GexSi1—x／Si和Ge／Si应变层超晶格

ＧｅｘＳｉ１－ｘ／Ｓｉ和Ｇｅ／Ｓｉ应变层超晶格是半导体超晶格中新发展起来的一种类型．本文简要地介绍了这类超晶格在生长和物理特性方面的一些基本问题，列举了它在器件应用方面的例子．给出了共度生长时超晶格的临界厚度值，超晶格中ＧｅｘＳｉ１－ｘ合金层能隙随成分的变化，以及界面处的能带失配值等．最后介绍了由Ｇｅ，Ｓｉ原子层有序排列而组成的新晶体．     

纳米（Li2AO4）1—x—（ZrO2）x固体电解质陶瓷

用溶液凝胶共混法制备了纳米级的Ｌｉ２ＳＯ４－ＺｒＯ２复合固体电解质陶瓷。在复合陶瓷中，Ｌｉ２ＳＯ４、ＺｒＯ２的晶粒平均尺寸分别为４５、２７ｎｍ。晶粒尺寸的纳米化在材料中引入了大量的界面结构和表面结构。研究了掺不同量的纳米ＺｒＯ２第二相对Ｌｉ２ＳＯ４相变温度、相变行为及体系电导的影响，在纳米ＺｒＯ２作用下，Ｌｉ２ＳＯ４的相变温度可以降低１４０℃。在适当配比时，在５４０℃其离子电导可达到０．２Ｓ／ｃｍ     

Si_（1－x）Ge_x／Si脊形波导X型分支器的研制

采用分子束外延方法制作低损耗Ｓｉ１－ｘＧｅ／Ｓｉ异质结脊形光波导,在Ｘ型交叉波导上实现了Ｓｉ１－ｘＧｅｘ／Ｓｉ光分支器的功能．设计中采用了ＳｉＧｅ大截面脊形波导的单模条件和交叉波导传输特性分析的结果．Ｘ型光分支器的实现为进一步研制Ｓｉ１－ｘＧｅｘ／Ｓｉ光开关和光电调制器积累了经验．     

Oxidation of Si(100)2x1 and Gex Si1−x (100)2x1

High resolution electron energy loss Spectroscopy (HREELS), X-ray photoelectron Spectroscopy (XPS) and low energy electron diffraction (LEED) have been used to characterize initial stages of oxidation of Si(100)2x1 and Ge_x Si_1−x (100)2x1 surfaces. Different oxidation stages of Si were identified by measuring Si 2p core level shifts and characteristic vibrations of Si-O-Si complexes. The latter may be described in the framework of continuous random network models.Then,from the experimentally determined frequencies, force constants,average bond angles and bond lengths are determined. Complementary,marker experiments with atomic hydrogen as a probe in conjunction with HREELS were used to determine the local, atomic structure for different stages of oxidation from chemical shifts of Si-H and Ge-H stretching mode intensities, respectively.     

Electronic Structure of Si1-xⅣx/Si Superlattices on Si （001）

We have preformed systematical ab initio studies of the structural and electronic properties of short-period Si1-xⅣx/Si （x = 0.125, 0.25, 0.5, Ⅳ=Ge, Sn） superlattices （SLs） grown along the [001] direction on bulk Si. The present calculations reveal that the Si0.875Ge0.125/Si, Si0.75Ge0.25/Si and Si0.875Sn0.125/Si are the F-point direct bandgap semiconductors. The technological importance lies in the expectation that the direct gap Si1-xⅣx/Si SLs may be used as components in integrated optoelectronic devices, in conjunction with the already well-established and highly advanced silicon technology.     

（La2／3Ca1／3）（Mn（3—x）／3Gax／3）O3体系巨磁电阻效应和电特性的研究

采用固态反应法制备了（Ｌａ２／３Ｃａ１／３）（Ｍｎ（３－ｘ）／３Ｇａｘ／３）Ｏ３（ｘ＝０．００，０．１０，０．１５，０．２０，０．３０）体系的系列样品。通过系统地测量其零场和１．６特斯拉（Ｔ）磁场下样品的电阻率－温度关系以及一定温度下磁电阻率与磁场的关系，发现随Ｇａ＾３＋替代量的增加其磁电阻率峰和电阻率峰均向低温方向移动，磁电阻率峰值增大，并伴生磁电阻率峰展宽效应。作者认为，上述结果是由于Ｇａ＾３     

混晶（RbxK1—x）2SnCl6的相变研究

用非极性喇曼散射光谱研究了混晶（ＲｂｘＫ１－ｘ）２ＳｎＣｌ６性质随组份（０〈ｘ〈１）及温度（１０Ｋ〈Ｔ〈３００Ｋ）的变化，发现在纯Ｋ２ＳｎＣｌ６晶体中用Ｒｂ＾＋部分替代Ｋ＾＋后，将降低原Ｋ２ＳｎＣｌ６的相变温度Ｔｃｌ。当混晶中Ｒｂ＾＋成份超过极限浓度（ｘ〉０．７）后，该相变就被抑制，不同组份样品的同一喇曼模频率，随Ｒｂ＾＋的增加，向低频方向移动，用平均力常数拟合给出很好的理论解释。     

Ge_xSi_（1－x）／Si异质结无间距定向耦合光开关模型分析

提出一种简便可行的ＧｅｘＳｉ１－ｘ异质结无间距定向耦合光开关（ＢＯＡ型－ＢｉｆｕｒｃａｔｉｏｎＯｐｔｉｃａｌＡｃｔｉｖｅ）模型分析方法。该方法采用等离子体包散效应分析了这种光开关的电学调制机理；采用异质结超注原理分析了开关的电学性质；并根据典单模脊形波导理论和上述分析，设计了利用双模干涉机制工作的Ｇｅ０．０５ＳＩ０．９５／Ｓｉ异质结ＢＯＡ型光开关的结构参数和电学参数。     

Direct Observation of NN Pairs Transfer in GaP1-xNx （x=0.12%）

Time-resolved photoluminescence （TRPL） was applied to investigate the transient process in GaP1-xNx （x = 0.12%） alloy. The filling, transferring and decay processes among nitrogen pairs are directly observed. The NN4 pair, either not present or only a small obscure peak under a proper excitation condition in the steady-state photoluminescence spectrum, is well resolved by TRPL.     

BaFCl_（x）Br_（1－x）：Sm~（2＋）中_（5）D_2→~（7）F_

本文以ＢａＦＣｌｘＢｒ－１－ｘ：Ｓｍ２＋Ｄ２→７Ｆ０的跃迁几率随ｘ变化为中心对ＢａＦＣｌｘＢｒ－１－ｘ：Ｓｍ２＋体系４ｆ５ｄ带的激发光谱、５Ｄ２→７Ｆ０跃迁的荧光衰减随温度的变化特性、５Ｄ２→７Ｆ０的跃迁几率等进行了研究．从而得出结论：在ＢａＦＣｌｘＢｒ１－ｘ：Ｓｍ２＋中，随Ｂｒ含量的增大，４ｆ５ｄ带与５Ｄ２能级更加接近，使７Ｆ０→Ｄ２的吸收截面增大，从而可能提高在５Ｄ２：能级烧孔的效率．     

Ag／YBa_2Cu_3O（7－x）、Al／YB_2Cu_3O（7－x）界面特性

利用电学测量方法结合二次离子质谱（ＳＩＭＳ）技术对金属Ａｇ和Ａｌ与ＹＢａ２Ｃｕ３Ｏ（７－ｘ）（ＹＢＣＯ）超导薄膜接触界面电学性质和互扩散特征进行了测试分析．分析结果显示由于Ａｇ和Ａｌ具有不同的化学性质，二者与ＹＢＣＯ界面的互扩散特性有明显不同．这些不同影响到接触界面的电学性质和接触窗口下ＹＢＣＯ的超导性能．在Ａｇ／ＹＢＣＯ样品中，在高于３５０℃以上的温度下氧气氛中退火将引起Ａｇ和Ｏ的界面互扩散，但对ＹＢＣＯ体内Ｏ的分布及ＹＢＣＯ的超导性能影响不大，且有利于在界面形成好的电学接触；在Ａｌ／ＹＢＣＯ样品中，在高于３５０℃以上的温度下氧气氛中退火后，界面则主要发生Ｏ向Ａｌ膜体内的扩散，并在Ａｌ和ＹＢＣＯ界面生成一不导电的氧化层，这些将影响到ＹＢＣＯ体内Ｏ的分布和接触窗口下的ＹＢＣＯ的超导性能．在合适的退火条件（约５００℃氧气氛中）下退火，Ａｇ与ＹＢＣＯ将形成小的接触电阻，利用剥离工艺制备的样品，其界面接触电阻率ρ（ρｃ＝Ｒ×Ａ）高于是１０（－６）Ωｃｍ２．     

Bi_（2．2）Sr_（1．8）Ca_（1．05）Cu（2．15－x）NaxO_

本文介绍了用熔融法制备Ｂｉ２．２Ｓｒ１．８Ｃａ１．０５Ｃｕ２．１５－ｘＮａｘＯ８＋ｙ（ｘ＝０，０．４～０．８）样品，发现诸样品零电阻温度都在９０Ｋ左右，其小ｘ＝０．７．Ｔｃ０达到９２，５Ｋ．在８１Ｋ较高温区，该类样品仍然表现出良好的超导电性，其临界电流密度还达到１０３Ａ／ｃｍ２量级．     

In_xGa_（1－x）As缓冲层上In_yGa_（1－y）As／（Al）Ga

本文中，发现在Ｉｎ＿ｘＧａ＿(１－ｘ)Ａｓ缓冲层上非故意掺杂的ＩｎｙＧａ＿(１－ｙ)Ａｓ／（Ａｌ）ＧａＡｓ超晶格样品中存在着两个互相反向的自建电场区，一个位于样品表面，另一个位于Ｉｎ＿ｘＧａ＿(１－ｘ)Ａｓ缓冲层和超晶格界面．据此，合理地解释了样品的光伏测试结果，并对此类样品的ＭＯＣＶＤ生长工艺给予指导．     

Formation of Ti1–x Si x and Ti1–x Si x N films by magnetron co-sputtering

The paper reports on surface morphology, structure and microhardness of TiSi–N films formed by cosputtering from two target-facing unbalanced magnetrons, equipped with pure Ti and Si targets, on an unheated substrate rotating in front of both targets. The ratio Si/Ti in the TiSi–N film was achieved by modifying the magnitude of currents in the individual magnetrons and by the addition of nitrogen to the film. The rotation of the substrate has a strong effect on the film deposition rate and its morphology. The deposition rate is 3 times lower than that of the film deposited on a stationary substrate. The surface roughness of a polycrystalline Ti film deposited on the rotating substrate is considerably higher than that on a stationary substrate. On the contrary, the surface of an amorphous Si film is smooth and there is no difference between the roughness of Si films sputtered on stationary and on rotating substrates. The hardness of the film increases with increasing Si content and with the addition of nitrogen to the TiSi film. The Ti(26 at.%)Si(8.5 at.%)N(65 at.%)-film sputtered on an unheated rotating steel substrate, held at a floating potential, exhibited the best result with a hardness of 29 GPa.     

GexSi1—x／Si应变超晶格雪崩光电探测器的分析与优化设计

对ＧｅｘＳｉ１－ｘ／Ｓｉ应变超晶格雪崩光电探测器进行了分析与优化设计，优化结构为：ｉ－Ｓｉ雪崩区厚是１．８～２μｍ；ｐ－Ｓｉ区的掺杂浓度是１０＾１８ｃｍ＾－３厚为１７ｎｍ超晶格总厚为３４０ｎｍ，它可探测１．３～１．６μｍ的红外光。     

GexSi1—x／Si异质结无间距定向耦合光开关模型分析

提出一种简便可行的ＧｅｘＳｉ１－ｘ异质结无间向耦合光开关（ＢＯＡ型－Ｂｉｆｕｒｃａｔｉｎ ＯｐｔｉｃａｌＡｃｔｉｖｅ）。该方法采用等离子体色散效应分析了这种光开关学调制查理；采用异质结超注原理分析了开关的电学性质，并根据曲单模脊形波导理论和上述，设计了利用双模干涉机制工作的Ｇｅ０．０５Ｓｉ０．９５／Ｓｉ异质结ＢＯＡ型光开并的结构参数和电学参数。     

Si1—xGex／Si脊形波导X型分支器的研制

采用分子束外延方法制作低损耗Ｓｉ１－ｘＧｅ／Ｓｉ异质结脊形光波导，在Ｘ型交叉波导上实现了Ｓｉ１－ｘＧｅｘ／Ｓｉ光分支器的功能，设计中采用了ＳｉＧｅ大截面脊形波导的单模条件和交波导传输特性分析的结果。Ｘ型光分支器的实现为进下Ｓｉ１－ｘＧｅｘ／Ｓｉ光开关和光电调制器积累了经验。     

Anomalous magnetostrictive effects in （La1—xTbx）2／3Sr1／3 MnO3

A series of (La_{1-x}Tb_x)_{2/3}Sr_{1/3}MnO_3 polycrystalline samples has been studied by means of x-ray diffraction, magnetostriction, and thermal expansion measurements. It has been found that this series undergoes a phase transition from a rhombohedral to an orthorhombic form at the doping level x≈0.20 at room temperature accompanied by an anisotropic magnetostriction up to －50×10^{-6} under a magnetic field of 1T. The linear and volume magnetostrictions vary with chemical composition, even change sign. At T=80K, the magnetostrictions for the samples of x=0.20 and 0.40 exhibit different behaviours. The sample of x=0.20 has positive volume and linear magnetostrictions and a negative anisotropic magnetostriction, while the sample of x=0.40 has an opposite behaviour. The magnitude of volume magnetostriction for both the samples is essential (～10^{-4}) at T=80K under a magnetic field of 4T. We conclude that these anomalous effects are due to the charge delocalization and the structural phase transition between orthorhombic and rhombohedral forms induced by the applied magnetic field.