electron microscopy (SEM) and energy dispersive X-ray analysis (EDAX) were carried out to characterise the surface morphology and also to understand the structure of the as synthesised coating on the substrates. The corrosion behaviour of titanium dioxide coated samples in simulated body fluid was evaluated using polarisation and impedance spectroscopy studies. The results reveal that the titanium dioxide coated 316L SS exhibit a higher corrosion resistance than the uncoated 316L SS. The titanium dioxide coated surface is porous, uniform and also it acts as a barrier layer to metallic substrate and the porous titanium dioxide coating induces the formation of hydroxyapatite layer on the metal surface.     

Solution-deposited microstructures based on aluminum-tris-hydroxyquinoline

Iridescent organic films consisting of quasi-parallel wire-like microstructures are grown by castings from ethanol solutions containing mixtures of aluminium-tris-hydroxyquinoline and 1,10-phenanthroline. Spectrophotometric measurements carried out in the ultraviolet-visible range indicate that the microstructured films have angular-dependent optical behaviour, which is motivated by a refractive-index modulation over dimensions that are comparable to visible-light wavelengths. According to the results of investigations carried out by means of optical microscopy, atomic force microscopy (AFM), and scanning near-field optical microscopy (SNOM), the refractive-index modulation originates from a thickness modulation and a phase separation that occurs as the aluminium-tris-hydroxyquinoline and phenanthroline co-crystallize, with the former material being arranged to form a green luminescent pattern on the top of the latter one.     

Influence of mesoporous substrate morphology on the structural, optical and electrical properties of RF sputtered ZnO layer deposited over porous silicon nanostructure

Morphological, optical and transport characteristics of the RF sputtered zinc oxide (ZnO) thin films over the mesoporous silicon (PS) substrates have been studied. Effect of substrate porosity on the grain growth and transport properties of ZnO has been analyzed. Physical and optical properties of ZnO-PS structures were investigated using scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and photoluminescence (PL) spectroscopy. Our experimental results indicate that on changing porosity of the PS substrates, regularity of the spatial distribution of the ZnO nanocrystallites can be controlled. While the morphology and grain size of ZnO depended strongly on the morphology and pore size of the PS substrates, the rectifying factors of the metal semiconductor junction were found to be different by a factor of 3. The deposition of semiconducting oxides on such mesoporous substrates/templates offers the possibility to control their properties and amplify their sensing response.     

Characteristics of sculptured Cu thin films and their optical properties as a function of deposition rate

Sculptured copper thin films were deposited on glass substrates, using different deposition rates. The nano-structure and morphology of the films were obtained, using X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Their optical properties were measured by spectrophotometry in the spectral range of 340-850 nm. The real and imaginary refractive indices, film thickness and fraction of metal inclusion in the film structure were obtained from optical fitting of the spectrophotometer data.     

Analysis of oxide formation induced by UV laser coloration of stainless steel

Laser-induced coloration on metal surfaces has important applications in product identification, enhancing styles and aesthetics. The color generation is the result of controlled surface oxidation during laser beam interaction with the metal surfaces. In this study, we aim to obtain in-depth understanding of the oxide formation process when an UV laser beam interacts with stainless steel in air. The oxide layer is analysed by means of optical microscopy, scanning electron microscopy (SEM) and time-of-flight secondary ion mass spectrometer (TOF-SIMS). TOF-SIMS results clearly show the formation of duplex oxide structures. The duplex structure includes an inner layer of Cr oxide solution and an outer layer of Fe oxide solution. The oxide layer thickness increased as the results of Fe diffusion to surface during multiple laser scanning passes.     

Combined use of SEM-EDS, OM and XRD for the characterization of corrosion products grown on silver roman coins

In the framework of the PROMET project (European Commission contract No. 509126) aimed to develop new analytical techniques and materials for monitoring and protecting metal artefacts and monuments from the Mediterranean region, the corrosion products grown on silver Roman coins during archaeological burial is studied by means of scanning electron microscopy combined with energy dispersive spectrometry (SEM-EDS), X-ray diffraction (XRD) and optical microscopy (OM) techniques. PACS 68.55.Jk; 68.35.Dv; 68.37.Hk; 68.55.Nq; 81.05.Bx     

Difference in high-temperature oxidation resistance of amorphous Zr-Si-N and W-Si-N films with a high Si content

The high-temperature oxidation resistance of amorphous Zr-Si-N and W-Si-N films with a high Si content (≥20 at.%) deposited by reactive dc magnetron sputtering at different partial pressures of nitrogen was systematically investigated by means of a symmetrical high-resolution thermogravimetry in a flowing air up to an annealing temperature of 1300 °C (a temperature limit for Si(1 0 0) substrate). Additional analyses including X-ray diffraction (XRD), light optical microscopy (LOM), scanning electron microscopy (SEM), atomic force microscopy (AFM), and microhardness measurement were carried out as well. The obtained results showed (i) an excellent high-temperature oxidation resistance of the Zr-Si-N films up to 1300 °C, (ii) a considerably lower oxidation resistance of the W-Si-N films. The W-Si-N films are completely oxidized at 800 °C with a subsequent volatilization of unstable WO_x oxides. On the other hand, the Zr-Si-N films are oxidized only very slightly on the surface, where a stable oxide barrier layer preventing further inward oxygen diffusion is formed. The thickness of the oxide layer is only about of 3% of the total film thickness. The phase composition, thermal stability of individual phases and amorphous structure were found to be key factors to achieve a high oxidation resistance.     

Investigation of optical properties of annealed aluminum phthalocyanine derivatives thin films

Semiconducting molecular materials based on aluminum phthalocyanine chloride (AlPcCl) and bidentate amines have been successfully used to prepare thin films by using a thermal evaporation technique. The morphology of the deposited films was studied by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Studies of the optical properties were carried out on films deposited onto quartz and (1 0 0) monocrystalline silicon wafers and films annealed after deposition. The absorption spectra recorded in the UV–vis region for the as-deposited and annealed samples showed two absorption bands, namely the Q- and B-bands. In addition, an energy doublet in the absorption spectra of the monoclinic form at 1.81 and 1.99 eV was observed. A band-model theory was employed in order to determine the optical parameters. The fundamental energy gap (direct transitions) was determined to be within the 2.47–2.59 and 2.24–2.44 eV ranges, respectively, for the as-deposited and annealed thin films.     

Preparation and atomic oxygen erosion resistance of silica film formed on silicon rubber by sol-gel method

Based on the characteristic that silicon coupling agents have the capability to develop ‘molecular bridge’ in the interface of organic materials and inorganic materials, silica films were prepared on the surface of flexible silicon rubber by sol-gel method and the optical transmittance of the sample before and after atomic oxygen irradiation was tested. The surface morphology and structure of silica films were investigated by scanning electronic microscope (SEM) and Fourier transformed infrared spectroscopy (FTIR). The results indicated that the silica sol could easily form a uniform thin film on the surface of silicon rubber pretreated by high concentration silicon coupling agents, and the inorganic silica films could combine with organic silicon rubber without obvious delamination on the interface.     

Study of environmental biodegradation of LDPE films in soil using optical and scanning electron microscopy

An outdoor soil burial test was carried out to evaluate the degradation of commercially available LDPE carrier bags in natural soil for up to 2 years. Biodegradability of low density polyethylene films in soil was monitored using both optical and scanning electron microscopy (SEM). After 7–9 months of soil exposure, microbial colonization was evident on the film surface. Exposed LDPE samples exhibit progressive changes towards degradation after 17–22 months. SEM images reveal signs of degradation such as exfoliation and formation of cracks on film leading to disintegration. The possible degradation mode and consequences on the use and disposal of LDPE films is discussed.     

Laser-surface-alloying of the iron based superalloy Incoloy-800H with Al

Laser surface alloying by the powder feed method of the iron based superalloy Incoloy 800H with aluminium has been carried out. The effects of different preparation parameters, like laser scan speed and powder feed rate, on the morphology of the alloyed zone have been investigated. Microstructure and composition have been determined by scanning electron microscopy (SEM), optical microscopy, and x-ray fluorescence spectroscopy. Three different phases with different Al-content have been distinguished. The observed Al-enrichment at the surface, the presence of Ni-Al and Fe-Al intermetallic compounds, and the considerable grain refining of the alloyed zone with respect to the substrate, make this surface modification technique a very good method to improve the corrosion behaviour of the Incoloy 800H super-alloy.     

Ancient silver extraction in the Montevecchio mine basin (Sardinia, Italy): micro-chemical study of pyrometallurgical materials

Different pyrometallurgical materials such as slags, refractory materials and thermally treated lead ores likely related to smelting and extractive processes and chronologically related to Punic and Roman periods (IV–III BC) have been found at Bocche di Sciria and Conca e Mosu in the Montevecchio mine basin (south western Sardinia, Italy), where archaeological findings and classical authors locate extractive metallurgy activities since pre-Roman times. By means of the combined use of X-ray diffraction (XRD), scanning electron microscopy (SEM) combined with energy-dispersive X-ray spectrometry (EDS), selected-area X-ray photoelectron spectroscopy (XPS) and optical microscopy (OM), micro-chemical and micro-structural investigations have been carried out in order to identify the nature of the pyrometallurgical materials, to decipher the processes carried out there and their technological steps and to determine the technological level of competence reached by the ancient metallurgists. The results confirm that the findings can be associated with smelting and extractive processes carried out close to the metal ore deposits first for the argentiferous lead production and, then, for the silver recovery via a cupellation process. Finally, the results disclose the high level of technological competence of the ancient metallurgists able to carry out complex high-temperature processes to treat the argentiferous lead ores and to recover low amounts of silver via high-temperature lead-selective oxidation.     

Growth and characterization of thin ZnO films deposited on glass substrates by electrodeposition technique

Electrodeposition technique was used in order to produce nanometric zinc oxide films on glass insulating substrates. The effect of electrolyte concentration and applied current density on the formation and growth of electrodeposited Zn thin films in aqueous solutions of ZnSO₄ were studied. After a thermal oxidation, a characterization of the structural morphology of the films deposited was carried out by optical microscopy (OM), atomic force microscopy (AFM), scanning electron microscopy (SEM) and by grazing incidence X-rays diffraction (GIXD). These characterization techniques show that the grains size of the films after oxidation at temperature 450 °C is between 5 and 15 nm, as well as the structure is polycrystalline nature with several orientations. UV/vis spectrophotometry confirms that it is possible to obtain transparent good ZnO films with an average transmittance of approximately 80% within the visible wavelength region, as well as the optical gap of obtained ZnO films is 3.17 eV.     

Thin films of molecular materials synthesized from C32H20N10M (M = Co, Pb, Fe): Film formation, electrical and optical properties

In this work, the synthesis of molecular materials formed from metallic phthalocyanines and 1,4-phenylenediamine is reported. The powder and thin film (∼80-115 nm thickness) samples of the synthesized materials, deposited by vacuum thermal evaporation, show the same intra-molecular bonds in the IR spectroscopy studies, which suggests that the thermal evaporation process does not alter these bonds. The morphology of the deposited films was studied using scanning electron microscopy (SEM) and atomic force microscopy (AFM) and their optical and electrical properties were studied as well. The optical parameters have been investigated using spectrophotometric measurements of transmittance in the wavelength range 200-1200 nm. The absorption spectra recorded in the UV-vis region for the deposited samples showed two bands, namely the Q and Soret bands. The optical activation energy was calculated and found to be 3.41 eV for the material with cobalt, 3.34 eV for the material including lead and 3.5 eV for the material with iron. The effect of temperature on conductivity was measured for the thin films and the corresponding conduction processes are discussed in this work.     

金属/多孔硅/单晶硅(M/PS/Si)微结构的电学特性

采用双槽电化学腐蚀法制备多孔硅层,然后在多孔硅表面沉积形成金属电极,制备出M/PS/Si微结构.利用SEM分析多孔硅的表面形貌,通过测试其I-V特性分析M/PS/Si微结构的电学特性.结果表明:由Pt做电极形成的M/PS/Si结构,表现出非整流特性.M/PS/Si结构的I-V曲线由线性区和非线性区组成,多孔硅孔隙率越高的M/PS/Si结构的I-V特性曲线线性区越宽.由Cu做电极形成的M/PS/Si结构,表现出整流特性.其整流比随多孔硅孔隙率增加而减小. 关键词： M/PS/Si微结构 孔隙率 I-V特性')" href="#">I-V特性 欧姆接触     

MOCVD法生长Ga、P掺杂的ZnO薄膜

采用金属有机化学气相沉积法在蓝宝石衬底上制备Ga、P掺杂的ZnO薄膜,分别采用X射线衍射、扫描电子显微镜、霍尔效应测试、光致发光谱对样品进行表征。通过Ga、P掺杂分别得到n、p型ZnO薄膜,n型ZnO薄膜的载流子浓度可以达到1×1019cm-3,p型ZnO薄膜的载流子浓度达到1.66×1016cm-3。所制备的ZnO薄膜具有c轴择优生长取向,并且p型ZnO薄膜具有较好的光致发光特性。     

Morphology and properties of ZnO films obtained by repeated spin coating on porous silicon substrates

Layers of porous silicon (PS), multilayered ZnO films, and heterostructures based on them are obtained. The surface morphology, chemical and phase composition of the PS layers and ZnO films, and the transverse cleavage of ZnO–PS nanocomposite, are investigated via energy-dispersive X-ray spectral analysis (EDX), X-ray diffraction (XRD), and scanning electron microscopy (SEM). The current–voltage characteristics of Al/Ag/p-Si(100)/PS/ZnO/Ag/Al and Al/Ag/p-Si(100)/PS/ZnO/SiC/Ag/Al heterostructures are studied.     

A study of structural, compositional and optical properties of spray-deposited non-stoichiometric (Zn,Fe)S thin films

Non-stoichiometric ternary chalcogenides (Zn,Fe)S were prepared in the film form by pyrolytic spray deposition technique, using air/nitrogen as the carrier gas. The precursor solution comprised of ZnCl₂, FeCl₂ and thiourea. The depositions were carried out under optimum conditions of experimental parameters viz. carrier gas (air/nitrogen) flow rate, concentration of precursor constituents, nozzle substrate distance and temperature of quartz substrate. The deposited thin films were later sintered in argon at 1073 K for 120 min.The structural, compositional and optical properties of the sintered thin films were studied. X-ray diffraction studies of the thin films indicated the presence of (Zn,Fe)S solid solution with prominent cubic sphalerite phase while surface morphology as determined by scanning electron microscopy (SEM) revealed a granular structure.The chemical composition of the resulting thin films as analyzed by energy dispersive X-ray analysis (EDAX) reflected the composition of the precursor solutions from which the depositions were carried out with Fe at% values ranging from 0.4 up to 33.SEM micrographs of thin films reveal that the grain sizes of the thin films prepared using air as carrier gas and N₂ as carrier gas are in the vicinity of 300 and 150 nm, respectively.The diffuse transmittance measurements for thin films, as a function of wavelength reveal the dependence of direct optical band gap on Fe content and type of phase.     

Growth and characterization of pulsed laser deposited ZnO thin films

One of the most important and promising materials from metal oxides is ZnO with specific properties for near UV emission and absorption optical devices. The properties of ZnO thin films strongly depend on the deposition method. Among them, pulsed laser deposition (PLD) plays an important role for preparing various kinds of ZnO films, e.g. doped, undoped, monocrystalline, and polycrystalline. Different approaches — ablation of sintered ZnO pellets or pure metallic Zn as target material are described. This contribution is comparing properties of ZnO thin films deposited from pure Zn target in oxygen atmosphere and those deposited from sintered ZnO target. There is a close connection between final thin film properties and PLD conditions. The surface properties of differently grown ZnO thin films are measured by secondary ion mass spectrometry (SIMS), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Furthermore, different approaches — ablation of sintered ZnO pellet or pure metallic Zn as target materials are described. The main results characterize typical properties of ZnO films versus technological parameters are presented. Presented at 5-th International Conference Solid State Surfaces and Interfaces, November 19–24, 2006, Smolenice Castle, Slovakia     

Nanoporous nickel oxide thin films and its improved electrochromic performance: Effect of thickness

Electrochromic properties of chemically bath deposited nanoporous NiO thin films were investigated as a function of film thickness using Ni sulphate precursor, aqueous ammonia and potassium persulphate as complexing and oxidizing agents respectively. The films were characterized for their structural, morphological, optical and electrochromic properties using X-ray diffraction, scanning electron microscopy, FT-IR spectroscopy, cyclic voltammetry, chronoamperometry and optical transmittance studies. X-ray diffraction patterns show that the films are polycrystalline, consisting of NiO cubic phase. Infrared spectroscopy results show the presence of free hydroxyl ion and water in NiO thin films. SEM micrographs revealed nanoporous nature composed of interconnected nanoporous network, forming well defined 3D nano envelopes. The optical band gap energy was found to be decreased from 3.22 to 2.80 eV with increasing film thickness. The electrochromic properties of all the films were investigated in aqueous (KOH) and non aqueous (LiClO₄-PC) electrolyte by means of cyclic voltammetry (CV), chronocoulometry (CC) and optical studies. The transmittance modulations or optical density differences during the coloring/bleaching process were found to be increased with the film thickness. This increment in optical differences led to an increase in coloration efficiency (CE) to about 95 cm²/C, which is two times more than that observed in KOH and response time of 2.9 s for bleaching (reduction) and 3.5 s for coloration (oxidation) observed for the film deposited at 60 min with excellent electrochemical stability up to 3000 c/b cycles in LiClO₄-PC electrolyte.