Morphology,composition, structure and optical properties of thermally annealed Cu2O thin films prepared by reactive DC sputtering method

Abstract

Thin films copper oxides are perspective materials for many optoelectronic applications, including photovoltaics. The samples were deposited on glass and silicon substrates by magnetron sputtering method using Modular Platform PREVAC. After deposition the samples were thermally treated by annealing in oxygen atmosphere for 60?min at 450?°C. Morphology confirms that all the films have crystalline structure. Optical measurements show that the films have wide band gap within the range 2.20÷2.48?eV before and 2.03÷2.40?eV after annealing. The article presents the discussion about the influence of annealing on Cu₂O thin film parameters.     

Comparison of tin‐doped indium oxide films fabricated by spray pyrolysis and magnetron sputtering

A comparison of the properties between Tin‐doped Indium Oxide (ITO) films fabricated by sputtering and spray pyrolysis is presented. This analysis shows that the ITO films fabricated by DC magnetron sputtering in pure argon gas requires of a subsequent annealing for the improvement of their structural, electrical and optical properties, when they are compared to films fabricated by single‐stage spray pyrolysis process that includes a new approach. The optimum annealing temperature for ITO films sputtered at room temperature lies in the 300‐350 °C range. Under such conditions, the ITO sputtered films are slightly more resistive than the resistivity (2 × 10^‐4 Ω‐cm) shown by films sprayed at 480 °C using a solution with a 5 % of tin to indium ratio, and almost four times the worst value of the combination of transparency and conductivity determined by the value of the figure of merit (FOM). The sprayed films have a high value of the FOM, 2.9×10^‐2 Ω^‐1, which is comparable with the best published results.     

X‐ray diffraction analysis of powder and thin film of (Gd1‐x Yx)2O3 prepared by sol‐gel process

The mixed oxide (Gd_1‐xY_x)₂O₃ (0.0 ≤ x ≤ 1.0) were synthesized, as powder and thin film, by a sol‐gel process. X‐ray diffraction data were collected and crystal structure and microstructure analysis were performed using Rietveld refinement method. All samples were found to have the same crystal system and formed solid solutions over the whole range of x. The cationic distribution, Gd³⁺ and Y³⁺, over the two non‐equivalent sites 8b and 24d of the space group Ia3 is found to be random for all values of (x). The lattice parameter is found to vary linearly with the composition (x). Replacing Gd³⁺ and Y³⁺ by each other introduces a systemic decrease in the x‐coordinate of cation position (24d) and slight changes in the oxygen coordinates. Crystallite size and microstrain analysis is performed along different crystallographic directions and anisotropic changes are found with the composition parameter (x). The average crystallite size ranges from 75 to 149 nm and the r.m.s strain from 0.027 to 0.068 x10^‐2. Textured Gd_1.841Y_0.159O₃ (400) buffer layers, with a high degree of alignment in both out‐plane and in‐plan, are successfully grown on cube textured Ni (001) tape substrates by sol–gel dip coating process. The resulting buffer layers are crack‐free, pinhole‐free, dense and smooth. YbBa₂Cu₃O_7‐x (YbBCO) thin film could be (00l) epitaxially grown on the obtained buffer layer using sol–gel dipping technique. (© 2007 WILEY ‐VCH Verlag GmbH & Co. KGaA, Weinheim)