InGaAs/GaAs量子点红外探测器

与量子阱红外探测器相比,量子点红外探测器具有不制作表面光栅就能在垂直入射红外光照射下工作以及工作温度更高等优势。然而,目前阻碍量子点红外探测器性能提高的技术瓶颈主要来自组装量子点较差的大小均匀性、较低的量子点密度以及垂直入射下子带跃迁吸收效率低等原因。利用分子束外延技术研究了如何从量子点材料生长和器件设计两方面来克服这些困难,并且制作了几种不同结构的InGaAs/GaAs量子点红外探测器。 在77 K时,这些器件在垂直入射条件下观察到了很强的光电流信号。     

半导体量子点的发光性质研究

用PL谱测试研究了半导体量子点的光致发光性能,分析了不同In组分覆盖层对分子束外延生长的量子点发光特性的影响,及导致发光峰红移的原因.结果显示,In元素有效抑制界面组分的混杂,使得量子点的均匀性得到改善,PL谱半高宽变窄.用InAs覆盖的In0.5Ga0.5As/GaAs自组织量子点实现了1.3um发光.     

内嵌自组装InAs量子点调制掺杂场效应管的光电特性

研究了阱中生长自组装InAs量子点的光谱特性,获得了室温1.265μm近红外荧光发光,探讨了与量子点尺寸分布相关的发光峰随温度的超常红移现象.制备了内嵌InAs量子点的异质结调制掺杂场效应晶体管,获得了高耐压的场效应器件电学特性,并有望制成新型红外光电探测场效应管.     

内嵌自组装InAs量子点调制掺杂场效应管的光电特性

研究了阱中生长自组装InAs量子点的光谱特性,获得了室温1.265μm近红外荧光发光,探讨了与量子点尺寸分布相关的发光峰随温度的超常红移现象.制备了内嵌InAs量子点的异质结调制掺杂场效应晶体管,获得了高耐压的场效应器件电学特性,并有望制成新型红外光电探测场效应管.     

内嵌自组装InAs量子点调制掺杂场效应管的光电特性

研究了阱中生长自组装InAs量子点的光谱特性，获得了室温1.265μm近红外荧光发光，探讨了与量子点尺寸分布相关的发光峰随温度的超常红移现象. 制备了内嵌InAs量子点的异质结调制掺杂场效应晶体管，获得了高耐压的场效应器件电学特性，并有望制成新型红外光电探测场效应管.     

ZnCdSe/ZnSe单量子阱中的双激子发光谱

在分子束外延生长的ＺｎＣｄＳｅ／ＺｎＳｅ单量子阱结构中,观察到了双激子发光谱．采用不同宽度的量子阱,得出了双激子束缚能与量子阱宽度的依赖关系．研究了双激子发光谱与激发光波长和激发功率的关系．发现在阱内激发的条件下,自由激子更容易由于相互作用而形成双激子,在～１ｍＷ／ｃｍ２的激发功率密度下即可观察到明显的双激子发光．     

InAs量子点低温盖层对其发光特性的影响

采用金属有机物化学气相淀积(MOCVD)技术生长了InAs量子点及不同组分和厚度的量子点低温盖层,采用光致荧光光谱(PL)和时间分辨荧光发射谱(TRPL)研究了量子点在不同低温盖层下的荧光发光性质。对比了常规方法和速率调制外延(FME)法生长GaAs低温盖层的量子点质量,结果表明,FME法生长低温盖层的量子点荧光发射谱光强更强且发光寿命达到0.6ns,明显优于普通方法生长低温盖层的量子点发光寿命。     

气源分子束外延生长的InAs/InP(100)量子点激光器

利用气源分子束外延(GSMBE)技术,在InP(100)衬底上生长InAs量子点激光器.有源区包含5层InAs量子点,每层量子点的平均尺寸是2.9 nm和76 nm,面密度在1010 cm-2左右,势垒层为InGaAsP.室温下量子点的光致发光中心波长在1.55 μm,发光峰半高宽为108 imeV.通过化学湿法腐蚀制备双沟道8μm宽脊条激光器,在20℃连续波工作模式下,腔长为0.7 mm的激光器的阈值电流为143 mA(2.5 kA/cm2),器件的激射中心波长在1.55 μm.由于量子点尺寸的非均匀性,在大电流注入,激光器的激射谱展宽.器件单端面最大输出功率为27 mW,功率斜率效率为130 mW/A.     

InGaAs／GaAs自组织量子点光致发光特性研究

用PL谱测试研究了GaAs和不同In组份InxGa1-xAs(x=0.1,0.2,0.3)覆盖层对分子外延生长的InAs/GaAs自组织量子点发光特性的影响,用InxGa1-xAs外延层覆盖InAs/GaAs量子点,比用GaAs做 其发光峰能量向低有端移动,发光峰半高度变窄,量子点发光峰能量随温度的红移幅度较小,理论计算证实这是由于覆盖层InxGa1-xAs减小了InAs表面应力导致发光峰红移,而In元素有效抑制了InAs/GaAs界面组份的混杂,量子点的均匀性得到改善,PL谱半高宽变窄,用InGaAs覆盖的In0.5Ga0.5As/GaAs自组织量子点实现了1．3μm发光,室温下PL谱半高宽为19．2meV,是目前最好的实验结果。     

提高Si量子点发光强度的途径

探讨了提高Si量子点发光强度的可能途径。这些方法主要包括:采用高密度和小尺寸的有序Si量子点、光学微腔结构、表面钝化处理技术和稀土发光中心掺杂。     

Enhanced Photocurrent Generation in Proton‐Irradiated “Giant” CdSe/CdS Core/Shell Quantum Dots

Group II–VI quantum dots (QDs) possess tunable electrical and optical properties that make them very attractive for high‐tech applications and power generation. The effects of proton irradiation on both the structural and physical properties of “giant” CdSe/CdS core–shell QDs (g‐CS QDs) are investigated. These experiments shed light on photoelectron delocalization in g‐CS QDs, where current linkages and strong variations in optical emission result from the spatial extension of the photoelectron wavefunctions over the conduction bands of CdSe and CdS. Monte Carlo simulations of ion–matter interactions show that the damaging rates can be set from the energy of impinging protons to promote the formation of structural defects in the core or shell. The formation of nanocavities is demonstrated after irradiation doses higher than ≈10¹⁷ H⁺ cm^?2, while a continuous decrease in luminescence intensity is observed for increasing proton fluencies. This feature is accompanied by a concomitant lifetime decrease marking the rise of nonradiative phenomena and the occurrence of greater photocarrier transfers between CdS and CdSe. Current‐to‐voltage characterizations evidence that proton implantation can be implemented to enhance the photocurrent generation in g‐CS QDs. This increase is attributed to the delocalization of photoelectrons in the CdS shell, whose improvement is found to promote electron–hole pair separation.     

InGaAs/GaAs量子阱中自组装InAs量子点的光学性质

在InGaAs/GaAs量子阱中生长了两组InAs量子点样品,用扫描电子显微镜(SEM)测量发现,量子点呈棱状结构,而不是通常的金字塔结构,这是由多层结构的应力传递及InGaAs应变层的各向异性引起的.采用变温光致发光谱(TDPL)和时间分辨谱(TRPL)研究了其光致发光稳态和瞬态特性.研究发现,InGaAs量子阱层可以有效地缓冲InAs量子点中的应变,提高量子点的生长质量,可以在室温下探测到较强的发光峰.在量子阱中生长量子点可以获得室温下1 318 nm的发光,并且使其PL谱的半高宽减小到25 meV.     

硼原子对Si(100)衬底上Ge量子点生长的影响

研究了硼原子对 Si( 1 0 0 )衬底上 Ge量子点自组织生长的影响 .硼原子的数量由 0单原子层变到 0 .3单原子层 .原子力显微镜的观察表明 ,硼原子不仅对量子点的大小 ,而且对其尺寸均匀性及密度都有很大影响 .当硼原子的数量为 0 .2单原子层时 ,获得了底部直径为 60± 5nm,面密度为 6× 1 0 9cm- 2 ,且均匀性很好的 Ge量子点 .另外 ,还简单讨论了硼原子对 Ge量子点自组织生长影响的机制 .     

Enhanced Photoluminescence and Photoresponsiveness of Eu3+ Ions-Doped CsPbCl3 Perovskite Quantum Dots under High Pressure

Metal halide perovskite quantum dots (QDs) have garnered tremendous attention in optoelectronic devices owing to their excellent optical and electrical properties. However, these perovskite QDs are plagued by pressure-induced photoluminescence (PL) quenching, which greatly restricts their potential applications. Herein, the unique optical and electrical properties of Eu³⁺-doped CsPbCl₃ QDs under high pressure are reported. Intriguingly, the PL of Eu³⁺ ions displays an enhancement with pressure up to 10.1 GPa and still preserves a relatively high intensity at 22 GPa. The optical and structural analysis indicates that the sample experiences an isostructural phase transition at approximately 1.53 GPa, followed by an amorphous state evolution, which is simulated and confirmed through density functional theory calculations. The pressure-induced PL enhancement of Eu³⁺ ions can be associated with the enhanced energy transfer rate from excitonic state to Eu³⁺ ions. The photoelectric performance is enhanced by compression and can be preserved upon the release of pressure, which is attributed to the decreased defect density and increased carrier mobility induced by the high pressure. This work enriches the understanding of the high-pressure behavior of rare-earth-doped luminescent materials and proves that high pressure technique is a promising way to design and realize superior optoelectronic materials.     

InP基多周期InAs/InAlGaAs量子点阵列的结构和光学性质

在InP（001）衬底上使用分子束外延技术自组织生长了多周期InAs/InAlGaAs量子点阵列结构。根据对透射电镜和光致发光谱结果的分析，认为引入与InP衬底晶格匹配的InAlGaAs缓冲层可以获得较大的InAs量子点结构，而InAlGaAs层的表面特性对InAs量子点的结构及光学性质有很大影响。对InP基InAlGaAs缓冲层上自组织量子点的形核和演化机制进行了探讨，提出量子点的演化过程表现为量子点的合并长大并伴随着自身的徙动，以获得能量最优的分布状态。     

多层InAs量子点的光致发光研究

采用MBE设备生长了多层InAs/GaAs量子点结构,测量了其变温光致发光谱和时间分辨光致发光谱.结果表明多层量子点结构有利于减小发光峰的半高宽,并且可以提高发光峰半高宽和发光寿命的温度稳定性.实验发现,加InGaAs盖层后,量子点发光峰的半高宽进一步减小,最小达到23.6 meV,并且发光峰出现红移.原因可能在于InGaAs盖层减小了InAs岛所受的应力,阻止了In组分的偏析,提高了InAs量子点尺寸分布的均匀性和质量,导致载流子在不同量子点中的迁移效应减弱.     

Calibration-Free and High-Sensitivity Microwave Detectors Based on InAs/InP Nanowire Double Quantum Dots

At the cutting-edge of microwave detection technology, novel approaches which exploit the interaction between microwaves and quantum devices are rising. In this study, microwaves are efficiently detected exploiting the unique transport features of InAs/InP nanowire double quantum dot-based devices, suitably configured to allow the precise and calibration-free measurement of the local field. Prototypical nanoscale detectors are operated both at zero and finite source-drain bias, addressing and rationalizing the microwave impact on the charge stability diagram. The detector performance is addressed by measuring its responsivity, quantum efficiency and noise equivalent power that, upon impedance matching optimization, are estimated to reach values up to ≈2000 A W⁻¹, 0.04 and ≈${10}^{-16}\mathrm{W}/\sqrt{Hz}$, respectively. The interaction mechanism between the microwave field and the quantum confined energy levels of the double quantum dots is unveiled and it is shown that these semiconductor nanostructures allow the direct assessment of the local intensity of the microwave field without the need for any calibration tool. Thus, the reported nanoscale devices based on III-V nanowire heterostructures represent a novel class of calibration-free and highly sensitive probes of microwave radiation, with nanometer-scale spatial resolution, that may foster the development of novel high-performance microwave circuitries.     

Si(001)斜切衬底上Ge量子点的固相外延生长

研究了Si(001)面偏[110]方向6°斜切衬底上Ge量子点的固相外延生长.实验结果表明,在Si(001)6°斜切衬底上固相外延生长Ge量子点的最佳退火温度为640℃,在斜切衬底上成岛生长的临界厚度低于在Si(001)衬底成岛生长的临界厚度,6°斜切衬底上淀积0.7nm Ge即可成岛,少于Si(001)衬底片上Ge成岛所需的淀积量.从Ge量子点的密度随固相外延温度的变化曲线,得到Ge量子点的激活能为1.9eV,远高于Si(111)面上固相外延Ge量子点的激活能0.3eV.实验亦发现,在Si(001)斜切衬底上固相外延生长的Ge量子点较Si(001)衬底上形成的量子点的热稳定性要好.     

InAs/GaAs系列量子点研究

为了获得波长长、均匀性好和发光效率高的量子点,采用分子束外延(MBE)技术和S-K应变自组装模式,在GaAs(100)衬底上研究生长了三种InAs量子点。采用MBE配备的RHEED确定了工艺参数:As压维持在1.33×10-5Pa;InAs量子点和In0.2Ga0.8As的生长温度为500℃;565℃生长50nmGaAs覆盖层。生长了垂直耦合量子点(InAs1.8ML/GaAs5nm/InAs1.8ML)、阱内量子点(In0.2Ga0.8As5nm/InAs2.4ML/In0.2Ga0.8As5nm)和柱状岛量子点(InAs分别生长1.9、1.7、1.5ML,停顿20s后,生长间隔层GaAs2nm)。测得对应的室温光致发光(PL)谱峰值波长分别为1.038、1.201、1.087μm,半峰宽为119.6、128.0、72.2nm、相对发光强度为0.034、0.153、0.29。根据PL谱的峰位、半峰宽和相对发光强与量子点波长、均匀性和发光效率的对应关系,可知量子点波长有不同程度的增加、均匀性越来越好、发光效率显著增强。