The adsorption and decomposition of NO on Pd(110)

The sticking probability of nitric oxide (NO) on Pd(110) and the relative selectivity of the surface to nitrogen (N₂) and nitrous oxide (N₂O) production has been measured as a function of coverage and as a function of surface and gas temperatures using a molecular beam. It is found that, at low temperatures (<440 K), molecular adsorption occurs with an initial sticking probability of 0.40 ± 0.02, rising quickly to a maximum of about 0.48 ± 0.02 as coverage increases before falling towards saturation. Following adsorption at 170 K four distinct adsorption sites can be identified by subsequent TPD. Hence, if beaming occurs at a temperature above the TPD peak due to a given site, then that site cannot be populated and the saturation coverage is found to be reduced. At higher temperatures (440–650 K) the sticking probability is seen to decrease continuously as a function of coverage. At a given NO uptake, the sticking probability falls with temperature indicating that the rate of NO desorption is significant in this temperature range. In addition, dissociation occurs leading to the desorption of nitrogen and nitrous oxide leaving only oxygen adatoms on the surface. The oxygen adatoms poison further reaction but can be cleaned off, even at the lowest temperature at which dissociation occurs, by hydrogen or carbon monoxide. At the low temperature end of this range more nitrous oxide is produced than nitrogen but this ratio falls with temperature until, above 600 K, there is 100% selectivity to the production of nitrogen which we propose is due to the low lifetime of molecular NO on the surface. However, at such high temperatures, reaction only occurs on a few sites probably located at the few step edges present on the crystal.     

Glycine on Pt(111): a TDS and XPS study

The adsorption and desorption of in situ deposited glycine on Pt(111) were investigated with thermal desorption spectroscopy (TDS) and X-ray photoelectron spectroscopy (XPS). Glycine adsorbs intact on Pt(111) at all coverages at temperatures below 250 K. The collected results suggest that the glycine molecules adsorb predominantly in the zwitterionic state both in the first monolayer and in multilayers. Upon heating, intact molecules start to desorb from multilayers around 325 K. The second (and possibly third) layer(s) are somewhat more strongly bound than the subsequent layers. The multilayer desorption follows zero order kinetics with an activation energy of 0.87 eV molecule⁻¹. From the first saturated monolayer approximately half of the molecules desorbs intact with a desorption peak at 360 K, while the other half dissociates before desorption. Below 0.25 monolayer all molecules dissociate upon heating. The dissociation reactions lead to H₂, CO₂, and H₂O desorption around 375 K and CO desorption around 450 K. This is well below the reported gas phase decomposition temperature of glycine, but well above the thermal desorption temperatures of the individual H₂, CO₂, and H₂O species on Pt(111), i.e. the dissociation is catalyzed by the surface and H₂, CO₂, and H₂O immediately desorb upon dissociation. For temperatures above 500 K the remaining residues of the dissociated molecules undergo a series of reactions leading to desorption of, for example, H₂CN, N₂ and C₂N₂, leaving only carbon left on the surface at 900 K. Comparison with previously reported studies of this system show substantial agreement but also distinct differences.     

Effects of preadsorbed oxygen on the formation and decomposition of NCO on Rh(111) surfaces

The interaction of HNCO with oxygen dosed Rh(111) surface has been investigated by Auger electron, electron energy loss and thermal desorption spectroscopy. The presence of adsorbed oxygen exerted no apparent influence on the weakly adsorbed HNCO (T_p = 130 K). It promoted, however, the dissociative adsorption of HNCO by forming a strong O—H bond which prevented the associative desorption of HNCO. As a result no H₂ and NH₃ formation occurred, in contrast with the clean surface, and the surface concentration of irreversibly bonded NCO was also increased. New products of the surface reaction were H₂O and CO₂, in addition to CO and N₂ observed on a clean surface. From the behavior of the losses characteristic for the adsorbed NCO it appeared that the preadsorbed oxygen exerted a significant stabilizing effect on the NCO bonded to the Rh.     

Evidence for bicarbonate formation on vacuum annealed TiO2(110) resulting from a precursor-mediated interaction between CO2 and H2O

The reaction of CO₂ and H₂O to form bicarbonate (HCO⁻₃) was examined on the nearly perfect and vacuum annealed surfaces of TiO₂(110) with temperature programmed desorption (TPD), static secondary ion mass spectrometry (SSIMS) and high resolution electron energy loss spectrometry (HREELS). The vacuum annealed TiO₂(110) surface possesses oxygen vacancy sites that are manifested in electronic EELS by a loss feature at 0.75 V. These oxygen vacancy sites bind CO₂ only slightly more strongly (TPD peak at 166 K) than do the five-coordinated Ti⁴⁺ sites (TPD peak at 137 K) typical of the nearly perfect TiO₂(110) surface. Vibrational HREELS indicates that CO₂ is linearly bound at the latter sites with a ν_a(OCO) frequency similar to the gas phase value. In contrast, oxygen vacancies dissociate H₂O to bridging OH groups which recombine to liberate H₂O in TPD at 490 K. No evidence for a reaction between CO₂ and H₂O is detected on the nearly perfect surface. In sequentially dosed experiments on the vacuum annealed surface at 110 K, CO₂ adsorption is blocked by the presence of preadsorbed H₂O, adsorbed CO₂ is displaced by postdosed H₂O, and there is little or no evidence for bicarbonate formation in either case. However, when CO₂ and H₂O are simultaneously dosed, a new CO₂ TPD state is observed at 213 K, and the 166 K state associated with CO₂ at the vacancies is absent. SSIMS was used to tentatively assign the 213 K CO₂ TPD state to a bicarbonate species. The 213 K CO₂ TPD state is not formed if the vacancy sites are filled with OH groups prior to simultaneous CO₂+H₂O exposure. Sticking coefficient measurements suggest that CO₂ adsorption at 110 K is precursor-mediated, as is known to be the case for H₂O adsorption on TiO₂(110). A model explaining the circumstances under which the proposed bicarbonate species is formed involves the surface catalyzed conversion of a precursor-bound H₂O–CO₂ van der Waals complex to carbonic acid, which then reacts at unoccupied oxygen vacancies to generate bicarbonate, but falls apart to CO₂ and H₂O in the absence of these sites. This model is consistent with the conditions under which bicarbonate is formed on powdered TiO₂, and is similar to the mechanism by which water catalyzes carbonic acid formation in aqueous solution.     

Direct reaction of adsorbed molecular oxygen with hydrazine on a clean Pt(111) surface

The oxidation of hydrazine on the clean Pt(111) surface has been investigated by temperature-programmed reaction spectroscopy (TPRS) in the temperature range 130–800 K. Direct reaction of molecular oxygen is observed on the Pt(111) surface for the first time, as indicated by the desorption of nitrogen beginning at 130 K with a maximum rate at 145 K, below the molecular oxygen dissociation temperature. Direct reaction of hydrazine with adsorbed molecular oxygen results in the formation of water and nitrogen. With excess hydrazine, all surface oxygen is reacted, forming water. When only adsorbed atomic oxygen is present, the low-temperature nitrogen yield decreases by a factor of 3 and the peak nitrogen desorption temperature increases to 170 K. No high-temperature (450–650 K) nitrogen desorption characteristic of nitrogen atom recombination is seen, indicating that during oxidation the nitrogen-nitrogen bond in hydrazine remains intact, as observed previously for hydrazine decomposition on the Pt(111) surface and hydrazine oxidation on rhodium. Two water desorption peaks are observed, characteristic of desorption-limited (175 K) and reaction-limited (200 K) water evolution from the Pt(111) surface. For low coverages of hydrazine, only the reaction-limited water desorption is observed, previously attributed to water formed from adsorbed hydroxyl groups. When excess hydrazine is adsorbed, the usual hydrazine decomposition products, H₂, N₂ and NH₃, are also observed. No nitrogen oxide species (NO, NO₂ and N₂O) were observed in these experiments, even when excess oxygen was available on the surface.     

Adsorption of hydrogen and deuterium on potassium-promoted Pd(100) surfaces

The adsorption of H₂ and D₂ has been studied on clean and K-promoted Pd(100) surfaces using thermal desorption, work function changes, ultraviolet photoelectron and Auger spectroscopy. The potassium adlayer significantly lowers the sticking coefficient (from 0.6 to 0.06 at θ_k = 0.2), and the uptake of hydrogen, but increases the desorption energy for H₂ desorption. Calculation showed that each potassium adatom blocks approximately 4–5 adsorption sites for H₂ adsorption. Atomization of hydrogen led to an increase of hydrogen uptake. The adsorption of potassium on the H-covered surface caused a significant decrease in the amount of hydrogen adsorbed on the surface (as indicated by less desorbing hydrogen below 500 K) and promoted the dissolution of H atoms into the bulk of Pd. The dissolved hydrogen was released only above 600–650 K. In the interpetation of the results the extended charge transfer from K-dosed Pd to the adsorbed H atoms and the direct interaction between adsorbed H and K adatoms are taken into account.     

Novel multi-walled nanotubes-supported and alkali-promoted Ru catalysts for ammonia synthesis under atmospheric pressure

A novel ammonia synthesis catalyst, alkali-promoted ruthenium supported on multi-walled nanotubes (MWNT), has been developed. Various alkali-promoters and carbon-based supports were compared. The effects of the contents of Ru and K, the treatment of MWNT, and the reaction temperature on ammonia synthesis activity were investigated. It was found that, as a support, the MWNT is much better than other carbon-based supports. The yield of NH₃ was 47.423 ml NH₃/h g-cat at 693 K, at atmospheric pressure and N₂/3H₂ flow-rate of 1800 ml/h for the catalyst with K/Ru/MWNT = 4/4/100 (w/w).     

Polyhedral silver clusters as single molecule ammonia sensor based on charge transfer-induced plasmon enhancement

The unique plasmon resonance characteristics of nanostructures based on metal clusters have always been the focus of various plasmon devices and different applications. In this work, the plasmon resonance phenomena of polyhedral silver clusters under the adsorption of NH₃, N₂, H₂, and CH₄ molecules are studied by using time-dependent density functional theory. Under the adsorption of NH₃, the tunneling current of silver clusters changes significantly due to the charge transfer from NH₃ to silver clusters. However, the effects of N₂, H₂, and CH₄ adsorption on the tunneling current of silver clusters are negligible. Our results indicate that these silver clusters exhibit excellent selectivities and sensitivities for NH₃ detection. These findings confirm that the silver cluster is a promising NH₃ sensor and provide a new method for designing high-performance sensors in the future.     

Effects of potassium on the adsorption and dissociation of CH3Cl on Pd(100)

The effects of potassium on the adsorption and dissociation of CH₃Cl on a Pd(100) surface has been investigated by ultraviolet photoelectron spectroscopy (UPS), Auger electron spectroscopy (AES), electron energy loss spectroscopy (in the electronic range EELS), temperature-programmed desorption (TPD) and work function change. In contrast to the clean surface, the adsorption of CH₃Cl caused a significant work function increase, 0.9-1.4 eV, of potassium-dosed Pd. Preadsorbed K enhanced the binding energy of CH₃C1 to the surface and induced the dissociation of adsorbed molecules. The extent of the dissociation increased almost linearly with the potassium content. The appearance of a new emission in the UPS spectrum at 9.2 eV, attributed to adsorbed CH₃ species, and the low-temperature formation of ethane suggest that a fraction of adsorbed CH₃Cl dissociates even at 115–125 K on potassium-dosed Pd(100). At the same time, a significant part of adsorbed CH₃ radical is stabilized, the reaction of which occurs only at 250–300 K. By means of TPD measurements, H₂, CH₄, C₂H₆, C₂H₄, KCl and K were detected in the desorbing gases. The results are interpreted by assuming a through-metal electronic interaction at low potassium coverage and by a direct interaction of the Cl in the adsorbed CH₃Cl with potassium at high potassium coverage. The latter proposal is supported by the electron excited Auger fine structure of the Cl signal and by the formation of KCl in the desorbing gases.     

Interactions of NH3, coadsorbed with PF3, on Ru(001)

NH₃, coadsorbed with PF₃, on Ru(001) has been studied by temperature programmed desorption (TPD) and high resolution electron energy loss spectroscopy (HREELS). HREELS shows that the P---F stretching frequency decreases by 60–90 cm⁻¹ in the presence of NH₃. This is explained by the enhancement, in the presence of NH₃, of backdonation of electrons from the metal to the antibonding orbital of the PF₃. The PF₃ bending frequency does not change in the presence of NH₃. This indicates that the σ donation of electrons from PF₃ to the metal substrate is not influenced by coadsorbed NH₃. The intensity of the PF₃ vibrational bands, particularly the PF₃ bending mode, decreases drastically in the presence of NH₃. We interpret this in terms of electric field shielding created by the coadsorbed NH₃ and/or the result of direct interactions between NH₃ and PF₃.     

The interaction of C2Cl4 with fe(110)

Quantitative adsorption studies, temperature programmed desorption (TPD) and Auger spectroscopy have been used to study the interaction of C₂Cl₄ with Fe(110) at 90 and 325 K. At 90 K, multilayer C₂Cl₄ adsorption occurs. The following desorption products are observed in the temperature range of 90–1050 K: C₂Cl₄ from the multilayer and the monolayer, FeCl₂, and a high mass iron chloride species with mass spectrometer cracking products FeCl⁺₂, FeCl⁺, and Fe⁺. Irreversible dissociative C₂Cl₄ adsorption occurs at 325 K and the only desorption product which is observed is the high mass iron chloride species. Auger spectroscopy shows that surface carbon from C₂Cl₄ starts to diffuse into the bulk of the crystal at ˜ 480 K while small coverages of chlorine remain on the surface of the crystal even after heating to 1050 K. Comparison of the behavior of C₂Cl₄ and CCl₄ on Fe(110) indicates that radical products (·CCl₃ and :CCl₂) observed to be produced from CCl₄ adsorption are not produced from C₂Cl₄ adsorption. This difference is probably due to the enhanced surface reactivity of the C=C bond in C₂Cl₄. A special reactivity of iron defect sites for C₂Cl₄ is observed through the production of associated FeCl₂ species which desorb via zero-order kinetics with an activation energy of 44.8 ± 8.5 kcal/mol, the sublimation enthalpy of FeCl₂.     

Cleavage of N-H bonds by active oxygen on Ag(110): I. Ammonia

Ammonia adsorbs without dissociation on clean Ag(110) with a binding energy of 11 kcal/mol. Coadsorption of ammonia and atomic oxygen at 105 K produces adsorbed hydroxyl groups and NH_x species. Coadsorption of ammonia and molecular oxygen leads to the stabilization of molecular oxygen, as is shown by the increase in the desorption peak temperature of dioxygen from 180 to 210 K. The reaction of ammonia with both forms of adsorbed oxygen produces the same products at the same temperatures. Water desorbs in a series of peaks at 310, 340, and 400 K resulting from hydroxyl recombination and hydrogen transfer from NH_x species to adsorbed oxygen atoms. NO and N₂ desorb together at 530 K. Oxygen recombination at 590 K only occurs following small ammonia doses such that excess oxygen persists on the surface. No hydrogen was seen to desorb under any reaction conditions. Vibrational spectroscopy shows that NH groups persist on the surface at temperatures well into the water desorption peak at 310 K and possibly to significantly higher temperatures, indicative of the difficulty of N-H bond cleavage by metallic silver.     

表面预处理对石墨烯上范德瓦耳斯外延生长GaN材料的影响

基于范德瓦耳斯外延生长的氮化镓/石墨烯材料异质生长界面仅靠较弱的范德瓦耳斯力束缚,具有低位错、易剥离等优势,近年来引起了人们的广泛关注.采用NH_3/H_2混合气体对石墨烯表面进行预处理,研究了不同NH_3/H_2比对石墨烯表面形貌、拉曼散射的影响,探讨了石墨烯在NH_3和H_2混合气氛下的表面预处理机制,最后在石墨烯上外延生长了1.6μm厚的GaN薄膜材料.实验结果表明:石墨烯中褶皱处的C原子更容易与气体发生刻蚀反应,刻蚀方向沿着褶皱进行;适当NH_3/H_2比的混合气体对石墨烯进行表面预处理可有效改善石墨烯上GaN材料的晶体质量.本研究提供了一种可有效提高GaN晶体质量的石墨烯表面预处理方法,可为进一步研究二维材料上高质量的GaN外延生长提供参考.     

Mechanisms of metastable N2 and Kr electron stimulated desorption from N2---Kr double layer and mixed films

Desorption of metastable particles from layered and mixed films, composed of N₂ and Kr, is induced by the impact of 6–50 eV monoenergetic electrons. From yield functions and time-of-flight analysis of the metastable particles emanating from these films, N*₂ and Kr* are identified as the desorbing species. Basic mechanisms responsible for their desorption are discussed. It is suggested that the desorption of Kr* arises from dissociation of transitory [Kr·N₂]* excimers. The desorption of N*₂ can arise from cavity expulsion, intramolecular vibrational energy transfer (with or without prior electronic excitation energy transfer from Kr excitions to N₂) and the dissociation of [Kr·N₂]* excimers.     

Effects of surface treatments and annealing on carbon-based molecular sieve membranes for gas separation

A new method in preparing carbon-based molecular sieve (CMS) membranes for gas separation has been proposed. Carbon-based films are deposited on porous Al₂O₃ disks using hexamethyldisiloxane (HMDSO) by remote inductively coupled plasma (ICP) chemical vapor deposition (CVD). After treating the film with ion bombardment and subsequent pyrolysis at a high temperature, carbon-based molecule sieve membranes can be obtained, exhibiting a very high H₂/N₂ selectivity around 100 and an extremely high permeance of H₂ around 1.5 × 10⁻⁶ mol m⁻² s⁻¹ Pa⁻¹ at 298 K. The O₂/N₂ selectivity could reach 5.4 with the O₂ permeance of 2 × 10⁻⁷ mol m⁻² s⁻¹ Pa⁻¹ at 423 K.

During surface treatments, HMDSO ions were found to be more effective than CH₄, Ar, O₂ and N₂ ions to improve the selectivity and permeance. Short and optimized surface treatment periods were required for high efficiency. Without pyrolysis, surface treatments alone greatly reduced the H₂ and N₂ permeances and had no effect on the selectivity. Besides, without any surface treatment, pyrolysis alone greatly increased the H₂ and N₂ permeances, but had no improvement on the selectivity, owing to the creation of large pores by desorption of carbon. A combination of surface treatment and pyrolysis is necessary for simultaneously enhancing the permeance and the selectivity of CMS membranes, very different from the conventional pore-plugging mechanism in typical CVD.     

NO adsorption and thermal behavior on Pd surfaces. A detailed comparative study

The adsorption and thermal behavior of NO on ‘flat’ Pd(111) and ‘stepped’ Pd(112) surfaces has been investigated by temperature programmed desorption (TPD), high resolution electron energy loss spectroscopy (HREELS), and electron stimulated desorption ion angular distribution (ESDIAD) techniques. NO is shown to molecularly adsorb on both Pd(111) and Pd(112) in the temperature range 100–373 K. NO thermally desorbs predominantly molecularly from Pd(111) near 500 K with an activation energy and pre-exponential factor of desorption which strongly depend on the initial NO surface coverage. In contrast, NO decomposes substantially on Pd(112) upon heating, with relatively large amounts of N₂ and N₂O desorbing near 500 K, in addition to NO. The fractional amount of NO dissociation on Pd(112) during heating is observed to be a strong function of the initial NO surface coverage. HREELS results indicate that the thermal dissociation of NO on both Pd(111) and Pd(112) occurs upon annealing to 490 K, forming surface-bound O on both surfaces. Evidence for the formation of sub-surface O via NO thermal dissociation is found only on Pd(112), and is verified by dissociative O₂ adsorption experiments. Both surface-bound O and sub-surface O dissolve into the Pd bulk upon annealing of both surfaces to 550 K. HREELS and ESDIAD data consistently indicate that NO preferentially adsorbs on the (111) terrace sites of Pd(112) at low coverages, filling the (001) step sites only at high coverage. This result was verified for adsorption temperatures in the range 100–373 K. In addition, the thermal dissociation of NO on Pd(112) is most prevalent at low coverages, where only terrace sites are occupied by NO. Thus, by direct comparison to NO/Pd(111), this study shows that the presence of steps on the Pd(112) surface enhances the thermal dissociation of NO, but that adsorption at the step sites is not the criterion for this decomposition.     

Structural effects on water formation from coadsorbed H + O on Rh(100)

The effect of adsorbate coverage, adsorption sequence and temperature on the structure, composition and reactivity of coadsorbed layers, produced by dissociative adsorption of O₂ and H₂ at 200 K on a Rh(100) surface, has been studied by combined TPD, XPS and LEED measurements. The emphasis is on the impact of the structure and composition of the mixed O + H layers on the synthesis of hydroxyl and water as a result of the O + H surface reaction. The difference in the O 1s binding energies of adsorbed O (529.9 eV) and OH species (530.8 eV) was used as a fingerprint to monitor the formation of the OH species. The H₂O TPD spectra show substantial variations of the desorption temperature range and the amount of water evolved with coadsorbate coverage and structure: from 270 to 350 K and from 0 to 0.08 ML, respectively. It has been found that dense O + H adlayers, where the O coverage is in the range 0.25-0.4 ML, favor the formation of stable OH species. The maximum amount of stable hydroxyl OH species ( 0.16 ML) can be produced by heating of these dense adlayers to 260 K. This results in reordering of the adspecies to form a new O + OH − (2 × 6) structure, where hydroxyls react readily to evolve 0.08 ML of water in a sharp desorption peak at 280 K. The effect of the adlayer density and restructuring on the production of OH and H₂O is discussed.     

Occurrence and elimination of in-plane misoriented crystals in AlN epilayers on sapphire via pre-treatment control

AlN epilayers are grown directly on sapphire(0001)substrates each of which has a low temperature AlN nucleation layer.The effects of pretreatments of sapphire substrates,including exposures to NH3/H2and to H2only ambients at different temperatures,before the growth of AlN epilayers is investigated.In-plane misoriented crystals occur in N-polar AlN epilayers each with pretreatment in a H2only ambient,and are characterized by six 60°-apart peaks with splits in each peak in(10ˉ12)phi scan and two sets of hexagonal diffraction patterns taken along the[0001]zone axis in electron diffraction.These misoriented crystals can be eliminated in AlN epilayers by the pretreatment of sapphire substrates in the NH3/H2ambient.AlN epilayers by the pretreatment of sapphire substrates in the NH3/H2ambient are Al-polar.Our results show the pretreatments and the nucleation layers are responsible for the polarities of the AlN epilayers.We ascribe these results to the different strain relaxation mechanisms induced by the lattice mismatch of AlN and sapphire.     

Investigation of the role of oxygen in NO reduction by C2H4 on the surface of stepped Pt(3 3 2)

The influence of pre-dosed oxygen on NO–C₂H₄ interactions on the surface of stepped Pt(3 3 2) has been investigated using Fourier transform infrared reflection–absorption spectroscopy (FTIR-RAS) and thermal desorption spectroscopy (TDS). The presence of oxygen significantly suppresses the adsorption of NO on the steps of Pt(3 3 2), leading to a very specific adsorption state for NO molecules when oxygen–NO co-adlayers are annealed to 350 K (assigned as atop NO on step edges). An oxygen-exchange reaction also takes place between these two kinds of adsorbed molecules, but there appears to be no other chemical reaction, which can result in the formation of higher-valence NOx.

C₂H₄ molecules which are post-dosed at 250 K to adlayers consisting of ¹⁸O and NO do not have strong interactions with either the NO or the ¹⁸O atoms. In particular, interactions which may result in the formation of new surface species that are intermediates for N₂ production appear to be absent. However, C₂H₄ is oxidized to C¹⁸O₂ by ¹⁸O atoms at higher annealing temperature. This reaction scavenges surface ¹⁸O atoms quickly, and the adsorption of NO molecules on step sites is therefore quickly restored. As a consequence, NO dissociation on steps proceeds very effectively, giving rise to N₂ desorption which closely resembles that following only NO exposure on a clean Pt(3 3 2), both in peak intensity and desorption temperature. It is concluded that the presence of ¹⁸O₂ in the selective catalytic reduction (SCR) of NO with C₂H₄ on the surface of Pt(3 3 2) does not play a role of activating reactants.     

蓝光激光器结构中InGaN/GaN多量子阱界面效应的精细光致发光光谱研究

金属有机化学气相沉积(MOCVD)方法制备InGaN/GaN多量子阱结构时,在GaN势垒层生长的N2载气中引入适量H2,能够有效改善阱/垒界面质量从而提升发光效率.本工作利用光致发光(PL)光谱技术,对蓝光激光器结构中的InGaN/GaN多量子阱的发光性能进行了精细的光谱学测量与表征,研究了通H2生长对量子阱界面的调控...