Nanostructured copper filaments in electrochemical deposition

In this Letter we report a novel self-organized copper electrodeposition in an ultrathin layer of CuSO4 electrolyte. The macroscopic fingering branches of the deposit consist of long copper filaments covered with periodic corrugated nanostructures. The mechanism of the nanostructure formation is explored and the origin of the significant descent of the branching rate in electrodeposition is discussed. We suggest that this growth phenomenon provides deeper insights into the role of diffusion and migration on pattern formation in electrodeposition.     

Optical and electrochemical properties of Cu-doped NiO films prepared by electrochemical deposition

Cu-doped nickel oxide (NiO) thin films were prepared by electrochemial deposition (cathodic deposition) technique onto the fluorine doped tin oxide (F: SnO₂; FTO) coated glass substrates from organic solutions. Effects of Cu content on the morphology, structure, optical and electrochromic properties of NiO films were investigated by means of scanning electron microscope (SEM), X-ray diffraction (XRD), ultraviolet-visible spectrophotometer (UV-vis) and cyclic voltammetry (CV), respectively. SEM images indicated the formation of nanorods after Cu was added. The films were formed with amorphous or short-range ordered NiO grains and a trace of face-centered cubic Ni_xCu_1−xO confirmed by XRD. The transmittances of both bleached state and colored state were significantly lowered when Cu was added. The NiO films doped with Cu (the molar ratio was 1/8) exhibited the optimum electrochromic behavior with a variation of transmittance (ΔT) up to ∼80% at the wavelength range of 350-600 nm. Cu doping reduces the response time for both the coloring and bleaching states, and the reversibility of the redox reaction was increased as well.     

电沉积制备磁性纳米线的研究进展

多孔阳极氧化铝为模板制备纳米结构材料具有独特的优越性,颇受人们的关注,近年来获得了深入的研究.文章介绍了用电化学沉积方法制备一维磁性纳米线的最新研究进展,阐述了各种结构磁性纳米线,包括单质、合金、多层、超晶格磁性纳米线的研究现状,展望了磁性纳米线的研究方向和在高密度垂直磁记录与巨磁电阻等方面的应用前景.     

电沉积制备磁性纳米线的研究进展

多孔阳极氧化铝为模板制备纳米结构材料具有独特的优越性,颇受人们的关注,近年来获得了深入的研究.文章介绍了用电化学沉积方法制备一维磁性纳米线的最新研究进展,阐述了各种结构磁性纳米线,包括单质、合金、多层、超晶格磁性纳米线的研究现状,展望了磁性纳米线的研究方向和在高密度垂直磁记录与巨磁电阻等方面的应用前景.     

Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition

We report a new Monte Carlo model to simulate the spontaneous oscillating growth in Cu(II)-acid electrochemical deposition system, and present the one-to-one correspondence between the oscillation of pH and the layered structure. Two mechanisms essential for the oscillation behavior, i.e. the adsorption and buffering, are incorporated into the deposition sequences. The simulation results are qualitatively in agreement with the experimental observations. Some system parameters essential for the oscillation generation are discussed. And through adjusting the adsorption ratio, the spatially columnar deposited structure is generated and the columnar alternative growth of copper and cuprous oxide phases is achieved.     

Characterization of copper SERS-active substrates prepared by electrochemical deposition

Surface Enhanced Raman Scattering (SERS) on copper substrates of various morphologies, prepared by electrochemical deposition on platinum targets, was investigated. The substrate preparation procedures differed by the coating bath compositions, applied current densities and the duration of individual steps. The surface morphology of the substrates was visualized by means of Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM). SERS spectra of selected organic thiols were measured and the relation between SERS spectral intensity and the surface structure of SERS-active substrates was studied. It has been shown that good Raman surface enhancement can be achieved on the copper substrates prepared by electrochemical deposition from ammoniac baths. Copper substrates fabricated from acidic baths did not show efficient Raman surface enhancement. The results of microscopic measurements demonstrated that the average surface roughness value does not play a substantial role, whereas the shape of the surface nanostructures is a key parameter.     

Film growth mechanisms in pulsed laser deposition

This paper reviews our recent studies of the fundamentals of growth morphology evolution in Pulsed Laser Deposition in two prototypical growth modes: metal-on-insulator island growth and semiconductor homoepitaxy. By comparing morphology evolution for pulsed laser deposition and thermal deposition in the same dual-use chamber under identical thermal, background, and surface preparation conditions, and varying the kinetic energy by varying the laser fluence or using an inert background gas, we have isolated the effect of kinetic energy from that of flux pulsing in determining the differences between morphology evolution in these growth methods. In each growth mode analytical growth models and Kinetic Monte Carlo simulations for thermal deposition, modified to include kinetic energy effects, are successful at explaining much of what we observe experimentally.     

Island growth in submonolayer deposition with aggregation and fragmentation

Island growth is studied in the case of island aggregation and break-up during submonolayer deposition. It is demonstrated that the island size distributions are of the scaling form and the mean island size has a power-law behaviour corresponding to hyperthermal deposition conditions. The corresponding scaling exponents are analytically derived and compared with the simulations by the revised particle coalescence method developed here. The scaling exponents are found to depend only on the homogeneity exponents of aggregation and fragmentation kernels.Received: 4 September 2003, Published online: 30 January 2004PACS: 68.55.-a Thin film structure and morphology - 68.35.Fx Diffusion; interface formation - 36.40.Sx Diffusion and dynamics of clustersPresent addressM. Rusanen: Institut Français du Pétrole, Groupe de Modélisation Moléculaire, BP 311, 92852 Rueil-Malmaison, France;Present address J. Asikainen: HRS F27, ETH Zentrum, 8092 Zürich, Switzerland     

Bistable growth in laser chemical vapor deposition

This is the first report on the observation of a bistability in laser-CVD. The effect is demonstrated for silicon deposition from silane by means of Ar⁺-laser radiation.     

Silver-coated graphene electrode produced by electrolytic deposition for electrochemical behaviors

This study evaluates the excellent electrochemical performance of silver (Ag)-coated graphene electrode using an electrolytic deposition technique. Ag particles are introduced to the graphene surface as a function of the applied current. A half cell of the Ag-coated graphene electrode is fabricated to examine the electrochemical performance, such as the charge–discharge behaviors, cyclic voltammetry, and specific capacitance. As a result, the electrochemical performance of the Ag-coated graphene electrode is two times higher than that of the crude graphene electrode.