高反射率Mo/B4C多层膜设计及制备

 运用遗传算法优化设计了Mo/B₄C多层膜结构。入射光入射角度取10°时,设计的理想多层膜膜对数为150,周期为3.59 nm,Gamma值（Mo膜厚与周期的比值）为0.41,峰值反射率为33.29%。采用恒功率模式直流磁控溅射方法制作Mo/B₄C多层膜。通过在Mo/B4C多层膜与基底之间增加15 nm厚的Cr粘附层,提高多层膜与基底的粘附力。另外,还采用调整多层膜Gamma值的方法减小其内应力,调整后多层膜结构周期为3.59 nm, Mo膜厚1.97 nm, B4C膜厚1.62 nm,峰值反射率26.34％。制备了膜对数为150的Mo/B₄C膜并测量了其反射率,在波长7.03 nm处,Mo/B₄C多层膜的近正入射反射率为21.0％。最后对测量结果进行了拟合,拟合得到Mo/B₄C多层膜的周期为3.60 nm,Gamma值0.60,界面粗糙度为0.30 nm。     

Effect of Interface Roughness on Perpendicular Magnetic Anisotropy of Fe/Tb Multilayers

Fe/Tb multilayers have been prepared which exhibit significant perpendicular magnetic anisotropy (PMA) even at RT. The effect of systematic variation in the interface roughness on PMA has been studied in these multilayers which were deposited simultaneously on a set of float glass substrates prepared with varying root mean square surface roughness. The amount of intermixing at the interfaces and uncorrelated part of the interface roughness of different multilayers remain similar, thus allowing one to separate out the effect of the correlated interface roughness only. X-ray reflectivity and conversion electron Mössbauer spectroscopy and SQUID magnetometry was used to characterise the systems. PMA was found to depend weakly on the correlated interface roughness.     

Study of vapor condensation on curvilinear fins under influence of capillary forces and gravity

The problem on film vapor condensation on curvilinear fins is solved numerically with regard to surface tension and gravity. Steam condensation on a fin of optimized and semicircular form was calculated for various inclinations of the fin relative to the direction of gravity vector and the levels of groove flooding. The calculations showed that the average heat transfer coefficient for a semicircular fin slightly decreases with changing the fin position relative to the direction of gravity vector, at that, the “zero” flow point from which the condensate flows in different directions shifts. For an optimized fin, there is no such shift, and the heat transfer coefficient does not practically change. The top of an optimized fin with a large curvature serves as a kind of "barrier" for the flow. The heat transfer coefficients on optimized fins are significantly higher than those on semicircular fins. The amount of the level of groove flooding significantly affects the condensation efficiency as a whole; however, it does not affect the process of condensation on the convex part of fins.     

Calculation of nuclear resonant scattering spectra of magnetic multilayers

We report on calculations of the angle- and time-dependent photon reflectivity of multilayers using the technique of characteristic matrices. Spectra of⁵⁶Fe/⁵⁷Fe and Cr/Fe multilayers are calculated under various conditions. The parameters of the multilayers are optimized for suitable test samples of reflectometry measurements.     

ZrO2／SiO2多层膜中膜厚组合周期数及基底材料对残余应力的影响

ZrO₂／SiO₂多层膜由相同沉积条件下的电子束蒸发方法制备而成， 通过改变多层膜中高(ZrO₂)、低(SiO₂)折射率材料膜厚组合周期数的方法，研究了沉积 在熔石英和BK7玻璃 基底上多层膜中残余应力的变化. 用ZYGO光学干涉仪测量了基底镀膜前后曲率半径的变化， 并确定了薄膜中的残余应力. 结果发现，该多层膜中的残余应力为压应力，随着薄膜中膜厚 组合周期数的增加，压应力值逐渐减小. 而且在相同条件下，石英基底上所沉积多层膜中的 压应力值要小于BK7玻璃基底上所沉积多层膜中的压应力值. 用x射线衍射技术测量分析了膜 厚组合周期数不同的ZrO₂／SiO₂多层膜微结构，发现随着周期数增 加，多层膜的结晶程 度增强. 同时多层膜的微结构应变表现出了与所测应力不一致的变化趋势，这主要是由多层 膜中，膜层界面之间复杂的相互作用引起的. 关键词： 2／SiO₂多层膜')" href="#">ZrO₂／SiO₂多层膜 残余应力 膜厚组合周期数     

50~110 nm波段高反射率多层膜的设计与制备

阐述了50~110 nm强吸收波段亚四分之一波长多层膜的设计方法.这种膜系是由强吸收材料叠加而成，每层膜光学厚度小于四分之一个波长.与常规周期多层膜相比，这种膜系更适用于提高强吸收波段的反射率.利用该方法设计了50 nm处高反射多层膜，并以此为初始条件通过Levenberg-Marquart优化方法完成了50~110 nm强吸收波段宽带高反射率Si/W/Co多层膜的设计，其平均反射率达到45%.采用直流磁控溅射方法制备了Si/W/Co多层膜,用X射线衍射仪(XRD)对膜层结构进行了测试，测试结果表明制作出的多层膜结构与设计结构基本相符.     

Influence of Ti/TiAlN-multilayer designs on their residual stresses and mechanical properties

In this research work, Ti/TiAlN multilayers of various designs were deposited onto substrates pretreated by different etching procedures. The influence of multilayer design and substrate pretreatment on multilayers adhesion, hardness, wear and friction coefficients was systematically analyzed and correlated with residual stresses of these multilayers as well as with residual stresses on the coating-near substrate region, which were analyzed by synchrotron X-ray diffraction at HZB-BESSYII. These investigations show that the adhesion can be improved by a specific etching procedure, which cause increased compressive stress in the coating-near the substrate region. Additionally, it was found, that the multilayer with the thickest ceramic layers has the highest hardness and the lowest wear coefficients as well as the lowest compressive residual stress within studied multilayers.     

Development of laser deposited multilayer zone plate structures for soft X-ray radiation

As a novel approach, the combination of pulsed laser deposition and focused ion beam was applied to fabricate different types of multilayer zone plate structures for soft X-ray applications. For this purpose, high quality non-periodic ZrO₂/Ti multilayers were deposited by pulsed laser deposition on planar Si substrates and on rotating steel wires with layer thicknesses according to the Fresnel zone plate law. Linear focusing optics were fabricated by cutting slices out of the multilayers by focused ion beam and placing them directly over pinholes within Si₃N₄ substrates. Additionally, it was shown that laser deposition of depth-graded multilayers on a wire is also a promising way for building up multilayer zone plates with point focus. First experiments using a table-top X-ray source based on a laser-induced plasma show that the determined focal length and spatial resolution of the fabricated multilayer Laue lens corresponds to the designed optic.     

Optimization for beaming effect from a subwavelength slit with periodically patterned metallic grooves

In this paper, we propose an optimizing method for the beaming effect from a slit aperture with finite metallic grooves. Aiming at the beaming effect of the structure at 0°, we analyze the effect of the parameters including groove depth, groove width and groove number of the structure on the diffraction efficiency as well as angular spectra in the far field by approximation of the boundary condition of the quasi-perfect conductor assumption and the fundamental mode. Our optimization results demonstrate that the diffraction at other angles is efficiently suppressed. Finally, we give several optimized parameters of three common wavelengths of 10.6 μm, 808 nm and 632.8 nm, on the basis of using the optimizing method. Although we analyze the beaming effect at 0° only, the method is also applicable to the analysis for other angles.     

Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering

Austenitic stainless steel can be attack by localized corrosion in saline environments, such as seawater. TiN/Ti multilayers can improve the corrosion resistance of the stainless steel better than TiN monolayers, because the titanium layers improve the impermeability of TiN/Ti multilayers. In this work, 1.75-4.55 μm thick layers were deposited on to grounded or −100 V biased substrates of 304 stainless steel substrates by reactive magnetron sputtering. The corrosion resistance of the layers was studied by means of potentiodynamic polarization in 0.5 M NaCl solutions. It was found that the pitting corrosion resistance was dependent on the bias and period number of the multilayers.     

Broadband and high efficiency metal multi-layer dielectric grating based on non-quarter-wave coatings as a reflective mirror

This article deals with designing a broadband and high efficiency metal multi-layer dielectric grating (MMDG) used to compress and stretch an ultrashort laser pulse. The diffraction characteristics of the MMDG are analysed by using the rigorous coupled-wave method. The multi-layer dielectric used as the reflective mirror is made up of non- quarter-wave coatings. Taking the diffraction efficiency of the 1 order as the value of merit function, the parameters such as groove depth, residual thickness, duty cycle, and reflective mirror are optimized to obtain broadband and high diffraction efficiency. The optimized MMDG shows an ultra-broadband working spectrum with the average efficiency exceeding 97% over 160 nm wavelength centred at 1053 nm and TE polarization. The optimized MMDG should be useful for chirped pulse amplification.     

Transparent conductive ITO/Ag/ITO multilayer electrodes deposited by sputtering at room temperature

ITO/Ag/ITO multilayers have been prepared onto conventional soda lime glass substrates by sputtering at room temperature. The optical and electrical characteristics of single layer and multilayer structures have been investigated as a function of the Ag and ITO film thicknesses. Transmittance and sheet resistance values are found mainly dependent on the Ag film thickness; whereas the wavelength range at which the maximum transmittance is achieved can be changed by adjusting the ITO films thickness. ITO/Ag/ITO electrodes with sheet resistance below 6 Ω/sq have been obtained for Ag film thickness above 10 nm and ITO layers thickness in the 30-50 nm range. These multilayers also show high transmittance in the visible spectral region, above 90% by discounting the glass substrate, with a maximum that is located at higher wavelengths for thicker ITO.     

Broadband and high efficiency metal multi-layer dielectric grating based on non-quarter wave coatings as reflective mirror

This article deals with designing broadband and high efficiency metal multi-layer dielectric grating (MMDG) used to compress and stretch ultra-short laser pulse. The diffraction characteristics of MMDG are analysed with the method of rigorous coupled-wave method. The multi-layer dielectric used as reflective mirror is made up of non-quarter wave coatings. Taking the diffraction efficiency of the -1 order as the value of merit function, the parameters such as groove depth, residual thickness, duty cycle, and reflective mirror are optimized to obtain broadband and high diffraction efficiency. The optimized MMDG shows an ultra-broadband working spectrum with the average efficiency exceeding 97% over 160 nm wavelength centred at 1053 nm and TE polarization. The optimized MMDG should be useful for chirped pulse amplification.     

Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods

The effects of repeating thickness periods on stress are studied in ZrO2/SiO2 multilayers deposited by electron-beam evaporation on BK7 glass and fused-silica substrates. The results show that the residual stress is compressive and decreases with an increase of the periods of repeating thickness in the ZrO2/SiO2 multilayers. At the same time, the residual stress in multilayers deposited on BK7 glass is less than that of samples deposited on fused silica. The variation of the microstructure examined by x-ray diffraction shows that microscopic deformation does not correspond to macroscopic stress, which may be due to variation of the interface stress.     

Laser scribing of gallium doped zinc oxide thin films using picosecond laser

We report on a comprehensive study of picosecond laser scribing of gallium doped zinc oxide (GZO) thin films deposited on glass substrates using 355 nm, 532 nm and 1064 nm radiation, respectively. In this study, we investigated the influence of front side and rear side irradiation and determined single pulse ablation thresholds for all three wavelengths. Good ablation quality with full electrical isolation, steep groove walls and a smooth groove bottom was achieved by 355 nm rear side processing with a scanning speed of 224 mm/s. Ridges at the groove rims were found to be between 15 nm and 45 nm high. At similar scanning speed, laser scribing using 532 nm and 1064 nm radiation resulted in a lower ablation quality due to a higher roughness of the groove bottoms or higher ridges at the groove rims.     

Growth and magnetism of Ni nanoparticles in Ni/Al2O3/Si or Si3N4 multilayers

We report on the fabrication of Ni/Al₂O₃/Si and textured Ni/Al₂O₃/Si₃N₄ multilayers containing Ni nanoparticles that exhibit significantly improved results. The secondary phases arising from thermal reaction between Ni and Si can be remarkably suppressed with increasing layers of Al₂O₃ and deposition of Ni/Al₂O₃ multilayers on Si₃N₄ substrates. Atomic force microscopy shows the formation of large as well as nanoclusters of Ni when grown on Si, whereas textured Ni nanoparticles are formed on Si₃N₄ substrates. The magnetization measurements on Ni/Al₂O₃/Si containing a single buffer layer of Al₂O₃ shows higher coercivity field with magnetic nanowire-like behavior, whereas with several Al₂O₃ alternate layers almost a superparamagnetic-like behavior is observed. However, significantly improved magnetic hysteresis was observed in textured Ni/Al₂O₃/Si₃N₄ multilayers due to preferred alignment of Ni nanocrystallites.     

磁控溅射方法制备垂直取向FePt/BN颗粒膜

用磁控溅射在热单晶MgO(100)基片上制备了［FePt/BN］多层膜，经真空热处理后，得到具有垂直取向L1₀-FePt/BN颗粒膜.X射线衍射结果和磁性测量的结果表明，［FePt(2nm)/BN(0.5nm)］₁₀和［FePt(1nm)/BN(0.25nm)］₂₀多层膜经700℃热处理1h后，均具有较好的(001)取向.［FePt(1nm)/BN(0.25nm)］₂₀垂直矫顽力达到522kA/m，剩磁比达到0.99，开关场分布S达到0.94，FePt晶粒平均尺寸约15—20nm，适合用于将来超高密度的垂直磁记录介质. 关键词： 磁控溅射 垂直磁记录 0-FePt/BN纳米颗粒膜')" href="#">L1₀-FePt/BN纳米颗粒膜     

Electrical peculiarities in Al/Si/Ge/…/Ge/Si and Al/SiGe/Si structures

The current–voltage (I–V) and capacitance–voltage (C–V) behaviour of different Si/Ge multilayers and SiGe single layers prepared on p-type Si substrates by magnetron sputtering and annealing, has been studied in the temperature range of 80–320 K by using Al Schottky contacts as test structures. Although a significant influence of the microstructure of the Si/Ge multilayers and SiGe layers was obtained on the electrical behaviour of the structures, the structures exhibited similar specific features.     

Development of Al-based multilayer optics for EUV

We report on the development of multilayer optics for the extreme ultra-violet (EUV) range. The optical performance of Al-based multilayer mirrors is discussed with regard to promising reflectivity and selectivity characteristics and the problems of the interfacial roughness for this type of multilayers. We demonstrate a possibility to reduce the average roughness by introducing additional metal layer (W or Mo) rather than depositing a buffer layer at each interface. We have prepared and tested Al/SiC, Al/W/SiC and Al/Mo/SiC multilayers of various periods for the spectral range from 15 to 40 nm, which is the range of increasing interest for high-order harmonic generation, synchrotron radiation and astrophysics. The structure of the three-component systems has been optimized in order to obtain the best reflectivity for each wavelength within the spectral range. We have shown that introduction of refractory metal in Al-based periodic stack can improve the optical performance of multilayer reflecting coatings designed for the EUV applications.     

Mo/Si多层膜表面保护层设计

为提高Mo/Si多层膜的稳定性与使用寿命,通过分析多层膜驻波电场的分布,对表面保护层及多层膜最上层材料的厚度进行优化设计,使优化后的反射率最高.计算表明,一定厚度的表面保护层总对应一个最优的最上层材料厚度.在13.36 nm波长,膜对数为50的Mo/Si多层膜10度入射的理论反射率为74.47%;当添加厚度为2.3 nm的Ru作为表面保护层,对应多层膜最上层Si的优化厚度为3.93 nm,其理论反射率为75.20％.设计结果表明,通过优化设计表面保护层,可以提高多层膜稳定性,改善多层膜性能.