退火气压对Bi3.25La0.75Ti3O12铁电薄膜的微观结构和铁电性能的影响

采用sol-gel法在Pt/TiO₂/SiO₂/p-Si(100)衬底上制备了Bi_3.25La_0.75Ti₃O₁₂(BLT)铁电薄膜,研究了在750 ℃时不同退火气压(p_{O2:10^-4—3 atm)对薄膜微观结构和电学性能的影响.XRD和拉曼光谱结果表明在10^-4和3 atm氧气压下退火 关键词： 3.25}La_0.75Ti₃O₁₂')" href="#">Bi_3.25La_0.75Ti₃O₁₂ 铁电性能 sol-gel法 正交化度     

La掺杂对Bi4Ti3O12薄膜铁电性能的影响

利用Sol-Gel法在Pt/Ti/SiO2/Si衬底上制备出Bi4Ti3O12和Bi3.25La0.75Ti3O12薄膜,研究了La掺杂对Bi4Ti3O12薄膜的晶体结构、铁电性能和疲劳特性的影响,发现La掺杂没有改变Bi4Ti3O12薄膜的基本晶体结构,并且提高了Bi4Ti3O12铁电薄膜的剩余极化值和抗疲劳性能,对La掺杂改善Bi4Ti3O12铁电薄膜性能的机理进行了讨论.     

化学溶液法制备的Bi3.25La0.75Ti3O12和Bi3.25Nd0.75Ti3O12薄膜的光学特性

采用化学溶液方法在(111)Pt／Ti/SiO2/Si衬底上制备了Bi3.25La0.75Ti3O12(BLT)和Bi3.25Nd0.75Ti3O12(BNT)薄膜．x射线衍射测试表明，两种薄膜都为单一的层状钙钛矿结构．扫描电子显微镜分析显示，BNT薄膜由大而均匀的棒状晶粒组成，BLT薄膜的组成晶粒则较小．采用紫外一近红外椭圆偏振光谱仪测试了200-100nm波长范围的椭圆偏振光谱，拟合得到薄膜的光学常数(折射率和消光系数)和厚度，确定BLT薄膜的禁带宽度分别为4．30和3．61eV，并采用单电子振子模型分析了薄膜在带间跃迁区的折射率色散关系．     

Si基Bi3.25La0.75Ti3O12铁电薄膜的制备与特性研究

采用Sol-Gel工艺低温制备了Si基Bi3.25La0.75Ti3O12铁电薄膜.研究了退火温度对薄膜微观结构、介电特性与铁电性能的影响.500℃退火处理的Bi3.25La0.75Ti3O12薄膜未能充分晶化,晶粒细小且有非晶团聚,介电与铁电性能均较差.高于550℃退火处理的Bi3.25La0.75Ti3O12薄膜表面平整无裂纹,晶粒均匀,无焦碌石相或其他杂相,薄膜为多晶生长,具有较好的介电与铁电性能,4V电压下的漏电流密度低于2×10-8A/cm2.随退火温度升高,晶化程度的提升和晶粒尺寸的增大使薄膜的剩余极化增大而矫顽电场降低.600℃退火处理的Bi3.25La0.75Ti3O12薄膜显示了优于Bi4Ti3O12薄膜的铁电性能,其剩余极化Pr和矫顽电场Ec分别达到17.5μC/cm2和102kV/cm.     

(Bi, La)4Ti3O12-Sr(Bi, La)4Ti4O15共生结构铁电材料性能研究

采用固相烧结工艺,制备了不同La掺杂量(x=0.00,0.25,0.50,0.75,1.00,1.25和1.50)的(Bi, La)4Ti3O12-Sr(Bi, La)4Ti4O15 (SrBi8-xLaxTi7O27)共生结构铁电陶瓷样品.用x射线衍射对其进行微结构分析,并测量铁电、介电性能.结果发现,La掺杂未改变Bi4Ti3O12-SrBi4Ti4O15共生结构铁电材料的晶体结构.随掺杂量的增加,样品的矫顽场(Ec)略有增加,剩余极化(2Pr)先增大,后减小.在x＝0.50时,2Pr达到极大值,为25.6 μC*cm-2,与Bi4Ti3O12-SrBi4Ti4O15相比,2Pr增加了近60%,而Ec仅增加约10%.随La掺杂量的增加,样品的居里温度TC逐渐降低,x＝0.50时,TC=556 ℃.在x=1.50时,样品出现弛豫铁电体的典型特征.     

化学溶液法制备的Bi3.25La0.75Ti3 O12和Bi3.25Ndo.75 Ti3 O12薄膜的光学特性

采用化学溶液方法在(111)Pt/Ti/SiO2/Si衬底上制备了Bi3.25La0.75Ti3O12(BLT)和Bi3.25Nd0.75Ti3O12(BNT)薄膜.x射线衍射测试表明,两种薄膜都为单一的层状钙钛矿结构.扫描电子显微镜分析显示,BNT薄膜由大而均匀的棒状晶粒组成,BLT薄膜的组成晶粒则较小.采用紫外-近红外椭圆偏振光谱仪测试了200-1700nm波长范围的椭圆偏振光谱,拟合得到薄膜的光学常数(折射率和消光系数)和厚度,确定BLT和BNT薄膜的禁带宽度分别为4.30和3.61eV,并采用单电子振子模型分析了薄膜在带间跃迁区的折射率色散关系.     

Si基Bi4Ti3O12铁电薄膜的制备与特性研究

采用sol-gel工艺,在分层快速退火的工艺条件下成功地制备了高质量Si基BiTi3O12铁电薄膜.研究了Si基Bi4Ti3O12薄膜的生长行为、铁电性能、C-V特性和疲劳特性.研究表明:Si基Bi4Ti3O12薄膜具有随退火温度升高沿c轴择优生长的趋势;退火温度通过影响薄膜的晶粒尺寸、生长取向和薄膜中载流子的浓度来改变Si基Bi4Ti3O12薄膜的铁电性能;Ag/Bi4Ti3O12/p-Si异质结的C-V特性曲线呈现顺时针回滞,可以实现极化存储;109次极化反转后Bi4Ti3O12薄膜的剩余极化仅下降12%,具有较好的疲劳特性.     

Effect of Annealing Temperature on Electrical Properties of Ferroelectric Bi3.25La0.75Ti3O12 Capacitors

Lanthanum-modified bismuth titanate (Bi_3.25La_0.75Ti₃O₁₂, BLT) thin films arefabricated on platinized Si wafers by the sol-gel method, and the effect of annealing temperatures ranging from 650°C to 800°C on the electrical properties of Pt/BLT/Pt capacitors are investigated. It is found that polarization and leakage current of BLT capacitors strongly depend on the annealing temperature although all the capacitors demonstrate very similar characteristics, except the value of polarization, in pulse-width dependence, retention, and fatigue. Remanent polarization increases with the increase of annealing temperature, and annealing temperature of 700°C can yield thelargest remanent polarization, and then polarization decreases with increasing annealing temperature. For the 700°C annealed Pt/BLT/Pt capacitor, the remanent polarization 2P_r and the coercive field 2E_c, at an electric field of 226kV/cm, are 23.8μC/cm² and 130kV/cm, respectively. Dielectric breakdown voltages of BLT films annealed at 750°C and 800°C are much lower than those annealed at 650°C and 700°C. At 100kV/cm, the leakage currents of BLT films prepared at 650°C and 700°C are only1.5×10^-6A/cm² and 8.9×10-7A/cm², espectively. Moreover, all the Pt/BLT/Pt capacitors exhibit excellent retention properties after a cumulative time of 1× m 10⁴s and do not show any significant fatigue up to 1×10¹⁰ switching cyclesat frequency of 1MHz.     

La掺杂对Bi4Ti3O12薄膜铁电性能的影响

利用Sol-Gel法在Pt/Ti/SiO₂/Si衬底上制备出Bi₄Ti₃O₁₂和Bi_3.25La_0.75Ti₃O₁₂薄膜，研究了La掺杂对Bi₄Ti₃O₁₂薄膜的晶体结构、铁电性能和疲劳特性的影响，发现La掺杂没有改变Bi₄Ti₃O₁₂薄膜的基本晶体结构，并且提高了Bi₄Ti₃O₁₂铁电薄膜的剩余极化值和抗疲劳性能，对La掺杂改善Bi₄Ti₃O₁₂铁电薄膜性能的机理进行了讨论. 关键词： 铁电性能 4Ti₃O₁₂薄膜')" href="#">Bi₄Ti₃O₁₂薄膜 3.25La_0.75Ti₃O₁₂薄膜')" href="#">Bi_3.25La_0.75Ti₃O₁₂薄膜 sol-gel法 La掺杂     

La掺杂SrBi4Ti4O15铁电材料性能研究

按x=0 0 0 ,0 10 ,0 2 5 ,0 5 0 ,0 75和 1 0 0 ,采用固相烧结工艺 ,制备了不同La掺杂量的SrBi4-xLaxTi4O1 5的陶瓷样品 .用x射线衍射对其微结构进行了分析 ,并测量了铁电、介电性能 .结果发现 ,La掺杂未改变SrBi4Ti4O1 5的晶体结构 .随掺杂量的增加 ,样品的矫顽场 (Ec)下降 ,剩余极化 ( 2Pr)先增大 ,后减小 .在x =0 2 5时 ,2Pr 达到极大值 ,为2 4 2 μC·cm- 2 ,这时Ec=60 8kV·cm- 1 ,与SrBi4Ti4O1 5相比 ,2Pr 增加了近 5 0 % ,而Ec 下降了近 2 5 % ,材料铁电性能显著提高 .SrBi4-xLaxTi4O1 5的相变温度Tc 随x的增加逐渐降低 ,x =0 2 5时 ,Tc=45 1℃ .在x =0 75 ,1 0 0时 ,样品出现弛豫铁电体的典型特征     

Si基铁电Bi3.15Nd0.85Ti3O12多层薄膜的一致取向生长和性能的研究

采用脉冲激光沉积(PLD)技术,利用LSCO/CeO2/YSZ多异质缓冲层,在Si(100)基片上成功地制备了c轴一致取向的Bi3.15Nd0.85Ti3O12(BNT)铁电薄膜.利用X射线衍射(XRD)和扫描电镜(SEM)分析测定了薄膜的相结构、取向和形貌特征,考察了沉积温度和氧分压对BNT薄膜微结构、取向和形貌的影响,确定了BNT薄膜的最佳沉积条件.对在优化的条件下制备得到的BNT薄膜的C-V曲线测试得到了典型的蝴蝶形曲线,表明该薄膜具有较好的电极化反转存储特性.最后讨论了BNT薄膜铁电性能与薄膜取向的相关性.     

Structural and optical properties of Bi3.25Nd0.75Ti3O12 ferroelectric thin films

Ferroelectric Bi_3.25Nd_0.75Ti₃O₁₂ (BNT) thin films were grown on (111)Pt/Ti/SiO₂/Si substrates by a chemical solution method. The films were composed of large rod-like grains. XRD and Raman spectroscopy measurements showed they were polycrystalline perovskite structure with a good crystallinity. Pt/BNT/Pt capacitors had been fabricated and showed good ferroelectricity. The optical constants (n, k) of BNT thin films in the wavelength ranges of 0.2–1.7 μm and 2.5–11.4 μm were obtained by spectroscopic ellipsometry measurements. The dispersion of the refractive index in the interband transition region followed the single electronic oscillator model. The optical band gap was found to be about 3.61 eV. PACS 77.84.-s; 78.20.Ci; 77.80.-e     

Nd掺杂对Bi4Ti3O12铁电薄膜的微结构和铁电性能的影响

利用溶胶-凝胶法在Pt/Ti/SiO₂/Si(100)衬底上制备了Nd掺杂Bi₄Ti₃O₁₂(Bi_4-xNd_xTi₃O₁₂, x=0.00,0.30,0.45,0.75,0.85,1.00,1.50)铁电薄膜样品.研究了Nd掺杂对Bi₄Ti₃O₁₂薄膜的微结构和铁电性能的影响.研究结果表明:Nd掺杂未改变Bi₄Ti₃O₁₂薄膜的基本晶体结构.在掺杂量x<0.45时,Nd³⁺只取代类钙钛矿层中的A位Bi³⁺.当x=0.45时,样品剩余极化强度达最大值,在270kV·cm^-1的电场下为32.7μC·cm^-2.掺杂量进一步增加时,结构无序度开始明显增大,Nd³⁺开始进入(Bi₂O₂)²⁺层,削弱其绝缘层和空间电荷库的作用,导致材料剩余极化逐渐下降.当掺杂量x达到1.50时,掺杂离子最终破坏(Bi₂O₂)²⁺层的结构,材料发生铁电-顺电相变.     

SrBi2Ta2O9/Bi4Ti3O12复合铁电薄膜的制备与特性研究

采用溶胶凝胶工艺在p-Si衬底上制备了SrBi2Ta2O9/Bi4Ti3O12复合铁电薄膜. 研究了SrBi2Ta2O9/Bi4Ti3O12复合薄膜的微观结构与生长行为、铁电性能和疲劳特性. 研究表明: Si衬底Bi4Ti3O12薄膜易于沿c轴择优生长,并有利于SrBi2Ta2O9/Bi4Ti3O12复合薄膜的生长.合理的SrBi2Ta2O9/Bi4Ti3O12厚度配比能获得较好的铁电性能和优良的抗疲劳特性,SrBi2Ta2O9/Bi4Ti3O12厚度配比为1∶3的复合薄膜的剩余极化强度和矫顽电场分别为8.1 μC/cm2 和 130 kV/cm,其无疲劳极化开关次数达1011以上.     

Ag/Bi4Ti3O12栅n沟道铁电场效应晶体管制备及存储特性

在溶胶-凝胶工艺获得高质量Bi4Ti3O12薄膜的基础上,制备了Ag/Bi4Ti3O12栅n沟道铁电场效应晶体管. 研究了Si基Bi4Ti3O12薄膜的生长特性及其对铁电薄膜/硅的界面状态和铁电场效应晶体管存储特性的影响. 研究表明,在合理的工艺条件下可以获得具有较高c-轴择优取向的纯钙钛矿相Si基Bi4Ti3O12铁电薄膜并有利于改善Bi4Ti3O12/Si之间的界面特性; 顺时针回滞的C-V特性曲线和C-T曲线表明Ag/Bi4Ti3O12栅n沟道铁电场效应晶体管具有极化存储效应和一定的极化电荷保持能力; 器件的转移(Isd-VG)特性曲线显示Ag/Bi4Ti3O12栅n沟道铁电场效应晶体管具有明显的栅极化调制效应.     

Large nonlinear optical response of polycrystalline Bi3.25La0.75Ti3O12 ferroelectric thin films on quartz substrates

We measure the nonlinear susceptibility of Bi(3.25)La(0.75)Ti(3)O(12) (BLT) thin films grown on quartz substrates using the Z-scan technique with picosecond laser pulses at a wavelength of 532 nm. The third-order nonlinear refractive index coefficient gamma and absorption coefficient beta of the BLT thin film are 3.1 x 10(-10) cm(2)/W and 3 x 10(-5) cm/W, respectively, which are much larger than those of most ferroelectric films. The results show that the BLT thin films on quartz substrates are good candidate materials for applications in nonlinear optical devices.     

烘烤温度对溶胶-凝胶法制备镧掺杂钛酸铋薄膜结构与铁电性质的影响

采用溶胶-凝胶法，在保持薄膜结晶温度和有机物分解温度相同情况下，发现烘烤温度（即溶剂的挥发温度）对镧掺杂钛酸铋薄膜的晶体结构、表面形貌和铁电性质均产生重要影响.在较低烘烤温度下得到的薄膜（117）择优取向明显.但随着烘烤温度增加，薄膜的（117）择优取向逐渐减弱.薄膜的表面晶粒形貌则从棒状逐渐转变为盘状.还测量了薄膜的铁电性质，发现在250℃烘烤温度下得到的薄膜具有最大的剩余极化强度，2Pr为28.4μC/cm2.对实验现象进行了定性解释. 关键词： 溶胶-凝胶法 烘烤温度 铁电薄膜