Matrix-assisted pulsed laser evaporation of polyfluorene thin films

Poly(9,9-dioctylfluorene) (PF8) thin films have been deposited by matrix-assisted pulsed laser evaporation (MAPLE) using a KrF excimer laser. The influence of the laser fluence (50-500 mJ/cm²) and the nature of the solvent (chloroform, toluene, tetrahydrofuran) on the films properties have been studied. The chemical composition of the deposited films was investigated by Fourier transform infrared (FTIR) spectroscopy and compared with the one of spin coated films. To investigate the effect of the deposition parameters on the optical properties of the films, photoluminescence (PL) measurements were performed. Poor structural and optical properties were observed for films deposited starting from chloroform solutions. When using toluene as solvent, the spectra characteristics improved with increasing laser fluence, while wide PL spectra were observed. The characteristic emission bands of the PF8 polymer were nicely detected for films deposited starting from a tetrahydrofuran (THF) solution. Moreover, in this last case, the PF8 structure is preserved at high laser fluences, too.     

Polycaprolactone biopolymer thin films obtained by matrix assisted pulsed laser evaporation

We report the successful deposition of polycaprolactone polymer by MAPLE using a KrF* excimer laser (λ = 248 nm, τ = 7 ns). According to FTIR spectra the deposited films have similar chemical structure to the dropcast material. The fluence plays a key role in optimizing the performances of MAPLE-synthesized polycaprolactone structures. We demonstrated that MAPLE allows for controlling the morphology of films to the level required in targeted drug delivery of pharmacologic agents.     

Functional polyethylene glycol derivatives nanostructured thin films synthesized by matrix-assisted pulsed laser evaporation

We report the thin film deposition by matrix-assisted pulsed laser evaporation (MAPLE) of a polymer conjugate with an hydrophilic sequence between metronidazole molecules that was covalently attached to both oligomer ends of carboxylate poly(ethylene glycol) (PEG 1.5-metronidazole). A pulsed KrF* excimer laser was used to deposit the drug-polymer composite films. Fourier transform infrared spectroscopy was used to demonstrate that MAPLE-transferred materials exhibited chemical properties similar to the starting materials. The dependence of the surface morphology on incident laser fluence is given.     

热蒸发与离子束溅射制备LaF3薄膜的光学特性

研究了钼舟热蒸发工艺和离子束溅射方法制备的单层LaF₃薄膜的特性。首先,采用分光光度计测量了LaF₃薄膜的透射率和反射率光谱,使用不同模型拟合得出薄膜的折射率和消光系数。然后,采用应力仪测量了加热和降温过程中LaF₃薄膜的应力-温度曲线。最后,采用X射线衍射仪测试了薄膜的晶体结构。实验结果表明,热蒸发制备的LaF₃（RH LaF₃）存在折射率的不均匀性,在193 nm,其折射率和消光系数分别为1.687和5×10^-4,而离子束溅射制备的LaF₃（IBS LaF₃）折射率和消光系数分别为1.714和9×10^-4。两种薄膜表现出相反的应力状态,RH LaF₃薄膜具有张应力,而IBS LaF₃具有压应力,退火之后其压应力减小。热蒸发制备的MgF₂/LaF₃减反膜在193 nm透过率为99.4%,反射率为0.04%,离子束溅射制备的AlF₃/LaF₃减反膜透过率为99.2%,反射率为0.1%。     

Laser deposition of cryoglobulin blood proteins thin films by matrix assisted pulsed laser evaporation

We report the first successful deposition of type II cryoglobulin blood protein thin films by matrix assisted pulsed laser evaporation (MAPLE) using a KrF^* excimer laser source (λ = 248 nm, τ_FWHM ≈ 20 ns) operated at a repetition rate of 10 Hz. We demonstrate by AFM and FTIR that MAPLE-deposited thin films consist of starting type II cryoglobulin only, maintaining its chemical structure and biological functionality, being properly collected and processed. The dependence on incident laser fluence of the induced surface morphology is presented. The presence of type II cryoglobulin was revealed as aggregates of globular material in the MAPLE-deposited thin films and confirmed by standard cryoglobulin tests.     

Silicon nano-wires fabricated by thermal evaporation of silicon wafer

Thin silicon nano-wires (SiNWs) with a diameter of 10–20 nm were fabricated by a simple thermal evaporation of silicon wafer at 1523 K. The gold produced by an electrochemical method was covered on the wafer surface as catalyst. It was found that the SiNWs are amorphous and its Raman peak shifted down maybe due to the effect of laser heating and quantum confinement. Finally, a temperature gradient growth model is suggested to explain the growth direction of SiNWs.     

热沉积法制备纳米二硫化钼薄膜及其光电特性研究

以M oS2粉末为原料,以氩气为携载气体,在400～600℃温度范围内利用热蒸发方法在硅衬底表面制备了不同厚度的M oS2薄膜．利用X射线衍射和扫描电子显微镜分析了M oS2薄膜的结构和表面形貌,发现M oS2薄膜由多晶M oS2粒子组成,颗粒均匀,平均纳米颗粒尺寸约为60 nm ．利用紫外可见光光谱仪测量了其吸收特性,发现样品在720 nm附近有很强的吸收．应用霍尔效应和伏安法研究了M oS2/Si样品的接触特性和电子的运输特性,发现该异质结具有良好的整流特性,即正向电压下电流随电压呈指数增长,而在反向偏压下漏电流很小,电子迁移率可达到6．730×102 cm2/（V · s）．实验结果表明MoS2薄膜具有良好的电学特性,可用来制备晶体管和集成电路等器件．     

Pulsed laser deposition of doped skutterudite thin films

Ca_xCo₄Sb₁₂ skutterudite thin films have been prepared by pulsed laser deposition using a Nd:YAG laser working at 532 or 266 nm of wavelength. Characterization has been carried out by X-ray diffraction, atomic force microscopy and scanning electron microscopy. Emphasis has been put on the difficulty to obtain the skutterudite phase. Influence of the deposition temperature, the way of sticking the substrate, the laser fluence, the base pressure prior to deposition and the laser wavelength has been studied. All parameters revealed to have a drastic effect, and the skutterudite could only be achieved in a very narrow range of temperature and laser fluence, for a given wavelength, showing the importance on how these parameters are measured to ensure reproducible results.     

Matrix assisted pulsed laser evaporation of cinnamate-pullulan and tosylate-pullulan polysaccharide derivative thin films for pharmaceutical applications

We have demonstrated the successful thin film growth of two pullulan derivatives (cinnamate-pullulan and tosylate-pullulan) using matrix assisted pulsed laser evaporation (MAPLE). Our MAPLE system consisted of a KrF* laser, a vacuum chamber, and a rotating target holder cooled with liquid nitrogen. Fused silica and silicon (1 1 1) wafers were used as substrates. The MAPLE-deposited thin films were characterized by transmission spectrometry, profilometry, atomic force microscopy (AFM), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy. The deposited layers ranged from 250 nm to 16.5 μm in thickness, depending on the laser fluence (0.065-0.5 J cm⁻²) and number of pulses applied for the deposition of one structure (1500-13,300). Our results confirmed that MAPLE was well-suited for the transfer of cinnamate-pullulan and tosylate-pullulan.     

Structural and optoelectronic properties of antimony tin sulphide thin films deposited by thermal evaporation techniques

Thin films of SnSb₂S₄ have been prepared on glass substrate by using thermal evaporation techniques. The films were annealed in argon gas at low pressure in sealed glass ampoules at 85 °C, 150 °C, 275 °C and 325 °C. XRD of the films reveal that the low temperature annealed films are poly crystalline while the as deposited films and high annealed films are in amorphous states. There is no adequate variation in the photoconductivity response of the amorphous and crystalline phases. The transmittance of the films is low and having no transmittance below 740 nm. The band gap calculated by ellipsometry technique is in the range of 1.82–3.1 eV. The films have n-type conductivity but the film annealed at 325 °C show p-type conductivity.     

Fabrication and characterization of ZnO micro and nanostructures prepared by thermal evaporation

A simple method of thermal evaporation to fabricate micro and nanostructures of zinc oxide was presented. ZnO micro and nanostructures, prepared under different quantity of O₂, were characterized by techniques such as scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy and analytical transmission electron Microscope. The SEM images indicated that the products prepared under the condition of sufficient O₂ were needle-like microrods and the samples synthesized under the condition of deficient O₂ were nanorods and nanowires with very high aspect ratio. The results of XRD and Raman shifts revealed that the ZnO micro and nanostructures synthesized under different quantity of O₂ were both single crystalline with the hexagonal wurtzite structure. The HRTEM images indicated that the ZnO nanowire prepared under the condition of deficient O₂ was single crystalline and grown along the direction of [0 0 1]. Photoluminescence measurement was carried out and it showed that the spectra of ZnO micro and nanostructures prepared under different quantity of O₂ exhibited similar emission features. In addition, the growth mechanism of ZnO micro and nanostructures was preliminarily discussed.     

Matrix assisted pulsed laser evaporation processing of triacetate-pullulan polysaccharide thin films for drug delivery systems

We report the first successful deposition of triacetate-pullulan polysaccharide thin films by matrix assisted pulsed laser evaporation. We used a KrF* excimer laser source (λ = 248 nm, τ ≈ 20 ns) operated at a repetition rate of 10 Hz. We demonstrated by FTIR that our thin films are composed of triacetate-pullulan maintaining its chemical structure and functionality. The dependence on incident laser fluence of the induced surface morphology is analysed.     

Pulsed laser deposition of fluoride glass thin films

The development of integrated waveguide lasers for different applications such as marking, illumination or medical technology has become highly desirable. Diode pumped planar waveguide lasers emitting in the green visible spectral range, e.g. thin films from praseodymium doped fluorozirconate glass matrix (called ZBLAN, owing to the main components ZrF₄, BaF₂, LaF₃, AlF₃ and NaF) as the active material pumped by a blue laser diode, have aroused great interest. In this work we have investigated the deposition of Pr:ZBLAN thin films using pulsed laser radiation of λ = 193 and λ = 248 nm. The deposition has been carried out on MgF₂ single crystal substrates in a vacuum chamber by varying both processing gas pressure and energy fluence. The existence of an absorption line at 210 nm in Pr:ZBLAN leads to absorption and radiative relaxation of the absorbed laser energy of λ = 193 nm preventing the evaporation of target material. The deposited thin films consist of solidified and molten droplets and irregular particulates only. Furthermore, X-ray radiation has been applied to fluoride glass targets to enhance the absorption in the UV spectral region and to investigate the deposition of X-ray treated targets applying laser radiation of λ = 248 nm. It has been shown that induced F-centres near the target surface are not thermally stable and can be easily ablated. Therefore, λ = 248 nm is not suitable for evaporation of Pr:ZBLAN.     

微柱状CsI闪烁薄膜热蒸发生长工艺

采用真空热蒸发法在石英玻璃基片上制备了具有特殊微柱状结构的碘化铯闪烁薄膜。运用扫描电子显微镜、X射线衍射仪和荧光光谱仪分别对碘化铯薄膜的形貌、结构及发光性能等进行了表征与分析。结果表明：在基片温度为260 ℃、沉积速率为3 nm·s-1时,所生长的碘化铯薄膜具有理想的微柱形貌、沿（110）晶面的择优取向和良好的透射性能;紫外光激发下,发射主峰为 438 nm,X射线激发下,发射主峰为315 nm,说明短波段发射峰需要的激发能量较高,而长波段发射峰对紫外光激发更为敏感。     

微柱状CsI闪烁薄膜热蒸发生长工艺

采用真空热蒸发法在石英玻璃基片上制备了具有特殊微柱状结构的碘化铯闪烁薄膜。运用扫描电子显微镜、X射线衍射仪和荧光光谱仪分别对碘化铯薄膜的形貌、结构及发光性能等进行了表征与分析。结果表明:在基片温度为260℃、沉积速率为3 nm.s-1时,所生长的碘化铯薄膜具有理想的微柱形貌、沿(110)晶面的择优取向和良好的透射性能;紫外光激发下,发射主峰为438 nm,X射线激发下,发射主峰为315nm,说明短波段发射峰需要的激发能量较高,而长波段发射峰对紫外光激发更为敏感。     

Optical and electrical properties of In-doped CdO thin films fabricated by pulse laser deposition

Transparent indium-doped cadmium oxide (In-CdO) thin films were deposited on quartz glass substrates by pulse laser deposition (PLD) from ablating Cd-In metallic target at a fixed pressure 10 Pa and a fixed substrate temperature 300 °C. The influences of indium concentrations in target on the microstructure, optical and electrical performances were studied. When the indium concentration reaches to 3.9 wt%, the as-deposited In-CdO film shows high optical transmission in visible light region, obviously enhanced direct band gap energy (2.97 eV), higher carrier concentration and lower electric resistivity compared with the undoped CdO film, while a further increase of indium concentration to 5.6 wt% induces the formation of In₂O₃, which reverse the variation of these parameters and performance.     

Reactive pulsed laser deposition of gold nitride thin films

We report on the growth and characterization of gold nitride thin films on Si 〈1 0 0〉 substrates at room temperature by reactive pulsed laser ablation. A pure (99.95%) Au target was ablated with KrF excimer laser pulses in nitrogen containing atmosphere (N₂ or NH₃). The gas ambient pressure was varied in the range 0.1-100 Pa. The morphology of the films was studied by using optical, scanning electron and atomic force microscopy, evidencing compact films with RMS roughness in the range 3.6-35.1 nm, depending on the deposition pressure. Rutherford backscattering spectrometry and energy dispersion spectroscopy (EDS) were used to detect the nitrogen concentration into the films. The EDS nitrogen peak does not decrease in intensity after 2 h annealing at 250 °C. Film resistivity was measured using a four-point probe and resulted in the (4-20) × 10⁻⁸ Ω m range, depending on the ambient pressure, to be compared with the value 2.6 × 10⁻⁸ Ω m of a pure gold film. Indentation and scratch measurements gave microhardness values of 2-3 GPa and the Young's modulus close to 100 GPa. X-ray photoemission spectra clearly showed the N 1s peak around 400 eV and displaced with respect to N₂ phase. All these measurements point to the formation of the gold nitride phase.     

Synthesis and characterization of ZnO thin films by thermal evaporation

ZnO thin films have been successfully synthesized by thermal evaporation of pure zinc at 900 °C under the flow of different percentages of argon and oxygen gases. The films were characterized by X-ray diffraction (XRD), variable pressure scanning electron microscopy (VPSEM), energy dispersive X-ray spectroscopy (EDS) and UV–vis spectroscopy. The aim of this paper is to study the influence of the oxygen percentage on the structural and morphological properties of the ZnO films. VPSEM results show that very thick needle structures were produced at high oxygen percentages. EDS results revealed that only Zn and O are present in the sample, indicating a composition of pure ZnO. XRD results showed that the ZnO synthesized under different quantities of oxygen were crystalline with the hexagonal wurtzite structure. UV–vis spectroscopy results indicated that the optical band gap energies from the transmission spectrum are between 3.62 and 3.69 eV for ZnO thin films.